Patents by Inventor Hang Yu

Hang Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250226203
    Abstract: Embodiments of the present technology may include semiconductor processing methods and systems. Methods include flowing a deuterium-containing precursor and a silicon containing precursor into a processing region of a processing chamber. Methods include contacting a semiconductor device disposed in the processing region with the deuterium-containing precursor and the silicon containing precursor. Methods include forming a deuterium-containing dielectric film over or on the semiconductor device at a processing temperature of greater than or about 350° C. Methods include passivating the target region with deuterium from the deuterium-containing dielectric film. Methods include where the deuterium-containing dielectric film is spaced apart from or adjacent to the target region.
    Type: Application
    Filed: January 10, 2024
    Publication date: July 10, 2025
    Applicant: Applied Materials, Inc.
    Inventors: Madhu Santosh Kumar Mutyala, Hang Yu, Woongsik Nam, Deenesh Padhi
  • Patent number: 12338530
    Abstract: Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a substrate support disposed within the chamber body. The substrate support may define a substrate support surface. The chambers may include a showerhead positioned supported atop the chamber body. The substrate support and a bottom surface of the showerhead may at least partially define a processing region within the semiconductor processing chamber. The showerhead may define a plurality of apertures through the showerhead. The bottom surface of the showerhead may define an annular groove or ridge that is positioned directly above at least a portion of the substrate support.
    Type: Grant
    Filed: July 9, 2021
    Date of Patent: June 24, 2025
    Assignee: Applied Materials, Inc.
    Inventors: Saketh Pemmasani, Daemian Raj Benjamin Raj, Xiaopu Li, Akshay Dhanakshirur, Mayur Govind Kulkarni, Madhu Santosh Kumar Mutyala, Deenesh Padhi, Hang Yu
  • Publication number: 20250203771
    Abstract: A printed circuit board includes at least one conductor path and a contact area for contacting an electrical component. The contact area includes at least one contact surface and a recess. The contact surface extends into the recess and the contact surface is connected to the conductor path.
    Type: Application
    Filed: December 13, 2024
    Publication date: June 19, 2025
    Inventors: Charles-Edouard De Gryse, Hang Yu, Johannes Peter Dingeldein, Matthias Oechsle, Mustafa Uslu, Thomas Dittert, Koji Hatanaka
  • Publication number: 20250193787
    Abstract: This application discloses a communication method, a terminal, and a network-side device, and pertains to the communication field. The communication method in embodiments of this application includes: sending, by a terminal, a first message to a network-side device, where the first message is used for requesting to use a requested slice to establish a connection to the network-side device; and receiving, by the terminal, a second message sent by the network-side device, where the second message carries information for indicating whether using the requested slice in a target tracking area TA is supported.
    Type: Application
    Filed: February 18, 2025
    Publication date: June 12, 2025
    Inventors: Hang YU, Yanchao KANG, Xiaowen SUN
  • Publication number: 20250182138
    Abstract: A system according to the present disclosure may include a processor, a centralized data warehouse, and a non-transitory computer readable medium storing thereon instructions that are executable by the processor to cause the system to perform operations. The operations may include comprising training a machine learning model based on enterprise data from the centralized data warehouse, the machine learning model trained to determine a value corresponding to a metric, receiving, from at least one external source, updated enterprise data, determining, in real-time by the machine learning model, a predicted change to the value based on the updated enterprise data, and presenting, via a graphical user interface (GUI), a suggested action based on the predicted change.
    Type: Application
    Filed: June 2, 2023
    Publication date: June 5, 2025
    Inventors: Xiangrong Chen, Huiting Li, Ligang Chen, Wei Wei, Hang Yu, Yuguan Chen, Wenjia Wu
  • Publication number: 20250140562
    Abstract: Metal stacks and methods of depositing a metal stack on a semiconductor substrate are disclosed. The metal stack is formed by depositing a tungsten (W) layer on the semiconductor substrate and depositing a molybdenum (Mo) layer on the tungsten (W) layer. In one method, a tungsten (W) capping layer is deposited on the molybdenum (Mo) layer, followed by formation of a nitride capping layer on the tungsten (W) capping layer). In a second method, a nitride capping layer is formed on the molybdenum (Mo) layer using an ammonia free process. Both processes result in the formation of a metal stack having low resistivity.
    Type: Application
    Filed: October 22, 2024
    Publication date: May 1, 2025
    Applicant: Applied Materials, Inc.
    Inventors: Zhaoxuan Wang, Wenting Hou, Jianxin Lei, Qixin Shen, Hang Yu
  • Publication number: 20250125145
    Abstract: Exemplary methods of forming a silicon-containing material may include providing a silicon-containing precursor to a processing region of a semiconductor processing chamber. A substrate may be housed within the processing region of the semiconductor processing chamber and include one or more features. The methods may include generating plasma effluents of the silicon-containing precursor in the processing region. The methods may include depositing a silicon-containing material on a vertically extending portion and a horizontally extending portion of the feature. Methods include soaking the deposited silicon-containing material with a second silicon-containing material.
