Patents by Inventor Hiromitsu Tanaka

Hiromitsu Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200182239
    Abstract: A detection apparatus includes a suction pressure acquirer configured to acquire suction pressure data indicating suction pressure of a pump, and a detector configured to detect occurrence of cavitation in the pump based on a variation coefficient of the suction pressure data during a detection target period.
    Type: Application
    Filed: December 5, 2019
    Publication date: June 11, 2020
    Applicant: Yokogawa Electric Corporation
    Inventors: Hiromitsu OGAWA, Soichiro KONADA, Norio TANAKA, Takaaki MATSUDA
  • Patent number: 10647094
    Abstract: There is provided a thermally conductive composite material obtained by dispersing a thermally conductive filler in a matrix. The thermally conductive filler is a mixture including boron nitride particles with an average particle size of 10 ?m to 100 ?m and aluminum nitride particles with an average particle size that is 1/100 to ½ of the average particle size of the boron nitride particles, a content of the boron nitride particles is 60 volume % to 90 volume % with respect to a total amount of the boron nitride particles and the aluminum nitride particles, a content of the thermally conductive filler is 80 volume % to 95 volume % with respect to a total amount of the composite material, and a porosity of the composite material is 10 volume % or less.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: May 12, 2020
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Megumi Sasaki, Hiromitsu Tanaka, Shinichi Miura, Masataka Deguchi, Masaki Terada, Tetsuyoshi Fukaya
  • Patent number: 10610820
    Abstract: Provided are: a wet desulfurization apparatus 13 which removes sulfur oxides in flue gas 12A from a boiler 11; a mist collection/agglomeration apparatus 14 which is provided on a downstream side of the desulfurization apparatus 13 and forms agglomerated SO3 mist by causing particles of SO3 mist contained in flue gas 12B from the wet desulfurization apparatus 13 to be bonded together and have bloated particle sizes; a CO2 recovery apparatus 18 constituted by a CO2 absorption tower 16 having a CO2 absorption unit 16A which removes CO2 contained in flue gas 12D by being brought into contact with a CO2 absorbent and an absorbent regeneration tower 17 which recovers CO2 by releasing CO2 from the CO2 absorbent having absorbed CO2 and regenerates the CO2 absorbent; and a mist collection unit 16C which collects CO2 absorbent bloated mist bloated by the CO2 absorbent being absorbed by the agglomerated SO3 mist in the CO2 absorption unit 16A.
    Type: Grant
    Filed: May 6, 2019
    Date of Patent: April 7, 2020
    Assignees: MITSUBISHI HEAVY INDUSTRIES ENGINEERING, LTD., MITSUBISHI HITACHI POWER SYSTEMS ENVIRONMENTAL SOLUTIONS, LTD.
    Inventors: Takuya Hirata, Hiromitsu Nagayasu, Yasutoshi Ueda, Tomoki Noborisato, Takao Tanaka, Masaya Kato
  • Patent number: 10531779
    Abstract: An electric vacuum cleaning apparatus that offers a high degree of convenience is provided that is capable of easily switching between a function that empties dust from an electric vacuum cleaner by moving dust collected by the cleaner to a station and accumulating the dust at the station, and a function that accumulates dust that is swept up together after quickly performing localized cleaning using an cleaning implement other than the cleaner at the station.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: January 14, 2020
    Assignee: Toshiba Lifestyle Products & Services Corporation
    Inventors: Yukio Machida, Masatoshi Tanaka, Satoshi Ohshita, Hiromitsu Ichikawa, Tsuyoshi Sato
  • Patent number: 10451771
    Abstract: An antireflection member, including a resin base member; and a particle layer having mesoporous-silica nanoparticles directly fixed to a surface of the resin base member, wherein the nanoparticles are at least partially embedded in the surface of the resin base member, and the nanoparticles are arranged in a mono-particle layer to form the particle layer.
