Patents by Inventor Gauri Karve
Gauri Karve has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190189504Abstract: Apparatus and methods for dielectric gap fill evaluations are provided. In one example, a method can comprise providing a gap fill substrate over one or more interlayer dielectric trenches of a dielectric layer and over a first material located in the one or more interlayer dielectric trenches. The method can also comprise depositing a gap fill candidate material within one or more gap fill substrate trenches of the gap fill substrate. Furthermore, the method can comprise etching the gap fill candidate material until a void within the first material is identified. Additionally, the method can comprise filling the one or more gap fill substrate trenches with a second material to form one or more contacts with the first material to measure a leakage current of one or more pitches.Type: ApplicationFiled: February 26, 2019Publication date: June 20, 2019Inventors: Isabel Cristina Chu, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Ekmini Anuja De Silva, Gauri Karve, Fee Li Lie, Nicole Adelle Saulnier, Indira Seshadri, Hosadurga Shobha
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Publication number: 20190172940Abstract: FinFET devices comprising multilayer gate spacers are provided, as well as methods for fabricating FinFET devices in which multilayer gate spacers are utilized to prevent or otherwise minimize the erosion of vertical semiconductor fins when forming the gate spacers. For example, a method for fabricating a semiconductor device comprises forming a dummy gate structure over a portion of a vertical semiconductor fin of a FinFET device, and forming a multilayer gate spacer on the dummy gate structure. The multilayer gate spacer comprises a first dielectric layer and a second dielectric layer, wherein the first dielectric layer has etch selectivity with respect to the vertical semiconductor fin and the second dielectric layer. In one embodiment, the first dielectric layer comprises silicon oxycarbonitride (SiOCN) and the second dielectric layer comprises silicon boron carbon nitride (SiBCN).Type: ApplicationFiled: February 5, 2019Publication date: June 6, 2019Inventors: Andrew M. Greene, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Eric R. Miller, Pietro Montanini
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Patent number: 10312140Abstract: Apparatus and methods for dielectric gap fill evaluations are provided. In one example, a method can comprise providing a gap fill substrate over one or more interlayer dielectric trenches of a dielectric layer and over a first material located in the one or more interlayer dielectric trenches. The method can also comprise depositing a gap fill candidate material within one or more gap fill substrate trenches of the gap fill substrate. Furthermore, the method can comprise etching the gap fill candidate material until a void within the first material is identified. Additionally, the method can comprise filling the one or more gap fill substrate trenches with a second material to form one or more contacts with the first material to measure a leakage current of one or more pitches.Type: GrantFiled: December 19, 2017Date of Patent: June 4, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Isabel Cristina Chu, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Ekmini Anuja De Silva, Gauri Karve, Fee Li Lie, Nicole Adelle Saulnier, Indira Seshadri, Hosadurga Shobha
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Patent number: 10304689Abstract: A method for fabricating a semiconductor structure includes forming a plurality of mandrel structures. A plurality of first spacers is formed on sidewalls of the mandrel structures. A plurality of second spacers is formed on sidewalls of the first spacers. The plurality of first spacers is removed selective to the plurality of second spacers and mandrel structures. A cut mask is formed over a first set of second spacers of the plurality of second spacers and a first set of mandrel structures of the plurality of mandrel structures. A second set of second spacers of the plurality of spacers and a second set of mandrel structures of the plurality of mandrel structures remain exposed. One of the second set of mandrel structures and the second set of second spacers is removed selective to the second set of second spacers and the second set of mandrel structures, respectively.Type: GrantFiled: March 29, 2018Date of Patent: May 28, 2019Assignee: International Business Machines CorporationInventors: Gauri Karve, Fee Li Lie, Eric R. Miller, Stuart A. Sieg, John R. Sporre, Sean Teehan
