Abstract: A dual band antenna is configured for use with a power meter having a power meter housing. The dual band antenna includes a flexible polymeric substrate and an adhesive layer that is secured relative to the flexible polymeric substrate. A first conductive element is disposed relative to the flexible polymeric substrate and has a first electrical length. A second conductive element is disposed relative to the flexible polymeric substrate and has a second electrical length. The first electrical length and the second electrical length are substantially the same.

Abstract: A pulse modulation system of a radio frequency (RF) power supply includes a modulation output circuit and a frequency adjustment circuit. The modulation output circuit is configured to modulate an output signal of the RF power supply and output a pulse modulation RF signal. Each pulse cycle of the pulse modulation RF signal includes a pulse-on phase and a pulse-off phase. An overshoot sub-phase is set in an initial preset time of the pulse-on phase. The frequency adjustment circuit is electrically connected to the modulation output circuit. The frequency adjustment circuit is configured to adjust an RF frequency of the pulse modulation RF signal of the overshoot sub-phase to cause a reflected power of the overshoot sub-phase to satisfy a preset reflected power or a reflected coefficient to satisfy a preset reflected coefficient.

Abstract: The present disclosure provides an impedance matching method, an impedance matching device and a plasma generating device. The impedance matching method is implemented for matching an impedance of a load connected to an RF source to an impedance of the RF source, including: selectively performing an automatic matching step or a frequency scan matching step according to an operation mode of the RF source, wherein: in the automatic matching step, instructing a motor to drive an impedance matching network to provide a certain impedance; and in the frequency scan matching step, instructing the motor to stop driving and the RF source to perform a frequency scanning operation. According to the embodiments of the present disclosure, a phenomenon of unstable and non-repetitive matching caused by fast impedance changing during the impedance matching process can be effectively avoided, and a large processing window and process stability can be implemented.

Abstract: A filter circuit is connected between a heating source and a load for filtering the load, and includes an inductor branch and a capacitor branch connected in parallel. The inductor branch includes a one-piece structured integrated component, and the integrated component is configured with a transformer function member and an inductor function member. The inductor function member is connected in series between the heating source and the transformer function member for filtering the load. The transformer function member is connected in parallel with the load for transmitting a heating electric signal output by the heating source to the load.

Abstract: A reaction chamber is provided. The reaction chamber includes a chamber body, a dielectric window, and a power supplier. The dielectric window is provided on top of the chamber body along a first direction and hermetically connected with the chamber body. Each coil of a plurality of sets of coils is wound around an outer surface of the dielectric window at an interval along the first direction. The plurality of sets of coils are connected in parallel, with first ends electrically coupled to the power supplier for supplying power to each set of the plurality of sets of coils, and with second ends grounded. The second ends of the plurality of sets of coils are arranged in proximity between the first ends.

Abstract: The present disclosure provides an adjustable capacitor comprising a ferroelectric dielectric layer, a first electrode and a second electrode disposed on opposite sides of the ferroelectric dielectric layer. The adjustable capacitor further comprises a first control electrode and a second control electrode insulated from the first electrode and the second electrode. The first control electrode and the second control electrode are configured to provide an electric field to the ferroelectric dielectric layer, to adjust a dielectric constant of the ferroelectric dielectric layer by controlling an electric field strength, thereby adjusting the capacitance between the first and the second electrodes. The present disclosure also provides an impedance matching device and a semiconductor processing apparatus.

Abstract: The present disclosure provides a lower electrode mechanism and a reaction chamber, the lower electrode mechanism includes a base for carrying a workpiece to be processed and a lower electrode chamber disposed under the base, the lower electrode chamber includes an electromagnetic shielding space and a non-electromagnetic shielding space isolated from each other, the chamber of the lower electrode chamber includes a first through hole and a second through hole, and the electromagnetic shielding space and the non-electromagnetic shielding space are respectively connected to outside through the first through hole and the second through hole to prevent a plurality of first components disposed in the electromagnetic shielding space from being interfered by a second component disposed in the non-electromagnetic shielding space.

Abstract: The present disclosure belongs to the field of pharmaceutical preparations and relates to the design of a series of lipophilic derivatives by using wild-type penetrating peptide penetratin. These penetratin derivatives have a strong ability to penetrate the ocular tissues and do not cause ocular tissue toxicity. As ocular absorption enhancers, non-invasive routes could be used to achieve intraocular drug delivery and increase the ocular bioavailability of drugs. These penetratin derivatives and the ophthalmic drug delivery system constructed by them are used for eye drop administration, which could replace the intraocular injection with poor patients compliance, which greatly enhances the convenience and safety of the treatment of intraocular and fundus diseases.

Abstract: An impedance matching system is provided. The impedance matching system includes: an impedance matching device arranged between a radio frequency (RF) power supply and a reaction chamber, adapted to connect the RF power supply to the reaction chamber through a switch, and configured to automatically perform an impedance matching on an output impedance of the RF power supply and an input impedance of the impedance matching device; the switch and a load circuit, the switch being configured to enable the RF power supply to be selectively connected to the reaction chamber or to the load circuit; and a control unit configured to control the switch to connect the RF power supply to the reaction chamber or connect the RF power supply to the load circuit according to a preset timing sequence. The impedance matching device is configured to convert a continuous wave output of the RF power supply into a pulse output according to the preset timing sequence, and provide the pulse output to the reaction chamber.

