Patents by Inventor Fung Chen

Fung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140105571
    Abstract: A scene segment playing system, a scene segment playing method and a recording medium thereof are provided. The system includes media supply equipment, a description generating server, a scene server, and an end device. The media supply equipment is used for supplying media data. Upon receiving the media data, the scene server supplies scene description data corresponding to the media data. The scene server acquires the media data and interval information supplied by the end device, and retrieves scene segment data from the media data according to a comparison result of the interval information and the scene description data, and outputs the scene segment data to the end device for playing.
    Type: Application
    Filed: December 13, 2012
    Publication date: April 17, 2014
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Chia-Hsiang CHANG, Emery JOU, Jing-Fung CHEN, Pei-Wen HUANG
  • Publication number: 20140105570
    Abstract: A system and method for constructing a scene clip, and a record medium thereof are provided. The system includes media supply equipment, a metadata server, a scene server, and an end device. The media supply equipment is used for providing media data. The metadata server is used for providing scene time information corresponding to playback scenes of the media data. A first end device acquires the media data and the scene time information, and extracts, according to capture time information input when playing the media data, at least one piece of target scene time from each piece of the scene time information. The scene server acquires the media data and the target scene time, and according to an alignment result of the target scene time and each piece of the scene time information, extracts local scene clips from the media data to form a piece of media division data.
    Type: Application
    Filed: December 13, 2012
    Publication date: April 17, 2014
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Chia-Hsiang CHANG, Emery JOU, Jing-Fung CHEN, Pei-Wen HUANG
  • Patent number: 8694349
    Abstract: The present invention provides a method for transferring a promotion information for a community. The method includes setting a business region, which has a center and a radius. A landmark building is selected to be the center of the business region. Next, a store data is accessed from a store located in the business region. The store data includes a first GPS location of the store and an associated promotion information of the store. Then, a second GPS location from a wireless communication device is accessed. Finally, a promotion information is sent to the wireless communication device when the first GPS location is closed to the second GPS location.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: April 8, 2014
    Assignee: Institute for Information Industry
    Inventors: Geng-Chyun Lean, Jing-Fung Chen
  • Publication number: 20140086555
    Abstract: A media scene playing system, method and a recording medium thereof are provided. The system includes a media providing module, an input module, and a media retrieval module. The media providing module is used for providing media data and scene description information corresponding thereto. The input module is used for inputting navigation data. The media retrieval module then compares the navigation data with acquired scene description information to find a scene period matching the navigation data, so as to retrieve scene section media corresponding to the scene period from the media data and play the scene section media.
    Type: Application
    Filed: December 12, 2012
    Publication date: March 27, 2014
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Chia-Hsiang CHANG, Emery JOU, Jing-Fung CHEN, Pei-Wen HUANG
  • Patent number: 8670106
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: March 11, 2014
    Assignee: PineBrook Imaging, Inc.
    Inventors: Jang Fung Chen, Thomas Laidig
  • Publication number: 20140064821
    Abstract: An applicator head for selectively dispensing product includes a base structure and a support structure. The base structure includes a top face inclined relative to a bottom face, and a first side wall. The top face includes a base flange, and defines a first orifice in fluid communication with a fastener of the bottom face. The support structure includes a lower face inclined relative to an upper face, and a second side wall. The upper face includes a top surface and defines a second orifice. The lower face includes a support flange engaged with the base flange such that the support structure is pivotable relative to the base structure between first and second positions. Fluid communication is facilitated from the fastener through the second orifice in only one of the first and second positions. A dispenser is also provided.
    Type: Application
    Filed: August 28, 2013
    Publication date: March 6, 2014
    Applicant: The Procter & Gamble Company
    Inventors: Amy Marie PRICE, Gregory Clegg SPOONER, Kin Wong YAU, Ming Fung CHEN, William Fraser Gwynfor JONES, David Bernard Domingo DEACON, Chun Yu WONG, Wai Keung TSUI
  • Publication number: 20140062903
    Abstract: A screen unlocking method with time information, a screen unlocking system with time information, and a recording medium are provided, and the method is applicable to an electronic device. The unlocking method includes the following steps: first, obtaining unlocking information through a detection module, where the unlocking information includes an unlocking instruction set and an unlocking time series; judging, by using an operation processing module, whether the unlocking instruction set and the unlocking time series in the unlocking information conform to a preset unlocking instruction set and a preset unlocking time series in preset unlocking information respectively; and if the unlocking instruction set and the unlocking time series conform to the preset unlocking instruction set and the preset unlocking time series respectively, enabling a touch display module to be unlocked and to correspondingly enter an operation picture with an application function.
    Type: Application
    Filed: November 6, 2012
    Publication date: March 6, 2014
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Chih-Kung LEE, Chia-Hsiang CHANG, Yung-Chieh HUNG, Emery JOU, Kun-Hung LEE, Jing-Fung CHEN, Pei-Wen HUANG, Yueh-Ying CHANG
  • Publication number: 20140064707
    Abstract: A scene scheduling system, a scene scheduling method, and a recording medium thereof are provided. This system includes a medium providing module, an input module, a time scheduling unit and a medium capture module. The medium providing module is used for providing medium data and ad medium data corresponding thereto. The input module is used for inputting a channel setting signal. The time scheduling unit provides a piece of preset time scheduling data, and adjusts the preset time scheduling data according to the channel setting signal, so as to form a piece of personalization time scheduling data. The medium capture module captures the medium data and the a piece of ad medium data corresponding to the channel setting signal and the personalization time scheduling data from the medium providing module according to the personalization time scheduling data.
