Abstract: A manufacturing apparatus for a semiconductor device, including: a reaction chamber configured to perform film formation on a wafer; a process gas supplying mechanism provided in an upper part of the reaction chamber and configured to introduce process gas to an interior of the reaction chamber; a gas discharging mechanism provided in a lower part of the reaction chamber and configured to discharge gas from the reaction chamber; a supporting member configured to hold the wafer; a cleaning gas supplying mechanism provided in an outer periphery of the supporting member and configured to emit cleaning gas in an outer periphery direction below an upper end of the supporting member; a heater configured to heat the wafer; and a rotary driving mechanism configured to rotate the wafer.

Abstract: A gypsum dewatering device 2 installed in a desulfurization facility 105 in which sulfur oxide in flue gas G is absorbed by limestone in an absorber 1, includes a belt filter 22 that absorbs sulfur oxide and dewaters gypsum slurry SS fed from the absorber 1 to form a gypsum cake SC, a vacuum suction mechanism 23 that sucks moisture in the gypsum cake SC via the belt filter 22, a moisture measuring means H1 that measures a moisture content of the gypsum cake SC to be dewatered by the belt filter 22, a heating means 25 that heats the gypsum cake SC dewatered by the belt filter 22 by hot water or steam, and a control means 26 that controls a heated state by the heating means 25 when the moisture content of the gypsum cake SC input from the moisture measuring means H1 has exceeded a predetermined amount.

Abstract: A tray moving mechanism includes: a unit base having an internal space formed as a containing space; and a tray movable between a retracted position in which the unit base is contained in the containing space and a projected position in which a music player formed in a substantially rectangular shape can be placed on the tray and in which a part of the tray is projected from the base unit, wherein the tray is moved with respect to the unit base such that the orientations of the tray with respect to the unit base in the retracted and projected positions are substantially 90 deg different from each other.

Abstract: A partially-reduced iron producing apparatus includes: an exhaust gas circulating device supplying an oxygen-containing gas to raw-material pellets to be heated by ignition of raw-material pellets, the oxygen-containing gas made by circulating part of an exhaust gas by use of the heat of the ignition raw-material pellets and mixing the discharged exhaust gas with air; and a liquid-tar separating device which is provided in the exhaust gas circulating device. A partially-reduced iron is produced by heating and reducing the whole of the raw-material pellets in a bed height direction thereof through a combustion region for the raw-material pellets and a heating region for the raw-material pellets, the combustion region formed on an upstream side of an endless grate by supplying the gas having a high oxygen concentration; and the heating region formed downstream of the combustion region of the endless grate by supplying the gas having a low oxygen concentration.

Abstract: A lateral electric field type liquid crystal display device includes substrates, liquid crystal put between the substrates, scan lines and data lines arranged on one of the substrates, and pixels each of whose boundary is defined by two scan lines and two data lines. In each pixel, a strip-shaped electrode and a common electrode are formed with an insulating film put thereamong, and the pixel electrode is arranged to extend close along one of the data lines. In each pixel, a part of the common electrode covering one of the data lines overlaps with the pixel electrode, the pixel electrode partially projects from the overlapping area, and a side edge of the projecting part of the pixel electrode is separated from a side edge of a part of the common electrode covering the other data line so as to generate a lateral electric field to drive the liquid crystal.

Abstract: To provide an active-matrix type liquid crystal display device having a structure in which alignment of flattening films formed in the display region is uniform and fine, which can secure a large storage capacitance with a small area and achieve a high numerical aperture. A recessed region having no flattening film is formed in a part on a source electrode. In the recessed region, a common electrode made with a transparent conductive film covers a source electrode to form a second storage capacitor.

