Patents by Inventor Heiko Feldmann
Heiko Feldmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8325426Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: GrantFiled: June 9, 2011Date of Patent: December 4, 2012Assignee: Carl Zeiss SMT GmbHInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
-
Patent number: 8319944Abstract: A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.Type: GrantFiled: June 28, 2010Date of Patent: November 27, 2012Assignee: Carl Zeiss SMT GmbHInventors: Helmut Beierl, Sascha Bleidistel, Wolfgang Singer, Toralf Gruner, Alexander Epple, Norbert Wabra, Susanne Beder, Jochen Weber, Heiko Feldmann, Baerbel Schwaer, Olaf Rogalsky, Ari Kazi
-
Patent number: 8310752Abstract: The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.Type: GrantFiled: March 30, 2009Date of Patent: November 13, 2012Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Toralf Gruner, Alexander Epple
-
Patent number: 8294991Abstract: An optical system of a microlithographic projection exposure apparatus permits comparatively flexible and fast influencing of the intensity distribution and/or the polarization state. The optical system includes at least one layer system that is at least one-side bounded by a lens or a mirror. The layer system is an interference layer system of several layers and has at least one liquid or gaseous layer portion with a maximum thickness of one micrometer (?m), and a manipulator for manipulation of the thickness profile of the layer portion.Type: GrantFiled: January 14, 2010Date of Patent: October 23, 2012Assignee: Carl Zeiss SMT GmbHInventors: Ralf Mueller, Toralf Gruner, Michael Totzeck, Heiko Feldmann, Hans-Jochen Paul
-
Publication number: 20120176670Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |??| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.Type: ApplicationFiled: March 19, 2012Publication date: July 12, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Rostalski, Heiko Feldmann
-
Patent number: 8211627Abstract: A method and to an apparatus for structuring a radiation-sensitive material are disclosed. The method can include using a dynamic mask to generate a first radiation pattern in a layer of the radiation-sensitive material, where the first radiation pattern has a thickness that is at most 50% of the thickness of the layer of the radiation-sensitive material. The method can also include using the dynamic mask to generate a second radiation pattern in the layer of the radiation-sensitive material. The dynamic mask can be configured to change its structure dynamically, and the first radiation pattern can be different from the second radiation pattern.Type: GrantFiled: December 30, 2008Date of Patent: July 3, 2012Assignee: Carl Zeiss SMT GmbHInventor: Heiko Feldmann
-
Publication number: 20120134016Abstract: The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.Type: ApplicationFiled: February 2, 2012Publication date: May 31, 2012Applicant: CARL ZEISS SMT GMBHInventors: Heiko Feldmann, Toralf Gruner, Alexander Epple
-
Publication number: 20120127566Abstract: A magnifying imaging optical system is disclosed that has precisely three mirrors, which image an object field in an object plane into an image field in an image plane. A ratio between a transverse dimension of the image field and a transverse dimension measured in the same direction of a useful face of the last mirror before the image field is greater than 3. In a further aspect, the magnifying imaging optical system is disclosed that has at least three mirrors, which image an object field in an object plane in an image field in an image plane. A first mirror in the beam path after the object field is concave, a second mirror is also concave and a third mirror is convex. An angle of incidence of imaging beams on the last mirror before the image field is less than 15°.Type: ApplicationFiled: November 22, 2011Publication date: May 24, 2012Inventors: Hans-Juergen Mann, Heiko Feldmann
-
Patent number: 8164759Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |??| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.Type: GrantFiled: March 12, 2010Date of Patent: April 24, 2012Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Rostalski, Heiko Feldmann
-
Publication number: 20120092637Abstract: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.Type: ApplicationFiled: December 21, 2011Publication date: April 19, 2012Applicant: CARL ZEISS SMT GMBHInventors: Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann, Jochen Hetzler
-
Patent number: 8107054Abstract: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.Type: GrantFiled: September 15, 2008Date of Patent: January 31, 2012Assignee: Carl Zeiss SMT GmbHInventors: Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann, Jochen Hetzler
-
Patent number: 8068276Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.Type: GrantFiled: October 6, 2010Date of Patent: November 29, 2011Assignee: Carl Zeiss SMT GmbHInventors: Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple, Hans-Juergen Rostalski
-
Patent number: 8031326Abstract: In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation arounType: GrantFiled: March 5, 2008Date of Patent: October 4, 2011Assignee: Carl Zeiss SMT GmbHInventors: Michael Totzeck, Susanne Beder, Wilfried Clauss, Heiko Feldmann, Daniel Kraehmer, Aurelian Dodoc
-
Publication number: 20110235013Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: ApplicationFiled: June 9, 2011Publication date: September 29, 2011Applicant: CARL ZEISS SMT GMBHInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
-
Publication number: 20110222043Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: May 20, 2011Publication date: September 15, 2011Applicant: CARL ZEISS SMT GMBHInventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
-
Patent number: 7982969Abstract: A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.Type: GrantFiled: December 9, 2008Date of Patent: July 19, 2011Assignee: Carl Zeiss SMT GmbHInventors: Karl-Heinz Schuster, Heiko Feldmann, Toralf Gruner, Michael Totzeck, Wilfried Clauss, Susanne Beder, Daniel Kraehmer, Olaf Dittmann
-
Patent number: 7965453Abstract: A reduction projection objective for projection lithography has a plurality of optical elements configured to image an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio |?|<1. The optical elements form a dry objective adapted with regard to aberrations to a gaseous medium with refractive index n?<1.01 filling an image space of finite thickness between an exit surface of the projection objective and the image surface. The optical elements include a largest lens having a maximum lens diameter Dmax and are configured to provide an image-side numerical aperture NA<1 in an effective image field having a maximum image field height Y?. With COMP=Dmax/(Y?·(NA/n?)2) the condition COMP<15.8 holds.Type: GrantFiled: January 4, 2010Date of Patent: June 21, 2011Assignee: Carl Zeiss SMT GmbHInventors: Wilhelm Ulrich, Aurelian Dodoc, Heiko Feldmann, Hans-Juergen Rostalski
-
Publication number: 20110134403Abstract: A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element that has no refractive power and is designed for dry operation of the projection objective. According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element is replaceable with the dry terminating element. Preferably, the dry terminating element and/or the immersion terminating element is composed of a plurality of plates, which are made of materials having different refractive indices.Type: ApplicationFiled: September 16, 2005Publication date: June 9, 2011Applicant: CARL ZEISS SMT AGInventors: Heiko Feldmann, Alexander Epple, Vladan Blahnik
-
Publication number: 20110026110Abstract: In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.Type: ApplicationFiled: October 6, 2010Publication date: February 3, 2011Applicant: CARL ZEISS SMT AGInventors: Heiko Feldmann, Susanne Beder, Aurelian Dodoc, Alexander Epple, Hans-Juergen Rostalski
-
Patent number: 7848031Abstract: A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer 1a directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.Type: GrantFiled: January 20, 2006Date of Patent: December 7, 2010Assignee: Carl Zeiss SMT AGInventors: Jochen Hetzler, Susanne Beder, Heiko Feldmann