Patents by Inventor Fung Chen

Fung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160147512
    Abstract: A variable inference system and a variable inference method for a software program are provided. The variable inference system and method calculate a first variable type output corresponding to an unknown variable for a plurality of first basic blocks of a software program. The variable inference system and method calculate a second variable type input corresponding to the unknown variable for a second basic block of the software program. The variable inference system and method calculate a second variable type generation when the second basic block includes a primitive instruction corresponding to the unknown variable. The variable inference system and method calculate a second variable type kill. The variable inference system and method calculate a second variable output corresponding to the unknown variable for the second basic block according to the second variable type input, the second variable type generation and the second variable type kill.
    Type: Application
    Filed: January 26, 2015
    Publication date: May 26, 2016
    Inventors: Yi-Ping YOU, Si-Hao WU, Yu-Jung CHENG, Jing-Fung CHEN
  • Publication number: 20160124316
    Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
    Type: Application
    Filed: January 11, 2016
    Publication date: May 5, 2016
    Inventors: David MARKLE, Thomas LAIDIG, Jeffrey KASKEY, Jang Fung CHEN
  • Publication number: 20160098272
    Abstract: A system and a method for visualizing a software program are provided. The system is configured to store the software program and its change logs. The system is further configured to generate a visualization structure of the software program according to at least one of Data Clumps information, Divergence Change information and Shotgun Surgery information, and display the software program according to the visualization structure. The method is applied to the system to implement the operations.
    Type: Application
    Filed: January 18, 2015
    Publication date: April 7, 2016
    Inventors: Shin-Jie LEE, Jonathan LEE, Jing Fung CHEN
  • Patent number: 9250509
    Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: February 2, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: David Markle, Thomas Laidig, Jeffrey Kaskey, Jang Fung Chen
  • Patent number: 9182953
    Abstract: An exemplary embodiment of the present disclosure illustrates a hybrid dynamic code compiling device having a parser, a native code generator, and a dynamic code rewriter, wherein the parser is coupled to the native code generator and the dynamic code rewriter. The parser receives and parses a first dynamic code to divide the first dynamic code into compilable blocks and non-compilable blocks. The native code generator generates a native code according to the compilable blocks. The dynamic code rewriter rewrites the non-compilable blocks to generate a second dynamic code, wherein the second dynamic code has function calls which communicate between the native code and the first dynamic code.
    Type: Grant
    Filed: December 12, 2013
    Date of Patent: November 10, 2015
    Assignee: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Yi-Ping You, Po-Yu Chen, Jing-Fung Chen
  • Patent number: 9158190
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units, where each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The parallel imaging writer system further includes a controller configured to control the plurality of SLM imaging units, where the controller tunes each of the SLM imaging unit individually in writing a mask data to a substrate.
    Type: Grant
    Filed: August 16, 2012
    Date of Patent: October 13, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jang Fung Chen, Thomas Laidig
  • Patent number: 9049416
    Abstract: A system and method for constructing a scene clip, and a non-statutory record medium thereof are provided. The system includes media supply equipment, a metadata server, a scene server, and an end device. The media supply equipment is used for providing media data. The metadata server is used for providing scene time information corresponding to playback scenes of the media data. A first end device acquires the media data and the scene time information, and extracts, according to capture time information input when playing the media data, at least one piece of target scene time from each piece of the scene time information. The scene server acquires the media data and the target scene time, and according to an alignment result of the target scene time and each piece of the scene time information, extracts local scene clips from the media data to form a piece of media division data.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: June 2, 2015
    Assignee: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Chia-Hsiang Chang, Emery Jou, Jing-Fung Chen, Pei-Wen Huang
  • Publication number: 20150143348
    Abstract: An exemplary embodiment of the present disclosure illustrates a hybrid dynamic code compiling device having a parser, a native code generator, and a dynamic code rewriter, wherein the parser is coupled to the native code generator and the dynamic code rewriter. The parser receives and parses a first dynamic code to divide the first dynamic code into compilable blocks and non-compilable blocks. The native code generator generates a native code according to the compilable blocks. The dynamic code rewriter rewrites the non-compilable blocks to generate a second dynamic code, wherein the second dynamic code has function calls which communicate between the native code and the first dynamic code.
