Patents by Inventor Deepak Shukla

Deepak Shukla has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor devices and methods of preparation
    Patent number: 8692238
    Abstract: An organic film-forming polymer has a Tg of at least 70° C. and comprises a backbone comprising recurring units of Structure (A) shown in this application. These organic film-forming polymers can be used as dielectric materials in various devices with improved properties such as improved mobility.
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: April 8, 2014
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Douglas R. Robello, Mark R. Mis, Wendy G. Ahearn, Dianne M. Meyer
  • Fuel Cell Fleet Optimization
    Publication number: 20140089055
    Abstract: A fuel cell fleet has a plurality of fuel cell systems each connected to a data server. The data server may be configured to obtain operational data from of the plurality of fuel cell systems. An efficiency controller operably connected to the data server and is configured to predict an efficiency and a power output of the fleet from the operational data and optimize the efficiency of the fleet to minimize the fleet fuel consumption while maintaining a desired fleet output power. The efficiency may be determined by a ratio of the fleet output current or output power to the fleet fuel consumption.
    Type: Application
    Filed: September 25, 2012
    Publication date: March 27, 2014
    Applicant: BLOOM ENERGY CORPORATION
    Inventors: James SMITH, David WEINGAERTNER, Pramod VACHHANI, Brent MILLER, Ram RAMANAN, Arne BALLANTINE, Swaminathan VENKATARAMAN, Deepak SHUKLA
  • Photocuring methods and articles prepared therefrom
    Patent number: 8664287
    Abstract: Photocuring methods are made more efficient by using an N-oxyazinium salt photoinitiator with an organic phosphine as a photoinitiator efficiency amplifier. This photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment. The method can be used to prepare various articles, fibers, or devices with photocured compositions.
    Type: Grant
    Filed: May 16, 2011
    Date of Patent: March 4, 2014
    Assignee: Eastman Kodah Company
    Inventor: Deepak Shukla
  • VIRUS TRAPS
    Publication number: 20140056947
    Abstract: Specific applications of particles and particle agglomerates with semiconductor surfaces are provided. The particles and particle agglomerates display a high affinity for viral particles, and may be used therapeutically and/or prophylactically to treat or prevent viral infections. The particles and particle agglomerates may also be used to remove viral particles from a surface or fluid, e.g., as an absorbent in a filter, applied to surfaces to render them virostatic, and as tool to handle viral particles, e.g., for research, diagnostic, or decontamination purposes.
    Type: Application
    Filed: August 24, 2012
    Publication date: February 27, 2014
    Applicants: CHRISTIAN-ALBRECHTS-UNIVERSITAT ZU KIEL, THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS, WESTERN UNIVERSITY OF HEALTH SCIENCES, UNIVERSITATSKLINIKUM SCHLESWIG-HOLSTEIN
    Inventors: Rainer Adelung, Yogendra Kumar Mishra, Claudia Röhl, Deepak Shukla, Frank Spors, Vaibhav Tiwari
  • Methods of photocuring and imaging
    Patent number: 8632858
    Abstract: The photocuring efficiency of a photoinitiator is increased by mixing it with an organic phosphite and an aldehyde. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment.
    Type: Grant
    Filed: February 14, 2011
    Date of Patent: January 21, 2014
    Assignee: Eastman Kodak Company
    Inventor: Deepak Shukla
  • SEMICONDUCTOR DEVICES AND METHODS OF PREPARATION
    Publication number: 20130285061
    Abstract: An organic film-forming polymer has a Tg of at least 70° C. and comprises a backbone comprising recurring units of Structure (A) shown in this application. These organic film-forming polymers can be used as dielectric materials in various devices with improved properties such as improved mobility.
