Patents by Inventor Hung Chih Chen

Hung Chih Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Retaining ring and articles for carrier head
    Patent number: 8376813
    Abstract: A carrier head for chemical mechanical polishing that has a base, a mounting assembly connected to the base having a surface for contacting a substrate, and a retaining ring secured to the base. The retaining ring can include perfluoroalkoxy, polyetherketoneketone, polybenzimidazole, a semi-crystalline thermoplastic polyester, or a long molecular chain molecule produced from poly-paraphenylene terephthalamide.
    Type: Grant
    Filed: February 10, 2010
    Date of Patent: February 19, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Doyle E. Bennett, Andrew J. Nagengast, Hung Chih Chen
  • FASTENING MECHANISM AND ELECTRONIC DEVICE HAVING THE SAME
    Publication number: 20130037295
    Abstract: A fastening mechanism for an electronic device, which has a shell body and a cover having a first fastening structure, includes a press portion adapted to be exposed from the shell body and pressable to extend resiliently into the shell body, and a second fastening structure adapted to engage to and disengage from the first fastening structure to prevent and permit removal of the cover from the shell body, respectively. A resilient component is adapted to be provided in the shell body, stores a restoring force when the cover is coupled to the shell body, and releases the restoring force when the second fastening structure is disengaged from the first fastening structure for biasing the cover away from the shell body.
    Type: Application
    Filed: July 24, 2012
    Publication date: February 14, 2013
    Inventors: Chen-Yi Liang, Hung-Chih Chen
  • ORNAMENTAL PLATE WITH EASY ASSEMBLY
    Publication number: 20130017358
    Abstract: An ornamental plate structure includes a supporting base and a sliding button. The sliding button includes a button portion, a first sliding portion, and a fastening portion whereon an incline and a wedging slot are formed. The ornamental plate structure further includes an ornamental plate having a plate, a hooking component and a fixing component. The fixing component includes a wedging portion, a second sliding portion and an assembly surface. The wedging portion wedges inside the wedging slot after the assembly surface slides relative to the incline at a predetermined distance so as to fix the ornamental plate on the supporting base. The button portion is pushed to slide the first sliding portion relative to the second sliding portion so as to separate the wedging portion from the wedging slot. The ornamental plate structure further includes a resilient component for driving the sliding button.
    Type: Application
    Filed: April 18, 2012
    Publication date: January 17, 2013
    Inventors: Chen-Yi Liang, Cheng-Hsiang Chuang, Hung-Chih Chen
  • Dishwasher having dedicated sprayer for silverware basket
    Patent number: 8349089
    Abstract: A method and apparatus for providing multiple spray zones to different subportions of a silverware basket within the wash chamber of a dishwasher.
    Type: Grant
    Filed: November 7, 2008
    Date of Patent: January 8, 2013
    Assignee: Whirlpool Corporation
    Inventors: Roger James Bertsch, David Hung-Chih Chen, Brian Lee Greenhaw, Jeffrey R. Taylor
  • PORTABLE ELECTRONIC APPARATUS AND CASING THEREFOR
    Publication number: 20120327611
    Abstract: A portable electronic apparatus and a casing thereof are disclosed. The portable electronic apparatus includes the casing including a base and an upper cover, and an electronic processing module disposed in the base. The base includes a first engagement structure having a lock slot. The upper cover includes a plate member and a second engagement structure mounted on the plate member. The second engagement structure includes a locking part and a detaching part connected to the locking part. The base and the upper cover are engaged such that the locking part is locked in the lock slot. The detaching part can be moved so as to detach the locking part from the lock slot. Therefore, a user can detach the locking part from the lock slot by the detaching part without any tools, which greatly reduces the complexity of the detachment of a casing of a conventional portable electronic apparatus.
