Abstract: The invention relates to a particle beam device (100) for imaging, analyzing and/or processing an object (114).

Abstract: A multipole element for creating a magnetic multipole field or for creating an electric-magnetic multipole field for a particle beam system such as a scanning electron microscope, for example, comprises: a tube surrounding a central axis of the multipole element; an external space assembly arranged outside of the tube and a vacuum space assembly arranged within the tube. The external space assembly comprises: a magnetically conductive circumferential pole piece surrounding the tube; a plurality of magnetically conductive supports arranged so as to be distributed around the central axis and extending from the circumferential pole piece up to an outer wall surface of the tube; and a plurality of coils. The vacuum space assembly comprises a plurality of magnetically conductive pole pieces arranged so as to be distributed around the central axis and extending from the tube in the direction of the central axis.

Abstract: A particle beam microscope comprises: a particle beam source for generating a particle beam; an objective lens for focusing the particle beam in an object plane; a first scintillator for converting electrons into light; a second scintillator for generating light by way of electrons; and light detectors for detecting the generated light. The distance of second scintillator from the object plane is greater than the distance of the first scintillator from the object plane. The second scintillator has a surface which faces the object plane and through which electrons arriving from the object plane pass. The electrons are converted into light by the second scintillator. The light generated by the first scintillator and detected by a light detector is incident on the second scintillator.

Abstract: Particle beam systems, for example electron beam microscopes, exhibit improved resolution in a first direction by manipulating a beam of charged particles so that the beam has a non-circular beam profile in a focal plane of an objective lens. Multiple images of a sample can be recorded at different orientations of the beam profile relative to the sample, and the recorded images can be synthesized using non-uniform spatial-frequency weights to obtain an image of the sample having improved resolution in any direction. The orientation of the beam profile can be adjusted to a target orientation depending on a structure on a sample prior to recording an image of the sample, thereby making it possible to achieve highest resolution in a selected direction of interest.

Abstract: A method for operating a particle beam microscopy system includes recording a first particle-microscopic image at a given first focus and varying the excitations of the first deflection device within a given first range. The method also includes changing the focus to a second focus, and determining a second range of excitations of the first deflection device on the basis of the first range, the first excitation, the second excitation and a machine parameter determined in advance. The method further includes recording a second particle-microscopic image at the second focus and varying the excitations of the first deflection device within the determined second range. The second range of excitations is determined so that a region of the object represented in the second particle-microscopic image was also represented in the first particle-microscopic image.

Abstract: A particle beam system includes a multiple beam particle source to generate a multiplicity of charged individual particle beams, and a multi-pole lens sequence with first and second multi-pole lens arrays. The particle beam system also includes a controller to control the multi-pole lenses of the multi-pole lens sequence so related groups of multi-pole lenses of the multi-pole lens sequence through which the same individual particle beam passes in each case altogether exert an individually adjustable and focussing effect on the respective individual particle beam passing therethrough.

Abstract: The invention relates to a particle beam device (100) for imaging, analyzing and/or processing an object (114).

Abstract: A method for operating a particle beam microscopy system includes recording a first particle-microscopic image at a given first focus and varying the excitations of the first deflection device within a given first range. The method also includes changing the focus to a second focus, and determining a second range of excitations of the first deflection device on the basis of the first range, the first excitation, the second excitation and a machine parameter determined in advance. The method further includes recording a second particle-microscopic image at the second focus and varying the excitations of the first deflection device within the determined second range. The second range of excitations is determined so that a region of the object represented in the second particle-microscopic image was also represented in the first particle-microscopic image.

Abstract: A particle beam generator for a particle beam device may be operated. A liquid metal may be provided from a container of a particle source to an emission device of the particle source and a first heating cycle for cleaning the particle source performed, which may comprise supplying a heating current to a heating device arranged at the emission device using a current supply unit, heating the emission device during a heating time period, measuring a value of a voltage drop at the heating device and/or at the current supply unit and adjusting at least one of: the heating current and the heating time period using the current supply unit, depending on the measured value of the voltage drop. A second heating cycle for cleaning the particle source may include using at least one of: the adjusted heating current and the adjusted heating time period, for heating the emission device.

Abstract: A particle beam apparatus includes a first aperture unit having an adjustable aperture opening. The particle beam apparatus may include a first condenser lens having a first pole shoe and a second pole shoe. Both the first pole shoe and the second pole shoe may be adjustable relative to a second aperture unit independently of each other. The second aperture unit may be designed as a pressure stage aperture separating a first area having a vacuum at a first pressure, and a second area having a vacuum at a second pressure. Additionally, a method for adjusting a beam current in a particle beam apparatus is provided.

Abstract: A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field B1 having lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure.

Abstract: A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field B1 having lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure.

Abstract: A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.

Abstract: A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field B1 having lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure.

Abstract: A method for operating a particle beam apparatus. An objective lens current may be swept, and a property of a deflection unit and/or of an aperture unit may be set while the objective lens current is swept. Setting the property may implemented in such a way that either an image of the object displayed on a display device does not move or any such movement of the displayed image has a minimal deflection. Moreover, the operating voltage of a beam generator may be swept and the object may be aligned by means of a specimen stage. While the operating voltage is swept, the specimen stage may be moved into an aligned position in such a way that either the image of the object displayed on the display device does not move or any such movement of the displayed image has a minimal deflection.

Abstract: An analysis device, possibly having an electrostatic and/or magnetic lens, analyzes the energy of charged particles and has an opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device. Another portion of the charged particles passes through the opposing field grid device and is detected by a detector. The opposing field grid device has a curvature. A center of curvature is an intersection point of an optical axis with the opposing field grid device. The curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis. The opposing field grid device is curved in the direction of the starting point as viewed from the center of curvature and/or is arranged to be displaceable along the optical axis.

Abstract: A method of adjusting a particle beam microscope includes measures A, B, C and D.

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract: A method for operating a particle beam apparatus. An objective lens current may be swept, and a property of a deflection unit and/or of an aperture unit may be set while the objective lens current is swept. Setting the property may implemented in such a way that either an image of the object displayed on a display device does not move or any such movement of the displayed image has a minimal deflection. Moreover, the operating voltage of a beam generator may be swept and the object may be aligned by means of a specimen stage. While the operating voltage is swept, the specimen stage may be moved into an aligned position in such a way that either the image of the object displayed on the display device does not move or any such movement of the displayed image has a minimal deflection.

Abstract: A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.