Patents by Inventor Henning Haffner
Henning Haffner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120156881Abstract: A method includes depositing a material layer over a semiconductor substrate and using a first mask in a first exposure/patterning process to pattern the material layer thereby forming a plurality of first and second features. The first features include patterns for the semiconductor device and the second features include printing assist features. The method includes using a second mask in a second exposure/patterning process to effectively remove the second features from the material layer and to define at least one separating structure between two first features.Type: ApplicationFiled: December 20, 2010Publication date: June 21, 2012Applicant: INFINEON TECHNOLOGIES NORTH AMERICA CORP.Inventor: Henning Haffner
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Patent number: 8161421Abstract: A method of training an Optical Proximity Correction (OPC) model comprises symmetrizing a complex design to be a test pattern having orthogonal symmetry. Symmetrizing may comprise establishing a axis of symmetry passing through the design, thereby dividing the design into two portions; deleting one of the two portions; and mirror-imaging the other of the two portions about the axis of symmetry. The design may be centered.Type: GrantFiled: July 7, 2008Date of Patent: April 17, 2012Assignees: International Business Machines Corporation, Infineon Technologies AGInventors: Ramya Viswanathan, Amr Y. Abdo, Henning Haffner, Oseo Park, Michael E. Scaman
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Publication number: 20120089953Abstract: A method for mask layout formation including forming a plurality of phase shapes on either side of a critical feature of a design layout of an integrated circuit chip having a plurality of critical features, wherein each phase shape has an edge; identifying a plurality of transition edges from the edges, wherein each transition edge is parallel to a critical feature; identifying a transition space defined by one of a group including two transition edges, wherein the space is external to all phase shapes, and one transition edge, wherein the space is external to all phase shapes; forming a transition polygon by closing each transition space with at least one closing edge, wherein each closing edge is perpendicular to the plurality of transition edges; transforming each transition polygon into a printing assist feature; and forming a first mask layout or a second mask layout from the printing assist features and the critical features.Type: ApplicationFiled: October 11, 2010Publication date: April 12, 2012Applicants: INFINEON TECHNOLOGIES NORTH AMERICA CORPORATION, INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Zachary Baum, Scott D. Halle, Henning Haffner
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Publication number: 20120074499Abstract: Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes using a first mask to pattern a gate material forming a plurality of first and second features. The first features form gate electrodes of the semiconductor devices, whereas the second features are dummy electrodes. Based on the location of these dummy electrodes, selected dummy electrodes are removed using a second mask. The use of the method provides greater flexibility in tailoring individual devices for different objectives.Type: ApplicationFiled: November 15, 2011Publication date: March 29, 2012Applicant: Infineon Technologies AGInventors: Henning Haffner, Manfred Eller, Richard Lindsay
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Patent number: 8099684Abstract: Embodiments of the present invention provide a method of placing printing assist features in a mask layout. The method includes providing a design layout having one or more designed features; generating a set of parameters, the set of parameters being associated with one or more printing assist features (PrAFs); adding the one or more PrAFs of the set of parameters to the design layout to produce a modified design layout; performing simulation of the one or more PrAFs and the one or more designed features on the modified design layout; verifying whether the one or more PrAFs are removable based on results of the simulation; and creating a set of PrAF placement rules based on the set of parameters, if the one or more PrAFs are verified as removable. The set of PrAF placement rules may be used in creating a final set of PrAF features to be used for creating the mask layout.Type: GrantFiled: January 8, 2009Date of Patent: January 17, 2012Assignees: International Business Machines Corporation, Infineon Technologies North America CorporationInventors: Jason E Meiring, Henning Haffner
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Patent number: 8092958Abstract: A mask and method for patterning a semiconductor wafer is disclosed. A mask set is fabricated on a transparent substrate. A mask layer comprising mask region elements that transmit light is disposed on the substrate, wherein each mask element is segmented into a plurality of segments.Type: GrantFiled: September 26, 2006Date of Patent: January 10, 2012Assignee: Infineon Technologies AGInventor: Henning Haffner
