Patents by Inventor Hang Yu

Hang Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12106208
    Abstract: The present invention discloses an online neuron spike sorting method based on neuromorphic computing, which converts neuron spike signals collected from the cerebral cortex into spike signals through field coding, classifies different waveforms and corresponding time stamps by means of spiking neural networks, and realizes online neuron spike sorting; at the same time, the online update method of spiking neural network is used to adapt to the online changes of neuronal spike waveform and improve the accuracy of long-term online neuronal spike sorting. This method has fast computational speed, which can improve the speed of spike sorting process, maintain high consistency in classification on different datasets, and facilitate the deployment of implanted chips.
    Type: Grant
    Filed: December 23, 2022
    Date of Patent: October 1, 2024
    Assignee: ZHEJIANG UNIVERSITY
    Inventors: Gang Pan, Yu Qi, Hang Yu
  • Publication number: 20240304437
    Abstract: Capacitor devices containing silicon boron nitride with high boron concentration are provided. In one or more examples, a capacitor device is provided and contains a stopper layer containing silicon boron nitride and disposed on a substrate, a dielectric layer disposed on the stopper layer, vias formed within the dielectric layer and the stopper layer, metal contacts disposed on bottoms of the vias, a nitride barrier layer containing a metal nitride material and disposed on walls of the vias and disposed on the metal contacts, and an oxide layer disposed within the vias on the nitride barrier layer, wherein the oxide layer contains one or more holes or voids formed therein. The silicon boron nitride contains about 18 atomic percent (at %) to about 50 at % of boron.
    Type: Application
    Filed: April 29, 2024
    Publication date: September 12, 2024
    Inventors: Chuanxi YANG, Hang YU, Sanjay KAMATH, Deenesh PADHI, Honggun KIM, Euhngi LEE, Zubin HUANG, Diwakar N. KEDLAYA, Rui CHENG, Karthik JANAKIRAMAN
  • Publication number: 20240273347
    Abstract: The present invention discloses an online neuron spike sorting method based on neuromorphic computing, which converts neuron spike signals collected from the cerebral cortex into spike signals through field coding, classifies different waveforms and corresponding time stamps by means of spiking neural networks, and realizes online neuron spike sorting; at the same time, the online update method of spiking neural network is used to adapt to the online changes of neuronal spike waveform and improve the accuracy of long-term online neuronal spike sorting. This method has fast computational speed, which can improve the speed of spike sorting process, maintain high consistency in classification on different datasets, and facilitate the deployment of implanted chips.
    Type: Application
    Filed: December 23, 2022
    Publication date: August 15, 2024
    Inventors: GANG PAN, YU QI, HANG YU
  • Publication number: 20240249953
    Abstract: Exemplary methods of semiconductor processing may include providing a fluorine-containing precursor to a processing region of a semiconductor processing chamber. A substrate may be housed within the processing region. The substrate may include a boron-containing material overlying a carbon-containing material. The methods may include generating plasma effluents of the fluorine-containing precursor. The methods may include contacting the substrate with the plasma effluents of the fluorine-containing precursor. The methods may include removing the boron-containing material from the substrate.
    Type: Application
    Filed: January 19, 2023
    Publication date: July 25, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Yeonju Kwak, Jeong Hwan Kim, Qian Fu, Siyu Zhu, Hang Yu, Srinivas Guggilla
  • Publication number: 20240229211
    Abstract: A method for manufacturing a hot-dip galvanized steel sheet having a high Si content and good plating adhesion. The method for manufacturing a hot-dip galvanized steel sheet includes the following: hot-rolling a steel raw material having a Si content of 1.0 mass % or more and coiling a steel sheet at 500° C. to 700° C.; subjecting a surface of the steel sheet after the coiling to an oxidation treatment at a heating temperature of a steel sheet temperature of 750° C. or lower, and subsequently subjecting the surface to a reduction treatment; and subjecting the steel sheet after the reduction treatment to a hot-dip galvanizing treatment to form a Zn-plated layer on a surface of the steel sheet.
    Type: Application
    Filed: March 2, 2022
    Publication date: July 11, 2024
    Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (Kobe Steel, Ltd.)