    Type: Application
    Filed: April 25, 2012
    Publication date: October 31, 2013
    Inventors: Deepak Shukla, Douqlas R. Robello, Mark R. Mis, Wendy G. Ahearn, Dianne M. Meyer
  • METHOD OF USING PHOTOCURABLE INKS
    Publication number: 20130260053
    Abstract: A photocurable ink contains a colorant dissolved or dispersed within a solvent, a photoinitiator, an organic phosphite, and a photocurable compound. This photocurable ink can be used for imaging or other applications where a uniform or patterned image is desired on a substrate. The photocurable ink can be cured partially before application, or totally cured after application.
    Type: Application
    Filed: May 31, 2013
    Publication date: October 3, 2013
    Inventor: Deepak Shukla
  • METHODS OF USING PHOTOCURABLE INKS
    Publication number: 20130260055
    Abstract: A method for using a photocurable ink including applying this photocurable ink to a suitable substrate. The photocurable ink can be partially cured during application, or fully cured after application. The photocurable ink contains a colorant dissolved or dispersed within a solvent, a photoinitiator, an organic phosphite, an aldehyde, and a photocurable compound. The organic phosphite is present in a molar excess relative to the aldehyde moieties that are present. The photocurable ink can be used for imaging or other applications where a uniform or patterned image is desired.
    Type: Application
    Filed: May 31, 2013
    Publication date: October 3, 2013
    Inventor: Deepak Shukla
  • Methods of preparing semiconductive compositions and devices
    Patent number: 8530270
    Abstract: An amic acid or amic ester precursor can be applied to a substrate and thermally converted into a semiconducting layer of the corresponding arylene diimide. This semiconducting thin film can be used in various articles including thin-film transistor devices that can be incorporated into a variety of electronic devices. In this manner, the arylene diimide need not be coated but is generated in situ from a solvent-soluble, easily coated precursor compound.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: September 10, 2013
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Dianne M. Meyer, Wendy G. Ahearn
  • METHOD FOR REDUCING GRAPHITE OXIDE
    Publication number: 20130180842
    Abstract: Graphite oxide can be converted to its reduced form (r-GO) using exposing radiation having a peak wavelength (?max) of less than 400 nm, and even less than 1 nm (X-rays). This conversion method is efficient and can be carried out with various forms of graphite oxide samples, with or without simultaneous application of heat, below atmospheric pressure, or in a reducing environment.
    Type: Application
    Filed: January 18, 2012
    Publication date: July 18, 2013
    Inventors: Thomas Nelson Blanton, Debasis Majumdar, E. Steven Brandt, Deepak Shukla
  • Articles containing coatings of amic acid salts
    Patent number: 8450726
    Abstract: An article includes a flexible or rigid substrate and dry layer comprising an aromatic, non-polymeric amic acid salt that can be thermally converted to a corresponding arylene diimide. Upon conversion of the aromatic, non-polymeric amic acid salt, the dry layer has semiconductive properties and can be used in various devices including thin-film transistor devices.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: May 28, 2013
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Dianne M. Meyer, Wendy G. Ahearn
  • Methods of providing semiconductor layers from amic acid salts
    Patent number: 8431433
    Abstract: A semiconductor layer and device can be provided using a method including thermally converting an aromatic, non-polymeric amic acid salt to a corresponding arylene diimide. The semiconducting thin films can be used in various articles including thin-film transistor devices that can be incorporated into a variety of electronic devices. In this manner, the arylene diimide need not be coated but is generated in situ from a solvent-soluble, easily coated aromatic, non-polymeric amic acid salt at relatively lower temperature because the cation portion of the salt acts as an internal catalyst.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: April 30, 2013
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Dianne M. Meyer, Wendy G. Ahearn
  • Semiconducting devices and methods of preparing
    Patent number: 8411489
    Abstract: An amic acid or amic ester precursor can be applied to a substrate to form a thin film, and is then thermally converted into a semiconducting layer of the corresponding arylene diimide. This semiconducting thin film can be used in various articles including thin-film transistor devices that can be incorporated into a variety of electronic devices. In this manner, the arylene diimide need not be coated onto the substrate but is generated in situ from a solvent-soluble, easily coated precursor compound.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: April 2, 2013
