Patents by Inventor Dirk Preikszas
Dirk Preikszas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8217350Abstract: A particle optical arrangement providing an electron microscopy system 3 and an ion beam processing system 7 comprises an objective lens 43 of the electron microscopy system having an annular electrode 59 being a component of the electron microscopy system arranged closest to a position 11 of an object to be examined. Between the annular electrode and a principal axis 9 of the ion beam processing system 7 a shielding electrode 81 is arranged.Type: GrantFiled: November 23, 2007Date of Patent: July 10, 2012Assignee: Carl Zeiss NTS GmbHInventor: Dirk Preikszas
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Publication number: 20120138814Abstract: A particle beam device includes a particle beam generator, an objective lens, and first and second deflection systems for deflecting the particle beam in an object plane defined by the objective lens. In a first operating mode, the first deflection system generates a first deflection field and the second deflection system generates a second deflection field. In a second operating mode, the first deflection system generates a third deflection field and the second deflection system generates a fourth deflection field.Type: ApplicationFiled: November 29, 2011Publication date: June 7, 2012Applicants: CARL ZEISS NTS LTD., CARL ZEISS NTS GMBHInventors: Dirk Preikszas, Armin Heinz Hayn
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Patent number: 8129693Abstract: A charged particle beam column includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens.Type: GrantFiled: June 26, 2009Date of Patent: March 6, 2012Assignee: Carl Zeiss NTS GmbHInventor: Dirk Preikszas
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Publication number: 20120025095Abstract: A charged particle beam system includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens.Type: ApplicationFiled: September 28, 2011Publication date: February 2, 2012Applicant: Carl Zeiss NTS GmbHInventor: Dirk Preikszas
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Patent number: 8063364Abstract: A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.Type: GrantFiled: December 22, 2009Date of Patent: November 22, 2011Assignee: Carl Zeiss NTS GmbHInventors: Dirk Preikszas, Michael Steigerwald, Daniel Tobias, Andreas Eisele, Momme Mommsen, Dietmar Doenitz, Christian Hendrich
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Publication number: 20110220788Abstract: An apparatus for focusing and for storage of ions and an apparatus for separation of a first pressure area from a second pressure area are disclosed, in particular for an analysis apparatus for ions. A particle beam device may have at least one of the abovementioned apparatuses. A container for holding ions and at least one multipole unit are provided. The multipole unit has a through-opening with a longitudinal axis as well as a multiplicity of electrodes. A first set of the electrodes is at a first radial distance from the longitudinal axis. A second set of the electrodes is in each case at a second radial distance from the longitudinal axis. The first radial distance is less than the second radial distance. Alternatively or additionally, the apparatus may have an elongated opening with a radial extent. The opening has a longitudinal extent which is greater than the radial extent.Type: ApplicationFiled: January 27, 2011Publication date: September 15, 2011Inventors: Alexander Laue, Albrecht Glasmachers, Christian Hendrich, Dirk Preikszas, Michel Aliman, Hubert Mantz, Ulrike Zeile, Holger Dömer
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Publication number: 20110215242Abstract: A particle beam device and a method for operation of a particle beam device are disclosed. The particle beam device has a sample chamber, a sample arranged in the sample chamber, a first particle beam column, a second particle beam column and at least one detector arranged in a first cavity in a first hollow body. The first cavity has a first inlet opening. The first particle beam column and the second particle beam column are arranged on one plane, while the detector is not arranged on that plane. At least one control electrode is arranged on the first particle beam column. The second particle beam column has a terminating electrode. A first hollow body voltage, a control electrode voltage and/or a terminating electrode voltage are/is chosen such that first interaction particles and/or second interaction particles enter the first cavity in the first hollow body through the first inlet opening.Type: ApplicationFiled: January 27, 2011Publication date: September 8, 2011Inventor: Dirk Preikszas
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Publication number: 20110108736Abstract: An SACP method includes directing a beam of charged particles onto an object surface of an object using a particle optical system, and detecting intensities of particles emanating from the object. The method further includes: (a1) adjusting an excitation of the second beam deflector for adjusting an impingement location of the beam on the object surface; (a2) adjusting an excitation of the first beam deflector for adjusting an angle of incidence of the beam on the object surface without changing the impingement location and detecting the intensity; and (a3) repeating the adjusting of the excitation of the first beam deflector for adjusting the angle of incidence without changing the impingement location such that a corresponding intensity is detected for each of at least 100 different angles of incidence at the same impingement location.Type: ApplicationFiled: November 9, 2010Publication date: May 12, 2011Applicant: CARL ZEISS NTS GMBHInventor: Dirk Preikszas
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Patent number: 7910887Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.Type: GrantFiled: February 27, 2009Date of Patent: March 22, 2011Assignee: Carl Zeiss NTS GmbHInventors: Michael D. G. Steigerwald, Dirk Preikszas, Volker Drexel
