Abstract: A fan includes a frame, an impeller and a motor. The impeller includes a hub, a plurality of blades, first air-guiding plates and second air-guiding plates. The hub has a tapered shape. A width of the hub gradually increases along a direction from a top portion of the hub to a bottom portion of the hub. The hub has at least an air vent. The blades are disposed around an outer periphery of the hub. The first air-guiding plates and the second air-guiding plates are disposed around an inner periphery of the hub. The first air-guiding plates are arranged between two of the second air-guiding plates in staggered. The second air-guiding plates are arranged between two of the first air-guiding plates in staggered. The first air-guiding plates and the second air-guiding plates have different thicknesses, heights or shapes.

Abstract: A light emitting device includes a light emitting diode package structure. The light emitting diode package structure includes a circuit structure, a plurality of light emitting diodes, and an encapsulation layer. The light emitting diodes are disposed on the circuit structure and electrically connected to the circuit structure. The encapsulation layer covers top surfaces and side surfaces of the light emitting diodes and a side surface of the circuit structure.

Abstract: Disclosed are small molecule antagonists of human ?4?7 integrin, and methods of using them to treat a number of diseases and conditions.

Abstract: A fan module is adapted to be disposed on a mainboard. The fan module includes a base, a stator unit, a circuit board, a first restriction structure and a second restriction structure. The base includes a mounting shaft and a base opening, wherein the mounting shaft has an axis. The mounting shaft is telescoped in the stator unit. The circuit board is coupled to the stator unit, wherein the circuit board includes a circuit board connection port. The first restriction structure restricts the circuit board, wherein the first restriction structure is arranged on the first straight line, and the first restriction structure is disposed a first distance away from the axis. The second restriction structure restricts the circuit board, wherein the second restriction structure is arranged on the second straight line, the second restriction structure is disposed a second distance away from the axis.

Abstract: A display panel repair device includes a supporting part, a picking part, and a debonding part. The supporting part is configured to carry a display panel and control a movement of the display panel. The display panel includes a display substrate and a plurality of light-emitting diodes (LEDs) fixing on the display substrate by binding material. The picking part is located on a side of the supporting part used to carry the display panel and configured for removing a LED from the display substrate and placing a new LED on the display substrate. The debonding part is configured to heat the display substrate from a side of the display substrate away from the picking part to melt the binding material.

Abstract: An impeller includes a hub and a plurality of blades. The blades are arranged around the hub, and each blade includes a leading edge, a blade tip, a root portion, a trailing edge, a windward side and a leeward side. The windward side including a first turning point and a second turning point, a first vertical height difference is formed from the blade tip to the first turning point, and a second vertical height difference is formed from the first turning point to the second turning point, and the first vertical height difference is greater than the second vertical height difference. The impeller apparently reduces the noise.

Abstract: The present disclosure describes a method of patterning a semiconductor wafer using extreme ultraviolet lithography (EUVL). The method includes receiving an EUVL mask that includes a substrate having a low temperature expansion material, a reflective multilayer over the substrate, a capping layer over the reflective multilayer, and an absorber layer over the capping layer. The method further includes patterning the absorber layer to form a trench on the EUVL mask, wherein the trench has a first width above a target width. The method further includes treating the EUVL mask with oxygen plasma to reduce the trench to a second width, wherein the second width is below the target width. The method may also include treating the EUVL mask with nitrogen plasma to protect the capping layer, wherein the treating of the EUVL mask with the nitrogen plasma expands the trench to a third width at the target width.

Abstract: Disclosed are small molecule inhibitors of ?v?6 integrin, and methods of using them to treat a number of specific diseases or conditions.

Abstract: An impeller is provided, including a metal housing, a shaft, and a plastic member. The metal housing has a shaft mounting hole. The inner surface of the shaft mounting hole includes three or more contact points, and the contact points are closer to the shaft than other portions of the inner surface of the shaft mounting hole. The shaft passes through the shaft mounting hole and is affixed by the contact points. The metal housing divides the shaft into an upper section, a middle section, and a lower section. The plastic member passes through the shaft mounting hole and is in contact with the middle section.

Abstract: A fan includes a fan frame and a driving device. The fan frame includes a base, a frame shell and static blades arranged on the periphery of the base. The driving device includes a stator structure and a rotor structure. The stator structure includes a stator magnetic pole group and a bushing. The rotor structure includes a bearing, a shaft, a rotor shell, a magnetic structure, a magnetic shell and blades. The shaft is connected with the rotor shell and disposed through the bearing. The stator magnetic pole group magnetically drives the magnetic structure to rotate the rotor shell. Two ends of the frame shell are configured with two turning portions, respectively. The two turning portions are disposed between parts of the frame shell with different curvatures. A curvature of the first turning portion is larger than a curvature of the second turning portion.