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Patent number: 8078998Abstract: Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes using a first mask to pattern a gate material forming a plurality of first and second features. The first features form gate electrodes of the semiconductor devices, whereas the second features are dummy electrodes. Based on the location of these dummy electrodes, selected dummy electrodes are removed using a second mask. The use of the method provides greater flexibility in tailoring individual devices for different objectives.Type: GrantFiled: July 20, 2010Date of Patent: December 13, 2011Assignee: Infineon Technologies AGInventors: Henning Haffner, Manfred Eller, Richard Lindsay
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Patent number: 8071261Abstract: Lithography masks and methods of manufacture thereof are disclosed. For example, a method of manufacturing a lithography mask includes forming a stack over a substrate. The stack includes bottom attenuated phase shift material layers, intermediate opaque material layers, and finally top resist layers. The method further includes patterning the stack and then trimming the resist layers to uncover a portion of the opaque material layers. The uncovered opaque material layers are subsequently etched followed by removal of any remaining resist layers.Type: GrantFiled: July 20, 2007Date of Patent: December 6, 2011Assignee: Infineon Technologies AGInventors: Alois Gutmann, Sajan Marokkey, Henning Haffner, Chandrasekhar Sarma, Haoren Zhuang, Matthias Lipinski
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Patent number: 8039203Abstract: Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes depositing a gate material over a semiconductor substrate, and depositing a first resist layer over the gate material. A first mask is used to pattern the first resist layer to form first and second resist features. The first resist features include pattern for gate lines of the semiconductor device and the second resist features include printing assist features. A second mask is used to form a resist template; the second mask removes the second resist features.Type: GrantFiled: May 23, 2008Date of Patent: October 18, 2011Assignees: Infineon Technologies AG, International Business Machines CorporationInventors: Helen Wang, Scott D. Halle, Henning Haffner, Haoren Zhuang, Klaus Herold, Matthew E. Colburn, Allen H. Gabor, Zachary Baum, Scott M. Mansfield, Jason E. Meiring
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Patent number: 7975246Abstract: A method that purposely relaxes OPC algorithm constraints to allow post OPC mask shapes to elongate along one direction (particularly lowering the 1-dimensional MEEF in this direction with the result of an effectively overall lowered MEEF) to produce a pattern on wafer that is circular to within an acceptable tolerance.Type: GrantFiled: August 14, 2008Date of Patent: July 5, 2011Assignees: International Business Machines Corporation, Infineon Technologies North America CorporationInventors: Derren Neylon Dunn, Michael M Crouse, Henning Haffner, Michael Edward Scaman
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Patent number: 7947431Abstract: Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate.Type: GrantFiled: July 30, 2010Date of Patent: May 24, 2011Assignee: Infineon Technologies AGInventors: Chandrasekhar Sarma, Alois Gutmann, Henning Haffner, Sajan Marokkey, Josef Maynollo
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Patent number: 7945869Abstract: A method for generating a mask pattern is provided. A target lithographic pattern comprising a plurality of first geometric regions is provided, wherein the regions between the plurality of first geometric regions comprise first spaces. The target lithographic pattern is transformed, and the transformed pattern is decomposed into a first pattern and a second pattern.Type: GrantFiled: August 20, 2007Date of Patent: May 17, 2011Assignees: Infineon Technologies AG, International Business Machines CorporationInventors: Henning Haffner, Scott M. Mansfield
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Publication number: 20100297398Abstract: Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate.Type: ApplicationFiled: July 30, 2010Publication date: November 25, 2010Inventors: Chandrasekhar Sarma, Alois Gutmann, Henning Haffner, Sajan Marokkey, Josef Maynollo
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Publication number: 20100276759Abstract: Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes using a first mask to pattern a gate material forming a plurality of first and second features. The first features form gate electrodes of the semiconductor devices, whereas the second features are dummy electrodes. Based on the location of these dummy electrodes, selected dummy electrodes are removed using a second mask. The use of the method provides greater flexibility in tailoring individual devices for different objectives.Type: ApplicationFiled: July 20, 2010Publication date: November 4, 2010Inventors: Henning Haffner, Manfred Eller, Richard Lindsay