    Type: Application
    Filed: December 12, 2013
    Publication date: May 21, 2015
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: YI-PING YOU, PO-YU CHEN, JING-FUNG CHEN
  • Patent number: 9025136
    Abstract: System and method for manufacturing three-dimensional integrated circuits are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving mask data to be written to one or more layers of the three-dimensional integrated circuit, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the one or more layers of the three-dimensional integrated circuit, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the one or more layers of the three-dimensional integrated circuits in parallel. The method of assigning performs at least one of scaling, alignment, inter-ocular displacement, rotational factor, or substrate deformation correction.
    Type: Grant
    Filed: September 2, 2011
    Date of Patent: May 5, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Jang Fung Chen, Thomas Laidig
  • Publication number: 20150095858
    Abstract: A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process. In embodiments, the invention provides a double exposure lithography method which trims (i.e., removes) unwanted SB residues from the substrate, that is suitable for use, for example, when printing 65 nm or 45 nm node devices or less. According to certain aspects, the present invention provides the ability to utilize large SBs due to the mutual trimming of SBs that results from the process of the present invention. Specifically, in the given process, both the H-mask and the V-mask contain circuit features and SBs, but they are in different corresponding orientations, and therefore, there is a mutual SB trimming for the H-mask and V-mask during the two exposures.
    Type: Application
    Filed: December 8, 2014
    Publication date: April 2, 2015
    Inventors: Jang Fung CHEN, Duan-Fu Stephen HSU, Douglas VAN DEN BROEKE
  • Patent number: 8965128
    Abstract: A code recognition method includes the following steps: a first code-image block is received. Wherein, several first codes are displayed on the first code-image block. The first code-image block is partitioned into several second code-image blocks. Wherein, each of the second code-image blocks displays a second code respectively. Each of the second codes is one of the first codes. Each of the second code-image blocks is recognized as several third codes corresponding to each of the second codes respectively. Some of the neighboring second code-image blocks are combined to form several third code-image blocks. Wherein, each of the third code-image blocks displays a first code set, which comprises some of the second codes. Each of the third code-image blocks is recognized as a second code set corresponding to each of the first code sets respectively. Wherein, each of the second code sets includes the codes selected from the third codes.
    Type: Grant
    Filed: December 17, 2010
    Date of Patent: February 24, 2015
    Assignee: Institute for Information Industry
    Inventors: Yi-Chong Zeng, Jing-Fung Chen
  • Publication number: 20150037399
    Abstract: The present disclosure concerns the novel use of pipoxolan and its pharmaceutical composition. Pipoxolan is useful therapeutic drugs for pathological conditions caused by vascular smooth muscle cell proliferation and migration to relieve a body appeared vascular injury, cerebrovascular ischemia, intimal hyperplasia, atherosclerotic stenosis, cerebral ischemia, and stroke.
    Type: Application
    Filed: May 2, 2014
    Publication date: February 5, 2015
    Applicant: China Medical University
    Inventors: Yuh-Fung CHEN, Huei-Yann TSAI
  • Patent number: 8914143
    Abstract: System and method for handling substrates in a lithography manufacturing process are disclosed. In one embodiment, a system for handling substrates in a lithography manufacturing process includes a plurality of porous chucks positioned above a substrate for imaging, a plurality of pressure sources configured to apply pressured air towards the substrate through the plurality of porous chucks, a plurality of vacuums configured to apply suction force away from the substrate, and a controller with control logic configured to hold the substrate in place by controlling the pressured air applied by the plurality of pressure sources and the suction force generated by the plurality of vacuums.
    Type: Grant
    Filed: April 29, 2011
    Date of Patent: December 16, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Jeffrey Kaskey, Thomas Laidig, Dave Markle, Jang-Fung Chen
  • Patent number: 8910091
    Abstract: A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process is disclosed. The method includes defining an initial H-mask and an initial V-mask corresponding to the target pattern; identifying horizontal critical features in the H-mask and vertical critical features in the V-mask; assigning a first phase shift and a first percentage transmission to the horizontal critical features, which are to be formed in the H-mask; and assigning a second phase shift and a second percentage transmission to the vertical critical features, which are to be formed in the V-mask. The method further includes the step of assigning chrome to all non-critical features in the H-mask and the V-mask.
