Patents by Inventor Hideyuki Sugiyama
Hideyuki Sugiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090180215Abstract: A magnetoresistive effect element includes a first ferromagnetic layer, Cr layer, Heusler alloy layer, barrier layer, and second ferromagnetic layer. The first ferromagnetic layer has the body-centered cubic lattice structure. The Cr layer is formed on the first ferromagnetic layer and has the body-centered cubic lattice structure. The Heusler alloy layer is formed on the Cr layer. The barrier layer is formed on the Heusler alloy layer. The second ferromagnetic layer is formed on the barrier layer.Type: ApplicationFiled: December 23, 2008Publication date: July 16, 2009Inventors: Mizue ISHIKAWA, Yoshiaki Saito, Hideyuki Sugiyama, Tomoaki Inokuchi
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Publication number: 20090156572Abstract: The present invention relates to a compound represented by the formula wherein ring A is a nitrogen-containing heterocycle optionally further having substituent(s), ring B is an aromatic ring optionally having substituent(s), ring C is a cyclic group optionally having substituent(s), R1 is a hydrogen atom, a hydrocarbon group optionally having substituent(s), an acyl group, a heterocyclic group optionally having substituent(s) or an amino group optionally having substituent(s), R2 is an optionally halogenated C1-6 alkyl group, m and n are each an integer of 0 to 5, m+n is an integer of 2 to 5, and is a single bond or a double bond, or a salt thereof and the like. Since the compound has a superior tachykinin receptor antagonistic action, and is useful as an agent for the prophylaxis or treatment of various diseases such as lower urinary tract diseases, gastrointestinal diseases, central nervous system diseases and the like.Type: ApplicationFiled: December 2, 2008Publication date: June 18, 2009Inventors: Yoshinori Ikeura, Junya Shirai, Hideyuki Sugiyama, Yuji Nishikimi, Taku Kamei, Nobuki Sakauchi
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Patent number: 7511991Abstract: A spin-injection magnetic random access memory according to an embodiment of the invention includes a magnetoresistive element having a magnetic fixed layer whose magnetization direction is fixed, a magnetic recording layer whose magnetization direction can be changed by injecting spin-polarized electrons, and a tunnel barrier layer provided between the magnetic fixed layer and the magnetic recording layer, a bit line which passes spin-injection current through the magnetoresistive element, the spin-injection current being used for generation of the spin-polarized electrons, a writing word line through which assist current is passed, the assist current being used for the generation of an assist magnetic field in a magnetization easy-axis direction of the magnetoresistive element, and a driver/sinker which determines a direction of the spin-injection current and a direction of the assist current.Type: GrantFiled: May 18, 2007Date of Patent: March 31, 2009Assignee: Kabushiki Kaisha ToshibaInventors: Yoshiaki Saito, Hideyuki Sugiyama, Tomoaki Inokuchi, Yoshihisa Iwata
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Publication number: 20090057654Abstract: A spin FET of an aspect of the present invention includes source/drain regions, a channel region between the source/drain regions, and a gate electrode above the channel region. Each of the source/drain regions includes a stack structure which is comprised of a low work function material and a ferromagnet. The low work function material is a non-oxide which is comprised of one of Mg, K, Ca and Sc, or an alloy which includes the non-oxide of 50 at % or more.Type: ApplicationFiled: August 25, 2008Publication date: March 5, 2009Inventors: Yoshiaki SAITO, Hideyuki Sugiyama, Tomoaki Inokuchi, Mizue Ishikawa
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Publication number: 20090059659Abstract: A spin transistor includes a first ferromagnetic layer provided on a substrate and having an invariable magnetization direction, a second ferromagnetic layer provided on the substrate apart from the first ferromagnetic layer in a first direction, and having a variable magnetization direction, a plurality of projecting semiconductor layers provided on the substrate to extend in the first direction, and sandwiched between the first ferromagnetic layer and the second ferromagnetic layer, a plurality of channel regions respectively provided in the projecting semiconductor layers, and a gate electrode provided on the channel regions.Type: ApplicationFiled: August 28, 2008Publication date: March 5, 2009Inventors: Tomoaki INOKUCHI, Mizue Ishikawa, Hideyuki Sugiyama, Yoshiaki Saito
