Abstract: A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a?), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.

Abstract: A radiation-sensitive resin composition includes a resin, a photoacid generator, a fluorine-containing resin, and a lactone compound. The resin does not include a first fluorine-containing repeating unit. The resin includes a first repeating unit that becomes alkali-soluble due to an acid. The fluorine-containing resin includes a second fluorine-containing repeating unit and a second repeating unit that becomes alkali-soluble due to an acid. A content of the lactone compound in the radiation-sensitive resin composition is about 31 to about 200 parts by mass based on 100 parts by mass of the resin.

Abstract: An encapsulant layer for a photovoltaic module enabling recovering and recycling or reusing of reutilizeable resources such as a transparent front face substrate and photovoltaic cell and the like among constituents of a photovoltaic module, and a method for manufacturing a regenerated photovoltaic cell and a regenerated transparent front face substrate. The photovoltaic module is formed by laminating: a transparent front face substrate; a photovoltaic cell carrying a wiring electrode and a takeoff electrode, and an encapsulant layer is placed on at least one surface; and a rear face protecting sheet. The encapsulant layer is a separable layer formed mainly of a thermoplastic resin, and an output maintenance factor of photoelectronic power of the photovoltaic module using the encapsulant layer is in a range of 80% to 100%.

Abstract: An encapsulant layer for a photovoltaic module enabling recovering and recycling or reusing of reutilizeable resources such as a transparent front face substrate and photovoltaic cell and the like among constituents of a photovoltaic module, and a method for manufacturing a regenerated photovoltaic cell and a regenerated transparent front face substrate. The photovoltaic module is formed by laminating: a transparent front face substrate; a photovoltaic cell carrying a wiring electrode and a takeoff electrode, and an encapsulant layer is placed on at least one surface; and a rear face protecting sheet. The encapsulant layer is a separable layer formed mainly of a thermoplastic resin, and an output maintenance factor of photoelectronic power of the photovoltaic module using the encapsulant layer is in a range of 80% to 100%.

Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which has a recurring unit (I) having a carboxyl group, a recurring unit (II) having a sulfo group and a recurring unit obtained by copolymerizing fluoroalkyl(meth)acrylates having 1 to 20 carbon atoms in a fluoroalkyl group thereof other than a recurring unit having a side chain that includes an alcoholic hydroxyl group having a fluoroalkyl group at least in an ?-position thereof, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

Abstract: An optical functional film exhibiting optical biaxiality which has a high degree of freedom in optical characteristics design. The optical functional film which exhibits optical biaxiality and includes: a substrate; and an optical functional layer formed on the substrate and having a rodlike compound. The rodlike compound forms irregular-random homogeneous alignment in the optical functional layer.

Abstract: A retardation film that is used as a polarizing plate protective film, thereby making it possible to yield a polarizing plate which is very good in durability and has a viewing angle compensation function. The retardation film has: an optical anisotropic film, in which a relation of nx>ny is realized between a refractive index “nx” in a slow axis direction of an in-plane direction and a refractive index “ny” in a fast axis direction of the in-plane direction; and a retardation layer formed on the optical anisotropic film and containing a liquid crystalline material, in which a relation of nx?ny<nz is realized between refractive indexes “nx” and “ny” in arbitrary directions “x” and “y” of an in-plane direction which are perpendicular to each other and a refractive index “nz” in a thickness direction. The optical anisotropic film uses a transparent substrate having a cellulose derivative.

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract: The invention mainly aims to provide an economical filler layer for a solar cell module which is excellent in the adhesion property to a transparent front substrate and a backside protective sheet, does not worsen the working environments, and causes no adverse effect on a solar cell element or electrodes at the time of production. To accomplish the aim, the invention provides a filler layer for a solar cell module containing a silane-modified resin obtained by polymerizing an ethylenic unsaturated silane compound and a polyethylene for polymerization and characterized in that the filler layer for a solar cell module has a gel fraction of 30% or lower when the filler layer for a solar cell module is used in a solar cell module.