Abstract: The present disclosure provides an impedance matching method, an impedance matching device and a plasma generating device. The impedance matching method is implemented for matching an impedance of a load connected to an RF source to an impedance of the RF source, including: selectively performing an automatic matching step or a frequency scan matching step according to an operation mode of the RF source, wherein: in the automatic matching step, instructing a motor to drive an impedance matching network to provide a certain impedance; and in the frequency scan matching step, instructing the motor to stop driving and the RF source to perform a frequency scanning operation. According to the embodiments of the present disclosure, a phenomenon of unstable and non-repetitive matching caused by fast impedance changing during the impedance matching process can be effectively avoided, and a large processing window and process stability can be implemented.

Abstract: A filter circuit is connected between a heating source and a load for filtering the load, and includes an inductor branch and a capacitor branch connected in parallel. The inductor branch includes a one-piece structured integrated component, and the integrated component is configured with a transformer function member and an inductor function member. The inductor function member is connected in series between the heating source and the transformer function member for filtering the load. The transformer function member is connected in parallel with the load for transmitting a heating electric signal output by the heating source to the load.

Abstract: A digital sight-singing piano is disclosed with a fixed-solfège keyboard, continuous keys and adjustable tones by kneading piano keys, wherein the key can be varied continuously and the frequency of a piano key can be slightly adjusted by kneading the piano key during playing. The keyboard of the digital sight-singing piano has fixed solfège, wherein no matter what key is used for playing, the piano keys in a solfège key set always have the same correspondence to the solfège syllables of the numbered musical notation in one octave. A color graphic vector numbered musical notation is also disclosed, wherein extended solfège is used to describe pitch, different colors are used to indicate the positions of the piano keys to press, notation frames with fixed width are used to represent the beat unit, and font (i.e., bold or not) of musical notes are used to show the strength of pressing piano keys. The color graphic vector numbered musical notation is suitable for computer-aided notation.

Abstract: An impedance matching system is provided. The impedance matching system includes: an impedance matching device arranged between a radio frequency (RF) power supply and a reaction chamber, adapted to connect the RF power supply to the reaction chamber through a switch, and configured to automatically perform an impedance matching on an output impedance of the RF power supply and an input impedance of the impedance matching device; the switch and a load circuit, the switch being configured to enable the RF power supply to be selectively connected to the reaction chamber or to the load circuit; and a control unit configured to control the switch to connect the RF power supply to the reaction chamber or connect the RF power supply to the load circuit according to a preset timing sequence. The impedance matching device is configured to convert a continuous wave output of the RF power supply into a pulse output according to the preset timing sequence, and provide the pulse output to the reaction chamber.

Abstract: Some embodiments of the present disclosure provide a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus includes a chamber, a support and a liner. The chamber is configured for plasma processes and includes a chamber wall. The support is configured to hold a wafer in the chamber. The liner is configured to surround the support and includes a top side and a bottom side. The top side is detachably hung on the chamber wall. The bottom side includes gas passages for plasma particles to pass through the liner.

Abstract: A digital sight-singing piano is disclosed with a fixed-solfège keyboard, continuous keys and adjustable tones by kneading piano keys, wherein the key can be varied continuously and the frequency of a piano key can be slightly adjusted by kneading the piano key during playing. The keyboard of the digital sight-singing piano has fixed solfège, wherein no matter what key is used for playing, the piano keys in a solfège key set always have the same correspondence to the solfège syllables of the numbered musical notation in one octave. A color graphic vector numbered musical notation is also disclosed, wherein extended solfège is used to describe pitch, different colors are used to indicate the positions of the piano keys to press, notation frames with fixed width are used to represent the beat unit, and font (i.e., bold or not) of musical notes are used to show the strength of pressing piano keys. The color graphic vector numbered musical notation is suitable for computer-aided notation.

Abstract: A method of detecting the vascular condition based on point fluctuation conduction characteristics of the heart and a device utilizing the same are disclosed in this patent.

Abstract: Some embodiments of the present disclosure provide a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus includes a chamber, a support and a liner. The chamber is configured for plasma processes and includes a chamber wall. The support is configured to hold a wafer in the chamber. The liner is configured to surround the support and includes a top side and a bottom side. The top side is detachably hung on the chamber wall. The bottom side includes gas passages for plasma particles to pass through the liner.

Abstract: The present invention relates to a system and method for inspecting and validating a flight procedure used in the field of civil aviation. The system comprises an image capturing apparatus, a storage device, a playing device, a recorder such as QAR, a data processing module and a synchronization module; the method for inspecting and validating a flight procedure applied in the system includes the following steps: collecting actual visual videos and flight parameters, generating simulation visual videos, generating over-limit alarms, processing data, generating complex simulation visual videos, generating flight trajectory and flight procedure protection area pictures, and synchronizing and playing the videos.

Abstract: Some embodiments of the present disclosure provide a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus includes a chamber, a support and a liner. The chamber is configured for plasma processes and includes a chamber wall. The support is configured to hold a wafer in the chamber. The liner is configured to surround the support and includes a top side and a bottom side. The top side is detachably hung on the chamber wait. The bottom side includes gas passages for plasma particles to pass through the liner.

Abstract: Some embodiments of the present disclosure, provide a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus includes a chamber, a support and a liner. The chamber is configured for plasma processes and includes a chamber wall. The support is configured to hold a wafer in the chamber. The liner is configured to surround the support and includes a top side and a bottom side. The top side is detachably hung on the chamber wait. The bottom side includes gas passages for plasma particles to pass through the liner.