    Inventors: Akira KAWAKAMI, Hiroo SHIGE, Hiroshi IRIE, Takayuki MAEDA, Hang YU
  • Publication number: 20240217182
    Abstract: A system and method for additive manufacturing are described. A system includes an additive manufacturing tooling head configured to deposit a heated material to form a workpiece, a tooling controller configured direct the tooling head through a sequence of additive manufacturing process actions, and a chamber comprising a build surface to support the workpiece during the sequence of additive manufacturing process actions. At least one thermal medium is positioned within the chamber. The tooling controller is further configured to determine a thermal gradient between the workpiece and the portion of the heated material based on the temperature of the workpiece and the temperature of the portion of the heated material to be deposited, and control the at least one thermal medium contained within the chamber over time based at least in part on a predetermined thermal gradient range.
    Type: Application
    Filed: May 26, 2022
    Publication date: July 4, 2024
    Inventors: Robert J. GRIFFITHS, David GARCIA, Hang YU
  • Patent number: 12016354
    Abstract: A fermented beverage and a preparation method are disclosed. The method uses ripened fruits and/or vegetables as raw materials. The method includes performing a natural ripening on a fruit and/or a vegetable at 15° C. to 30° C. for 5 days to 10 days to obtain a ripened fruit and/or vegetable; and inoculating lactic acid bacteria into the ripened fruit and/or vegetable, and performing a fermentation for 10 days to 30 days at 15° C. to 30° C. to obtain the fermented beverage. After 23 days of fermentation, the fermented beverage has a total flavonoid content up to 0.5 mg/mL to 2.0 mg/mL, which is beneficial to human health, a pH of 3.2 to 3.8 and a total titratable acidity of up to 12 mg/mL to 18 mg/mL. The fermented beverage requires a short fermentation cycle, which is beneficial to industrial production.
    Type: Grant
    Filed: October 22, 2020
    Date of Patent: June 25, 2024
    Assignees: Shandong Feilong Food Co., Ltd., Jiangnan University
    Inventors: Yuliang Cheng, Lin Xu, Shengnan Liu, Chengsheng Wang, Fuwei Pi, Yue Wang, Yahui Guo, Hang Yu, Yunfei Xie, Weirong Yao, He Qian
  • Patent number: 12020907
    Abstract: Exemplary semiconductor processing chambers may include a gasbox. The chambers may include a substrate support. The chambers may include a blocker plate positioned between the gasbox and the substrate support. The blocker plate may define a plurality of apertures through the plate. The chambers may include a faceplate positioned between the blocker plate and the substrate support. The faceplate may be characterized by a first surface facing the blocker plate and a second surface opposite the first surface. The faceplate may be characterized by a central axis. The faceplate may define a plurality of apertures through the faceplate distributed in a number of rings. Each ring of apertures may include a scaled increase in aperture number from a ring radially inward. A radially outermost ring of apertures may be characterized by a number of apertures reduced from the scaled increase in aperture number.
    Type: Grant
    Filed: April 9, 2020
    Date of Patent: June 25, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Arun Thottappayil, Mayur Govind Kulkarni, Junghoon Sun, Jun Tae Choi, Hang Yu
  • Patent number: 12014154
    Abstract: Methods and systems are presented for providing a computer platform that manages the impacts of government regulations on existing software processes of an online service provider. A regulation document is obtained from a government agency. The regulation document is processed, and legal obligations relevant to an online service provider are extracted from the regulation document. An ensemble machine learning model is used to recommend, for each of the legal obligations, software controls that can be implemented within one or more software processes of the online service provider to mitigate a risk of the legal obligations. The ensemble machine learning model may include an attribute-based model and a text-based model. An explainable visual interface is provided to present the recommended software controls and context that indicates to a user how the software controls are determined for the legal obligations.
    Type: Grant
    Filed: March 19, 2021
    Date of Patent: June 18, 2024
    Assignee: PAYPAL, INC.
    Inventors: Sneha Venkatachalam, Ravi Retineni, Hang Yu, Zhaoyang Wang, Yi Ren, Zihao Zhao, Huiting Li, Gaoyuan Wang, Li Cao
  • Publication number: 20240184207
    Abstract: Embodiments disclosed herein include a method of developing a patterning stack. In an embodiment, the method comprises providing a patterning stack, where the patterning stack comprises an underlayer and a photoresist over the underlayer, and where the underlayer has a first adhesion strength with the photoresist. The method may further comprise exposing and developing the photoresist with electromagnetic radiation and a developer, where scum remains on a surface of the underlayer. In an embodiment, the method further comprises treating the underlayer so that the underlayer has a second adhesion strength with the scum, and removing the scum.