    Type: Grant
    Filed: November 4, 2015
    Date of Patent: October 22, 2019
    Assignee: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
    Inventors: Norihiro Mizoshita, Hiromitsu Tanaka
  • Patent number: 10427093
    Abstract: A CO2 recovery apparatus is provided with: a CO2 absorption tower for bringing exhaust gas into contact with a CO2 absorbing liquid and making the CO2 absorbing liquid absorb the CO2 contained in the exhaust gas; a CO2 absorbing liquid regeneration tower for heating the CO2 absorbing liquid with steam and releasing CO2 from the CO2 absorbing liquid and regenerating the CO2 absorbing liquid; a flowmeter for determining the flow rates of the exhaust gas introduced into the CO2 absorption tower; and a control unit for classifying the flow rates of the exhaust gas into multiple flow rate ranges, and controlling the flow rate of the CO2 absorbing liquid supplied to the CO2 absorption tower and the flow rate of steam supplied to the CO2 absorbing liquid regeneration tower on the basis of prescribed set load values which have been previously established in accordance with the multiple flow rate ranges.
    Type: Grant
    Filed: January 9, 2015
    Date of Patent: October 1, 2019
    Assignee: MITSUBISHI HEAVY INDUSTRIES ENGINEERING, LTD.
    Inventors: Takuya Hirata, Hiroshi Tanaka, Hiromitsu Nagayasu, Yoshiki Sorimachi, Daisuke Shimada, Tsuyoshi Oishi
  • Publication number: 20190292056
    Abstract: A carbon material precursor comprises an acrylamide-based polymer having a weight-average molecular weight of 10,000 to 2,000,000 and a polydispersity of the molecular weight (weight-average molecular weight/number-average molecular weight) of 5.0 or less.
    Type: Application
    Filed: March 14, 2019
    Publication date: September 26, 2019
    Applicant: KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
    Inventors: Takuya MORISHITA, Kazuhiro NOMURA, Hiromitsu TANAKA, Megumi SASAKI, Makoto KATO
  • Publication number: 20190255483
    Abstract: Provided are: a wet desulfurization apparatus 13 which removes sulfur oxides in flue gas 12A from a boiler 11; a mist collection/agglomeration apparatus 14 which is provided on a downstream side of the desulfurization apparatus 13 and forms agglomerated SO3 mist by causing particles of SO3 mist contained in flue gas 12B from the wet desulfurization apparatus 13 to be bonded together and have bloated particle sizes; a CO2 recovery apparatus 18 constituted by a CO2 absorption tower 16 having a CO2 absorption unit 16A which removes CO2 contained in flue gas 12D by being brought into contact with a CO2 absorbent and an absorbent regeneration tower 17 which recovers CO2 by releasing CO2 from the CO2 absorbent having absorbed CO2 and regenerates the CO2 absorbent; and a mist collection unit 16C which collects CO2 absorbent bloated mist bloated by the CO2 absorbent being absorbed by the agglomerated SO3 mist in the CO2 absorption unit 16A.
    Type: Application
    Filed: May 6, 2019
    Publication date: August 22, 2019
    Applicants: MITSUBISHI HEAVY INDUSTRIES ENGINEERING, LTD., MITSUBISHI HITACHI POWER SYSTEMS ENVIRONMENTAL SOLUTIONS, LTD.
    Inventors: Takuya Hirata, Hiromitsu Nagayasu, Yasutoshi Ueda, Tomoki Noborisato, Takao Tanaka, Masaya Kato
  • Patent number: 10328383
    Abstract: A wet desulfurization apparatus which removes sulfur oxides in flue gas from a boiler 11 includes a mist collection/agglomeration apparatus which is provided on a downstream side of the desulfurization apparatus and forms agglomerated SO3 mist by causing particles of SO3 mist contained in flue gas 12B from the wet desulfurization apparatus to be bonded together and have bloated particle sizes; a CO2 recovery apparatus constituted by a CO2 absorption tower having a CO2 absorption unit which removes CO2 contained in flue gas by being brought into contact with a CO2 absorbent and an absorbent regeneration tower which recovers CO2 by releasing CO2 from the CO2 absorbent having absorbed CO2 and regenerates the CO2 absorbent; and a mist collection unit which collects CO2 absorbent bloated mist bloated by the CO2 absorbent being absorbed by the agglomerated SO3 mist in the CO2 absorption unit.
    Type: Grant
    Filed: September 24, 2015
    Date of Patent: June 25, 2019
    Assignees: MITSUBISHI HEAVY INDUSTRIES ENGINEERING, LTD., MITSUBISHI HITACHI POWER SYSTEMS ENVIRONMENTAL SOLUTIONS, LTD.
