Abstract: Optical system (40) for observing multiple objects (61, 63) positioned distal from one another, having a camera unit (42) comprising a first prism unit (43) positioned on the optical axis (41) and/or in the beam path (47) of the camera unit for producing two partial beam paths (48, 49) as well as two object prism units (51, 52), each of which is situated in a partial beam path and assigned to an object.

Abstract: A method and device for transferring a chip (18) situated on a transfer substrate (26) to a contact substrate (50), and for contacting the chip with the contact substrate, in which the chip, the back side (19) of which is attached adhesively to a support surface of the transfer substrate facing the contact substrate, is charged with laser energy from behind through the transfer substrate, and the chip contacts (59, 60) thereof that are arranged opposite a contact surface (58) of the contact substrate are brought into contact with substrate contacts (56, 57) arranged on the contact surface by means of a pressing device (45, 46) from behind through the transfer substrate, and a thermal bond is created between the chip contacts and the substrate contacts.

Abstract: A method and a device for the mutual contacting of two wafer-type component composite configurations made of multiple identical components which are implemented coherently, in particular a semiconductor wafer (12) with a functional component wafer (14), to produce electronic assemblies on the wafer level, in which the component composite configurations are each situated on a receptacle unit (11; 13) and the contact pressure necessary for the contacting between contact metallizations of the component composite configurations to be connected to one another is generated in such a way that a vacuum is generated in a contact chamber which receives the component composite configurations and is delimited by the receptacle units, and the contacting of the contact metallizations is performed by a rear energy impingement of a component composite configuration.

Abstract: A method and device for alternately contacting two wafer-like component composite arrangements (12, 14) consisting of a plurality of cohesively designed similar components, in particular of a semiconductor wafer with a function component wafer for manufacturing electronic modules on a wafer level, in which the two component composite arrangements, each provided with contact metallizations on their opposing contact surfaces (38, 39), are brought into a coverage position with their contact metallizations to form contact pairs, in which position the contact metallizations that are to be joined together are pressed against one another, the contact metallizations being thereby contacted by exposing the rear of one of the component composite arrangements (12) to laser radiation (20), the wavelength of the laser radiation being selected as a function of the degree of absorption of the component composite arrangement exposed to laser radiation at the rear, so that a transmission of the laser radiation through the com

Abstract: In order to apply solder material (20) to a workpiece (1), compressed gas is guided through a bore hole (5) of a capillary (3). A pressure sensor (13) situated in the bore hole (5) measures the dynamic pressure of the compressed gas. As soon as the tip (12) of the capillary approaches the workpiece (1), the dynamic pressure increases and is used as a measure for the distance between the tip (12) of the capillary (3) and the workpiece (1), enabling the feed motion of the capillary to be controlled.

Abstract: Process for the formation of a spatial chip arrangement having several chips (32, 36, 37, 38, 39) arranged in several planes and electrically connected to one another, in which the chips are connected via their peripheral connection surfaces (33) to assigned conducting paths (23) of a conducting-path structure (24, 25) arranged on at least one carrier substrate (21, 22) by the chips being arranged transverse to the longitudinal extent of the carrier substrate.

Abstract: The invention relates to a method for producing a contact substrate (10) as well as to a contact substrate with through-plating between a connector arrangement (21) arranged at the top of a dielectric carrier substrate (12) and the underside of the carrier substrate, wherein the connector arrangement extends along an aperture margin (22) of a substrate recess (15), and the underside (11) of the carrier substrate (12) is supported by a backstop (23), wherein a formed solder material part (24) is placed in the substrate recess (15), and in a subsequent method-related step said formed solder material part (24) is deformed within the substrate recess so as to form a formed contact part (50), such that radial displacement of the material of the formed solder material part in the substrate recess results in a non-positive connection between an intrados surface (28) of the substrate recess and the connector arrangement (21), and that the formed contact part provides through-plating between the connector arrangement

Abstract: The invention relates to a device for applying pieces of material to a workpiece. Said device comprises a plurality of capillaries which respectively bring a piece of material (6) to a work station (3) in one working cycle. The piece of material is placed on the work station. A filling station fills a circular conveyer with a number of pieces of material (6) corresponding to the number of capillaries (4). An extracting station (19) is arranged in the transport path from the filling station (18) to the machining station (4?), said extracting station (19) extracting individual fragments of material (6) in a selective manner.

Abstract: Contact bump construction (27) and method for the production of a contact bump construction for the formation of elevated contact sites on connecting surfaces (22) of a substrate (21), particularly chip connecting surfaces, with a spacer metallization (28) for the attainment of a defined height of the contact bump construction, wherein the spacer metallization (28) consists at least partly of annealed copper.