    Type: Application
    Filed: October 11, 2023
    Publication date: June 6, 2024
    Inventors: Zhiyu Huang, BOCHENG CAO, SIYU ZHU, HANG YU, YUNG-CHEN LIN, CHI-I LANG
  • Publication number: 20240150937
    Abstract: Provided herein are protective masks made with polymer-based materials and methods of forming the materials. Methods of forming the interlaced polymer-based materials comprise applying adhesive to a substrate, electrospinning a first polymer solution onto the substrate from a first group of spinning electrodes, electrospinning a second polymer solution onto the substrate from a second group of spinning electrodes, and applying hot air to dry the polymer-based materials electrospun from the first polymer solution and the second polymer solution to form the interlaced polymer-based materials.
    Type: Application
    Filed: May 18, 2022
    Publication date: May 9, 2024
    Inventors: Siu Wah WONG, Ho Wang TONG, Chi Hang YU, Yu Hang LEUNG, Wing Man CHAN
  • Publication number: 20240141464
    Abstract: A steel sheet may be used for hot-dip galvanizing capable of manufacturing hot-dip galvannealed steel sheet(s) with a high Si content and in which alloying unevenness is suppressed. Such a steel sheet for hot-dip galvanizing may include an internal oxide layer containing an oxide of Si between a surface layer of the steel sheet and a steel sheet base portion. The Si content in a chemical composition of the steel sheet may be 1.0 mass % or more. A solid solution Si amount from a surface of the steel sheet to a depth of 1 ?m measured at all four positions including positions of 10 mm, 30 mm, and 50 mm from an edge in a coil width direction and a position of a center in the coil width direction at a rear end in a rolling direction of the steel sheet for hot-dip galvanizing may be 1.4 wt. % or less.
    Type: Application
    Filed: March 2, 2022
    Publication date: May 2, 2024
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
    Inventors: Akira KAWAKAMI, Hiroo SHIGE, Hiroshi IRIE, Takayuki MAEDA, Hang YU
  • Publication number: 20240133013
    Abstract: A method for manufacturing a hot-dip galvanized steel sheet having a high Si content and good plating adhesion. The method for manufacturing a hot-dip galvanized steel sheet includes the following: hot-rolling a steel raw material having a Si content of 1.0 mass % or more and coiling a steel sheet at 500° C. to 700° C.; subjecting a surface of the steel sheet after the coiling to an oxidation treatment at a heating temperature of a steel sheet temperature of 750° C. or lower, and subsequently subjecting the surface to a reduction treatment; and subjecting the steel sheet after the reduction treatment to a hot-dip galvanizing treatment to form a Zn-plated layer on a surface of the steel sheet.
    Type: Application
    Filed: March 2, 2022
    Publication date: April 25, 2024
    Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (Kobe Steel, Ltd.)
    Inventors: Akira KAWAKAMI, Hiroo SHIGE, Hiroshi IRIE, Takayuki MAEDA, Hang YU
  • Publication number: 20240091170
    Abstract: Provided are catechol nanoparticles, catechol protein nanoparticles, and a preparation method and use thereof. The method includes: adding a tannin compound-containing natural herb medicine into water to obtain a mixture, and subjecting the mixture to heating reflux extraction to obtain a herb medicine extract and subjecting the herb medicine extract to fractionation to obtain the catechol nanoparticles.
    Type: Application
    Filed: August 1, 2023
    Publication date: March 21, 2024
    Applicant: Shihezi University
    Inventors: Bo HAN, Jingmin Fan, Hang Yu, Rui Xue, Jiawei Guan, Yu Xu, Linyun He, Ji Liu, Chengyu Jiang, Xin Lu, Xiangze Kong, Wei Yu, Wen Chen
  • Patent number: 11935751
    Abstract: Exemplary deposition methods may include delivering a boron-containing precursor and a nitrogen-containing precursor to a processing region of a semiconductor processing chamber. The methods may include providing a hydrogen-containing precursor with the boron-containing precursor and the nitrogen-containing precursor. A flow rate ratio of the hydrogen-containing precursor to either of the boron-containing precursor or the nitrogen-containing precursor may be greater than or about 2:1. The methods may include forming a plasma of all precursors within the processing region of the semiconductor processing chamber. The methods may include depositing a boron-and-nitrogen material on a substrate disposed within the processing region of the semiconductor processing chamber.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: March 19, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Siyu Zhu, Chuanxi Yang, Hang Yu, Deenesh Padhi, Yeonju Kwak, Jeong Hwan Kim, Qian Fu, Xiawan Yang
  • Publication number: 20240087882
    Abstract: Exemplary semiconductor processing methods may include providing one or more deposition precursors to a processing region of a semiconductor processing chamber. The methods may include contacting a substrate housed in the processing region with the one or more deposition precursors. The methods may include forming a silicon-containing material on the substrate. The methods may include providing a fluorine-containing precursor to the processing region of the semiconductor processing chamber. The methods may include contacting the silicon-containing material on the substrate with the fluorine-containing precursor to form a fluorine-treated silicon-containing material. The methods may include contacting the fluorine-treated silicon-containing material with plasma effluents of argon or diatomic nitrogen.