    Inventors: Takuya Hirata, Hiromitsu Nagayasu, Yasutoshi Ueda, Tomoki Noborisato, Takao Tanaka, Masaya Kato
  • Publication number: 20190178771
    Abstract: A new method capable of evaluating wettability of a surface of a material is provided. The method includes the following: applying a gas jet to a surface of a material that is covered with a liquid so as to squeeze the liquid; imaging a surface of a liquid film formed on the surface of the material after squeezing the liquid; and evaluating wettability of the material based on the presence or absence of interference fringes on the surface of the liquid film.
    Type: Application
    Filed: August 18, 2017
    Publication date: June 13, 2019
    Applicants: Riken, Kitagawa Iron Works Co., Ltd.
    Inventors: Nobuyuki Tanaka, Yuki Nakanishi, Junko Takahara, Akane Awazu, Yo Tanaka, Yoshihide Haruzono, Hiromitsu Nasu
  • Publication number: 20190167802
    Abstract: A self-emulsifying composition contains: 70 to 90% by weight of at least one compound selected from the group consisting of ?3 polyunsaturated fatty acids and their pharmaceutically acceptable salts and esters; 0.5 to 6% by weight of water; 1 to 29% by weight of a polyoxyethylene sorbitan fatty acid ester as an emulsifier (optionally including a polyoxyl castor oil, and not including lecithin); and lecithin in an amount of 3 to 40 parts by weight in relation to 100 parts by weight of ?3 polyunsaturated fatty acids and the like. The self-emulsifying composition is excellent in self-emulsifying property, composition dispersibility, emulsion stability, and absorbability, is free from ethanol and polyhydric alcohols or only has such an alcohol added thereto at a reduced concentration, and is useful for foods and pharmaceuticals.
    Type: Application
    Filed: February 11, 2019
    Publication date: June 6, 2019
    Applicant: MOCHIDA PHARMACEUTICAL CO., LTD.
    Inventors: Hiromitsu ITO, Hirosato FUJII, Motoo YAMAGATA, Daichi TANAKA
  • Patent number: 10305188
    Abstract: An antenna device includes: a plurality of cores arranged in series; a coil; and a capacitor connected to the coil, in which a first core, which is selected from the plurality of cores, and a second core, which is selected from the plurality of cores and is arranged on any one end portion side of the first core, are arranged apart from each other, and in which at least one end surface, which is selected from an end surface of the first core on a side on which the second core is arranged and an end surface of the second core on a side on which the first core is arranged, is located on an inner peripheral side of the coil.
    Type: Grant
    Filed: August 9, 2017
    Date of Patent: May 28, 2019
    Assignee: Sumida Corporation
    Inventors: Yoshinori Inoue, Isao Douchi, Kei Tanaka, Takanari Fujimaki, Yoshinori Miura, Hiroshi Kawasaki, Hiromitsu Kuriki, Takanobu Rokuka, Hiroyuki Miyazaki
  • Patent number: 10234762
    Abstract: A pattern-forming method comprises: forming a resist underlayer film on an upper face side of a substrate; forming a silicon-containing film on an upper face side of the resist underlayer film; and removing the silicon-containing film with a basic aqueous solution. The pattern-forming method does not include, after the forming of the silicon-containing film and before the removing of the silicon-containing film, treating the silicon-containing film with a treatment liquid comprising an acid or a fluorine compound. The silicon-containing film is preferably formed a hydrolytic condensation product of a composition containing a compound represented by formula (1) in an amount of no less than 60 mol % with respect to total silicon compounds. X represents a halogen atom or —OR2, and R2 represents a monovalent organic group.
