Patents by Inventor Hui Lin

Hui Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12232425
    Abstract: A magnetoresistive random access memory (MRAM) device includes a first array region and a second array region on a substrate, a first magnetic tunneling junction (MTJ) on the first array region, a first top electrode on the first MTJ, a second MTJ on the second array region, and a second top electrode on the second MTJ. Preferably, the first top electrode and the second top electrode include different nitrogen to titanium (N/Ti) ratios.
    Type: Grant
    Filed: November 21, 2023
    Date of Patent: February 18, 2025
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Hui-Lin Wang, Si-Han Tsai, Dong-Ming Wu, Chen-Yi Weng, Ching-Hua Hsu, Ju-Chun Fan, Yi-Yu Lin, Che-Wei Chang, Po-Kai Hsu, Jing-Yin Jhang
  • Patent number: 12227410
    Abstract: The present disclosure provides a semiconductor device. The semiconductor device includes a first device and a second device disposed adjacent to the first device; a conductive pillar disposed adjacent to the first device or the second device; a molding surrounding the first device, the second device and the conductive pillar; and a redistribution layer (RDL) over the first device, the second device, the molding and the conductive pillar, wherein the RDL electrically connects the first device to the second device and includes an opening penetrating the RDL and exposing a sensing area over the first device.
    Type: Grant
    Filed: January 5, 2024
    Date of Patent: February 18, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Po Chen Yeh, Yi-Hsien Chang, Fu-Chun Huang, Ching-Hui Lin, Chiahung Liu, Shih-Fen Huang, Chun-Ren Cheng
  • Patent number: 12227874
    Abstract: Methods for determining suitability of Czochralski growth conditions to produce silicon substrates for epitaxy. The methods involve evaluating substrates sliced from ingots grown under different growth conditions (e.g., impurity profiles) by imaging the wafer by infrared depolarization. An infrared depolarization parameter is generated for each epitaxial wafer. The parameters may be compared to determine which growth conditions are well-suited to produce substrates for epitaxial and/or post-epi heat treatments.
    Type: Grant
    Filed: June 7, 2022
    Date of Patent: February 18, 2025
    Assignee: GlobalWafers Co., Ltd.
    Inventors: Zheng Lu, Shan-Hui Lin, Chun-Chin Tu, Chi-Yung Chen, Feng-Chien Tsai, Hong-Huei Huang
  • Patent number: 12230738
    Abstract: A flip-chip light-emitting diode (LED) includes: a substrate having a patterned surface formed with a protrusion unit including first and second protrusions; a light-emitting epitaxial layer that is disposed on the second protrusions and that includes first and second semiconductor layers and an active layer interposed therebetween; first and second electrodes connected to the first and second semiconductor layers, respectively; and a passivation layer having an epitaxial-covering portion and a substrate-covering portion. The substrate-covering portion of the passivation layer has a top surface with hillocks having a height lower than that of the second protrusions. A high-voltage light-emitting device is also disclosed.
    Type: Grant
    Filed: January 28, 2022
    Date of Patent: February 18, 2025
    Assignee: XIAMEN SANAN OPTOELECTRONICS CO.
    Inventors: Feng Wang, Anhe He, Zhanggen Xia, Ensong Nie, Kang-Wei Peng, Su-Hui Lin
  • Publication number: 20250056874
    Abstract: One aspect of the present disclosure pertains to a device. The device includes a substrate, a logic circuit disposed on the substrate, and a nanoelectromechanical systems (NEMS) device electrically connected to the logic circuit and formed on the substrate. The NEMS device includes a first electrode electrically connected to the logic circuit, a second electrode electrically connected to a first power supply, a movable feature electrically connected to the second electrode, and a control electrode operable to move the movable feature relative to the first electrode.
