Patents by Inventor Dirk Preikszas
Dirk Preikszas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11915907Abstract: A method for operating a particle beam microscopy system includes recording a first particle-microscopic image at a given first focus and varying the excitations of the first deflection device within a given first range. The method also includes changing the focus to a second focus, and determining a second range of excitations of the first deflection device on the basis of the first range, the first excitation, the second excitation and a machine parameter determined in advance. The method further includes recording a second particle-microscopic image at the second focus and varying the excitations of the first deflection device within the determined second range. The second range of excitations is determined so that a region of the object represented in the second particle-microscopic image was also represented in the first particle-microscopic image.Type: GrantFiled: February 1, 2022Date of Patent: February 27, 2024Assignee: Carl Zeiss Microscopy GmbHInventors: Dirk Preikszas, Simon Diemer
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Publication number: 20220415604Abstract: A particle beam system includes a multiple beam particle source to generate a multiplicity of charged individual particle beams, and a multi-pole lens sequence with first and second multi-pole lens arrays. The particle beam system also includes a controller to control the multi-pole lenses of the multi-pole lens sequence so related groups of multi-pole lenses of the multi-pole lens sequence through which the same individual particle beam passes in each case altogether exert an individually adjustable and focussing effect on the respective individual particle beam passing therethrough.Type: ApplicationFiled: August 30, 2022Publication date: December 29, 2022Inventors: Dirk Preikszas, Hans Fritz, AndrĂ¡s G. Major
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Publication number: 20220367142Abstract: The invention relates to a particle beam device (100) for imaging, analyzing and/or processing an object (114).Type: ApplicationFiled: March 16, 2022Publication date: November 17, 2022Applicant: Carl Zeiss Microscopy GmbHInventors: Dirk Preikszas, Michael W. Phaneuf
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Publication number: 20220246389Abstract: A method for operating a particle beam microscopy system includes recording a first particle-microscopic image at a given first focus and varying the excitations of the first deflection device within a given first range. The method also includes changing the focus to a second focus, and determining a second range of excitations of the first deflection device on the basis of the first range, the first excitation, the second excitation and a machine parameter determined in advance. The method further includes recording a second particle-microscopic image at the second focus and varying the excitations of the first deflection device within the determined second range. The second range of excitations is determined so that a region of the object represented in the second particle-microscopic image was also represented in the first particle-microscopic image.Type: ApplicationFiled: February 1, 2022Publication date: August 4, 2022Inventors: Dirk Preikszas, Simon Diemer
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Patent number: 11380519Abstract: A particle beam generator for a particle beam device may be operated. A liquid metal may be provided from a container of a particle source to an emission device of the particle source and a first heating cycle for cleaning the particle source performed, which may comprise supplying a heating current to a heating device arranged at the emission device using a current supply unit, heating the emission device during a heating time period, measuring a value of a voltage drop at the heating device and/or at the current supply unit and adjusting at least one of: the heating current and the heating time period using the current supply unit, depending on the measured value of the voltage drop. A second heating cycle for cleaning the particle source may include using at least one of: the adjusted heating current and the adjusted heating time period, for heating the emission device.Type: GrantFiled: November 5, 2020Date of Patent: July 5, 2022Assignee: Carl Zeiss Microscopy GmbHInventor: Dirk Preikszas
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Patent number: 11139140Abstract: A particle beam apparatus includes a first aperture unit having an adjustable aperture opening. The particle beam apparatus may include a first condenser lens having a first pole shoe and a second pole shoe. Both the first pole shoe and the second pole shoe may be adjustable relative to a second aperture unit independently of each other. The second aperture unit may be designed as a pressure stage aperture separating a first area having a vacuum at a first pressure, and a second area having a vacuum at a second pressure. Additionally, a method for adjusting a beam current in a particle beam apparatus is provided.Type: GrantFiled: July 22, 2010Date of Patent: October 5, 2021Assignee: Carl Zeiss Microscopy GmbHInventors: Dirk Preikszas, Michael Albiez
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Patent number: 11087949Abstract: A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field B1 having lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure.Type: GrantFiled: August 20, 2020Date of Patent: August 10, 2021Assignee: Carl Zeiss Microscopy GmbHInventors: Dirk Preikszas, Bernd Hafner
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Publication number: 20200381206Abstract: A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field B1 having lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure.Type: ApplicationFiled: August 20, 2020Publication date: December 3, 2020Inventors: Dirk Preikszas, Bernd Hafner
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Patent number: 10854421Abstract: A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.Type: GrantFiled: June 3, 2019Date of Patent: December 1, 2020Assignees: Carl Zeiss Microscopy GmbH, Carl Zeiss Microscopy Ltd.Inventors: Daniela Donhauser, Christian Mueller, Barry Chamley, Tobias Volkenandt, Dirk Preikszas, Giuseppe Pavia, Heiko Stegmann
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Patent number: 10755889Abstract: A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field B1 having lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure.Type: GrantFiled: March 26, 2018Date of Patent: August 25, 2020Assignee: Carl Zeiss Microscopy GmbHInventors: Dirk Preikszas, Bernd Hafner
