Patents by Inventor Heiko Feldmann
Heiko Feldmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240152057Abstract: The invention relates to an apparatus and a method for characterizing a microlithographic mask. According to one aspect, an apparatus according to the invention comprises at least one light source which emits coherent light, an illumination optical unit which produces a diffraction-limited light spot on the mask from the coherent light of the at least one light source, a scanning device, by use of which it is possible to implement a scanning movement of the diffraction-limited light spot relative to the mask, a sensor unit, and an evaluation unit for evaluating the light that is incident on the sensor unit and has come from the mask, an output coupling element for coupling out a portion of the coherent light emitted by the at least one light source, and an intensity sensor for capturing the intensity of this output coupled portion.Type: ApplicationFiled: January 19, 2024Publication date: May 9, 2024Inventors: Johannes Ruoff, Heiko Feldmann, Ulrich Matejka, Thomas Thaler, Sascha Perlitz, Shao-Chi Wei, Joerg Frederik Blumrich, Markus Deguenther
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Patent number: 11947265Abstract: An optical diffraction component has a periodic grating structure profile. The diffraction structure levels are arranged so that a wavelength range around two different target wavelengths diffracted by the grating structure profile has radiation components with three different phases that interfere destructively with one another. Diffraction structure levels predefine a topography of a grating period of the grating structure profile that is repeated regularly along a period running direction. These include a neutral diffraction structure level, a positive diffraction structure level raised relative thereto, and a negative diffraction structure level lowered relative thereto. The neutral diffraction structure level has an extent along the period running direction which is less than 50% of the extent of the grating period. A difference between the two target wavelengths is less than 50%.Type: GrantFiled: February 17, 2022Date of Patent: April 2, 2024Assignee: Carl Zeiss SMT GmbHInventor: Heiko Feldmann
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Patent number: 11914303Abstract: The invention relates to an apparatus and a method for characterizing a microlithographic mask. According to one aspect, an apparatus according to the invention comprises at least one light source which emits coherent light, an illumination optical unit which produces a diffraction-limited light spot on the mask from the coherent light of the at least one light source, a scanning device, by use of which it is possible to implement a scanning movement of the diffraction-limited light spot relative to the mask, a sensor unit, and an evaluation unit for evaluating the light that is incident on the sensor unit and has come from the mask, an output coupling element for coupling out a portion of the coherent light emitted by the at least one light source, and an intensity sensor for capturing the intensity of this output coupled portion.Type: GrantFiled: June 11, 2021Date of Patent: February 27, 2024Assignee: Carl Zeiss SMT GmbHInventors: Johannes Ruoff, Heiko Feldmann, Ulrich Matejka, Thomas Thaler, Sascha Perlitz, Shao-Chi Wei, Joerg Frederik Blumrich, Markus Deguenther
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Patent number: 11867642Abstract: The invention relates to an inspection device for masks for semiconductor lithography, comprising an imaging device for imaging a mask, and an image recording device, wherein one or more correction bodies which exhibit a dispersive behavior for at least one subrange of the illumination radiation used for the imaging are arranged in the light path between the mask and the image recording device. The invention furthermore relates to a method for taking account of longitudinal chromatic aberrations in inspection devices for masks, comprising the following steps: recording a specific number of images having differently defocused positions, and selecting a subset of the images and simulating a longitudinal chromatic aberration of a projection exposure apparatus.Type: GrantFiled: February 1, 2021Date of Patent: January 9, 2024Assignee: Carl Zeiss SMT GmbHInventors: Holger Seitz, Thomas Zeuner, Heiko Feldmann
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Publication number: 20230367227Abstract: An optical system for a lithography apparatus includes an optical element. The optical element comprises a substrate, an optically effective area provided on the substrate, and a plurality of channels which run through the substrate and to which a pressure can be applied via a fluid. An initial surface profile and a target surface profile different from the initial surface profile are associated with the optically effective area. The optically effective area can be switched from the initial surface profile to the target surface profile by applying pressure and a resulting deformation of the channels.Type: ApplicationFiled: July 24, 2023Publication date: November 16, 2023Inventors: Heiko Feldmann, Stefan Hembacher
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Patent number: 11817231Abstract: A detection system serves for X-ray inspection of an object. An imaging optical arrangement serves to image the object in an object plane illuminated by X-rays generated by an X-ray source. The imaging optical arrangement comprises an imaging optics to image a transfer field in a field plane into a detection field in a detection plane. A detection array is arranged at the detection field. An object mount holds the object to be imaged and is movable relative to the X-ray source via an object displacement drive along at least one lateral object displacement direction in the object plane. A shield stop with a transmissive shield stop aperture is arranged in an arrangement plane in a light path and is movable via a shield stop displacement drive in the arrangement plane.Type: GrantFiled: August 16, 2021Date of Patent: November 14, 2023Assignees: Carl Zeiss SMT GmbH, Carl Zeiss X-ray Microscopy Inc.Inventors: Johannes Ruoff, Juan Atkinson Mora, Thomas Anthony Case, Heiko Feldmann, Christoph Hilmar Graf Vom Hagen, Thomas Matthew Gregorich, Gerhard Krampert