    Type: Application
    Filed: November 17, 2023
    Publication date: February 13, 2025
    Inventors: Hung-Li Chiang, Ching-Hui Lin, Chun-Ren Cheng, Iuliana Radu
  • Publication number: 20250053203
    Abstract: A damping mechanism includes a fixed base, a damping swing arm, a rolling body, and a push-pressing apparatus. The damping swing arm is rotatably disposed on the fixed base by using a damping member. A first concave portion, a protrusion, and a second concave portion are disposed on a side wall of the damping member, and the protrusion has a guide surface inclined relative to an axis such that when the push-pressing apparatus squeezes the guide surface of the protrusion to the rolling body, the guide surface enhances a push-pressing force of the push-pressing apparatus, so that the damping member is subject to greater pressure, and torque damping is increased as the damping swing arm rotates.
    Type: Application
    Filed: October 24, 2024
    Publication date: February 13, 2025
    Inventors: Kenji Nagai, Akio Ishiguro, Hui Lin
  • Publication number: 20250054900
    Abstract: A package structure includes a circuit substrate, a package unit, a thermal interface material and a cover. The package unit is disposed on and electrically connected with the circuit substrate. The package unit includes a first surface facing the circuit substrate and a second surface opposite to the first surface. A underfill is disposed between the package unit and the circuit substrate, surrounding the package unit and partially covering sidewalls of the package unit. The cover is disposed over the package unit and over the circuit substrate. An adhesive is disposed on the circuit substrate and between the cover and the circuit substrate. The thermal interface material includes a metal-type thermal interface material and is disposed between the cover and the package unit. The thermal interface material physically contacts the second surface and the sidewalls of the package unit and physically contacts the underfill.
    Type: Application
    Filed: August 7, 2023
    Publication date: February 13, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Yen Lan, Chih-Chien Pan, Pu Wang, Li-Hui Cheng, Ying-Ching Shih, Yu-Wei Lin
  • Publication number: 20250056746
    Abstract: An electronic device including a device housing, a cable, a cable positioning structure, and a housing restriction structure is provided. The device housing includes a through hole. The through hole includes a central region, a first channel region, and a second channel region. The cable passes through the device housing. The cable positioning structure is disposed on the cable. The cable positioning structure includes a first protrusion and a second protrusion. The cable positioning structure is adapted to be rotated between a first orientation and a second orientation relative to the device housing. The housing restriction structure is disposed on the device housing. The housing restriction structure includes a first restrain member and a first stopper. In a positioned state, the cable positioning structure is in the second orientation. The first restrain member and the first stopper restrict the cable positioning structure.
    Type: Application
    Filed: July 18, 2024
    Publication date: February 13, 2025
    Inventors: Che-Cheng WU, Chen-Wei HUANG, Yu-Hsiang LIN, Ya-Hui LO
  • Publication number: 20250056986
    Abstract: A display panel includes a base substrate, a display structure layer located on the base substrate of a display region and including multiple display region metal layers, a touch structure layer, multiple contact pads, and a first inorganic insulating layer. The touch structure layer is located on a side of the display structure layer away from the base substrate. The multiple contact pads are located in the first bezel region, and at least one contact pad includes at least one contact pad metal layer. The first inorganic insulating layer exposes at least part of surfaces of contact pad metal layers of the multiple contact pads away from the base substrate. The contact pad metal layer of the at least one contact pad exposed by the first inorganic insulating layer and one of the multiple display region metal layers of the display structure layer are of a same layer structure.
    Type: Application
    Filed: March 28, 2023
    Publication date: February 13, 2025
    Inventors: Chaoxue QIN, Jiamian SUN, Hui LUO, Zerong YANG, Yuheng QIU, Hwang KIM, Wei LIN
  • Patent number: 12222653
    Abstract: A method for forming a semiconductor device structure is provided. The method includes forming a resist layer over a material layer, the resist layer includes an inorganic material. The inorganic material includes a plurality of metallic cores and a plurality of first linkers bonded to the metallic cores. The method includes forming a modified layer over the resist layer, and the modified layer includes an auxiliary. The method includes performing an exposure process on the modified layer and the resist layer, and removing a portion of the modified layer and a first portion of the resist layer by a first developer. The first developer includes a ketone-based solvent having a substituted or unsubstituted C6-C7 cyclic ketone, an ester-based solvent having a formula (b), or a combination thereof.