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Publication number: 20090050948Abstract: A spin MOS field effect transistor includes a source electrode and a drain electrode each having a structure obtained by stacking an impurity diffusion layer, a (001)-oriented MgO layer and a Heusler alloy. The impurity diffusion layer is formed in a surface region of a semiconductor layer. The (001)-oriented MgO layer is formed on the impurity diffusion layer. The Heusler alloy is formed on the MgO layer.Type: ApplicationFiled: August 20, 2008Publication date: February 26, 2009Inventors: Mizue ISHIKAWA, Yoshiaki Saito, Hideyuki Sugiyama, Tomoaki Inokuchi
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Patent number: 7485938Abstract: It is possible to perform a writing operation with low power consumption and a low current, and enhance reliability without causing element breakdown. There are provided a first magnetization-pinned layer including at least one magnetic film in which a magnetization direction is pinned; a second magnetization-pinned layer including at least one magnetic film in which a magnetization direction is pinned; a magnetic recording layer formed between the first magnetization-pinned layer and the second magnetization-pinned layer and including at least one magnetic film in which a magnetization direction is changeable by injecting spin-polarized electrons; a tunnel barrier layer formed between the first magnetization-pinned layer and the magnetic recording layer; and a nonmagnetic intermediate layer formed between the magnetic recording layer and the second magnetization-pinned layer.Type: GrantFiled: September 15, 2006Date of Patent: February 3, 2009Assignee: Kabushiki Kaisha ToshibaInventors: Yoshiaki Saito, Hideyuki Sugiyama
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Publication number: 20080283888Abstract: A spin transistor includes a non-magnetic semiconductor substrate having a channel region, a first area, and a second area. The channel region is between the first and the second areas. The spin transistor also includes a first conductive layer located above the first area and made of a ferromagnetic material magnetized in a first direction; and a second conductive layer located above the second area and made of a ferromagnetic material magnetized in one of the first direction and a second direction that is antiparallel with respect to the first direction. The channel region introduces electron spin between the conductive layers. The spin transistor also includes a gate electrode located between the conductive layers and above the channel region; and a tunnel barrier film located between the non-magnetic semiconductor substrate and at least one of the conductive layers.Type: ApplicationFiled: July 8, 2008Publication date: November 20, 2008Applicant: Kabushiki Kaisha ToshibaInventors: Yoshiaki SAITO, Hideyuki SUGIYAMA
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Publication number: 20080285183Abstract: An area of an element can be made small and fluctuation in area can be reduced. A magneto-resistance effect element is provided with a first electrode with an end face; a magneto-resistance effect film which is formed such that a surface thereof comes in contact with the end face of the first electrode; and a second electrode which is formed on another surface of the magneto-resistance effect element opposed from the surface coming in contact with the surface of the first electrode. The magneto-resistance effect film includes a magnetization pinned layer whose magnetization direction is pinned, a magnetization free layer whose magnetization direction is changeable, and a first non-magnetic layer which is provided between the magnetization pinned layer and the magnetization free layer.Type: ApplicationFiled: July 22, 2008Publication date: November 20, 2008Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Hideyuki Sugiyama, Yoshiaki Saito
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Publication number: 20080275085Abstract: The present invention provides a novel piperidine derivative and a tachykinin receptor antagonist containing same, as well as a compound represented by the formula: wherein R1 is carbamoylmethyl, methylsulfonylethylcarbonyl and the like; R2 is methyl or cyclopropyl; R3 is a hydrogen atom or methyl; R4 is a chlorine atom or trifluoromethyl; R5 is a chlorine atom or trifluoromethyl; and a group represented by the formula: is a group represented by the formula: wherein R6 is a hydrogen atom, methyl, ethyl or isopropyl; R7 is a hydrogen atom, methyl or a chlorine atom; and R8 is a hydrogen atom, a fluorine atom, a chlorine atom or methyl; or 3-methylthiophen-2-yl, and a salt thereof.Type: ApplicationFiled: April 23, 2008Publication date: November 6, 2008Inventors: Junya Shirai, Shinji Morimoto, Hideyuki Sugiyama, Nobuki Sakauchi, Takeshi Yoshikawa
