Patents by Inventor Fung Chen

Fung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8253923
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the imaging system includes a plurality of spatial light modulator (SLM) imaging units, where each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro minors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The imaging system further includes a controller configured to control the plurality of SLM imaging units, where the controller tunes each of the SLM imaging unit individually in writing a mask data to a substrate in a lithography manufacturing process.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: August 28, 2012
    Assignee: Pinebrook Imaging Technology, Ltd.
    Inventors: Jang Fung Chen, Thomas Laidig
  • Patent number: 8244056
    Abstract: An image contrast enhancement apparatus and method thereof are provided. The image contrast enhancement apparatus includes an image analysis module, a histogram separation unit, and a histogram adjustment unit. The image analysis module statistically analyzes pixels of an original image to produce a plurality of histogram bins and combines the histogram bins into a sub-histogram. The histogram separation unit separates each sub-histogram in every separation level into two sub-histograms in the next separation level, increases or decreases a base width of each sub-histogram such that the respective group density of two sub-histograms corresponding to the same separation point are substantially identical. The histogram adjustment unit re-distributes histogram bins of each sub-histogram or merges a portion of histogram bins of each sub-histogram in every separation level.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: August 14, 2012
    Assignee: Institute for Information Industry
    Inventors: Yi-Chong Zeng, Jing-Fung Chen
  • Publication number: 20120166454
    Abstract: A computer-implemented method for generating a hierarchy-based trace log includes: receiving a log generated by a trace program performed in a computer system, the log having entries organized by sequence number, each entry including an object key for an object involved in the traced event and a log message about the traced event; identifying all object keys that occur in the log; assigning different separation values to each of the entries; generating respective adjusted sequence numbers for all of the entries by combining each entry's sequence number with the separation value for that entry; and storing an adjusted log having entries organized by the adjusted sequence numbers.
    Type: Application
    Filed: December 22, 2010
    Publication date: June 28, 2012
    Applicant: SAP AG
    Inventor: Long Fung Chen
  • Publication number: 20120141030
    Abstract: A code recognition method includes the following steps: a first code-image block is received. Wherein, several first codes are displayed on the first code-image block. The first code-image block is partitioned into several second code-image blocks. Wherein, each of the second code-image blocks displays a second code respectively. Each of the second codes is one of the first codes. Each of the second code-image blocks is recognized as several third codes corresponding to each of the second codes respectively. Some of the neighboring second code-image blocks are combined to form several third code-image blocks. Wherein, each of the third code-image blocks displays a first code set, which comprises some of the second codes. Each of the third code-image blocks is recognized as a second code set corresponding to each of the first code sets respectively. Wherein, each of the second code sets includes the codes selected from the third codes.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 7, 2012
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Yi-Chong Zeng, Jing-Fung Chen
  • Publication number: 20120122023
    Abstract: A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.
    Type: Application
    Filed: January 25, 2012
    Publication date: May 17, 2012
    Applicant: ASML MaskTools B.V.
    Inventors: Duan-Fu Stephen Hsu, Jung Chul Park, Douglas Van Den Broeke, Jang Fung Chen
  • Patent number: 8132130
    Abstract: A method for forming exposure masks for imaging a target pattern having features to be imaged on a substrate in a multi-exposure process. The method includes the steps of generating a set of decomposition rules defining whether a given feature of the target pattern is assigned to a first exposure mask or a second exposure mask; applying the decomposition rules to each of the features in the target pattern so as to assign each of the features in the target pattern to one of the first exposure mask or second exposure mask; and generating the first exposure mask and the second exposure mask containing the respective features assigned to each mask.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: March 6, 2012
    Assignee: ASML Masktools B.V.
    Inventors: Jang Fung Chen, Duan-Fu Stephen Hsu, Douglas Van Den Broeke, Thomas Laidig
  • Patent number: 8122391
    Abstract: A method of generating complementary masks based on a target pattern having features to be imaged on a substrate for use in a multiple-exposure lithographic imaging process. The method includes the steps of: defining an initial H-mask corresponding to the target pattern; defining an initial V-mask corresponding to the target pattern; identifying horizontal critical features in the H-mask having a width which is less than a predetermined critical width; identifying vertical critical features in the V-mask having a width which is less than a predetermined critical width; assigning a first phase shift and a first percentage transmission to the horizontal critical features, which are to be formed in the H-mask; and assigning a second phase shift and a second percentage transmission to the vertical critical features, which are to be formed in the V-mask. The method further includes the step of assigning chrome to all non-critical features in the H-mask and the V-mask.
