Abstract: An antireflection member, including a resin base member; and a particle layer having mesoporous-silica nanoparticles directly fixed to a surface of the resin base member, wherein the nanoparticles are at least partially embedded in the surface of the resin base member, and the nanoparticles are arranged in a mono-particle layer to form the particle layer.

Abstract: A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent.

Abstract: A composition for forming a resist underlayer film includes a polysiloxane, and a solvent composition. The solvent composition includes an organic solvent which includes a compound represented by the following formula (1) or a carbonate compound and which has a standard boiling point of no less than 150.0° C. R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an acyl group having 1 to 4 carbon atoms. R3 represents a hydrogen atom or a methyl group. n is an integer of 1 to 4. In a case where n is no less than 2, a plurality of R3s are identical or different.

Abstract: A nanoheterostructure includes a first inorganic component and a second inorganic component one of which is a matrix, and the other of which is three-dimensionally and periodically arranged in the matrix, and has a three-dimensional periodic structure whose average value of one unit length of a repeated structure is 1 nm to 100 nm.

Abstract: An object of the present invention is to provide a test/diagnosis method for fertility which allows the estimation of the possibility of leading to pregnancy based on the ability of sperm to fuse with an egg and the identification of a cause of infertility; and a polynucleotide and a fertility testing kit which are used in the method.

Abstract: Provided is an electrode catalyst for a fuel cell including: a carbon support; and catalytic metal supported on the carbon support, the catalytic metal being selected from platinum or a platinum alloy, in which the carbon support has a crystallite size of (002) plane of carbon within a range of 5.0 nm or more and has a specific surface area within a range of 95 m2/g to 170 m2/g, and the catalytic metal has a crystallite size of (220) plane of platinum within a range of 4.5 nm or less.

Abstract: Fine graphite particles include plate-like graphite particles; and an aromatic vinyl copolymer which is adsorbed on the plate-like graphite particles, and which contains a vinyl aromatic monomer unit represented by the following formula (1): —(CH2—CHX)—??(1) (in the formula (1), X represents a phenyl group, a naphthyl group, an anthracenyl group, or a pyrenyl group, provided that these groups may have each a substituent).

Abstract: A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent.

Abstract: A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent.

Abstract: An antireflection film comprises: mesoporous nanoparticles having a metal oxide framework and an average particle diameter of 30 to 200 nm; and a mesoporous transparent material having a metal oxide framework and filling voids among the nanoparticles.

Abstract: A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent.

Abstract: A resist pattern-forming method capable of forming a resist pattern excellent in pattern collapse resistance in the case of development with the organic solvent in multilayer resist processes. The method has the steps of: (1) providing a resist underlayer film on a substrate using a composition for forming a resist underlayer film; (2) providing a resist film on the resist underlayer film using a photoresist composition; (3) exposing the resist film; and (4) developing the exposed resist film using a developer solution containing no less than 80% by mass of an organic solvent, in which the composition for forming a resist underlayer film contains (A) a component that includes a polysiloxane chain and that has a carboxyl group, a group that can generate a carboxyl group by an action of an acid, an acid anhydride group or a combination thereof.

Abstract: An electrophoretic display device includes a first substrate including switching elements and driving electrodes, an electrophoretic display element layer fixed on a predetermined display region of the first substrate, a sealing member formed to surround the display element layer on the first substrate, the sealing member being thicker than the display element layer, and a second substrate fixed on an opposite end of the sealing member to the first substrate, the second substrate having a wider area than the display element layer. The first substrate, the sealing member, and the second substrate constitute a closed inner space around the display element layer, thereby enclosing the display element layer in the space. The space is filled with an inert gas having a pressure approximately equal to an atmospheric pressure or is set in a predetermined vacuum state.