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Patent number: 7799486Abstract: Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate.Type: GrantFiled: November 21, 2006Date of Patent: September 21, 2010Assignee: Infineon Technologies AGInventors: Chandrasekhar Sarma, Alois Gutmann, Henning Haffner, Sajan Marokkey, Josef Maynollo
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Patent number: 7785946Abstract: Integrated circuits and methods of manufacture and design thereof are disclosed. For example, a method of manufacturing includes using a first mask to pattern a gate material forming a plurality of first and second features. The first features form gate electrodes of the semiconductor devices, whereas the second features are dummy electrodes. Based on the location of these dummy electrodes, selected dummy electrodes are removed using a second mask. The use of the method provides greater flexibility in tailoring individual devices for different objectives.Type: GrantFiled: September 25, 2007Date of Patent: August 31, 2010Assignee: Infineon Technologies AGInventors: Henning Haffner, Manfred Eller, Richard Lindsay
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Publication number: 20100175040Abstract: Embodiments of the present invention provide a method of placing printing assist features in a mask layout. The method includes providing a design layout having one or more designed features; generating a set of parameters, the set of parameters being associated with one or more printing assist features (PrAFs); adding the one or more PrAFs of the set of parameters to the design layout to produce a modified design layout; performing simulation of the one or more PrAFs and the one or more designed features on the modified design layout; verifying whether the one or more PrAFs are removable based on results of the simulation; and creating a set of PrAF placement rules based on the set of parameters, if the one or more PrAFs are verified as removable. The set of PrAF placement rules may be used in creating a final set of PrAF features to be used for creating the mask layout.Type: ApplicationFiled: January 8, 2009Publication date: July 8, 2010Applicants: International Business Machines Corporation, Infineon Technologies North America Corp.Inventors: Jason E. Meiring, Henning Haffner
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Patent number: 7669173Abstract: A method of making a semiconductor device is disclosed. A target mask pattern is provided which includes features to be exposed on the mask, and features to be non-exposed on the mask. The to be exposed features are fractured by searching for geometries on the target mask pattern that meet one or more conditions, identifying mask pattern structures to be fractured, fracturing the identified pattern structures according to a fracture instruction list, creating a set of mask exposure patterns, exposing the mask to the mask exposure pattern, and developing the mask.Type: GrantFiled: December 7, 2006Date of Patent: February 23, 2010Assignee: Infineon Technologies AGInventor: Henning Haffner
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Patent number: 7669176Abstract: System and method for using adjustment patterns as well as physical parameters as targets to control mask structure dimensions using optical proximity correction. A method for correcting layer patterns comprises selecting optimum sacrificial patterns, defining virtual targets from the optimum sacrificial patterns, and executing an optical proximity correction process with the virtual targets to correct layer patterns. The selecting of the optimum sacrificial patterns may be performed in a separate processing stage, thereby reducing the number of targets to be investigated during a process window optical proximity correction, thereby reducing the runtime, processing, and memory requirements.Type: GrantFiled: September 14, 2007Date of Patent: February 23, 2010Assignee: Infineon Technologies AGInventor: Henning Haffner
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Publication number: 20100042967Abstract: A method that purposely relaxes OPC algorithm constraints to allow post OPC mask shapes to elongate along one direction (particularly lowering the 1-dimensional MEEF in this direction with the result of an effectively overall lowered MEEF) to produce a pattern on wafer that is circular to within an acceptable tolerance.Type: ApplicationFiled: August 14, 2008Publication date: February 18, 2010Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION, INFINEON TECHNOLOGIES NORTH AMERICA CORPORATIONInventors: Derren N. Dunn, Michael M. Crouse, Henning Haffner, Michael E. Scaman