    Type: Grant
    Filed: January 21, 2010
    Date of Patent: February 21, 2012
    Assignee: ASML Masktools B.V.
    Inventors: Jang Fung Chen, Duan-Fu Stephen Hsu, Douglas Van Den Broeke
  • Patent number: 8120753
    Abstract: A method of generating a model for simulating the imaging performance of an optical imaging system having a pupil. The method includes the steps of defining the optical imaging system and a process to be utilized by the optical imaging system; and defining a model equation representing the imaging performance of the optical imaging system and the process, where the model equation including a calibrated pupil kernel. The calibrated pupil kernel representing a linear model of the pupil performance.
    Type: Grant
    Filed: November 8, 2007
    Date of Patent: February 21, 2012
    Assignee: ASML Masktools B.V.
    Inventors: Gabriel Berger, Tamer Coskun, Sangbong Park, Jang Fung Chen
  • Patent number: 8111921
    Abstract: A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.
    Type: Grant
    Filed: September 13, 2007
    Date of Patent: February 7, 2012
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Jung Chul Park, Douglas Van Den Broeke, Jang Fung Chen
  • Publication number: 20120026478
    Abstract: System and method for manufacturing three-dimensional integrated circuits are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving mask data to be written to one or more layers of the three-dimensional integrated circuit, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the one or more layers of the three-dimensional integrated circuit, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the one or more layers of the three-dimensional integrated circuits in parallel. The method of assigning performs at least one of scaling, alignment, inter-ocular displacement, rotational factor, or substrate deformation correction.
    Type: Application
    Filed: September 2, 2011
    Publication date: February 2, 2012
    Inventors: Jang Fung Chen, Thomas Laidig
  • Patent number: 8040573
    Abstract: A method of determining calibration test patterns to be utilized to calibrate a model for simulating the imaging performance of an optical imaging system. The method includes the steps of defining design rules associated with a given imaging process; defining a model equation representing the imaging performance of the optical imaging system; determining a boundary of an imaging signal space based on the design rules; selecting calibration patterns based on the boundary of the imaging signal space such that the calibration patterns are on the boundary or within the boundary of the imaging signal space; and storing the selected calibration test patterns, where the calibration test patterns are utilized to calibrate the model for simulating the imaging performance of the optical imaging system.
    Type: Grant
    Filed: August 14, 2007
    Date of Patent: October 18, 2011
    Assignee: ASML Masktools B.V.
    Inventors: Xuelong Shi, Jang Fung Chen, Douglas Van Den Broeke
  • Patent number: 8039180
    Abstract: A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding—the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features to be imaged, where the assist features have a length corresponding to the expanded width of the features to be imaged, and returning the features to be imaged from the expanded width to a width corresponding to the target pattern.
    Type: Grant
    Filed: February 22, 2011
    Date of Patent: October 18, 2011
    Assignee: ASML Masktools B.V.
    Inventors: Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke, Jang Fung Chen
  • Publication number: 20110236808
    Abstract: A method of generating complementary masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes low contrast vertical features. The generation of the horizontal mask includes the steps of optimizing the bias of the low contrast vertical features contained in the horizontal mask; and applying assist features to the horizontal mask. The method further includes generating a vertical mask based on the target pattern, where the vertical mask contains low contrast horizontal features. The generation of the vertical mask includes the steps of optimizing the bias of low contrast horizontal features contained in the vertical mask; and applying assist features to the vertical mask.
    Type: Application
    Filed: June 7, 2011
    Publication date: September 29, 2011
    Applicant: ASML Mask Tools B.V.
    Inventors: Duan-Fu Stephen Hsu, Sangbong Park, Douglas Van Den Broeke, Jang Fung Chen
  • Patent number: 7998355
    Abstract: A method of generating a mask for printing a pattern including a plurality of features. The method includes the steps of depositing a layer of transmissive material having a predefined percentage transmission on a substrate; depositing a layer of opaque material on the transmissive material; etching a portion of the substrate, the substrate being etched to a depth based on an etching selectivity between the transmissive layer and the substrate; exposing a portion of the transmissive layer by etching the opaque material; etching the exposed portion of the transmissive layer so as to expose an upper surface of the substrate; where the exposed portions of the substrate and the etched portions of the substrate exhibit a predefined phase shift relative to one another with respect to an illumination signal.
