Abstract: A device includes first and second semiconductor chips. The first semiconductor chip includes an edge defining a periphery of the first semiconductor chip. The second semiconductor chip is greater in size than the first semiconductor chip. The second semiconductor chip is stacked over the first semiconductor chip so that the second semiconductor chip hangs over from the edge of the first semiconductor chip. The second semiconductor chip includes a plurality of wiring patterns including a first wiring pattern that positions over the edge of the first semiconductor chip, an insulating film which covers the wiring patterns and which includes on or more holes that expose one or more the wiring patterns, and one or more bump electrodes formed on the one or more the wiring patterns. Remaining one or ones of the wiring patterns is kept covered by the insulating layer and includes the first wiring pattern.

Abstract: A semiconductor device comprises a conductor film and a capacitor comprising a lower electrode provided on the conductor film. The conductor film includes a first conductive film containing a first metal, a second conductive film containing a second metal on the first conductive film, and an oxide film of the second metal on the second conductive film. The oxide film of the second metal has a lower electric resistivity than an oxide film of the first metal.

Abstract: A wafer (or a circuit board), which is used to perform three-dimensional mounting, has protrusion 20 which is provided in low melting point metal 15 for electrically connecting mutually joined wafers 61 and 62, and which defines an interval between mutually joined wafers 61 and 62 without being deformed at the time when low melting point metal 15 is melted. A joining structure of wafers 61 and 62 is manufactured by using wafers 61 and 62, at least one of which has protrusion 20. In the manufactured joining structure of wafers 61 and 62, wafers 61 and 62 are electrically connected to each other by low melting point metal 15, and protrusion 20, which defines the interval between wafers 61 and 62 without being deformed at the time when low melting point metal 15 is melted, is provided in low melting point metal 15.

Abstract: A semiconductor device according to this invention includes a first power line that supplies power to a first circuit, a second power line that supplies power to a second circuit, and a capacitive element that is provided between the first power line and the second power line.

Abstract: Disclosed herein is a semiconductor device that includes a clock terminal supplied with a first clock signal from outside; a dividing circuit dividing a frequency of the first clock signal to generate a plurality of second clock signals that are different in phase from one another; a multiplier circuit multiplying the second clock signals to generate a third clock signal, the multiplexer having a predetermined operating delay time; a data strobe terminal supplied with a first data strobe signal from outside; a strobe signal generation circuit adding the predetermined operating delay time to the first data strobe signal to generate a second data strobe signal; and a skew detection circuit measuring a skew between the third clock signal and the second data strobe signal.

Abstract: Disclosed herein is a semiconductor chip that includes: a semiconductor chip body including a semiconductor substrate and a circuit element layer provided on a main surface of the semiconductor substrate, the circuit element layer including a plurality of circuit elements; first to fourth penetrating electrodes penetrating the semiconductor chip body; a first conductive path electrically connected between the first penetrating electrode and the second penetrating electrode without being in contact with any one of the circuit elements; a second conductive path electrically connected between the first penetrating electrode and the third penetrating electrode without being in contact with any one of the circuit elements; and a third conductive path electrically connected between the second penetrating electrode and the fourth penetrating electrode without being in contact with any one of the circuit elements.

Abstract: This semiconductor device according to the present invention includes a plurality of cylindrical lower electrodes aligned densely in a memory array region; a plate-like support which is contacted on the side surface of the cylindrical lower electrodes, and links to support the plurality of the cylindrical lower electrodes; a pore portion provided in the plate-like support; a dielectric film covering the entire surface of the cylindrical lower electrodes and the plate-like support in which the pore portion is formed; and an upper electrode formed on the surface of the dielectric film, wherein the boundary length of the part on the side surface of the cylindrical lower electrode which is exposed on the pore portion is shorter than the boundary length of the part on the side surface of the cylindrical lower electrode which is not exposed on the pore portion.

Abstract: A semiconductor device includes a high-breakdown voltage transistor in which at least first and second vertical transistor are connected in series to each other. The first vertical transistor includes a first unit transistor group having a plurality of unit transistors each having a semiconductor pillar. The second vertical transistor includes a second unit transistor group having a plurality of unit transistors each having a semiconductor pillar. The plurality of unit transistors constituting the first and the second unit transistor groups have pillar lower diffusion layers which are shared.

Abstract: A device including first and second semiconductor chips, each of first and second semiconductor chips including first to M-th penetration electrodes, M being an integer equal to or greater than 3, each of the first to M-th penetration electrodes penetrating through a semiconductor substrate, and the first semiconductor chip including a first input circuit coupled to the M-th penetration electrode of the first semiconductor chip at an input node thereof, the first and second semiconductor chips being stacked with each other in which the first to M-th penetration electrodes of the second semiconductor chip are vertically arranged respectively with the first to M-th penetration electrodes of the first semiconductor chip, in which the first to (M?2)-th penetration electrodes of the second semiconductor chip are electrically coupled to the second to (M?1)-th penetration electrodes of the first semiconductor chip, respectively.

