Abstract: A polishing liquid for polishing a glass substrate includes cerium oxide as polishing abrasive particles, and a substance that reduces cerium oxide in response to irradiation of light.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: A method for polishing a glass substrate, by which a polishing speed that is higher than a conventional polishing speed can be maintained for a long period of time in processing for polishing a glass substrate using cerium oxide as polishing abrasive particles is provided. A polishing liquid containing cerium oxide as polishing abrasive particles is supplied to a polishing surface of a glass substrate, and the glass substrate is subjected to polishing processing. This polishing liquid contains the cerium oxide as polishing abrasive particles and a substance that reduces cerium oxide in response to light irradiation. Also, processing for irradiating the polishing liquid with light is performed when polishing processing is performed.

Abstract: A transmission/reception system includes a transmitter and a receiver. The transmitter includes a first circuit that: acquires plural pieces of broadcast image data; categorizes the broadcast image data at least into first and second groups; generates program guide screen data that switches between first and second program guide screen data; generates temporal information about the predetermined time interval and broadcast program identification information; and transmits the screen data and the information. The receiver includes a second circuit that: receives the data and the information; outputs the program guide screen data; detects, when any one of the display frames is selected by a user operation, broadcast program identification information contained in the first or second program guide screen data; and performs control in such a way that the broadcast image data corresponding to the detected broadcast program identification information are output from the image data output device.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: Provided is an optical film 10 including a light-transmitting base material 11 and a light-transmitting functional layer 12 provided on one surface of the light-transmitting base material 11, wherein the optical film 10 has a spectral transmittance of less than 1% at a wavelength of 380 nm, a spectral transmittance of 10% or more and less than 60% at a wavelength of 410 nm, and a spectral transmittance of 70% or more at a wavelength of 440 nm, and wherein the light-transmitting functional layer 12 has a film thickness of 9 ?m or less.

Abstract: A composition for resist underlayer film formation, includes a compound represented by formula (1) and a solvent. Ar1 represents an aromatic heterocyclic group having a valency of m and having 5 to 20 ring atoms; m is an integer of 1 to 11; Ar2 is a group bonding to a carbon atom of the aromatic heteroring in Ar1 and represents an aromatic carbocyclic group having 6 to 20 ring atoms and having a valency of (n+1) or an aromatic heterocyclic group having 5 to 20 ring atoms and having a valency of (n+1); n is an integer of 0 to 12; and R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, a halogen atom, or a nitro group.

Abstract: The composition contains a compound and a solvent. The compound includes a group represented by formula (1). The compound has a molecular weight of no less than 200 and has a percentage content of carbon atoms of no less than 40% by mass. In the formula (1), R1 and R2 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms, or R1 and R2 taken together represent a part of an alicyclic structure having 3 to 20 ring atoms constituted together with the carbon atom to which R1 and R2 bond; Ar1 represents a group obtained by removing (n+3) hydrogen atoms from an arene or heteroarene having 6 to 20 ring atoms; and X represents an oxygen atom, —CR3R4—, —CR3R4—O— or —O—CR3R4—.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: A method for polishing a glass substrate, by which a polishing speed that is higher than a conventional polishing speed can be maintained for a long period of time in processing for polishing a glass substrate using cerium oxide as polishing abrasive particles is provided. A polishing liquid containing cerium oxide as polishing abrasive particles is supplied to a polishing surface of a glass substrate, and the glass substrate is subjected to polishing processing. This polishing liquid contains the cerium oxide as polishing abrasive particles and a substance that reduces cerium oxide in response to light irradiation. Also, processing for irradiating the polishing liquid with light is performed when polishing processing is performed.

Abstract: A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R1 and R2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R1 and R2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R1 and R2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R1 and R2 bond.

Abstract: Provided is an optical film 10 including a light-transmitting base material 11 and a light-transmitting functional layer 12 provided on one surface of the light-transmitting base material 11, wherein the optical film 10 has a spectral transmittance of less than 1% at a wavelength of 380 nm, a spectral transmittance of 10% or more and less than 60% at a wavelength of 410 nm, and a spectral transmittance of 70% or more at a wavelength of 440 nm, and wherein the light-transmitting functional layer 12 has a film thickness of 9 ?m or less.

Abstract: A transmission/reception system includes a transmitter and a receiver. The transmitter includes a first circuit that: acquires plural pieces of broadcast image data; categorizes the broadcast image data at least into first and second groups; generates program guide screen data that switches between first and second program guide screen data; generates temporal information about the predetermined time interval and broadcast program identification information; and transmits the screen data and the information. The receiver includes a second circuit that: receives the data and the information; outputs the program guide screen data; detects, when any one of the display frames is selected by a user operation, broadcast program identification information contained in the first or second program guide screen data; and performs control in such a way that the broadcast image data corresponding to the detected broadcast program identification information are output from the image data output device.

Abstract: A chain includes a plurality of inner links and a plurality of outer links. Each of the inner links includes a pair of inner plates each having a bush hole and a bush. The bush includes both end portions which are press-fitted into bush holes of the pair of the inner plates. Each of the outer links includes a pair of outer plates and a pin. A diametric dimension in a pitch direction of an inner diametric surface of the bush is constant along an entire axial length of the bush. A diametric dimension in a height direction of the inner diametric surface at each of the both end portions of the bush is smaller than a diametric dimension in the height direction of the inner diametric surface at an intermediate part of the bush located between the pair of inner plates.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: Provided are [1] an optical laminate comprising a substrate film, a transparent conductive layer and a surface protection layer in this order, wherein an average value of a surface resistivity measured according to JIS K6911 is in the range of 1.0×107 ?/? or more and 1.0×1010 ?/? or less, and a standard deviation ? of the surface resistivity is 5.0×108 ?/? or less, [2] an optical laminate comprising a substrate film, a transparent conductive layer and a surface protection layer in this order, wherein the substrate film is a cycloolefin polymer film, a ratio of a thickness of the substrate film to a thickness of the entire optical laminate is 80% or more and 95% or less, and a rate of elongation of the optical laminate at a temperature of 150° C., as measured using a dynamic viscoelasticity measuring apparatus under conditions of a frequency of 10 Hz, a tensile load of 50 N and a rate of temperature increase of 2° C./min, is 5.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: A chain includes a plurality of inner links and a plurality of outer links. Each of the inner links includes a pair of inner plates each having a bush hole and a bush. The bush includes both end portions which are press-fitted into bush holes of the pair of the inner plates. Each of the outer links includes a pair of outer plates and a pin. A diametric dimension in a pitch direction of an inner diametric surface of the bush is constant along an entire axial length of the bush. A diametric dimension in a height direction of the inner diametric surface at each of the both end portions of the bush is smaller than a diametric dimension in the height direction of the inner diametric surface at an intermediate part of the bush located between the pair of inner plates.