    Type: Grant
    Filed: May 14, 2021
    Date of Patent: February 11, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ming-Hui Weng, An-Ren Zi, Ching-Yu Chang, Chin-Hsiang Lin, Chen-Yu Liu
  • Patent number: 12224485
    Abstract: A microminiaturized antenna feed module includes a substrate, a plurality of coupled feed portions, and an active circuit. The substrate defines a plurality of visa penetrating the substrate. The coupled feed portions, made of conductive material and have different coupling areas, are electrically connected to the active circuit through the holes, to feed in electrical signals, the coupled feed portions couple the electrical signals to the metal frame to radiate wireless signals; the active circuit controls the switching of radiation modes of the metal frame. The application also provides an electronic device with the microminiaturized antenna feed module.
    Type: Grant
    Filed: May 31, 2022
    Date of Patent: February 11, 2025
    Assignee: FIH CO., LTD.
    Inventors: Cho-Kang Hsu, Min-Hui Ho, Wei-Cheng Su, Yen-Hui Lin
  • Patent number: 12222654
    Abstract: A method includes illuminating radiation to a resist layer over a substrate to pattern the resist layer. The patterned resist layer is developed by using a positive tone developer. The patterned resist layer is rinsed using a basic aqueous rinse solution. A pH value of the basic aqueous rinse solution is lower than a pH value of the developer, and a rinse temperature of rinsing the patterned resist layer is in a range of about 20° C. to about 40° C.
    Type: Grant
    Filed: July 16, 2021
    Date of Patent: February 11, 2025
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ming-Hui Weng, Chen-Yu Liu, Cheng-Han Wu, Ching-Yu Chang, Chin-Hsiang Lin
  • Patent number: 12224108
    Abstract: A coil module is provided, including a second coil mechanism. The second coil mechanism includes a third coil assembly and a second base corresponding to the third coil assembly. The second base has a positioning assembly corresponding to a first coil mechanism.
    Type: Grant
    Filed: October 5, 2023
    Date of Patent: February 11, 2025
    Assignee: TDK TAIWAN CORP.
    Inventors: Feng-Lung Chien, Tsang-Feng Wu, Yuan Han, Tzu-Chieh Kao, Chien-Hung Lin, Kuang-Lun Lee, Hsiang-Hui Hsu, Shu-Yi Tsui, Kuo-Jui Lee, Kun-Ying Lee, Mao-Chun Chen, Tai-Hsien Yu, Wei-Yu Chen, Yi-Ju Li, Kuei-Yuan Chang, Wei-Chun Li, Ni-Ni Lai, Sheng-Hao Luo, Heng-Sheng Peng, Yueh-Hui Kuan, Hsiu-Chen Lin, Yan-Bing Zhou, Chris T. Burket
  • Patent number: 12221442
    Abstract: This disclosure relates to GLP-1 agonists of Formula (I), including pharmaceutically acceptable salts and solvates thereof, and pharmaceutical compositions including the same.
    Type: Grant
    Filed: January 26, 2024
    Date of Patent: February 11, 2025
    Assignee: Gasherbrum Bio, Inc.
    Inventors: Qinghua Meng, Weiqiang Xing, Haizhen Zhang, Xichen Lin, Hui Lei, Andrew Jennings
  • Publication number: 20250041310
    Abstract: The present application provides methods of treating cancer using a combination of an inhibitor of A2A and/or A2B and an inhibitor of PD-1 and/or PD-L1.