Abstract: A controller includes a set of first terminals to be coupled to a device that is under control of the controller, and a control circuit configured to generate and output onto the set of first terminals edge specifying information that takes a selected one of first and second states, the edge specifying information being supplied to the device to cause the device to activate a data strobe signal at a first timing when the selected one of the edge specifying information is the first state and at a second timing, that is different from the first timing, when the edge specifying information is the second state, the control circuit being further configured to generate and output onto the set of first terminals a read command, the read command being supplied to the device to cause the device to return to the controller a data signal.

Abstract: Disclosed herein is a memory module that includes a plurality of command address connectors formed on the module substrate, a plurality of memory devices mounted on the module substrate, and a plurality of command address register buffers mounted on the module substrate. The command address connectors receive a command address signal from outside. The memory devices include a plurality of first memory devices and a plurality of second memory devices. The command address register buffers include a first command address register buffer that supplies the command address signal to the first memory devices and a second command address register buffer that supplies the command address signal to the second memory devices.

Abstract: A method of manufacturing a semiconductor device, comprising preparing a wiring substrate and mounting a first rectangular semiconductor chip having plural of first electrodes arranged along short sides thereof on the wiring substrate. A second rectangular semiconductor chip having plural of second electrodes arranged along short sides thereof is stacked on the first semiconductor chip so that the short sides of the second semiconductor chip are perpendicular to the short sides of the first semiconductor chip and that gaps are formed between the wiring substrate and short side portions of the second semiconductor chip. The method further comprises filling the gaps with a first resin from locations near long sides of the second semiconductor chip in a direction parallel to the short sides of the second semiconductor chip. The first and the second electrodes are connected to connection pads of the wiring substrate by first and second wires, respectively.

Abstract: In a semiconductor device, the thickness of an insulating film formed in a through hole is reduced, while an annular groove having an insulating material embedded therein is provided so as to ensure a sufficient total thickness of the insulator, whereby a through silicon via is provided with an insulating ring which is improved in both processability and functionality.

Abstract: A device has a first substrate having a first surface; a first electrode pad arranged on the first surface of the first substrate; a first insulator film provided on the first surface of the first substrate so that the first electrode pad is exposed; a first bump electrode provided on the first electrode pad and having a first diameter; and a second bump electrode provided on the first insulator film and having a second diameter smaller than the first diameter.

Abstract: To provide a memory array for information bit that stores information bits, a memory array for check bit that stores check bits, a correction circuit that, in response to a write request, reads the information bit and the check bit corresponding to a write address from the respective memory arrays and corrects an error included in the information bit, and a mixer temporarily holding information bit corrected by the correction circuit. The mixer overwrites only a part of bytes of the held information bits with write data according to a byte mask signal. Accordingly, a capacity required for the memory array for check bit can be reduced while the byte mask function is maintained.

Abstract: Disclosed herein is a device that includes a first semiconductor chip outputting a read command and a clock signal, a plurality of second semiconductor chips stacked to the first semiconductor chip, and a signal path electrically connected between the first and second semiconductor chips. Each of the second semiconductor chips performs a read operation to read out a data signal stored therein in response to the read command. Each of the second semiconductor chips includes a counter circuit performing a count operation in response to the clock signal to generate a count signal, and an output control circuit outputs the data signal to the signal path when the count signal indicates a predetermined value. The predetermined values of the second semiconductor chips are different from one another.

Abstract: A method for manufacturing a semiconductor device includes at least forming a lower electrode comprising titanium nitride on a semiconductor substrate, forming a dielectric film comprising zirconium oxide as a primary constituent on the lower electrode, forming a first protective film comprising a titanium compound on the dielectric film, and forming an upper electrode comprising titanium nitride on the first protective film. The method can include a step of forming a second protective film on the lower electrode before the step of forming the dielectric film on the lower electrode.

Abstract: A method for doping a dielectric material by pulsing a first dopant precursor, purging the non-adsorbed precursor, pulsing a second precursor, purging the non-adsorbed precursor, and pulsing a oxidant to form an intermixed layer of two (or more) metal oxide dielectric dopant materials. The method may also be used to form a blocking layer between a bulk dielectric layer and a second electrode layer. The method improves the control of the composition and the control of the uniformity of the dopants throughout the thickness of the doped dielectric material.

Abstract: A method for forming a DRAM MIM capacitor stack having low leakage current involves the use of a first electrode that serves as a template for promoting the high k phase of a subsequently deposited dielectric layer. The high k dielectric layer comprises a doped material that can be crystallized after a subsequent annealing treatment. An amorphous blocking is formed on the dielectric layer. The thickness of the blocking layer is chosen such that the blocking layer remains amorphous after a subsequent annealing treatment. A second electrode layer compatible with the blocking layer is formed on the blocking layer.

Abstract: A method for forming a DRAM MIM capacitor stack having low leakage current involves the use of a first electrode that serves as a template for promoting the high k phase of a subsequently deposited dielectric layer. The high k dielectric layer comprises a doped material that can be crystallized after a subsequent annealing treatment. A metal oxide second electrode layer is formed above the dielectric layer. The metal oxide second electrode layer has a crystal structure that is compatible with the crystal structure of the dielectric layer. Optionally, a second electrode bulk layer is formed above the metal oxide second electrode layer.