Abstract: A decomposable ROM image sequentially including an OS header corresponding to an OS image, the OS image, a non-OS header corresponding to a non-OS image and the non-OS image. To compose the decomposable ROM image, the OS header, which includes OS size information of the OS image and the non-OS header, which includes non-OS size information of the non-OS image are created first. Then, the OS header, the OS image, the non-OS header and the non-OS image are sequentially combined. To decompose the decomposable ROM image, the OS image is retrieved from the ROM image according to the OS size information obtained from the OS header. The non-OS image is then retrieved from the ROM image according to the non-OS size information obtained from the non-OS header.

Abstract: A method for etching a polysilicon gate structure in a plasma etch chamber is provided. The method initiates with defining a pattern protecting a polysilicon film to be etched. Then, a plasma is generated. Next, substantially all of the polysilicon film that is unprotected is etched. Then, a silicon containing gas is introduced and a remainder of the polysilicon film is etched while introducing a silicon containing gas. An etch chamber configured to introduce a silicon containing gas during an etch process is also provided.

Abstract: A method and related apparatus for reordering access requests used to access main memory of a data processing system. The method includes receiving one or more access requests for accessing the memory device in a first predetermined order, and reordering the access requests in a second predetermined order to be processed in a request queue by relocating a first access request to follow a second access request accessing a same memory page to increase processing efficiency. In addition, the relocating is prohibited if it increases a processing latency for a third access request to exceed a predetermined limit.

Abstract: The present invention relates to personal cleansing wipes articles which have superior softness, feel and cleansing properties. The wipes of the present invention comprise a substrate and an aqueous liquid cleansing composition which is coated onto or impregnated into said substrate to the extent of from about 100% to about 400% by weight of the substrate. The substrate is a single-layer, nonwoven substrate which is formed from hydroentangled fibers. Upon a substantial portion of a base surface comprising the substrate there exists a three-dimensional pattern comprising a plurality of discrete, raised fibrous regions. The raised fibrous regions have a density which is substantially the same as the density of the base surface. The raised fibrous regions are joined to the base surface by a fibrous transition region. The aqueous liquid cleansing composition comprises an effective amount of a cleansing surfactant.

Abstract: The present invention discloses a tool control system (TCS) having an operation management interface providing an interface for an operator to communicate with the tool control system and with an associated piece of processing equipment to allow coordination between manual and automatic dispatching of FOUPs (Front Opening Unified Pods) to the equipment within a full automatic fab. The TCS provides a daily monitoring support function allowing operators to decide when to perform a daily monitor and when to manually insert selected lots into the TCS. Additionally, a method of using the TCS to relax the loading of a wafer dispatching system is disclosed. The method provides for using manual and automated pre-dispatching functions to allow manual insertion of FOUPs within an overhead transport system and to allow prioritizing of individual wafer lots and batches of wafer lots with real-time activity in a manner optimally minimizing downtime within the TCS.

Abstract: The present invention discloses a tool control system (TCS) having an operation management interface providing an interface for an operator to communicate with the tool control system and with an associated piece of processing equipment to allow coordination between manual and automatic dispatching of FOUPS to the equipment within a full automatic fab. The TCS provides a daily monitoring support function allowing operators to decide when to perform a daily monitor and when to manually insert selected lots into the TCS. Additionally, a method of using the TCS to relax the loading of a wafer dispatching system is disclosed. The method provides for using manual and automated pre-dispatching functions to allow manual insertion of FOUPs within an overhead transport system and to allow prioritizing of individual wafer lots and batches of wafer lots with real-time activity in a manner optimally minimizing downtime within the TCS.

Abstract: A thin film deposition method using plasma enhanced chemical vapor deposition is described. In a plasma enhanced chemical vapor deposition chamber, plasma is used to enhance the chemical reaction to form a thin film on a substrate. The substrate is then removed, followed by passing a cleaning gas into the chamber to remove residues in the chamber. Before loading another batch of substrate in the chamber, a pre-deposition process is performed to isolate contaminants generated from the cleaning process. A discharge plasma treatment is then conducted to lower the amount of accumulated electrical charges.