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Patent number: 10243079Abstract: FinFET devices comprising multilayer gate spacers are provided, as well as methods for fabricating FinFET devices in which multilayer gate spacers are utilized to prevent or otherwise minimize the erosion of vertical semiconductor fins when forming the gate spacers. For example, a method for fabricating a semiconductor device comprises forming a dummy gate structure over a portion of a vertical semiconductor fin of a FinFET device, and forming a multilayer gate spacer on the dummy gate structure. The multilayer gate spacer comprises a first dielectric layer and a second dielectric layer, wherein the first dielectric layer has etch selectivity with respect to the vertical semiconductor fin and the second dielectric layer. In one embodiment, the first dielectric layer comprises silicon oxycarbonitride (SiOCN) and the second dielectric layer comprises silicon boron carbon nitride (SiBCN).Type: GrantFiled: June 30, 2017Date of Patent: March 26, 2019Assignee: International Business Machines CorporationInventors: Andrew M. Greene, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Eric R. Miller, Pietro Montanini
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Patent number: 10229910Abstract: A method for forming a semiconductor device includes blocking a first region of a wafer and forming a plurality of fins in a second region of the wafer. A protective conformal mask layer is deposited over the plurality of fins in the second region, the second region is blocked, and a plurality of fins are formed in the first region of the wafer using a variety of wet and/or dry etching procedures. The protective conformal mask layer protects the plurality of fins in the second region from the variety of wet and/or dry etching procedures that are used to form the plurality of fins in the first region.Type: GrantFiled: May 12, 2017Date of Patent: March 12, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Isabel C. Chu, Lawrence A. Clevenger, Leigh Anne H. Clevenger, Mona A. Ebrish, Gauri Karve, Fee Li Lie, Deepika Priyadarshini, Nicole A. Saulnier, Indira P. Seshadri
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Patent number: 10211321Abstract: Embodiments of the present invention provide a structure and method of minimizing stress relaxation during fin formation. Embodiments may involve forming a looped spacer on an upper surface of a substrate and adjacent to at least a sidewall of a mandrel. The mandrel may be removed, leaving the looped spacer on the substrate. An exposed portion of the substrate may be removed to form a looped fin below the looped spacer. The spacer may be removed, leaving a looped fin. A looped fin formation may reduce stress relaxation compared to conventional fin formation methods. Embodiments may include forming a gate over a looped portion of a looped fin. Securing a looped portion in position with a gate may decrease stress relaxation in the fin. Thus, a looped fin with a looped portion of the looped fin under a gate may have substantially reduced stress relaxation compared to a conventional fin.Type: GrantFiled: December 8, 2017Date of Patent: February 19, 2019Assignee: International Business Machines CorporationInventors: Sivananda K. Kanakasabapathy, Gauri Karve, Juntao Li, Fee Li Lie, Stuart A. Sieg, John R. Sporre
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Patent number: 10211319Abstract: Embodiments of the present invention provide a structure and method of minimizing stress relaxation during fin formation. Embodiments may involve forming a looped spacer on an upper surface of a substrate and adjacent to at least a sidewall of a mandrel. The mandrel may be removed, leaving the looped spacer on the substrate. An exposed portion of the substrate may be removed to form a looped fin below the looped spacer. The spacer may be removed, leaving a looped fin. A looped fin formation may reduce stress relaxation compared to conventional fin formation methods. Embodiments may include forming a gate over a looped portion of a looped fin. Securing a looped portion in position with a gate may decrease stress relaxation in the fin. Thus, a looped fin with a looped portion of the looped fin under a gate may have substantially reduced stress relaxation compared to a conventional fin.Type: GrantFiled: June 27, 2017Date of Patent: February 19, 2019Assignee: International Business Machines CorporationInventors: Sivananda K. Kanakasabapathy, Gauri Karve, Juntao Li, Fee Li Lie, Stuart A. Sieg, John R. Sporre
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Patent number: 10199503Abstract: Transistors and methods of forming the same include forming a semiconductor fin from a first material on dielectric layer. Material is etched away from the dielectric layer directly underneath a channel region of the semiconductor fin, with the semiconductor fin still being supported by the dielectric layer in a source and drain region. A gate stack is formed around the channel region of the semiconductor fin, with a portion of the gate stack underneath the semiconductor fin being larger than a portion of the gate stack above the semiconductor fin.Type: GrantFiled: April 24, 2017Date of Patent: February 5, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Fee Li Lie, Eric R. Miller, John R. Sporre, Sean Teehan