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Dianne M. Meyer, Wendy G. Ahearn
  • Aromatic amic acid salts and compositions
    Patent number: 8404892
    Abstract: Aromatic non-polymeric amic acid salts are designed to be thermally converted into corresponding arylene diimides. These aromatic, non-polymeric amic acid salts can be used to prepare semiconducting thin films that can be used in various articles including thin-film transistor devices that can be incorporated into a variety of electronic devices. In this manner, the arylene diimide need not be coated but is generated in situ from a solvent-soluble, easily coated aromatic, non-polymeric amic acid salt at relatively lower temperature because the cation portion of the amic acid salt acts as an internal catalyst.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: March 26, 2013
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Dianne M. Meyer, Wendy G. Ahearn
  • Photocurable compositions containing N-oxyazinium salt photoinitiators
    Patent number: 8399533
    Abstract: A photocurable composition includes at least one N-oxyazinium salt photoinitiator, a photosensitizer for the N-oxyazinium salt photoinitiator, an N-oxyazinium salt efficiency amplifier, and one or more photocurable acrylates. This composition can be cured using irradiation under high efficiency. Curing can be carried out in oxygen-containing environment.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: March 19, 2013
    Assignee: Eastman Kodak Company
    Inventor: Deepak Shukla
  • PHOTOCURING METHODS AND ARTICLES PREPARED THEREFROM
    Publication number: 20120295035
    Abstract: Photocuring methods are made more efficient by using an N-oxyazinium salt photoinitiator with an organic phosphine as a photoinitiator efficiency amplifier. This photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment. The method can be used to prepare various articles, fibers, or devices with photocured compositions.
    Type: Application
    Filed: May 16, 2011
    Publication date: November 22, 2012
    Inventor: Deepak Shukla
  • PHOTOINITIATOR AND PHOTOCURABLE COMPOSITIONS AND USES
    Publication number: 20120295999
    Abstract: The photocuring efficiency of an N-oxyazinium salt photoinitiator is increased by mixing it with an organic phosphine as a photoinitiator efficiency amplifier. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment.
    Type: Application
    Filed: May 16, 2011
    Publication date: November 22, 2012
    Inventor: Deepak Shukla
  • Aromatic amic acids or amic esters and compositions
    Patent number: 8314265
    Abstract: Novel amic acids and amic esters can be thermally converted into corresponding arylene diimides. These amic acids and amic ester can be used as precursors to prepare semiconducting thin films that can be used in various articles including thin-film transistor devices that can be incorporated into a variety of electronic devices. In this manner, the arylene diimides need not be coated out of solvent in which they may be insoluble, but they can be generated in situ from a solvent-soluble, easily coated amic acid or amic ester.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: November 20, 2012
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Dianne M. Meyer, Wendy G. Ahearn
  • Method of making N-type semiconductor devices
    Patent number: 8309394
    Abstract: An organic semiconducting composition consists essentially of an N,N-dicycloalkyl-substituted naphthalene diimide and a polymer additive comprising an insulating or semiconducting polymer having a permittivity at 1000 Hz of at least 1.5 and up to and including 5. This composition can be used to provide a semiconducting layer in a thin-film transistor that can be incorporated into a variety of electronic devices.
    Type: Grant
    Filed: January 22, 2010
    Date of Patent: November 13, 2012
    Assignee: Eastman Kodak Company
    Inventors: Deepak Shukla, Dianne M. Meyer
  • PHOTOCURABLE INKS WITH ALDEHYDES AND METHODS OF USE
    Publication number: 20120207945
    Abstract: A photocurable ink contains a colorant dissolved or dispersed within a solvent, a photoinitiator, an organic phosphite, an aldehyde, and a photocurable compound. The organic phosphite is present in a molar excess relative to the aldehyde moieties that are present. The photocurable ink can be used for imaging or other applications where a uniform or patterned image is desired. The photocurable ink can be cured partially before application, or totally cured after application.
    Type: Application
    Filed: February 14, 2011
    Publication date: August 16, 2012
    Inventor: Deepak Shukla