    Type: Grant
    Filed: February 21, 2012
    Date of Patent: December 9, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Jang Fung Chen, Duan-Fu Stephen Hsu, Douglas Van Den Broeke
  • Publication number: 20140192336
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system comprises a plurality of spatial light modulator (SLM) imaging units, and a controller configured to control the plurality of SLM imaging units. Each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The controller synchronizes movements of the plurality of SLM imaging units with movement of a substrate in writing a mask data to the substrate in a lithography manufacturing process.
    Type: Application
    Filed: March 10, 2014
    Publication date: July 10, 2014
    Applicant: PineBrook Imaging, Inc.
    Inventors: Jang Fung CHEN, Thomas LAIDIG
  • Publication number: 20140192334
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system, where the parallel imaging writer system includes a plurality of multiple charged-particle beam (MCB) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying one or more objects in an area of the substrate to be imaged by corresponding MCB imaging units, and performing multiple exposures to image the one or more objects in the area of the substrate by controlling the plurality of MCB imaging units to write the plurality of partitioned mask data patterns in parallel.
    Type: Application
    Filed: March 10, 2014
    Publication date: July 10, 2014
    Applicant: PineBrook Imaging, Inc.
    Inventors: Jang Fung CHEN, Thomas Laidig
  • Patent number: 8744245
    Abstract: A system and a method for summary collection and playing of scenes and a recording medium thereof are provided. The system includes media supply equipment, a scene description server, a scene server, and an end device. The media supply equipment supplies media data. The scene description server supplies scene description information of a scene segment corresponding to the media data, where each piece of scene description information records a playing content of the scene segment corresponding thereto. The scene server obtains the media data and a summary collect command supplied by the end device, and retrieves a plurality of partial scene segments from the media data according to an analysis result of the summary collect command and the playing content recorded by each piece of scene description information, so as to form media summary data and output the media summary data to the end device.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: June 3, 2014
    Assignee: Institute for Information Industry
    Inventors: Chia-Hsiang Chang, Emery Jou, Jing-Fung Chen, Pei-Wen Huang
  • Patent number: 8737818
    Abstract: A scene segment playing system, a scene segment playing method and a recording medium thereof are provided. The system includes media supply equipment, a description generating server, a scene server, and an end device. The media supply equipment is used for supplying media data. Upon receiving the media data, the scene server supplies scene description data corresponding to the media data. The scene server acquires the media data and interval information supplied by the end device, and retrieves scene segment data from the media data according to a comparison result of the interval information and the scene description data, and outputs the scene segment data to the end device for playing.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: May 27, 2014
    Assignee: Institute for Information Industry
    Inventors: Chia-Hsiang Chang, Emery Jou, Jing-Fung Chen, Pei-Wen Huang
  • Publication number: 20140119710
    Abstract: A scene control system and method and a recording medium thereof are provided. The system includes a media supply module, a time code unit, and a monitoring unit. The media supply module is used for supplying original scene information and spare scene information. The time code unit respectively obtains an original scene time code corresponding to the original scene information and a spare scene time code corresponding to the spare scene information. The monitoring unit is used for obtaining a control signal according to external ratings or through watching the original scene information downloaded in advance, and according to the control signal, processing an original scene picture of a segment unsuitable for watching in the original scene information through retrieval, content insertion, or pixelization, so as to avoid playing of an inappropriate picture.
    Type: Application
    Filed: February 6, 2013
    Publication date: May 1, 2014
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Pei-Wen HUANG, Emery JOU, Jing-Fung CHEN, Chia-Hsiang CHANG
  • Publication number: 20140105572
    Abstract: A system and a method for summary collection and playing of scenes and a recording medium thereof are provided. The system includes media supply equipment, a scene description server, a scene server, and an end device. The media supply equipment supplies media data. The scene description server supplies scene description information of a scene segment corresponding to the media data, where each piece of scene description information records a playing content of the scene segment corresponding thereto. The scene server obtains the media data and a summary collect command supplied by the end device, and retrieves a plurality of partial scene segments from the media data according to an analysis result of the summary collect command and the playing content recorded by each piece of scene description information, so as to form media summary data and output the media summary data to the end device.
    Type: Application
    Filed: December 13, 2012
    Publication date: April 17, 2014
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Chia-Hsiang CHANG, Emery JOU, Jing-Fung CHEN, Pei-Wen HUANG