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Publication number: 20190006506Abstract: FinFET devices comprising multilayer gate spacers are provided, as well as methods for fabricating FinFET devices in which multilayer gate spacers are utilized to prevent or otherwise minimize the erosion of vertical semiconductor fins when forming the gate spacers. For example, a method for fabricating a semiconductor device comprises forming a dummy gate structure over a portion of a vertical semiconductor fin of a FinFET device, and forming a multilayer gate spacer on the dummy gate structure. The multilayer gate spacer comprises a first dielectric layer and a second dielectric layer, wherein the first dielectric layer has etch selectivity with respect to the vertical semiconductor fin and the second dielectric layer. In one embodiment, the first dielectric layer comprises silicon oxycarbonitride (SiOCN) and the second dielectric layer comprises silicon boron carbon nitride (SiBCN).Type: ApplicationFiled: June 30, 2017Publication date: January 3, 2019Inventors: Andrew M. Greene, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Eric R. Miller, Pietro Montanini
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Patent number: 10170477Abstract: A method of making a semiconductor device comprises forming a first channel region comprising a first channel region material and a second channel region comprising a second channel region material; disposing a gate dielectric on the first channel region and second channel region; depositing a work function modifying material on the gate dielectric; disposing a mask over the work function modifying material deposited on the gate dielectric disposed on the first channel region; removing the work function modifying material from the unmasked gate dielectric disposed on the second channel region; removing the mask from the work function modifying material deposited on the gate dielectric disposed on the first channel region; forming a first gate electrode on the work function modifying material deposited on the first channel region and forming a second gate electrode on the gate dielectric disposed on the second channel region.Type: GrantFiled: November 6, 2015Date of Patent: January 1, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Ruqiang Bao, Gauri Karve, Derrick Liu, Robert R. Robison, Gen Tsutsui, Reinaldo A. Vega, Koji Watanabe
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Patent number: 10147725Abstract: A method of making a semiconductor device comprises forming a first channel region comprising a first channel region material and a second channel region comprising a second channel region material; disposing a gate dielectric on the first channel region and second channel region; depositing a work function modifying material on the gate dielectric; disposing a mask over the work function modifying material deposited on the gate dielectric disposed on the first channel region; removing the work function modifying material from the unmasked gate dielectric disposed on the second channel region; removing the mask from the work function modifying material deposited on the gate dielectric disposed on the first channel region; forming a first gate electrode on the work function modifying material deposited on the first channel region and forming a second gate electrode on the gate dielectric disposed on the second channel region.Type: GrantFiled: December 14, 2015Date of Patent: December 4, 2018Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Ruqiang Bao, Gauri Karve, Derrick Liu, Robert R. Robison, Gen Tsutsui, Reinaldo A. Vega, Koji Watanabe
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Publication number: 20180342615Abstract: Embodiments are directed to methods and resulting structures for a vertical field effect transistor (VFET) having a super long channel. A pair of semiconductor fins is formed on a substrate. A semiconductor pillar is formed between the semiconductor fins on the substrate. A region that extends under all of the semiconductor fins and under part of the semiconductor pillar is doped. A conductive gate is formed over a channel region of the semiconductor fins and the semiconductor pillar. A surface of the semiconductor pillar serves as an extended channel region when the gate is active.Type: ApplicationFiled: November 15, 2017Publication date: November 29, 2018Inventors: Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Fee Li Lie, Eric R. Miller, John R. Sporre, Sean Teehan
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Publication number: 20180342614Abstract: Embodiments are directed to methods and resulting structures for a vertical field effect transistor (VFET) having a super long channel. A pair of semiconductor fins is formed on a substrate. A semiconductor pillar is formed between the semiconductor fins on the substrate. A region that extends under all of the semiconductor fins and under part of the semiconductor pillar is doped. A conductive gate is formed over a channel region of the semiconductor fins and the semiconductor pillar. A surface of the semiconductor pillar serves as an extended channel region when the gate is active.Type: ApplicationFiled: May 23, 2017Publication date: November 29, 2018Inventors: Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Fee Li Lie, Eric R. Miller, John R. Sporre, Sean Teehan