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Publication number: 20230050439Abstract: An imaging optical arrangement serves to image an object illuminated by X-rays. An imaging optics serves to image a transfer field in a field plane into a detection field in a detection plane. A layer of scintillator material is arranged at the transfer field. A stop is arranged in a pupil plane of the imaging optics. The imaging optics has an optical axis. A center of a stop opening of the stop is arranged at a decentering distance with respect to the optical axis. Such imaging optical arrangement ensures a high quality imaging of the object irrespective of a tilt of X-rays entering the transfer field. The imaging optical arrangement is part of a detection assembly further comprising a detection array and an object mount. Such detection assembly is part of a detection system further comprising a X-ray source.Type: ApplicationFiled: August 16, 2021Publication date: February 16, 2023Inventors: Johannes Ruoff, Heiko Feldmann
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Publication number: 20230046280Abstract: A detection system serves for X-ray inspection of an object. An imaging optical arrangement serves to image the object in an object plane illuminated by X-rays generated by an X-ray source. The imaging optical arrangement comprises an imaging optics to image a transfer field in a field plane into a detection field in a detection plane. A detection array is arranged at the detection field. An object mount holds the object to be imaged and is movable relative to the light source via an object displacement drive along at least one lateral object displacement direction in the object plane. A shield stop with a transmissive shield stop aperture is arranged in an arrangement plane in a light path and is movable via a shield stop displacement drive in the arrangement plane.Type: ApplicationFiled: August 16, 2021Publication date: February 16, 2023Inventors: Johannes Ruoff, Juan Atkinson Mora, Thomas Anthony Case, Heiko Feldmann, Christoph Hilmar Graf Vom Hagen, Thomas Matthew Gregorich, Gerhard Krampert
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Publication number: 20220171292Abstract: An optical diffraction component has a periodic grating structure profile. The diffraction structure levels are arranged so that a wavelength range around two different target wavelengths diffracted by the grating structure profile has radiation components with three different phases that interfere destructively with one another. Diffraction structure levels predefine a topography of a grating period of the grating structure profile that is repeated regularly along a period running direction. These include a neutral diffraction structure level, a positive diffraction structure level raised relative thereto, and a negative diffraction structure level lowered relative thereto. The neutral diffraction structure level has an extent along the period running direction which is less than 50% of the extent of the grating period. A difference between the two target wavelengths is less than 50%.Type: ApplicationFiled: February 17, 2022Publication date: June 2, 2022Inventor: Heiko Feldmann
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Publication number: 20210397099Abstract: The invention relates to an apparatus and a method for characterizing a microlithographic mask. According to one aspect, an apparatus according to the invention comprises at least one light source which emits coherent light, an illumination optical unit which produces a diffraction-limited light spot on the mask from the coherent light of the at least one light source, a scanning device, by use of which it is possible to implement a scanning movement of the diffraction-limited light spot relative to the mask, a sensor unit, and an evaluation unit for evaluating the light that is incident on the sensor unit and has come from the mask, an output coupling element for coupling out a portion of the coherent light emitted by the at least one light source, and an intensity sensor for capturing the intensity of this output coupled portion.Type: ApplicationFiled: June 11, 2021Publication date: December 23, 2021Inventors: Johannes Ruoff, Heiko Feldmann, Ulrich Matejka, Thomas Thaler, Sascha Perlitz, Shao-Chi Wei, Joerg Frederik Blumrich, Markus Deguenther
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Patent number: 11194256Abstract: An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength ?1. A second of the diffraction structure groups is configured to suppress a second target wavelength ?2, where (?1??2)2/(?1+?2)2<20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.Type: GrantFiled: November 17, 2020Date of Patent: December 7, 2021Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Valentin Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop
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Publication number: 20210318622Abstract: An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength ?1. A second of the diffraction structure groups is configured to suppress a second target wavelength ?2, where (?1??2)2/(?1+?2)2<20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.Type: ApplicationFiled: November 17, 2020Publication date: October 14, 2021Inventors: Heiko Feldmann, Valentin Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop
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Publication number: 20210156809Abstract: The invention relates to an inspection device for masks for semiconductor lithography, comprising an imaging device for imaging a mask, and an image recording device, wherein one or more correction bodies which exhibit a dispersive behavior for at least one subrange of the illumination radiation used for the imaging are arranged in the light path between the mask and the image recording device. The invention furthermore relates to a method for taking account of longitudinal chromatic aberrations in inspection devices for masks, comprising the following steps: recording a specific number of images having differently defocused positions, and selecting a subset of the images and simulating a longitudinal chromatic aberration of a projection exposure apparatus.Type: ApplicationFiled: February 1, 2021Publication date: May 27, 2021Inventors: Holger Seitz, Thomas Zeuner, Heiko Feldmann
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Patent number: 10928332Abstract: The invention relates to an inspection device for masks for semiconductor lithography, comprising an imaging device for imaging a mask, and an image recording device, wherein one or more correction bodies which exhibit a dispersive behavior for at least one subrange of the illumination radiation used for the imaging are arranged in the light path between the mask and the image recording device. The invention furthermore relates to a method for taking account of longitudinal chromatic aberrations in inspection devices for masks, comprising the following steps: recording a specific number of images having differently defocused positions, and selecting a subset of the images and simulating a longitudinal chromatic aberration of a projection exposure apparatus.Type: GrantFiled: July 3, 2018Date of Patent: February 23, 2021Assignee: Carl Zeiss SMT GmbHInventors: Holger Seitz, Thomas Zeuner, Heiko Feldmann
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Patent number: 10852640Abstract: An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength ?1. A second of the diffraction structure groups is configured to suppress a second target wavelength ?2, where (?1??2)2/(?1+?2)2<20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.Type: GrantFiled: January 10, 2020Date of Patent: December 1, 2020Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Valentin Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop
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Publication number: 20200225586Abstract: An optical diffraction component is configured to suppress at least one target wavelength by destructive interference. The optical diffraction component includes at least three diffraction structure levels that are assignable to at least two diffraction structure groups. A first of the diffraction structure groups is configured to suppress a first target wavelength ?1. A second of the diffraction structure groups is configured to suppress a second target wavelength ?2, where (?1??2)2/(?1+?2)2<20%. A topography of the diffraction structure levels can be described as a superimposition of two binary diffraction structure groups. Boundary regions between adjacent surface sections of each of the binary diffraction structure groups have a linear course and are superimposed on one another at most along sections of the linear course.Type: ApplicationFiled: January 10, 2020Publication date: July 16, 2020Inventors: Heiko Feldmann, Valentin Bolsinger, William Peter Van Drent, Jozef Petrus Henricus Benschop
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Patent number: 10281824Abstract: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.Type: GrantFiled: January 24, 2017Date of Patent: May 7, 2019Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Daniel Kraehmer, Jean-Claude Perrin, Julian Kaller, Aurelian Dodoc, Vladimir Kamenov, Olaf Conradi, Toralf Gruner, Thomas Okon, Alexander Epple
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Patent number: 10274649Abstract: A mirror for EUV radiation includes a mirror body, which has at least one EUV radiation-reflecting region and at least two EUV radiation-permeable regions. A spatial separation of the illumination and imaging beam paths is possible with small angles of incidence and a large object-side numerical aperture.Type: GrantFiled: March 8, 2013Date of Patent: April 30, 2019Assignee: Carl Zeiss SMT GmbHInventors: Johannes Ruoff, Heiko Feldmann
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Publication number: 20190011376Abstract: The invention relates to an inspection device for masks for semiconductor lithography, comprising an imaging device for imaging a mask, and an image recording device, wherein one or more correction bodies which exhibit a dispersive behavior for at least one subrange of the illumination radiation used for the imaging are arranged in the light path between the mask and the image recording device. The invention furthermore relates to a method for taking account of longitudinal chromatic aberrations in inspection devices for masks, comprising the following steps: recording a specific number of images having differently defocused positions, and selecting a subset of the images and simulating a longitudinal chromatic aberration of a projection exposure apparatus.Type: ApplicationFiled: July 3, 2018Publication date: January 10, 2019Inventors: Holger Seitz, Thomas Zeuner, Heiko Feldmann
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Patent number: 10114293Abstract: An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.Type: GrantFiled: August 16, 2012Date of Patent: October 30, 2018Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Erik Matthias Sohmen, Joachim Stuehler, Oswald Gromer, Ulrich Mueller, Michael Layh, Markus Schwab