    Type: Application
    Filed: September 9, 2022
    Publication date: March 14, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Siyu Zhu, Hang Yu, Deenesh Padhi, Sung-Kwan Kang, Abdul Wahab Mohammed, Abhijit Basu Mallick
  • Patent number: 11929278
    Abstract: Exemplary substrate support assemblies may include an electrostatic chuck body that defines a substrate support surface. The substrate support surface may define a plurality of protrusions that extend upward from the substrate support surface. A density of the plurality of protrusions within an outer region of the substrate support surface may be greater than in an inner region of the substrate support surface. The substrate support assemblies may include a support stem coupled with the electrostatic chuck body. The substrate support assemblies may include an electrode embedded within the electrostatic chuck body.
    Type: Grant
    Filed: May 19, 2021
    Date of Patent: March 12, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Madhu Santosh Kumar Mutyala, Saketh Pemmasani, Akshay Dhanakshirur, Mayur Govind Kulkarni, Hang Yu, Deenesh Padhi
  • Publication number: 20240038833
    Abstract: Memory devices and methods of forming memory devices are described. Methods of forming electronic devices are described where carbon is used as the removable mold material for the formation of a DRAM capacitor. A dense, high-temperature (500° C. or greater) PECVD carbon material is used as the removable mold material, e.g., the core material, instead of oxide. The carbon material can be removed by isotropic etching with exposure to radicals of oxygen (O2), nitrogen (N2), hydrogen (H2), ammonia (NH3), and combinations thereof.
    Type: Application
    Filed: July 14, 2023
    Publication date: February 1, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Fredrick Fishburn, Tomohiko Kitajima, Qian Fu, Srinivas Guggilla, Hang Yu, Jun Feng, Shih Chung Chen, Lakmal C. Kalutarage, Jayden Potter, Karthik Janakiraman, Deenesh Padhi, Yifeng Zhou, Yufeng Jiang, Sung-Kwan Kang
  • Publication number: 20240014039
    Abstract: Exemplary semiconductor processing methods may include providing an oxygen-containing precursor to a processing region of a semiconductor processing chamber. The methods may include forming a plasma of the oxygen-containing precursor to produce oxygen-containing plasma effluents. The methods may include contacting a substrate housed in the processing region with the oxygen-containing plasma effluents. The substrate may include a boron-and-nitrogen-containing material overlying a carbon-containing material. The boron-and-nitrogen-containing material comprises a plurality of openings. The methods may include etching the carbon-containing material.
    Type: Application
    Filed: July 11, 2022
    Publication date: January 11, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Jeong Hwan Kim, Yeonju Kwak, Qian Fu, Siyu Zhu, Chuanxi Yang, Hang Yu
  • Patent number: 11867892
    Abstract: An embodiment in accordance with the present invention provides a miniature microscope capable of performing in vivo, real-time imaging of multiple organ sites in awake and behaving animals (e.g. rodents). A microscope according to the present invention includes multiple optical contrast mechanisms (i.e. contrast arising from neural, hemodynamic and other physiological components). Exemplary contrast mechanisms include, but are not limited to fluorescence, hemoglobin level, deoxyhemoglobin level, and blood flow. The microscope is fully adaptable to in vitro and ex vivo imaging, can be customized to concurrently image at variable magnifications, conduct optogenetic/electrical/chemical stimulations, drug delivery, microdialysis, accompanied by electrical signal recording, wireless image transmission and charging.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: January 9, 2024
    Assignee: The Johns Hopkins University
    Inventors: Arvind Pathak, Nitish Thakor, Janaka Senarathna, Hang Yu