    Type: Grant
    Filed: July 6, 2007
    Date of Patent: August 16, 2011
    Assignee: ASML Masktools B.V.
    Inventors: Douglas Van Den Broeke, Kurt E. Wampler, Jang Fung Chen
  • Patent number: 7985515
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: July 26, 2011
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Kurt E. Wampler, Markus Franciscus Antonius Eurlings, Jang Fung Chen, Noel Corcoran
  • Patent number: 7981576
    Abstract: A method of generating complementary masks for use in a dark field double dipole imaging process. The method includes the steps of identifying a target pattern having a plurality of features, including horizontal and vertical features; generating a horizontal mask based on the target pattern, where the horizontal mask includes low contrast vertical features. The generation of the horizontal mask includes the steps of optimizing the bias of the low contrast vertical features contained in the horizontal mask; and applying assist features to the horizontal mask. The method further includes generating a vertical mask based on the target pattern, where the vertical mask contains low contrast horizontal features. The generation of the vertical mask includes the steps of optimizing the bias of low contrast horizontal features contained in the vertical mask; and applying assist features to the vertical mask.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: July 19, 2011
    Assignee: ASML Masktools B.V.
    Inventors: Duan-Fu Stephen Hsu, Sangbong Park, Douglas Van Den Broeke, Jang Fung Chen
  • Publication number: 20110143268
    Abstract: A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding- the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features to be imaged, where the assist features have a length corresponding to the expanded width of the features to be imaged, and returning the features to be imaged from the expanded width to a width corresponding to the target pattern.
    Type: Application
    Filed: February 22, 2011
    Publication date: June 16, 2011
    Applicant: ASML MaskTools B.V.
    Inventors: Thomas Laidig, Kurt E. Wampler, Douglas Van Den Broeke, Jang Fung Chen
  • Publication number: 20110116713
    Abstract: An image contrast enhancement apparatus and method thereof are provided. The image contrast enhancement apparatus includes an image analysis module, a histogram separation unit, and a histogram adjustment unit. The image analysis module statistically analyzes pixels of an original image to produce a plurality of histogram bins and combines the histogram bins into a sub-histogram. The histogram separation unit separates each sub-histogram in every separation level into two sub-histograms in the next separation level, increases or decreases a base width of each sub-histogram such that the respective group density of two sub-histograms corresponding to the same separation point are substantially identical. The histogram adjustment unit re-distributes histogram bins of each sub-histogram or merges a portion of histogram bins of each sub-histogram in every separation level.
    Type: Application
    Filed: December 4, 2009
    Publication date: May 19, 2011
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Yi-Chong Zeng, Jing-Fung Chen
  • Publication number: 20110096162
    Abstract: A detection apparatus, a detection method and a computer readable medium thereof for detecting an object in real time are provided. The detection apparatus is electrically connected to a video capturing apparatus for capturing a video sequence comprising the object. The detection apparatus generates a first transformed frame and a second transformed frame according to the video sequence, and retrieves a plurality of target pixel bits and a plurality of adjacent pixel bits from the first transformed frame. The detection apparatus further interlaces the target pixel bits and the adjacent pixel bits to enhance the accuracy of determining the position where the object appears in the second transformed frame without considerably increasing the computational complexity.
    Type: Application
    Filed: November 30, 2009
    Publication date: April 28, 2011
    Applicant: INSTITUTE FOR INFORMATION INDUSTRY
    Inventors: Jing-Fung CHEN, Jen-Chih WANG, Chih-Chun LAI
  • Patent number: 7892703
    Abstract: A method of generating a mask for printing a pattern including a plurality of features. The method includes the steps of obtaining data representing the plurality of features; and forming at least one of the plurality of features by etching a substrate to form a mesa and depositing a chrome layer over the entire upper surface of the mesa, where said mesa has a predetermined height.
    Type: Grant
    Filed: August 10, 2006
    Date of Patent: February 22, 2011
    Assignee: ASML Masktools B.V.
    Inventors: Jang Fung Chen, Duan-Fu Stephen Hsu, Douglas Van Den Broeke, Jung Chul Park, Thomas Laidig