Abstract: A processing station for forming an insulating film comprises a chemical vapor deposition (CVD) unit, a cleaning unit, a cassette station that receives a plurality of substrates, and a transfer system. The transfer system effectuates the conveyance of a substrate being processed between the CVD unit, the cleaning unit, and the cassette station. The CVD unit is placed in a position facing the cassette station, the transfer system is disposed between the CVD unit and the cassette station, and the cleaning unit is positioned proximate to the transfer system. Within the processing station, a substrate is subjected to an operating cycle that includes a plurality of deposition passes alternated with at least a wet cleaning operation. Each deposition pass forms a thickness of insulating layer smaller than the desired thickness of insulating film. Each wet cleaning operation removes residual particles from an intermediary insulating layer.

Abstract: A program testing system includes an event list, a random selector, and a state machine. The event list records events that a to-be-tested program can handle. The random selector randomly selects the to-be-tested event from the event list. According to a current state and the contents of a state transition table of the to-be-tested program, the state machine determines whether the to-be-tested event is valid in relation to the current state. When the state machine determines that, in relation to the current state, the to-be-tested event is a valid event, the program testing system then based on this result uses a valid to-be-tested event to test the to-be-tested program. The present invention also discloses a program testing method for achieving the above-mentioned system.

Abstract: A decomposable ROM image sequentially including an OS header corresponding to an OS image, the OS image, a non-OS header corresponding to a non-OS image and the non-OS image. To compose the decomposable ROM image, the OS header, which includes OS size information of the OS image and the non-OS header, which includes non-OS size information of the non-OS image are created first. Then, the OS header, the OS image, the non-OS header and the non-OS image are sequentially combined. To decompose the decomposable ROM image, the OS image is retrieved from the ROM image according to the OS size information obtained from the OS header. The non-OS image is then retrieved from the ROM image according to the non-OS size information obtained from the non-OS header.

Abstract: The present invention discloses a CMP pad dresser which has a plurality of uniformly spaced abrasive particles protruding therefrom. The abrasive particles are super hard materials, and are typically diamond, polycrystalline diamond (PCD), cubic boron nitride (cBN), or polycrystalline cubic boron nitride(PcBN). The abrasive particles are brazed to a substrate which may be then coated with an additional anti-corrosive layer. The anti-corrosive layer is usually a diamond or diamond-like carbon which is coated over the surface of the disk to prevent erosion of the brazing alloy by the chemical slurry used in conjunction with the CMP pad. This immunity to chemical attack allows the CMP pad dresser to dress the pad while it is polishing a workpiece. In addition to even spacing on the substrate, the abrasive particles extend for a uniform distance away from the substrate, allowing for even grooming or dressing of a CMP pad both in vertical and horizontal directions.

Abstract: Disclosed is a screw with an improved head, in which a stress-relieving notch is formed at each corner of a driving recess on the screw head. The stress-relieving notch is in an equal arcuate shape. Apart from the well known slotted or Phillips one, the driving recess is also available with a triangle, square, hexagonal, or any other multiangular form in section.

Abstract: The present invention discloses a CMP pad dresser which has a plurality of uniformly spaced abrasive particles protruding therefrom. The abrasive particles are super hard materials, and are typically diamond, polycrystalline diamond (PCD), cubic boron nitride (cBN), or polycrystalline cubic boron nitride(PcBN). The abrasive particles are brazed to a substrate which may be then coated with an additional anti-corrosive layer. The anti-corrosive layer is usually a diamond or diamond-like carbon which is coated over the surface of the disk to prevent erosion of the brazing alloy by the chemical slurry used in conjunction with the CMP pad. This immunity to chemical attack allows the CMP pad dresser to dress the pad while it is polishing a workpiece. In addition to even spacing on the substrate, the abrasive particles extend for a uniform distance away from the substrate, allowing for even grooming or dressing of a CMP pad both in vertical and horizontal directions.

Abstract: A method is provided for fabricating an array of memory cells for a dynamic random access memory. Each memory cell has an associated capacitor. An array of memory cell transistors is formed and each memory cell transistor has a source, a drain and a gate. The source is coupled to a bit line, and the gate is coupled to a word line. A lower conductive layer is formed over the array of memory cell transistors. The lower conductive layer is electrically coupled to the source of the memory cell transistors. A temporary insulation layer is formed over the lower conductive layer. A portion of the temporary insulation layer and the lower conductive layer are removed to form an electrically separate capacitor bottom plate for each memory cell and an inter-capacitor isolation region. A lateral portion of the temporary insulation layer is removed to form a capacitor sidewall spacing region. A protective layer is formed to fill the inter-capacitor isolation region and the capacitor sidewall spacing region.