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Patent number: 10699869Abstract: A method for operating a particle beam apparatus. An objective lens current may be swept, and a property of a deflection unit and/or of an aperture unit may be set while the objective lens current is swept. Setting the property may implemented in such a way that either an image of the object displayed on a display device does not move or any such movement of the displayed image has a minimal deflection. Moreover, the operating voltage of a beam generator may be swept and the object may be aligned by means of a specimen stage. While the operating voltage is swept, the specimen stage may be moved into an aligned position in such a way that either the image of the object displayed on the display device does not move or any such movement of the displayed image has a minimal deflection.Type: GrantFiled: February 19, 2019Date of Patent: June 30, 2020Assignee: Carl Zeiss Microscopy GmbHInventors: Dirk Preikszas, Gero Walter
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Patent number: 10665423Abstract: An analysis device, possibly having an electrostatic and/or magnetic lens, analyzes the energy of charged particles and has an opposing field grid device to which a voltage is applied in such a way that a portion of the charged particles is reflected by the opposing field grid device. Another portion of the charged particles passes through the opposing field grid device and is detected by a detector. The opposing field grid device has a curvature. A center of curvature is an intersection point of an optical axis with the opposing field grid device. The curvature has a radius of curvature which is given by the section between the center of curvature and a starting point on the optical axis. The opposing field grid device is curved in the direction of the starting point as viewed from the center of curvature and/or is arranged to be displaceable along the optical axis.Type: GrantFiled: June 15, 2016Date of Patent: May 26, 2020Assignee: Carl Zeiss Microscopy GmbHInventor: Dirk Preikszas
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Patent number: 10629404Abstract: A method of adjusting a particle beam microscope includes measures A, B, C and D.Type: GrantFiled: November 13, 2018Date of Patent: April 21, 2020Assignee: Carl Zeiss Microscopy GmbHInventor: Dirk Preikszas
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Patent number: 10546717Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.Type: GrantFiled: March 19, 2018Date of Patent: January 28, 2020Assignee: Carl Zeiss Microscopy GmbHInventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen
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Publication number: 20190318905Abstract: A method for operating a particle beam apparatus. An objective lens current may be swept, and a property of a deflection unit and/or of an aperture unit may be set while the objective lens current is swept. Setting the property may implemented in such a way that either an image of the object displayed on a display device does not move or any such movement of the displayed image has a minimal deflection. Moreover, the operating voltage of a beam generator may be swept and the object may be aligned by means of a specimen stage. While the operating voltage is swept, the specimen stage may be moved into an aligned position in such a way that either the image of the object displayed on the display device does not move or any such movement of the displayed image has a minimal deflection.Type: ApplicationFiled: February 19, 2019Publication date: October 17, 2019Applicant: Carl Zeiss Microscopy GmbHInventors: Dirk Preikszas, Gero Walter
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Publication number: 20190304743Abstract: A charged particle beam system includes a charged particle source, an extraction electrode, a suppressor electrode, a first variable voltage supply for biasing the extraction electrode with an extraction voltage and a second variable voltage supply for biasing the suppressor electrode with a suppressor voltage.Type: ApplicationFiled: June 3, 2019Publication date: October 3, 2019Inventors: Daniela Donhauser, Christian Mueller, Barry Chamley, Tobias Volkenandt, Dirk Preikszas, Giuseppe Pavia, Heiko Stegmann
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Publication number: 20190148104Abstract: A method of adjusting a particle beam microscope includes measures A, B, C and D.Type: ApplicationFiled: November 13, 2018Publication date: May 16, 2019Inventor: Dirk Preikszas
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Publication number: 20180286625Abstract: A beam deflector includes a magnetic-flux-guiding structure which has an opening through which a beam axis extends, and at least two coils arranged at the magnetic-flux-guiding structure so that they produce a magnetic field B1 having lines passing through the two coils in succession, leave the magnetic-flux-guiding structure at a first location on a first side in relation to the beam axis, cross the beam axis at a second location which is arranged at a distance along the beam axis from the magnetic-flux-guiding structure, re-enter into the magnetic flux-guiding structure at a third location on a second side lying opposite the first side, and extend around the opening from the third location to the first location within the magnetic-flux-guiding structure.Type: ApplicationFiled: March 26, 2018Publication date: October 4, 2018Inventors: Dirk Preikszas, Bernd Hafner
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Patent number: 10062542Abstract: A method for operating a particle beam microscope includes: setting potentials of a particle source and an object; directing a particle beam onto the object; setting an excitation of a particle-optical lens; generating a dependence between a manipulated variable and the excitation so that the excitation is representable as a monotonic function dependent on the manipulated variable; changing the manipulated variable via an actuating element to focus the particle beam at the object; and determining a target value of the manipulated variable in a manner dependent on the set potentials. The target value virtually corresponds to an ideal excitation of the lens. The particle beam in the case of the ideal excitation is focused at the object. The absolute value of the first derivative of the function in a value range containing the target value is less than in the case of values lying outside of this value range.Type: GrantFiled: January 29, 2016Date of Patent: August 28, 2018Assignee: Carl Zeiss Microscopy GmbHInventor: Dirk Preikszas
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Publication number: 20180211815Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.Type: ApplicationFiled: March 19, 2018Publication date: July 26, 2018Inventors: Edgar Fichter, Joerg Fober, Dirk Preikszas, Christian Hendrich, Michael Schnell, Momme Mommsen