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Patent number: 10121852Abstract: A semiconductor structure is provided that includes a semiconductor fin portion having an end wall and extending upward from a substrate. A gate structure straddles a portion of the semiconductor fin portion. A first set of gate spacers is located on opposing sidewall surfaces of the gate structure; and a second set of gate spacers is located on sidewalls of the first set of gate spacers. One gate spacer of the second set of gate spacers has a lower portion that directly contacts the end wall of the semiconductor fin portion.Type: GrantFiled: October 26, 2017Date of Patent: November 6, 2018Assignee: International Business Machines CorporationInventors: Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie, Derrick Liu, Soon-Cheon Seo, Stuart A. Sieg
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Patent number: 10121853Abstract: A semiconductor structure is provided that includes a semiconductor fin portion having an end wall and extending upward from a substrate. A gate structure straddles a portion of the semiconductor fin portion. A first set of gate spacers is located on opposing sidewall surfaces of the gate structure; and a second set of gate spacers is located on sidewalls of the first set of gate spacers. One gate spacer of the second set of gate spacers has a lower portion that directly contacts the end wall of the semiconductor fin portion.Type: GrantFiled: October 26, 2017Date of Patent: November 6, 2018Assignee: International Business Machines CorporationInventors: Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie, Derrick Liu, Soon-Cheon Seo, Stuart A. Sieg
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Publication number: 20180308978Abstract: Transistors and methods of forming the same include forming a semiconductor fin from a first material on dielectric layer. Material is etched away from the dielectric layer directly underneath a channel region of the semiconductor fin, with the semiconductor fin still being supported by the dielectric layer in a source and drain region. A gate stack is formed around the channel region of the semiconductor fin, with a portion of the gate stack underneath the semiconductor fin being larger than a portion of the gate stack above the semiconductor fin.Type: ApplicationFiled: April 24, 2017Publication date: October 25, 2018Inventors: Marc A. Bergendahl, Kangguo Cheng, Gauri Karve, Fee Li Lie, Eric R. Miller, John R. Sporre, Sean Teehan
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Patent number: 10062714Abstract: A fin of silicon-germanium material is formed and covered with an epitaxially grown layer of silicon material. A dummy transistor gate is then formed to extend over a channel of the fin. Sidewall spacers are formed on each side of the dummy transistor gate and directly on top of the expitaxial silicon layer. Epitaxially grown raised source and drain regions are formed on each side of the dummy transistor gate adjacent the sidewall spacers. The dummy transistor gate and a portion of the epitaxial silicon layer (underneath said dummy transistor gate) are removed and replaced by a metal gate.Type: GrantFiled: June 9, 2016Date of Patent: August 28, 2018Assignees: INTERNATIONAL BUSINESS MACHINES CORPORATION, STMICROELECTRONICS, INC.Inventors: Bruce Doris, Gauri Karve, Qing Liu
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Publication number: 20180226262Abstract: A method for fabricating a semiconductor structure. The method includes forming a plurality of mandrel structures. A plurality of first spacers is formed on sidewalls of the mandrel structures. A plurality of second spacers is formed on sidewalls of the first spacers. The plurality of first spacers is removed selective to the plurality of second spacers and mandrel structures. A cut mask is formed over a first set of second spacers of the plurality of second spacers and a first set of mandrel structures of the plurality of mandrel structures. A second set of second spacers of the plurality of spacers and a second set of mandrel structures of the plurality of mandrel structures remain exposed. One of the second set of mandrel structures and the second set of second spacers is removed selective to the second set of second spacers and the second set of mandrel structures, respectively.Type: ApplicationFiled: March 29, 2018Publication date: August 9, 2018Applicant: International Business Machines CorporationInventors: Gauri KARVE, Fee Li LIE, Eric R. MILLER, Stuart A. SIEG, John R. SPORRE, Sean TEEHAN
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Patent number: 10032680Abstract: A method for forming a fin on a substrate comprises patterning and etching a layer of a first semiconductor material to define a strained fin, depositing a layer of a second semiconductor material over the fin, the second semiconductor material operative to maintain the a strain in the strained fin, etching to remove a portion of the second semiconductor material to define a cavity that exposes a portion of the fin, etching to remove the exposed portion of the fin such that the fin is divided into a first segment and a second segment, and depositing an insulator material in the cavity, the insulator material contacting the first segment of the fin and the second segment of the fin.Type: GrantFiled: December 30, 2015Date of Patent: July 24, 2018Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Bruce B. Doris, Hong He, Sivananda K. Kanakasabapathy, Gauri Karve, Fee Li Lie, Stuart A. Sieg