Abstract: A method for preparing carbon black from pyrolysis char of waste tires by a molten salt thermal treatment and a product thereof are provided. The method includes heating one or two groups of a metal chloride salt group and a metal sulfate group to obtain a molten salt; adding pyrolysis char of waste tires into the molten salt and subjecting same to a molten salt thermal treatment under a preset reaction atmosphere; after the reaction is complete, separating the reaction product to obtain a secondary molten salt and treated pyrolysis char, washing the treated pyrolysis char with hot water and then drying same so as to obtain carbon black, and at the same time, recycling the secondary molten salt.

Abstract: An impeller is provided, including a metal housing, a shaft, and a plastic member. The metal housing has a shaft mounting hole. The inner surface of the shaft mounting hole includes three or more contact points, and the contact points are closer to the shaft than other portions of the inner surface of the shaft mounting hole. The shaft passes through the shaft mounting hole and is affixed by the contact points. The metal housing divides the shaft into an upper section, a middle section, and a lower section. The plastic member passes through the shaft mounting hole and is in contact with the middle section.

Abstract: A fan includes a fan frame and a driving device. The fan frame includes a base, a frame shell and static blades arranged on the periphery of the base. The driving device includes a stator structure and a rotor structure. The stator structure includes a stator magnetic pole group and a bushing. The rotor structure includes a bearing, a shaft, a rotor shell, a magnetic structure and blades. The shaft is connected with the rotor shell and disposed through the bearing. The stator magnetic pole group magnetically drives the magnetic structure to rotate the rotor shell. The blades are arranged on the periphery of the rotor shell. Two ends of the frame shell are configured with two turning portions, respectively. The two turning portions are disposed between parts of the frame shell with different curvatures.

Abstract: Disclosed are small molecule inhibitors of ?v?6 integrin, and methods of using them to treat a number of diseases and conditions.

Abstract: The invention provides a low-temperature hydrogen oxidation system comprising at least one hydrogen oxidation device, at least one hydrogen reaction module is disposed in the hydrogen oxidation device, at least one hydrogen reaction channel is formed in the hydrogen reaction module and is provided with at least one catalyst, the hydrogen oxidation device is provided with at least one gas inlet channel and at least one gas outlet channel to communicate with the hydrogen reaction channel, at least one cooling channel is further formed in the hydrogen oxidation device; and at least one gas humidifying device disposed at a position of the gas inlet channel.

Abstract: A method includes placing a photomask having a contamination on a surface thereof in a plasma processing chamber. The contaminated photomask is plasma processed in the plasma processing chamber to remove the contamination from the surface. The plasma includes oxygen plasma or hydrogen plasma.

Abstract: Disclosed are small molecule inhibitors of ?v?6 integrin, and methods of using them to treat a number of specific diseases or conditions.

Abstract: The present disclosure describes a method of patterning a semiconductor wafer using extreme ultraviolet lithography (EUVL). The method includes receiving an EUVL mask that includes a substrate having a low temperature expansion material, a reflective multilayer over the substrate, a capping layer over the reflective multilayer, and an absorber layer over the capping layer. The method further includes patterning the absorber layer to form a trench on the EUVL mask, wherein the trench has a first width above a target width. The method further includes treating the EUVL mask with oxygen plasma to reduce the trench to a second width, wherein the second width is below the target width. The method may also include treating the EUVL mask with nitrogen plasma to protect the capping layer, wherein the treating of the EUVL mask with the nitrogen plasma expands the trench to a third width at the target width.

Abstract: A centrifugal fan is disclosed and includes a lower case, an impeller and an upper case. The lower case includes a bottom plate and a sidewall. The impeller is disposed on the bottom plate. The upper case is assembled with the sidewall to form an outlet. The upper case is formed by stamping and includes a first plane, an inlet and a grille. When the impeller is rotated, an airflow flowing from the inlet to the outlet is formed. The grille is protruded outwardly from the first plane, and includes a connecting frame and plural ribs. A spacing height is formed between the connecting frame and the inlet. Each rib has a first end connected to the connecting frame and a second end connected to the first plane. A pair of notches are disposed adjacent to two opposite lateral edges of the second end of the corresponding rib, respectively.