    Type: Application
    Filed: October 11, 2023
    Publication date: April 17, 2025
    Applicant: Applied Materials, Inc.
    Inventors: Tianyang Li, Hang Yu, Rui Cheng, Deenesh Padhi, Woongsik Nam
  • Publication number: 20250101578
    Abstract: Exemplary semiconductor structures may include a stack of layers overlying a substrate. The stack of layers may include a first portion of layers, a second portion of layers overlying the first portion of layers, and a third portion of layers overlying the second portion of layers. The first portion of layers, the second portion of layers, and the third portion of layers may include alternating layers of a silicon oxide material and a silicon nitride material. One or more apertures may be formed through the stack of layers. A lateral notch in each individual layer of silicon nitride material at an interface of the individual layer of silicon nitride material and an overlying layer of silicon oxide material may extend a distance less than or about 100% of a distance corresponding to a thickness of the individual layer of silicon nitride material.
    Type: Application
    Filed: December 10, 2024
    Publication date: March 27, 2025
    Applicant: Applied Materials, Inc.
    Inventors: Xinhai Han, Hang Yu, Kesong Hu, Kristopher R. Enslow, Masaki Ogata, Wenjiao Wang, Chuan Ying Wang, Chuanxi Yang, Joshua Maher, Phaik Lynn Leong, Grace Qi En Teong, Alok Jain, Nagarajan Rajagopalan, Deenesh Padhi, SeoYoung Lee
  • Publication number: 20250097032
    Abstract: This application pertains to the field of communication technologies and discloses a service processing method. The method includes: receiving, by a first network device, a service processing request of a second network device for a target privacy protection service; obtaining a target privacy processing model obtained through joint training with the second network device; and performing, by using the target privacy processing model, privacy processing on network data related to the target privacy protection service, and then transmitting the network data to the second network device.
    Type: Application
    Filed: November 29, 2024
    Publication date: March 20, 2025
    Inventors: Hui WANG, Yanchao KANG, Hang YU
  • Publication number: 20250071543
    Abstract: This application discloses a privacy protection information processing method and apparatus, and a communication device, and pertains to the field of communication technologies. The privacy protection information processing method of embodiments of this application includes: sending, by a first communication device, a privacy protection service request message to a second communication device, where the privacy protection service request message includes an identifier of the first communication device and privacy protection service description information; and receiving, by the first communication device, privacy-protected service data returned by the second communication device.
    Type: Application
    Filed: November 7, 2024
    Publication date: February 27, 2025
    Inventors: Hui WANG, Yanchao KANG, Hang YU
  • Publication number: 20250070915
    Abstract: This application discloses an information transmission method and apparatus, a communication device, and a readable storage medium, which relate to the technical field of communications. An information transmission method of embodiments of this application includes: sending, by a first communication device, a first message to a second communication device, where the first message includes an information elements container, and the information elements container includes identification information of at least one first information element and content of the at least one first information element.
    Type: Application
    Filed: November 15, 2024
    Publication date: February 27, 2025
    Inventors: Hang YU, Yizhong ZHANG, Yanchao KANG
  • Publication number: 20250061232
    Abstract: Provided are a data processing method and apparatus, a core network node, an electronic device, and a storage medium. The data processing method includes following operations. A first core network node receives a task request sent by an application function AF. The first core network node performs a process of sending target data to the AF. The target data is data obtained through a privacy protection.
    Type: Application
    Filed: November 6, 2024
    Publication date: February 20, 2025
    Inventors: Hang YU, Yanchao KANG, Hui WANG
  • Publication number: 20250024420
    Abstract: An information transmission method and a network element. The information transmission method of embodiments of this application includes: A first core network element receives a location service request from a second core network element. The location service request is used to request location information of at least one user equipment, the location service request includes location granularity indication information, and the location granularity indication information is used to indicate at least one of location granularities of multiple gradients. The first core network element determines location accuracy and a quality of service QoS class based on the location service request. The first core network element sends a user equipment location service request to a first network element. The first core network element receives the user equipment location information sent by the first network element.
    Type: Application
    Filed: September 28, 2024
    Publication date: January 16, 2025
    Applicant: VIVO MOBILE COMMUNICATION CO., LTD.
    Inventors: Hang YU, Weiwei CHONG
  • Publication number: 20250024417
    Abstract: A user equipment information prediction method and apparatus and a network element. The method in embodiments of this application includes: obtaining, by a first network element, user equipment location data of a first time period using a location service LCS architecture; and inputting, by the first network element, the user equipment location data of the first time period into a traffic model or a supervised learning model, and obtaining user equipment prediction information of a second time period output by the traffic model or the supervised learning model.
    Type: Application
    Filed: September 27, 2024
    Publication date: January 16, 2025
    Applicant: VIVO MOBILE COMMUNICATION CO., LTD.
    Inventors: Hang YU, Weiwei CHONG
  • Patent number: 12195846
    Abstract: Exemplary methods of forming semiconductor structures may include forming a silicon oxide layer from a silicon-containing precursor and an oxygen-containing precursor. The methods may include forming a silicon nitride layer from a silicon-containing precursor, a nitrogen-containing precursor, and an oxygen-containing precursor. The silicon nitride layer may be characterized by an oxygen concentration greater than or about 5 at. %. The methods may also include repeating the forming a silicon oxide layer and the forming a silicon nitride layer to produce a stack of alternating layers of silicon oxide and silicon nitride.