Abstract: A retardation film having excellent optical characteristic realizing properties, which is capable of obtaining a highly durable polarizing plate having a viewing angle compensating function by being used as a polarizing plate protection film. The retardation film can be used as a viewing angle compensating film of a liquid crystal display of the IPS system, with a wide realizable range of optical characteristics, excellent adhesion properties to a polarizer, and the adjustment easiness of the optical characteristics. The retardation film has an optically anisotropic film, an optically anisotropic layer, and a first optically anisotropic material showing a positive dispersion type wavelength dependency of a retardation, in which a refractive index nx1 of a lagging phase axis direction in an in-plane direction and a refractive index ny1 of a leading phase axis direction in the in-plane direction satisfy the formula of nx1>ny1.

Abstract: A cutting tool is provided to process a processed member having an opening portion with a curved inner surface, so that a through hole is formed and a part of the inner surface of the opening portion corresponding to the through hole is processed. The through hole extends from a surface of the processed member to reach the opening portion. The cutting tool includes a shank member, and a processing member having a smaller diameter than the shank member. A groove portion of the processing member has a cutting edge, and a chip evacuation groove through which chip is expelled outward. A self guide portion of the processing member is arranged between the groove portion and the shank member and provided with a substantially cylindrical shape, to guide the cutting edge toward the part of the inner surface of the opening portion corresponding to the through hole in the processing.

Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

Abstract: A metal oxide film producing method which is an inexpensive wetting coating by use of a metal oxide film forming-solution, and which enables to yield an even and dense metal oxide film having a sufficient film thickness even on a substrate, such as one having complicated structural part or one comprising porous materials.

Abstract: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of ?-position.

Abstract: A lithium battery comprises a pouch (4) and a lithium battery module (2) packaged in the pouch (4). The pouch (4) is formed from a battery packaging laminated structure (10). The laminated structure (10) has an outermost layer (11), a barrier layer (12) and an innermost layer (14), or an outermost layer (11), a barrier layer (12), an intermediate layer (13) and an innermost layer (14) superposed in that order. The outermost layer (11) is formed of a formable base material, the barrier layer (12) is formed of a impermeable base material having a barrier property, the intermediate layer (13) is formed of a formable base material and the innermost layer (14) is formed of a heat-adhesive base material.

Abstract: A radiation-sensitive resin composition which is a resist having properties such as excellent sensitivity, a small degree of line edge roughness of patterns, capability of inhibiting pattern collapsing, and the like is provided. The radiation-sensitive resin composition comprises an acid-dissociable group-containing polymer having recurring units of the following formulas (1-1) and (1-2), an additive of the following formula (1-3), and an acid generator, in the formula (1-1), R1 represents a methyl group and the like and X represents a specific polycyclic alicyclic hydrocarbon group and the like, in the formula (1-2), R1 represents a methyl group and the like and Z represents an acid-dissociable group which is dissociable by the action of an acid, and in the formula (1-3), n is an integer from 1-8 and A individually represents a hydroxyl group and the like.

Abstract: An oxide semiconductor electrode is provided with a bonding layer with excellent temporal stability of adhesive force and excellent productivity in a transfer method including a dye-sensitized solar cell with the oxide semiconductor electrode; a method of producing an oxide semiconductor electrode that can produce an oxide semiconductor electrode excellent in the energy conversion efficiency at the high productivity is also provided. The oxide semiconductor electrode and method for making the same are disclosed noting that the oxide semiconductor electrode includes: a base material; a bonding layer formed on the base material made of a thermoplastic resin; a first electrode layer formed on the bonding layer made of a metal oxide; and a porous layer formed on the first electrode and made of the fine particle of a metal oxide semiconductor, wherein the thermoplastic resin includes a silane-modified resin.

Abstract: A fluorescent-lamp driving apparatus and a compact self-ballasted fluorescent lamp, when a blowout occurs at the electrodes of the arc tube, swiftly and assuredly stop a glow discharge at the electrodes of the arc tube, therefore have heightened security. In the compact self-ballasted fluorescent lamp 1, a switching device (nMOS-FET56) is mounted to the lighting unit 50 so that the entire device main body of the switching device faces the choke coil 52, with the print substrate 51 therebetween. Thus structured lighting unit 50 forms a heat transmission path between the nMOS-FET56 and the choke coil 52, and the heat generated at the choke coil 52 will be swiftly and assuredly transmitted to the device main body of the nMOS-FET56.