Abstract: A method is provided for fabricating a stacked capacitor in a storage node (memory cell) of a dynamic random access memory (DRAM) that exceeds the photolithography limit. A DRAM has an array of memory cells and each memory cell has an associated capacitor. An array of memory cell transistors is formed and each memory cell transistor has a source, drain and gate. The drain is coupled to a bit line, and the gate coupled to a word line. A lower conductive layer is formed over the array of memory cell transistors. The lower conductive layer is electrically coupled to the source of each of the memory cell transistors. A protective layer is patterned and formed over a predetermined portion of the lower conductive layer for defining an inter-capacitor isolation region. A portion of the lower conductive layer is removed to form a bottom plate of the capacitor associated with each memory cell, such that a protected portion of the lower conductive layer under the protective layer is removed.

Abstract: A copper replenishment system for replenishing copper which is depleted from a copper plating solution. The replenishment is achieved by the use of a compact filter cartridge, which is inserted into a recirculating loop for the solution. The filter cartridge contains a chemical, which when reacting with the solution replenishes the copper into the solution. The filter cartridge is a compact unit which can be easily handled and reduces the amount of contaminants that could be introduced by the presence of the replenishment chemical.

Abstract: A motorcycle rear wheel brake pedal comprises a brake tread rod, a tread plate, a tread plate base, a fastening plate, and a fastening element. The brake tread rod is fastened at one end thereof with a motorcycle frame and is provided at another end thereof with a pedal seat on which the fastening plate is retained securely. The tread plate base is secured to the upper surface of the fastening plate and is provided on the upper surface thereof with a plurality of skidproof elongated ribs fastened thereto. The tread plate is provided with a plurality of elongated through holes corresponding in location, number and shape to the skidproof elongate ribs of the tread plate base. The tread plate is fastened to the tread plate base such that the skidproof elongate ribs of the tread plate base are received in and jutted out of the elongate through holes of the tread plate for providing the tread plate with a skidproof surface.

Abstract: An improved motorcycle step and assembly of interlocking components including an axle for connection to the motorcycle frame the axle featuring a tapered section for engaging an inner sleeve having a plurality of ribs formed along its outer surface, the inner sleeve being composed of a soft material and being locatable on the axle, an outer sleeve having a plurality of slots corresponding to the ribs which is adapted to slide over the inner sleeve and receive the ribs and a locating element formed on the end of the outer sleeve to receive a projection from the axle where the outer sleeve has an optional decorative cover plate.

Abstract: An improved brake lever includes a lever body, a protective strip and a cap. The lever body is provided with a longitudinal slot which has a narrowed slit merged into the lever body at both ends of the longitudinal slot. The protective strip can be readily received and retained with the longitudinal slot. The end portion of the lever body has a flat portion which is provided with a dowel hole. The dowel hole has a narrowed inlet. The bottom side of the cap is incorporated with a bead. By this arrangement, the bead of the cap can be readily received and retained by the dowel hole. Accordingly, a compact and firm engagement is ensured between the cap and the lever body. Consequently, an improved brake lever with above described advantages is achieved.

Abstract: A improved footrest includes a supporting bracket which is made from rigid material and a supporting stuffing which is made from soft material. The first supporting bracket has a hollow chamber at its center and is provided with a plurality of elongate slots formed in its wall. The supporting stuffing has a passage defined in the center and a plurality of projecting ribs formed on its outer surface in alignment with the slots of the supporting bracket. A shaft member is received and retained within the passage of the supporting stuffing to provide a rigid support to the supporting stuffing and the supporting bracket. The shaft member has a cylindrical recess at one end and a hole is provided through the outer wall of the shaft member such that the hole is in communication with the recess. A connecting adaptor has a lug at one end and a shaft at the other end. The lug of the connecting adaptor has a hole therein and can be attached to a frame of the motorcycle using a bolt and a nut.