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Publication number: 20080247223Abstract: A spin-injection magnetic random access memory of an aspect of the present invention includes a magnetoresistive element, a unit which writes data into the magnetoresistive element by use of spin-polarized electrons generated by a spin-injection current and which applies, to the magnetoresistive element, a magnetic field of a direction of a hard magnetization of the magnetoresistive element during the writing.Type: ApplicationFiled: June 4, 2008Publication date: October 9, 2008Inventors: Tomoaki INOKUCHI, Yoshiaki Saito, Hideyuki Sugiyama
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Publication number: 20080239930Abstract: A spin FET includes a first ferromagnetic film disposed on a first source/drain area, a direction of magnetization thereof being fixed in an upward direction or a downward direction perpendicular to a film surface, a second ferromagnetic film disposed on a second source/drain area, a direction of magnetization thereof being changed in the upward direction or the downward direction, an anti-ferromagnetic ferroelectric film disposed on the second ferromagnetic film, and a tunnel barrier film disposed at least between the first source/drain area and the first ferromagnetic film or between the second source/drain and the second ferromagnetic film. Resistance of the anti-ferromagnetic ferroelectric film is larger than ON resistance when the first and second source/drain areas conduct electricity through the channel area.Type: ApplicationFiled: February 11, 2008Publication date: October 2, 2008Inventors: Yoshiaki SAITO, Hideyuki SUGIYAMA, Tomoaki INOKUCHI
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Patent number: 7420786Abstract: An area of an element can be made small and fluctuation in area can be reduced. A magneto-resistance effect element is provided with a first electrode with an end face; a magneto-resistance effect film which is formed such that a surface thereof comes in contact with the end face of the first electrode; and a second electrode which is formed on another surface of the magneto-resistance effect element opposed from the surface coming in contact with the surface of the first electrode. The magneto-resistance effect film includes a magnetization pinned layer whose magnetization direction is pinned, a magnetization free layer whose magnetization direction is changeable, and a first non-magnetic layer which is provided between the magnetization pinned layer and the magnetization free layer.Type: GrantFiled: March 1, 2005Date of Patent: September 2, 2008Assignee: Kabushiki Kaisha ToshibaInventors: Hideyuki Sugiyama, Yoshiaki Saito
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Patent number: 7411235Abstract: A spin transistor includes a first conductive layer that is made of a ferromagnetic material magnetized in a first direction, and functions as one of a source and a drain; a second conductive layer that is made of a ferromagnetic material magnetized in one of the first direction and a second direction that is antiparallel with respect to the first direction, and functions as the other one of the source and the drain. The spin transistor also includes a channel region that is located between the first conductive layer and the second conductive layer, and introduces electron spin between the first conductive layer and the second conductive layer; a gate electrode that is located above the channel region; and a tunnel barrier film that is located between the channel region and at least one of the first conductive layer and the second conductive layer.Type: GrantFiled: June 10, 2005Date of Patent: August 12, 2008Assignee: Kabushiki Kaisha ToshibaInventors: Yoshiaki Saito, Hideyuki Sugiyama
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Patent number: 7394684Abstract: A spin-injection magnetic random access memory of an aspect of the present invention includes a magnetoresistive element, a unit which writes data into the magnetoresistive element by use of spin-polarized electrons generated by a spin-injection current and which applies, to the magnetoresistive element, a magnetic field of a direction of a hard magnetization of the magnetoresistive element during the writing.Type: GrantFiled: March 13, 2006Date of Patent: July 1, 2008Assignee: Kabushiki Kaisha ToshibaInventors: Tomoaki Inokuchi, Yoshiaki Saito, Hideyuki Sugiyama
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Patent number: 7348591Abstract: A switch element includes a substrate; a plurality of carbon nanotubes provided upright on the substrate; magnetic particles arranged at tip ends of the carbon nanotubes respectively; and a plurality of conductive layers formed between base ends of the carbon nanotubes and the substrate. A switching operation of the switching element is performed in such a manner that the carbon nanotubes or the magnetic particles are brought into contact with each other according to an electrical potential between the conductive layers, and the carbon nanotubes are separated from each other when an electrical current flows through the carbon nanotubes with the carbon nanotubes or the magnetic particles brought into contact with each other.Type: GrantFiled: August 11, 2006Date of Patent: March 25, 2008Assignee: Kabushiki Kaisha ToshibaInventors: Takashi Yamauchi, Chika Tanaka, Hideyuki Sugiyama, Atsuhiro Kinoshita, Junji Koga, Yuichi Motoi, Yoshihiko Nakano, Seiichi Suenaga