Abstract: A film-forming apparatus and method for the formation of silicon carbide comprising, a film-forming chamber to which a reaction gas is supplied, a temperature-measuring unit which measures a temperature within the chamber, a plurality of heating units arranged inside the chamber, an output control unit which independently controls outputs of the plurality of heating units, a substrate-transferring unit which transfers a substrate into, and out of the chamber, wherein the output control unit turns off or lowers at least one output of the plurality of heating units when the film forming process is completed, when the temperature measured by the temperature-measuring unit reaches a temperature at which the substrate-transferring unit is operable within the chamber, then at least one output of the plurality of heating units turned off or lowered, is turned on or raised, and the substrate is transferred out of the film-forming chamber by the substrate-transferring unit.

Abstract: To acquire a fine viewing angle property from oblique view fields in a lateral electric field type liquid crystal display device having liquid crystal initial alignment directions in two orthogonal directions. The absorption axis of the incident-side polarization plate and the absorption axis of the exit-side polarization plate are orthogonal to each other in both of the region I and the region II, and the liquid crystal layer, the in-cell retarder as an optical compensation layer, the A-plate, and the C-plate sandwiched therebetween are in parallel to either one of the absorption axes or orthogonal to the substrates. Therefore, the transmittance can be suppressed to be low and a fine black display can be acquired even when the display surface is viewed from the oblique view fields.

Abstract: An inspection apparatus includes an imaging device and an image processing device. The imaging device photographs a specimen and outputs a color image of the specimen to the image processing device. The image processing device subjects the color image of the specimen to negative-positive reversal. After detecting a mode value of the hue the color image having been subjected to negative-positive reversal, the image processing device changes the hue of the color image in accordance with a difference between a boundary value of two predefined hues and the detected mode value. In accordance with the change of the hue, a plurality of target pixels different in the saturation is extracted and the saturation and the intensity of each pixel are changed, or the gradation of each pixel is converted so that the plurality of target pixels becomes most distant from one another in a color space.

Abstract: A film-forming apparatus and method comprising a film-forming chamber for supplying a reaction gas into, a cylindrical shaped liner provided between an inner wall of the film-forming chamber and a space for performing a film-forming process, a main-heater for heating a substrate placed inside the liner, from the bottom side, a sub-heater cluster provided between the liner and the inner wall, for heating the substrate from the top side, wherein the main-heater and the sub-heater cluster are resistive heaters, wherein the sub-heater cluster has a first sub-heater provided at the closest position to the substrate, and a second sub-heater provided above the first sub-heater, wherein the first sub-heater heats the substrate in combination with the main-heater, the second sub-heater heats the liner at a lower output than the first sub-heater, wherein each temperature of the main-heater, the first sub-heater, and the second sub-heater is individually controlled.

Abstract: A gypsum dewatering device 2 installed in a desulfurization facility 105 in which sulfur oxide in flue gas G is absorbed by limestone in an absorber 1, includes a belt filter 22 that absorbs sulfur oxide and dewaters gypsum slurry SS fed from the absorber 1 to form a gypsum cake SC, a vacuum suction mechanism 23 that sucks moisture in the gypsum cake SC via the belt filter 22, a moisture measuring means H1 that measures a moisture content of the gypsum cake SC to be dewatered by the belt filter 22, a heating means 25 that heats the gypsum cake SC dewatered by the belt filter 22 by hot water or steam, and a control means 26 that controls a heated state by the heating means 25 when the moisture content of the gypsum cake SC input from the moisture measuring means H1 has exceeded a predetermined amount.

Abstract: An in-vehicle audio apparatus includes: a base body that is arranged in a fixed state; a storage tray that is moved between a drawing-out position and a storing position with respect to the base body and inserts and takes out a music reproducing device at the drawing-out position; a pressing body that is moved in accordance with a moving position of the storage tray in a direction perpendicular to a moving direction of the storage tray and presses the music reproducing device that is inserted into the storage tray when the pressing body is moved to one side; and a bias spring that presses the pressing body to the one side.