Abstract: A method is provided for producing a substrate arrangement. The process includes the preparation of a substrate and bringing connecting surfaces of the substrate into contact with inner contacts of a wiring layer, the application of contact material to outer contacts of the wiring layer defining an outer connecting surface arrangement to form base contact bumps (31) and the application of joining material to the base contact bumps to form contact bump tops joined to the base contact bumps, wherein the joining material is applied as joining material moldings (35) and the contact bump tops are formed by at least partial melting of the joining material moldings by the action of laser energy.

Abstract: The device for positioning a tool (1) in relation to a workpiece (6) controls drives (2, 3, 4) in relation to three spatial axes (x, y, z) through two cameras (10, 11), the first (1) of which takes an image essentially along a spatial axis (y), the other (11) being oriented essentially vertically with respect to a surface (8) of the workpiece.

Abstract: An apparatus for applying solder balls to a substrate and for remelting the solder balls on soldering points of the substrate has a capillary for supplying a solder ball to the soldering points and for placing the solder ball at the free end of the capillary opposite the soldering point, a means for supplying heat to the solder ball to remelt it, and a pressing apparatus for holding down the substrate to prevent the substrate from being resilient when placing and remelting the solder ball.

Abstract: In order to apply solder material (20) to a workpiece (1), compressed gas is guided through a bore hole (5) of a capillary (3). A pressure sensor (13) situated in the bore hole (5) measures the dynamic pressure of the compressed gas. As soon as the tip (12) of the capillary approaches the workpiece (1), the dynamic pressure increases and is used as a measure for the distance between the tip (12) of the capillary (3) and the workpiece (1), enabling the feed motion of the capillary to be controlled.

Abstract: The invention relates to a method for ablating a plurality of raised points of contact (11, 12, 13, 17, 18) that consist of a metal, such as tin or indium, that is meltable above a first temperature, or an alloy thereof, such as tin-containing solder, silver-containing solder or lead-containing solder, said points of contacts being distributed across a substrate (10). It is also possible to produce convex domes on a plurality of metal support segments that are located on one of the surfaces of a substrate. The aim of the invention is to reduce production costs, especially to remove a soldered spot once produced that turns out to be defective. To this end, a plurality of the raised points of contact (11, 12), especially substantially all points of contact, are at least substantially melted off from the substrate (10) by touching them with a molten metal (30, 31, 32).

Abstract: A method for contacting microchips is provided, in which an adhesive is deposited such on a side of a substrate, on which a conductor trace is located, and/or on a side of a microchip, on which at least one bump is located, such that a liquid layer of adhesive is formed on the same. Subsequent to adjusting the microchips such that the at least one bump is located above a predetermined site on the conductor trace of the substrate, a press contact between the at least one bump and the predetermined site is produced by exerting a pressure between the microchip and the substrate, with the adhesive being subsequently cured.

Abstract: The device for positioning a tool (1) in relation to a workpiece (6) controls drives (2, 3, 4) in relation to three spatial axes (x, y, z) through two cameras (10, 11), the first (1) of which takes an image essentially along a spatial axis (y), the other (11) being oriented essentially vertically with respect to a surface (8) of the workpiece.

Abstract: An apparatus for applying solder balls to a substrate (7, 9) and for remelting the solder balls on soldering points (6) of the substrate (7, 9) has a capillary (3) for supplying a solder ball (5) to the soldering points (6) and for placing the solder ball (5) at the free end (4) of the capillary (3) opposite the soldering point, a means for supplying heat to the solder ball (5) to remelt it, and a pressing apparatus (10) for holding down the substrate (7, 9) to prevent the substrate (7, 9) from being resilient when placing and remelting the solder ball (5).

Abstract: A method for manufacturing a bump on a terminal face (Z1) of a semiconductor substrate (20), in which the terminal face is nucleated to generate a basic metallization through electrolytic coating of the terminal face with zincate, in such a way that zinc particles (24) electrolytically deposited on the terminal face serve as nuclei for an ensuing contact metallization (28) autocatalytically deposited on the basic metallization. In addition to the electrolytic coating with zincate, an electrolytic coating of the terminal face with palladium takes place, in such a way that, in addition to zinc particles (24), palladium particles (25) deposited on the terminal face serve as nuclei for the contact metallization subsequently autocatalytically deposited on the terminal face.

Abstract: A treatment device for cleaning or ashing surfaces of flat wafers (10), wherein at least one flat base plate (30) is provided as an electrode in a treatment chamber (40), said treatment chamber being adapted to be evacuated. Depressions (31) are formed and distributed in said base plate such that they are suitable for receiving support pieces (20), said depressions having at least one arrangement or positioning adapted to a shape of a wafer to be treated. Each support piece has at least one support surface a height of which, after inserting a support piece into a respective depression, comes to rest at a level (a) above the base plate.

Abstract: Contact bump construction (27) and method for the production of a contact bump construction for the formation of elevated contact sites on connecting surfaces (22) of a substrate (21), particularly chip connecting surfaces, with a spacer metallization (28) for the attainment of a defined height of the contact bump construction, wherein the spacer metallization (28) consists at least partly of annealed copper.