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Publication number: 20080062580Abstract: A spin memory includes a magneto-resistance element having a first ferromagnetic layer in which a magnetization direction is pinned, a second ferromagnetic layer in which a magnetization direction changes, and a first nonmagnetic layer between the first and second ferromagnetic layers, a lower electrode and an upper electrode extending in a direction between 45 degrees and 90 degrees relative to an axis of hard magnetization of the second ferromagnetic layer, and sandwiching the magneto-resistance element at one end in a longitudinal direction, a switching element connected to another end in a longitudinal direction of the lower electrode, and a bit line connected to another end in a longitudinal direction of the upper electrode, wherein writing is carried out by supplying spin-polarized electrons to the second ferromagnetic layer and applying a magnetic field from the lower electrode and the upper electrode to the second ferromagnetic layer.Type: ApplicationFiled: August 28, 2007Publication date: March 13, 2008Inventors: Tomoaki INOKUCHI, Yoshiaki Saito, Hideyuki Sugiyama
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Publication number: 20080061332Abstract: A spin MOSFET includes: a semiconductor substrate; a first magnetic film formed on the semiconductor substrate and including a first ferromagnetic layer, a magnetization direction of the first ferromagnetic layer being pinned; a second magnetic film formed on the semiconductor substrate to separate from the first magnetic film and including a magnetization free layer, a first nonmagnetic layer being a tunnel insulator and provided on the magnetization free layer, and a magnetization pinned layer provided on the first nonmagnetic layer, a magnetization direction of the magnetization free layer being changeable and a magnetization direction of the magnetization pinned layer being fixed; a gate insulating film provided at least on the semiconductor substrate between the first magnetic film and the second magnetic film; and a gate electrode formed on the gate insulating film.Type: ApplicationFiled: June 29, 2007Publication date: March 13, 2008Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Yoshiaki Saito, Hideyuki Sugiyama, Tomoaki Inokuchi
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Publication number: 20070253120Abstract: It is possible to provide a magnetoresistive effect element which has thermal stability even if it is made fine and in which the magnetization in the magnetic recording layer can be inverted at a low current density. A magnetoresistive effect element includes: a magnetization pinned layer having a magnetization pinned in a direction; a magnetization free layer of which magnetization direction is changeable by injecting spin-polarized electrons into the magnetization free layer; a tunnel barrier layer provided between the magnetization pinned layer and the magnetization free layer; a first antiferromagnetic layer provided on the opposite side of the magnetization pinned layer from the tunnel barrier layer; and a second antiferromagnetic layer which is provided on the opposite side of the magnetization free layer from the tunnel barrier layer and which is thinner in thickness than the first antiferromagnetic layer.Type: ApplicationFiled: April 19, 2007Publication date: November 1, 2007Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Yoshiaki Saito, Hideyuki Sugiyama, Tomoaki Inokuchi
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Publication number: 20070223269Abstract: A spin-injection magnetic random access memory according to an embodiment of the invention includes a magnetoresistive element having a magnetic fixed layer whose magnetization direction is fixed, a magnetic recording layer whose magnetization direction can be changed by injecting spin-polarized electrons, and a tunnel barrier layer provided between the magnetic fixed layer and the magnetic recording layer, a bit line which passes spin-injection current through the magnetoresistive element, the spin-injection current being used for generation of the spin-polarized electrons, a writing word line through which assist current is passed, the assist current being used for the generation of an assist magnetic field in a magnetization easy-axis direction of the magnetoresistive element, and a driver/sinker which determines a direction of the spin-injection current and a direction of the assist current.Type: ApplicationFiled: May 18, 2007Publication date: September 27, 2007Inventors: Yoshiaki SAITO, Hideyuki Sugiyama, Tomoaki Inokuchi, Yoshihisa Iwata