Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: A straight tube LED lamp includes: a straight tube in which a plurality of light emitting diodes is housed; a first cap for forming a power feeding connection to the plurality of light emitting diodes, provided on one axial direction end side of the straight tube; and a second cap for grounding, provided on another axial direction end side of the straight tube. A first terminal for forming an electrical connection to a power feeding terminal of a first lamp socket is provided in the first cap. A second terminal for forming an electrical connection to a grounding terminal of a second lamp socket is provided in the second cap.

Abstract: The present invention provides a display device having excellent light energy conversion efficiency. The present invention relates to a display device including a light-diffusing layered body. The light-diffusing layered body includes a wavelength conversion layer containing optically isotropic semiconductor particles and a light-diffusing layer on at least one surface of the wavelength conversion layer. The light-diffusing layer contains a binder component and light-diffusing particles that contain an organic material or an inorganic material. The light-diffusing particles protrude in a range of 3 to 50% of the particle size of the light-diffusing particles from an outermost surface of the light-diffusing layer. The light-diffusing layer has projections and depressions on the outermost surface due to the light-diffusing particles protruding therefrom. The light-diffusing layer has a film thickness of 1 to 30 ?m.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: The present invention provides a display device having excellent light energy conversion efficiency. The present invention relates to a display device including a light-diffusing layered body. The light-diffusing layered body includes a wavelength conversion layer containing optically isotropic semiconductor particles and a light-diffusing layer on at least one surface of the wavelength conversion layer. The light-diffusing layer contains a binder component and light-diffusing particles that contain an organic material or an inorganic material. The light-diffusing particles protrude in a range of 3 to 50% of the particle size of the light-diffusing particles from an outermost surface of the light-diffusing layer. The light-diffusing layer has projections and depressions on the outermost surface due to the light-diffusing particles protruding therefrom. The light-diffusing layer has a film thickness of 1 to 30 ?m.

Abstract: A fluorine-containing polymer for use in a radiation-sensitive resin composition is used for forming a photoresist film in a process of forming a resist pattern, including a liquid immersion lithographic process in which radiation is emitted through a liquid having a refractive index larger than the refractive index of air at a wavelength of 193 nm, and being present between a lens and the photoresist film. The fluorine-containing polymer has a weight average molecular weight determined by gel permeation chromatography in the range from 1,000 to 50,000 and a receding contact angle with water and the photoresist film formed therefrom is 70° or more.

Abstract: An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.

Abstract: A dedicated power source for LED lamps capable of reliably detecting attachment of an LED lamp is provided. A dedicated power source has a DC power source portion, and includes a lighting circuit which receives power supplied from the DC power source portion and light-controls an LED lamp including an LED element and a detection resistor connected in parallel to the LED element and an attachment detecting portion for detecting attachment of the LED lamp based on a voltage level changing in accordance with attachment/detachment of the detection resistor by attachment/detachment of the LED lamp.

Abstract: A manufacturing method of a glass substrate for a magnetic disk is provided whereby nano pits and/or nano scratches cannot be easily produced in polishing a principal face of a glass substrate using a slurry containing zirconium oxide as an abrasive. The manufacturing method of a glass substrate for a magnetic disk includes, for instance, a polishing step of polishing a principal face of a glass substrate using a slurry containing, as an abrasive, zirconium oxide abrasive grains having monoclinic crystalline structures (M) and tetragonal crystalline structures (T).

Abstract: A manufacturing method of a glass substrate for a magnetic disk is provided whereby nano pits and/or nano scratches cannot be easily produced in polishing a principal face of a glass substrate using a slurry containing zirconium oxide as an abrasive. The manufacturing method of a glass substrate for a magnetic disk includes, for instance, a polishing step of polishing a principal face of a glass substrate using a slurry containing, as an abrasive, zirconium oxide abrasive grains having monoclinic crystalline structures (M) and tetragonal crystalline structures (T).

Abstract: A nozzle of an ejector depressurizes and injects fluid, which is supplied to the nozzle. The nozzle is received in a receiving space of a body. The nozzle and the body are formed by press working. The nozzle includes nozzle-side ribs, which extend in an axial direction and project radially outward. The body includes body-side ribs, which extend in the axial direction and project radially outward. In a predetermined cross section of each of the nozzle and the body, which is perpendicular to the axial direction and includes the corresponding ribs, the nozzle or the body is formed seamlessly as a continuous single piece member.

Abstract: A fluorine-containing polymer for use in a radiation-sensitive resin composition is used for forming a photoresist film in a process of forming a resist pattern, including a liquid immersion lithographic process in which radiation is emitted through a liquid having a refractive index larger than the refractive index of air at a wavelength of 193 nm, and being present between a lens and the photoresist film. The fluorine-containing polymer has a weight average molecular weight determined by gel permeation chromatography in the range from 1,000 to 50,000 and a receding contact angle with water and the photoresist film formed therefrom is 70° or more.

Abstract: An LED light source lamp includes a housing configured to be attached to a lamp holder; an LED module provided in the housing; a drive circuit provided in the housing and configured to drive the LED module to cause the LED module to emit light; an LED installation plate on which the LED module is installed; a cover arranged to block an optical axis of the LED module and configured to transmit light emitted from the LED module; and a separation member configured to separate the drive circuit from a space between the LED module and the cover in the housing. The LED installation plate has a rear surface, opposite the surface on which the LED module is installed. The rear surface is configured to closely contact the lamp holder, and is a part of the housing.

Abstract: A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: Provided is an optical layered body that includes a polyester base, a primer layer formed thereon, and a hard coat layer formed on the primer. The polyester has a retardation of not less than 8000 nm, and a difference (nx?ny) of 0.07 to 0.20 between a refractive index (nx) in a slow axis direction that is a high refractive index direction and a refractive index (ny) of a fast axis direction that is orthogonal to the slow axis direction, a refractive index (np) of the primer, the refractive index (nx) in the slow axis direction of the polyester, and the refractive index (ny) in the fast axis direction of the polyester satisfy ny<np<nx, and a refractive index (nh) of the hard coat, the refractive index (nx) in the slow axis direction of the polyester, and the refractive index (ny) in the fast axis direction of the polyester satisfy ny<nh<nx.

Abstract: An LED light source lamp includes a housing configured to be attached to a lamp holder; an LED module provided in the housing; a drive circuit provided in the housing and configured to drive the LED module to cause the LED module to emit light; an LED installation plate on which the LED module is installed; a cover arranged to block an optical axis of the LED module and configured to transmit light emitted from the LED module; and a separation member configured to separate the drive circuit from a space between the LED module and the cover in the housing. The LED installation plate has a rear surface, opposite the surface on which the LED module is installed. The rear surface is configured to closely contact the lamp holder, and is a part of the housing.

Abstract: An LED light source lamp has built-in drive circuits in a housing, and is used by being attached to a lamp holder. An LED installation plate is arranged, in a main space of the housing, on an attachment side to the lamp holder. An LED module on a surface, of the LED installation plate, opposite to the lamp holder, is a collection of LEDs driven by the drive circuit. A light diffusion member is arranged so as to block the optical axis of light emitted by each LED of the LED module. Here, the drive circuits are arranged in an outer peripheral space, between the LED module and the light diffusion member, so as not to block the optical axis of light emitted by each LED of the LED module.

Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.