    Type: Application
    Filed: November 7, 2012
    Publication date: March 6, 2014
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Chia-Hsiang CHANG, Jing-Fung CHEN, Emery JOU, Yueh-Ying CHANG
  • Publication number: 20140068658
    Abstract: An advertisement embedded system, an advertisement embedded method, and a recording medium thereof are provided. The system includes a medium providing module and a digital television (DTV) apparatus. The medium providing module is used to provide a piece of advertisement media data. The DTV apparatus includes a digital signal receiving unit, a detection unit, and a processing unit. The digital signal receiving unit receives a DTV signal, and the detection unit detects strength of the DTV signal. The processing unit is connected to the digital signal receiving unit and the detection unit. When the strength of the DTV signal detected by the detection unit is less than a preset value, the processing unit switches a media source of the DTV apparatus from the digital signal receiving unit to the medium providing module, so as to obtain the piece of advertisement media data.
    Type: Application
    Filed: November 6, 2012
    Publication date: March 6, 2014
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Jing-Fung CHEN, Chia-Hsiang CHANG, Emery JOU, Pei-Wen HUANG
  • Patent number: 8644589
    Abstract: A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: February 4, 2014
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Jungchul Park, Doug Van Den Broeke, Jang Fung Chen
  • Patent number: 8632930
    Abstract: A method of generating complementary masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes low contrast vertical features. The generation of the horizontal mask includes the steps of optimizing the bias of the low contrast vertical features contained in the horizontal mask; and applying assist features to the horizontal mask. The method further includes generating a vertical mask based on the target pattern, where the vertical mask contains low contrast horizontal features. The generation of the vertical mask includes the steps of optimizing the bias of low contrast horizontal features contained in the vertical mask; and applying assist features to the vertical mask.
    Type: Grant
    Filed: June 7, 2011
    Date of Patent: January 21, 2014
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Sangbong Park, Douglas Van Den Broeke, Jang Fung Chen
  • Publication number: 20130325614
    Abstract: The present invention provides a method for transferring a promotion information for a community. The method includes setting a business region, which has a center and a radius. A landmark building is selected to be the center of the business region. Next, a store data is accessed from a store located in the business region. The store data includes a first GPS location of the store and an associated promotion information of the store. Then, a second GPS location from a wireless communication device is accessed. Finally, a promotion information is sent to the wireless communication device when the first GPS location is closed to the second GPS location.
    Type: Application
    Filed: May 30, 2012
    Publication date: December 5, 2013
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Geng-Chyun LEAN, Jing-Fung CHEN
  • Publication number: 20130321786
    Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
    Type: Application
    Filed: June 4, 2013
    Publication date: December 5, 2013
    Inventors: David MARKLE, Thomas LAIDIG, Jeffrey KASKEY, Jang Fung CHEN
  • Patent number: 8495529
    Abstract: A method of generating a mask having optical proximity correction features.
    Type: Grant
    Filed: November 5, 2009
    Date of Patent: July 23, 2013
    Assignee: ASML Masktools B.V.
    Inventors: Douglas van Den Broeke, Jang Fung Chen
  • Publication number: 20130182940
    Abstract: A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.
    Type: Application
    Filed: March 5, 2013
    Publication date: July 18, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen Hsu, Jung Chul Park, Douglas Van Den Broeke, Jang Fung Chen
  • Patent number: 8391605
    Abstract: A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.
    Type: Grant
    Filed: January 25, 2012
    Date of Patent: March 5, 2013
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Jung Chul Park, Douglas Van Den Broeke, Jang Fung Chen
  • Publication number: 20130055171
    Abstract: A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process is disclosed. The method includes defining an initial H-mask and an initial V-mask corresponding to the target pattern; identifying horizontal critical features in the H-mask and vertical critical features in the V-mask; assigning a first phase shift and a first percentage transmission to the horizontal critical features, which are to be formed in the H-mask; and assigning a second phase shift and a second percentage transmission to the vertical critical features, which are to be formed in the V-mask. The method further includes the step of assigning chrome to all non-critical features in the H-mask and the V-mask.
    Type: Application
    Filed: February 21, 2012
    Publication date: February 28, 2013
    Applicant: ASML MaskTools B.V.
    Inventors: Jang Fung Chen, Duan-Fu Stephen Hsu, Douglas Van Den Broeke
  • Patent number: 8373752
    Abstract: A detection apparatus, a detection method and a computer readable medium thereof for detecting an object in real time are provided. The detection apparatus is electrically connected to a video capturing apparatus for capturing a video sequence comprising the object. The detection apparatus generates a first transformed frame and a second transformed frame according to the video sequence, and retrieves a plurality of target pixel bits and a plurality of adjacent pixel bits from the first transformed frame. The detection apparatus further interlaces the target pixel bits and the adjacent pixel bits to enhance the accuracy of determining the position where the object appears in the second transformed frame without considerably increasing the computational complexity.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: February 12, 2013
    Assignee: Institute for Information Industry
    Inventors: Jing-Fung Chen, Jen-Chih Wang, Chih-Chun Lai
  • Publication number: 20120307225
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system includes a plurality of spatial light modulator (SLM) imaging units, where each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The parallel imaging writer system further includes a controller configured to control the plurality of SLM imaging units, where the controller tunes each of the SLM imaging unit individually in writing a mask data to a substrate.
    Type: Application
    Filed: August 16, 2012
    Publication date: December 6, 2012
    Inventors: Jang Fung Chen, Thomas Laidig
  • Publication number: 20120264066
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.
    Type: Application
    Filed: May 29, 2009
    Publication date: October 18, 2012
    Inventors: Jang Fung Chen, Thomas Laidig