Abstract: A film-forming apparatus and method is provided that includes a reflector and insulator capable of suppressing the thermal degradation of components in close proximity to the heater in a film-forming apparatus. In a film-forming apparatus the reflector is used in combination with insulator. Specifically, in a film-forming apparatus a reflector is disposed below a heater with the insulator placed below the reflector. The insulator absorbs the radiant heat from the heater thus suppressing an excessive rise in temperature around the heater, it is therefore possible to prevent thermal degradation of components in close proximity of the heater. For example, when the temperature of a semiconductor substrate is 1650° C., the temperature of the quartz heater base maybe about 1000° C. This is lower than the softening point temperature of the quartz heater base, preventing deformation of the heater base.

Abstract: A thin input device can be made small and thin, and prevent an excessive force from acting on a connecting part with a substrate when an operating part is operated to detect deformation of an actuating member. An actuating member is received in a recess of a lower case, and a lid is fixed. The actuating member includes fixed parts provided at four corners and deformable parts thinner than the fixed parts. The fixed parts are fixedly sandwiched between a bottom surface of the recess of the lower case and the lid. The deformable parts, to which strain detecting elements are attached, are provided in four directions around the operating part. When the operating knob is operated to deform a deformable part, the force acts only on the case, and an excessive force does not act on connecting parts between the connecting terminals, and a substrate.

Abstract: To provide a structure of an electrically stable step film of a columnar spacer, which can be formed in a region of a storage capacitor without increasing the number of steps. A liquid crystal display device of the present invention further includes, in all the pixels, step films of a same area formed with a semiconductor layer within a storage capacitor forming part. The pixels includes a kind in which the columnar spacer is provided at a position abutting against a step film forming part and a kind in which the columnar spacer is provided at a position away from the step film forming part.

Abstract: In this can lid, a rivet-slanting inhibitor which flows a metal of the can lid main body located between the rivet to the rivet side thereby correcting or preventing the slanting of the rivet is formed on a location in an opposite area which is opposed to an opening part across the rivet except for the coining part.

Abstract: To provide an active-matrix type liquid crystal display device having a structure in which alignment of flattening films formed in the display region is uniform and fine, which can secure a large storage capacitance with a small area and achieve a high numerical aperture. A recessed region having no flattening film is formed in a part on a source electrode. In the recessed region, a common electrode made with a transparent conductive film covers a source electrode to form a second storage capacitor.

Abstract: The invention provides a biaxially-oriented polyester film that comprises a biaxially oriented polyethylene terephthalate film and contains 9000 ppm or less of ethylene terephthalate cyclic trimer, has a molten specific resistance of within 1.0×108?·cm, and at least one surface of the film has a surface resistivity of 13 log ? or less under a relative humidity of 65%. The invention also provides a wrap-around label for a container produced from the film.

Abstract: A film-forming apparatus and film-forming method is provided that includes a reflector system capable of adjusting the temperature distribution of a substrate. The essential role of a reflector is to reduce the output of a heater by reflecting radiation heat from the heater and to protect members provided below the heater from heat. When a silicon wafer is heated by a first heater and a second heater, the temperature of the silicon wafer becomes higher in the inner circumferential part of the wafer rather than in the outer circumferential part of the silicon wafer. When a ring-shaped reflector is used, radiation heat is reflected by the ring-shaped portion, but is not reflected by the inner circumferential part of the reflector. Therefore, the use of a ring-shaped reflector makes it possible to allow a wafer to have an even heating distribution.

Abstract: It is an object of the present invention to provide a film-forming apparatus and a film-forming method that can prolong the lifetime of heaters used under high temperature conditions in an epitaxial growth technique. An inert gas discharge portion supplies an inert gas into the space containing the heater, gas is then discharged through the gas discharge portion without influence on the semiconductor substrate during film formation. It is therefore possible to prevent the reaction gas entering into the space containing the high-temperature heaters. This makes it possible to prevent a reaction between hydrogen gas contained in the reaction gas and SiC constituting the heaters. Therefore, it is possible to prevent carbon used as a base material of the heaters from being exposed due to the decomposition of SiC and then reacting with hydrogen gas. This makes it possible to prolong the lifetime of the heaters.