    Type: Grant
    Filed: August 6, 2020
    Date of Patent: January 14, 2025
    Assignee: Applied Materials, Inc.
    Inventors: Xinhai Han, Hang Yu, Kesong Hu, Kristopher R. Enslow, Masaki Ogata, Wenjiao Wang, Chuan Ying Wang, Chuanxi Yang, Joshua Maher, Phaik Lynn Leong, Grace Qi En Teong, Alok Jain, Nagarajan Rajagopalan, Deenesh Padhi, SeoYoung Lee
  • Publication number: 20250016867
    Abstract: A resource control method and apparatus, a terminal, and a network side device are provided. The resource control metho comprises: a network side device determines failure of reactivation of a first PDU session initiated by a terminal due to NSAC of a first slice; and the network side device transmits a first message to the terminal, wherein the first message carries at least one of the following: first indication information indicating that a cause of the failure of the reactivation of the first PDU session fails is failure of the NSAC of the first slice fails; and second indication information indicating a first timer bound to the first slice and indicating that the terminal is allowed to reinitiate reactivation of the first PDU session associated with the first slice after expiry of the first timer.
    Type: Application
    Filed: September 25, 2024
    Publication date: January 9, 2025
    Inventors: Hang YU, Yanchao KANG
  • Publication number: 20240420949
    Abstract: Exemplary processing methods may include i) providing one or more deposition precursors to a processing region of a semiconductor processing chamber. A substrate may be housed within the processing region. The substrate may include one or more features defining one or more sidewalls. The methods may include ii) forming plasma effluents of the one or more deposition precursors. The methods may include iii) contacting the substrate with the plasma effluents of the one or more deposition precursors. The contacting may deposit a doped silicon-and-oxygen-containing material on the substrate. A first portion of the doped silicon-and-oxygen-containing material deposited on the one or more sidewalls of the one or more features may be characterized by a poorer film quality than a second portion of the doped silicon-and-oxygen-containing material deposited on a lower portion of the one or more features.
    Type: Application
    Filed: June 15, 2023
    Publication date: December 19, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Woongsik Nam, Euhngi Lee, Tianyang Li, Jisung Park, Hang Yu, Deenesh Padhi, Shichen Fu, Yufeng Jiang
  • Publication number: 20240402705
    Abstract: The present disclosure relates to the technical field of decision-making of unmanned surface vehicles, and provides a brain-like memory-based environment perception and decision-making method and system for an unmanned surface vehicle. The method includes: obtaining an image of an environment in front of an unmanned surface vehicle; and inputting the image of the environment into an environment perception and decision-making model of the unmanned surface vehicle, and outputting an action instruction, where the environment perception and decision-making model of the unmanned surface vehicle includes an image feature extractor, a Bidirectional Encoder Representations from Transformers (BERT) model, a fully connected layer, a short-term scene memory module, and a long-term memory module that are connected in turn; the BERT model extracts an image feature representation containing a text feature from an image feature. The present disclosure improves accuracy of decision-making of an action.
    Type: Application
    Filed: September 6, 2023
    Publication date: December 5, 2024
    Inventors: Shaorong Xie, Hang Yu, Xiangfeng Luo
  • Publication number: 20240328079
    Abstract: Described herein is an embossable non-solvent polyurethane sheet, which is formed from a non-solvent polyurethane system including a polyol component (a) and an isocyanate component (b), where the polyol component (a) includes (a-1) at least one polyol having a functionality in a range of from 1.5 to 2.5; and (a-2) optionally at least one polyol having a functionality in a range of 2.7 to 3.5, wherein an amount of the at least one polyol (a-2) is ?6 wt %, based on a total weight of the polyol component (a), and wherein the polyol component (a) has an average functionality of from 1.5 to 2.1. Also described herein are a laminate including the sheet and a synthetic leather including the sheet. Also described herein are a method of using the sheet, a method of using the laminate, and a method of using the synthetic leather.
    Type: Application
    Filed: October 13, 2021
    Publication date: October 3, 2024
    Inventors: Zhong Kai ZHANG, Feng QIN, Hang Yu XU, Chun Yi CHEN
  • Publication number: 20240332009
    Abstract: Exemplary methods of semiconductor processing may include forming a layer of silicon nitride on a semiconductor substrate. The layer of silicon nitride may be characterized by a first roughness. The methods may include performing a post-deposition treatment on the layer of silicon nitride. The methods may include reducing a roughness of the layer of silicon nitride such that the layer of silicon nitride may be characterized by a second roughness less than the first roughness.
    Type: Application
    Filed: March 26, 2024
    Publication date: October 3, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Qixin Shen, Chuanxi Yang, Hang Yu, Deenesh Padhi, Prashanthi Para, Miguel S. Fung, Rajesh Prasad, Fenglin Wang, Shan Tang, Kyu-Ha Shim