    Type: Grant
    Filed: September 16, 2016
    Date of Patent: March 19, 2019
    Assignee: JSR CORPORATION
    Inventors: Masayoshi Ishikawa, Hiromitsu Tanaka, Tomoharu Kawazu, Junya Suzuki, Tomoaki Seko, Yoshio Takimoto
  • Publication number: 20180292753
    Abstract: Provided are: a composition for forming a silicon-containing film for EUV lithography capable of forming a silicon-containing film that is superior in an outgas-inhibiting property and enables formation of a resist pattern with a superior collapse-inhibiting property and a favorable configuration; a silicon-containing film for EUV lithography; and a pattern-forming method. The composition for forming a silicon-containing film for EUV lithography contains: a polysiloxane; a compound having an onium cation and a sulfonate anion; and a solvent, in which a sum of atomic masses of the atoms constituting the sulfonate anion is no less than 240, the sulfonate anion has a sulfonate group, and a carbon atom adjacent to the sulfonate group, and a fluorine atom does not bond to the carbon atom.
    Type: Application
    Filed: March 22, 2018
    Publication date: October 11, 2018
    Applicant: JSR CORPORATION
    Inventors: Hiromitsu TANAKA, Junya SUZUKI, Ryuichi SERIZAWA, Yuusuke OOTSUBO
  • Publication number: 20180272674
    Abstract: There is provided a thermally conductive composite material obtained by dispersing a thermally conductive filler in a matrix. The thermally conductive filler is a mixture including boron nitride particles with an average particle size of 10 ?m to 100 ?m and aluminum nitride particles with an average particle size that is 1/100 to ½ of the average particle size of the boron nitride particles, a content of the boron nitride particles is 60 volume % to 90 volume % with respect to a total amount of the boron nitride particles and the aluminum nitride particles, a content of the thermally conductive filler is 80 volume % to 95 volume % with respect to a total amount of the composite material, and a porosity of the composite material is 10 volume % or less.
    Type: Application
    Filed: March 20, 2018
    Publication date: September 27, 2018
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Megumi SASAKI, Hiromitsu TANAKA, Shinichi MIURA, Masataka DEGUCHI, Masaki TERADA, Tetsuyoshi FUKAYA
  • Patent number: 10078265
    Abstract: A pattern-forming method comprises: forming a resist underlayer film on an upper face side of a substrate; forming a silicon-containing film on an upper face side of the resist underlayer film; and removing at least a part of the resist underlayer film and at least a part of the silicon-containing film with a basic aqueous solution. Preferably, the pattern-forming method further comprises, after the forming of the silicon-containing film and before the removing of the resist underlayer film and the silicon-containing film, forming a resist pattern on an upper face side of the silicon-containing film, and etching the silicon-containing film using the resist pattern as a mask.
    Type: Grant
    Filed: September 16, 2016
    Date of Patent: September 18, 2018
    Assignee: JSR CORPORATION
    Inventors: Shun Aoki, Hiromitsu Tanaka, Goji Wakamatsu, Yoshio Takimoto, Masayoshi Ishikawa, Toru Kimura
  • Patent number: 10036954
    Abstract: A pattern-forming method comprises: forming a resist underlayer film on an upper face side of a substrate; forming a silicon-containing film on an upper face side of the resist underlayer film; and removing at least a part of the resist underlayer film and at least a part of the silicon-containing film with a basic aqueous solution. Preferably, the pattern-forming method further comprises, after the forming of the silicon-containing film and before the removing of the resist underlayer film and the silicon-containing film, forming a resist pattern on an upper face side of the silicon-containing film, and etching the silicon-containing film using the resist pattern as a mask.
    Type: Grant
    Filed: September 16, 2016
    Date of Patent: July 31, 2018
    Assignee: JSR CORPORATION
    Inventors: Shun Aoki, Hiromitsu Tanaka, Goji Wakamatsu, Yoshio Takimoto, Masayoshi Ishikawa, Toru Kimura
  • Patent number: 10025188
    Abstract: A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: July 17, 2018
    Assignee: JSR CORPORATION
    Inventors: Yusuke Anno, Takashi Mori, Hirokazu Sakakibara, Taiichi Furukawa, Kazunori Takanashi, Hiromitsu Tanaka, Shin-ya Minegishi
  • Patent number: D832337
    Type: Grant
    Filed: March 9, 2018
    Date of Patent: October 30, 2018
    Assignee: BROTHER INDUSTRIES, LTD.
    Inventors: Ai Nanno, Hiromitsu Tanaka
  • Patent number: D848525
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: May 14, 2019
    Assignee: BROTHER INDUSTRIES, LTD.
    Inventors: Masahide Asano, Yukihiko Sato, Hiromitsu Tanaka