Abstract: The LED lighting device includes a lighting circuit unit, a current detecting unit, a voltage detecting unit, and a control unit. The lighting circuit unit is adapted in use to be connected to a lamp socket to be connected to a LED lamp, and is configured to provide an output voltage in the form of a DC voltage to the lamp socket in a manner to turn on the LED lamp. The current detecting unit is configured to detect an output current which is caused by the output voltage and is supplied from said lighting circuit unit to said lamp socket. The voltage detecting unit is configured to detect the output voltage of said lighting circuit unit. The control unit configured to control the lighting circuit unit.

Abstract: An encapsulant layer for a photovoltaic module enabling recovering and recycling or reusing of reutilizeable resources such as a transparent front face substrate and photovoltaic cell and the like among constituents of a photovoltaic module, and a method for manufacturing a regenerated photovoltaic cell and a regenerated transparent front face substrate. The photovoltaic module is formed by laminating: a transparent front face substrate; a photovoltaic cell carrying a wiring electrode and a takeoff electrode, and an encapsulant layer is placed on at least one surface; and a rear face protecting sheet. The encapsulant layer is a separable layer formed mainly of a thermoplastic resin, and an output maintenance factor of photoelectronic power of the photovoltaic module using the encapsulant layer is in a range of 80% to 100%.

Abstract: A straight tube LED lamp includes: a straight tube in which a plurality of light emitting diodes is housed; a first cap for forming a power feeding connection to the plurality of light emitting diodes, provided on one axial direction end side of the straight tube; and a second cap for grounding, provided on another axial direction end side of the straight tube. A first terminal for forming an electrical connection to a power feeding terminal of a first lamp socket is provided in the first cap. A second terminal for forming an electrical connection to a grounding terminal of a second lamp socket is provided in the second cap.

Abstract: An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group.

Abstract: A pattern-forming method includes applying a photoresist composition to a substrate to form a resist film. The photoresist composition includes an acid generator and a first polymer that includes an acid-dissociable group. The resist film is exposed. The resist film is developed using a developer having an organic solvent content of 80 mass % or more to form a prepattern of the resist film. A polymer film having a phase separation structure in a space defined by the prepattern is formed using a composition that includes a plurality of second polymers. A part of the phase separation structure of the polymer film is removed.

Abstract: An LED light source lamp has built-in drive circuits in a housing, and is used by being attached to a lamp holder. An LED installation plate is arranged, in a main space of the housing, on an attachment side to the lamp holder. An LED module on a surface, of the LED installation plate, opposite to the lamp holder, is a collection of LEDs driven by the drive circuit. A light diffusion member is arranged so as to block the optical axis of light emitted by each LED of the LED module. Here, the drive circuits are arranged in an outer peripheral space, between the LED module and the light diffusion member, so as not to block the optical axis of light emitted by each LED of the LED module.

Abstract: An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.

Abstract: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of ?-position.

Abstract: A radiation-sensitive resin composition includes an acid-labile group-containing resin, a radiation-sensitive acid generating agent, and an acid diffusion controller including a first compound shown by a following general formula (1-1) and a second compound shown by a following general formula (1-2) or (1-3). In the formula (1-1), each of R1 and R2 individually represents a hydrogen atom or the like, and Rp represents an acid-labile group. In the formula (1-2), R3 represents a hydrogen atom or the like, and each of R4 to R6 individually represents a hydrogen atom or the like. In the formula (1-3), R3 represents a hydrogen atom or the like, Rq represents a single bond or the like, and each of R5 and R6 individually represents a hydrogen atom or the like.

Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

Abstract: Provided is a lamp designed to use as a light source a solid-state light emitting device with a simple and inexpensive structure and having an improved heat dissipation performance. A lamp uses a solid-state light emitting device as a light source. A cap is mounted to an external apparatus at the time of use. A housing is made of a translucent material and is connected to the cap. A light-emitting module includes one or a plurality of solid-state light emitting devices and is mounted such that the main-light-emission side (lower side in FIG. 1) thereof is in close contact with the inner wall of the housing. Further, the gap between the housing and the light-emitting module may be filled with a thermal conductive material having a translucency and a thermal conductivity.

Abstract: An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R1 and R2 independently represents a hydrocarbon group having 1 to 8 carbon atoms or a halogenated hydrocarbon group.

Abstract: A dedicated power source for LED lamps capable of reliably detecting attachment of an LED lamp is provided. A dedicated power source has a DC power source portion, and includes a lighting circuit which receives power supplied from the DC power source portion and light-controls an LED lamp including an LED element and a detection resistor connected in parallel to the LED element and an attachment detecting portion for detecting attachment of the LED lamp based on a voltage level changing in accordance with attachment/detachment of the detection resistor by attachment/detachment of the LED lamp.

Abstract: The LED lighting device includes a lighting circuit unit, a current detecting unit, a voltage detecting unit, and a control unit. The lighting circuit unit is adapted in use to be connected to a lamp socket to be connected to a LED lamp, and is configured to provide an output voltage in the form of a DC voltage to the lamp socket in a manner to turn on the LED lamp. The current detecting unit is configured to detect an output current which is caused by the output voltage and is supplied from said lighting circuit unit to said lamp socket. The voltage detecting unit is configured to detect the output voltage of said lighting circuit unit. The control unit configured to control the lighting circuit unit.

Abstract: An LED lamp system which suppresses flickering of an LED element is provided. The LED lamp system includes straight-tube type LED lamps each having LED elements and a dedicated power source for lighting the LED elements. The dedicated power source full-wave rectifies and smoothes a commercial AC power source, outputs constant current having a ripple factor of 1.3 or smaller and thus lights the LED elements.

Abstract: An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming composition is stably maintained without being eluted in a medium such as water during liquid immersion lithography and is easily dissolved in an alkaline developer. The upper layer-forming composition covers a photoresist film for forming a pattern by exposure to radiation. The composition comprises a resin dissolvable in a developer for the photoresist film and a solvent in which the resin is dissolved. The solvent has a viscosity of less than 5.2×10?3 Pa·s at 20° C. In addition, the solvent does not cause intermixing of the photoresist film and the upper layer-forming composition. The solvent contains an ether or a hydrocarbon.

Abstract: A cutting tool is provided to process a processed member having an opening portion with a curved inner surface, so that a through hole is formed and a part of the inner surface of the opening portion corresponding to the through hole is processed. The through hole extends from a surface of the processed member to reach the opening portion. The cutting tool includes a shank member, and a processing member having a smaller diameter than the shank member. A groove portion of the processing member has a cutting edge, and a chip evacuation groove through which chip is expelled outward. A self guide portion of the processing member is arranged between the groove portion and the shank member and provided with a substantially cylindrical shape, to guide the cutting edge toward the part of the inner surface of the opening portion corresponding to the through hole in the processing.

Abstract: A nozzle of an ejector depressurizes and injects fluid, which is supplied to the nozzle. The nozzle is received in a receiving space of a body. The nozzle and the body are formed by press working. The nozzle includes nozzle-side ribs, which extend in an axial direction and project radially outward. The body includes body-side ribs, which extend in the axial direction and project radially outward. In a predetermined cross section of each of the nozzle and the body, which is perpendicular to the axial direction and includes the corresponding ribs, the nozzle or the body is formed seamlessly as a continuous single piece member.