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Publication number: 20110049361Abstract: A particle beam apparatus includes a first aperture unit having an adjustable aperture opening. The particle beam apparatus may include a first condenser lens having a first pole shoe and a second pole shoe. Both the first pole shoe and the second pole shoe may be adjustable relative to a second aperture unit independently of each other. The second aperture unit may be designed as a pressure stage aperture separating a first area having a vacuum at a first pressure, and a second area having a vacuum at a second pressure. Additionally, a method for adjusting a beam current in a particle beam apparatus is provided.Type: ApplicationFiled: July 22, 2010Publication date: March 3, 2011Inventors: Dirk Preikszas, Michael Albiez
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Publication number: 20100327179Abstract: A charged particle beam column includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens.Type: ApplicationFiled: June 26, 2009Publication date: December 30, 2010Applicant: CARL ZEISS NTS GMBHInventor: Dirk Preikszas
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Publication number: 20100294930Abstract: Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size fat the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least din the first direction, and a ratio d/f being 2 or more.Type: ApplicationFiled: December 12, 2008Publication date: November 25, 2010Applicant: CARL ZEISS NTS GMBHInventors: Dirk Preikszas, Michael Steigerwald, Joerg Ackermann
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Publication number: 20100258738Abstract: A device for deflecting a particle beam out of a beam axis, or for guiding a particle beam into the beam axis, has a simple design, requires little space, and additionally ensures that no area of an object that is not to be struck is struck by a particle beam. The device may include components in the following sequence along the beam axis: first deflection element, a magnetic apparatus for providing a magnetic field axially to the beam axis, and a second deflection element. A particle beam apparatus may have a device of this type.Type: ApplicationFiled: September 26, 2008Publication date: October 14, 2010Inventor: Dirk Preikszas
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Publication number: 20100155597Abstract: A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.Type: ApplicationFiled: December 22, 2009Publication date: June 24, 2010Applicant: CARL ZEISS NTS GMBHInventors: Dirk PREIKSZAS, Michael STEIGERWALD, Daniel TOBIAS, Andreas EISELE, Momme MOMMSEN, Dietmar DOENITZ, Christian HENDRICH
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Publication number: 20100044566Abstract: A positioning device and a particle beam apparatus including a positioning device ensure reliable positioning of a holder for holding an object at any working distance. The positioning device includes a positionable holder for holding the object. A light source generates a light beam which is guided in the direction of the positionable holder. A detector detects the light beam. An injection area injects particles of a particle beam such that they are guided in the direction of the positionable holder. The light beam passes the injection area. The injection area has an output side for the light beam and the particle beam, which is directed toward the holder. The detector includes a detector element situated in an area between the output side and the holder. The light source includes a light source element situated in an area which extends away from the holder, starting from the output side.Type: ApplicationFiled: May 14, 2009Publication date: February 25, 2010Inventors: Dietmar DONITZ, Dirk PREIKSZAS, Michael STEIGERWALD
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Publication number: 20090309025Abstract: A particle optical arrangement providing an electron microscopy system 3 and an ion beam processing system 7 comprises an objective lens 43 of the electron microscopy system having an annular electrode 59 being a component of the electron microscopy system arranged closest to a position 11 of an object to be examined. Between the annular electrode and a principal axis 9 of the ion beam processing system 7 a shielding electrode 81 is arranged.Type: ApplicationFiled: November 23, 2007Publication date: December 17, 2009Inventor: Dirk Preikszas
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Publication number: 20090309024Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.Type: ApplicationFiled: February 27, 2009Publication date: December 17, 2009Inventors: MICHAEL D.G. STEIGERWALD, DIRK PREIKSZAS, VOLKER DREXEL
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Patent number: 7523009Abstract: An instrument, in particular an electron microscope, has at least one user controllable operating parameter and at least one further operating parameter having a required value at least partially dependent on that of the user controllable parameter. A number of possible values of the further operating parameter are stored in a memory and each stored value corresponds to a respective possible value of the user controllable parameter. Selecting one of said stored possible values causes the instrument to be controlled accordingly. There is also provided a tuner for enabling the user to alter the selected value and updating apparatus for updating the memory accordingly, so that the adjusted value of the further operating parameter is subsequently selected from the memory if the same value of the user controllable parameter is then chosen again.Type: GrantFiled: August 12, 2003Date of Patent: April 21, 2009Assignee: Carl Zeiss NTS GmbHInventors: Dirk Preikszas, David Ralph Hubbard
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Patent number: 7507962Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.Type: GrantFiled: November 8, 2006Date of Patent: March 24, 2009Assignee: Carl Zeiss NTS GmbHInventors: Michael D. G. Steigerwald, Dirk Preikszas, Volker Drexel
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Patent number: 7425701Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.Type: GrantFiled: January 13, 2004Date of Patent: September 16, 2008Assignee: Carl Zeiss NTS GmbHInventors: Michael D. G. Steigerwald, Dirk Preikszas, Volker Drexel