    Type: Application
    Filed: July 10, 2024
    Publication date: February 6, 2025
    Inventors: Hui Wang, Peter Niels Carlsen, Taisheng Huang, Yong Li, Luping Lin, Chao Qi, Pramod Unnikrishnan Thekkat, Xiaozhao Wang, Liangxing Wu, Wenqing Yao, Wenyu Zhu
  • Publication number: 20250048936
    Abstract: A semiconductor device includes: a substrate comprising a magnetic tunneling junction (MTJ) region and a logic region, a MTJ on the MTJ region, a top electrode on the MTJ, a connecting structure on the top electrode, and a first metal interconnection on the logic region. Preferably, the first metal interconnection includes a via conductor on the substrate and a trench conductor, in which a bottom surface of the trench conductor is lower than a bottom surface of the connecting structure.
    Type: Application
    Filed: October 17, 2024
    Publication date: February 6, 2025
    Applicant: United Microelectronics Corp.
    Inventors: Hui-Lin Wang, Po-Kai Hsu, Chen-Yi Weng, Jing-Yin Jhang, Yu-Ping Wang, Hung-Yueh Chen
  • Publication number: 20250041264
    Abstract: The object of the present disclosure is to provide a method for treating diabetes by using an Antrodia camphorata compound, wherein the Antrodia camphorata compound is shown in the following formula 1: or the pharmacologically acceptable salts of the formula 1.
    Type: Application
    Filed: January 24, 2024
    Publication date: February 6, 2025
    Inventors: Mao-tien Kuo, Yin-yu Kuo, Hui-ling Tseng, Tai-lin Tseng, Wan-ping Tseng, Yi-ling Ye, Li-shian Shi, Ya-hong Lin
  • Publication number: 20250044543
    Abstract: A focusing lens assembly includes a housing, a liquid lens, a solid lens assembly, an elastic member set, and a driving assembly. The liquid lens covers a light incidence port of the housing and includes an operating member. The solid lens assembly is located in an accommodating space of the housing. A liquid lens optical axis substantially coincides with the solid lens optical axis. The elastic member set is configured to suspend the solid lens assembly in the accommodating space. The driving assembly includes a coil set fixed to the solid lens assembly and a fixed magnet set fixed to the housing and corresponds to the coil set. When the coil set is driven, the coil set interacts with the fixed magnet set, so that the solid lens assembly moves along the solid lens optical axis to selectively enable the solid lens assembly to abut against the operating member.
    Type: Application
    Filed: March 27, 2024
    Publication date: February 6, 2025
    Applicant: GUANGZHOU LUXVISIONS INNOVATION TECHNOLOGY LIMITED
    Inventors: Jyun-Jie Lin, Tsung-Kai Chang, Chuan-Hui Liu
  • Publication number: 20250043337
    Abstract: Provided herein are methods of assaying a methylated DNA-binding protein comprising contacting methylated DNA-binding proteins with labeled oligonucleotides, obtaining sample partitions for oligonucleotides with different methylation states, and quantifying the labeled oligonucleotides in the partitions.
    Type: Application
    Filed: May 10, 2024
    Publication date: February 6, 2025
    Inventors: Saiyou OHSHIMA, Kenneth Edmund STAPLETON, Dustin Howard HITE, Xiao-Bo CHEN, Chia-Hui LIN, Dania ANNUAR, Jessica Michelle PIERACCI
  • Publication number: 20250044708
    Abstract: In a method of forming a pattern, a photo resist layer is formed over an underlying layer, the photo resist layer is exposed to an actinic radiation carrying pattern information, the exposed photo resist layer is developed to form a developed resist pattern, a directional etching operation is applied to the developed resist pattern to form a trimmed resist pattern, and the underlying layer is patterned using the trimmed resist pattern as an etching mask.
    Type: Application
    Filed: October 18, 2024
    Publication date: February 6, 2025
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ru-Gun LIU, Huicheng CHANG, Chia-Cheng CHEN, Jyu-Horng SHIEH, Liang-Yin CHEN, Shu-Huei SUEN, Wei-Liang LIN, Ya Hui CHANG, Yi-Nien SU, Yung-Sung YEN, Chia-Fong CHANG, Ya-Wen YEH, Yu-Tien SHEN