    Type: Application
    Filed: September 22, 2011
    Publication date: December 27, 2012
    Inventors: Chen-Yi Liang, Hung-Chih Chen
  • Closed-loop control for effective pad conditioning
    Patent number: 8337279
    Abstract: A method and apparatus for conditioning a polishing pad is provided. The conditioning element is held by a conditioning arm rotatably mounted to a base at a pivot point. An actuator pivots the arm about the pivot point. The conditioning element is urged against the surface of the polishing pad, and translated with respect to the polishing pad to remove material from the polishing pad and roughen its surface. The interaction of the abrasive conditioning surface with the polishing pad surface generates a frictional force. The frictional force may be monitored by monitoring the torque applied to the pivot point, and material removal controlled thereby. The conditioning time, down force, translation rate, or rotation of the conditioning pad may be adjusted based on the measured torque.
    Type: Grant
    Filed: June 22, 2009
    Date of Patent: December 25, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Sivakumar Dhandapani, Stan D. Tsai, Daxin Mao, Sameer Deshpande, Shou-Sung Chang, Gregory E. Menk, Charles C. Garretson, Jason Garcheung Fung, Christopher D. Cocca, Hung Chih Chen
  • GAS BARRIER FILM AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20120308808
    Abstract: A gas barrier film and method for manufacturing the abovementioned gas barrier film are disclosed in the present invention. The gas barrier film is applied in electronic product, food, medicine and other fields for protecting them from gas and water. The gas barrier film comprises a gas barrier layer and pluralities of cladding layers. The gas barrier layer is a liquid layer, and the cladding layers are disposed on the opposite surface of the gas barrier layer.
    Type: Application
    Filed: September 22, 2011
    Publication date: December 6, 2012
    Applicant: NATIONAL TSING HUA UNIVERSITY
    Inventors: Ta-Jo LIU, Chin-Ghia LIU, Po-Hao TSAO, Hung-Chih CHEN
  • Substrate retainer
    Patent number: 8298047
    Abstract: A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
    Type: Grant
    Filed: January 10, 2011
    Date of Patent: October 30, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Steven M. Zuniga, Hung Chih Chen
  • MEASUREMENT OF PAD THICKNESS AND CONTROL OF CONDITIONING
    Publication number: 20120270477
    Abstract: A conditioning process includes rotating a polishing pad about an axis of rotation, conditioning the polishing pad by sweeping an abrasive disk in a path across a surface of the polishing pad between an inner radial distance from the axis of rotation and an outer radial distance from the axis of rotation, sweeping a sensor across the polishing pad while conditioning the polishing pad, measuring a thickness of the polishing pad at a plurality of positions between the inner radial distance and the outer radial distance with the sensor, and adjusting at least one of a dwell time or a pressure of the abrasive disk against the polishing pad for a portion of the path based on measurements of the thickness by the sensor such that the polishing pad wears to a more uniform thickness than without such adjustment.
    Type: Application
    Filed: April 22, 2011
    Publication date: October 25, 2012
    Inventors: Roy C. Nangoy, Hung Chih Chen, Shou-Sung Chang, Erik S. Rondum, Sameer Deshpande
  • LITHIUM CELL SIMULATING DEVICE
    Publication number: 20120239340
    Abstract: A lithium cell simulating device includes a programmable power supplying module for generating multiple powers; a lithium cell status controlling module for generating multiple lithium cell statuses; a load setting module for simulating a lithium cell status; a device under test (DUT) status detecting module for detecting whether a device under test (DUT) is actuated; and a control unit for controlling a test procedure in its entirety. Accordingly, the lithium cell simulating device is suitable for use with DUTs of different power requirements and effective in simulating a charging/discharging status, a battery level status, and a battery temperature status under different conditions in the absence of a lithium cell and other complicated test apparatuses, so as to enable a great reduction of costs incurred in performing a test on a production line.
    Type: Application
    Filed: June 1, 2011
    Publication date: September 20, 2012
    Applicant: ASKEY COMPUTER CORP.
    Inventors: HUNG-CHIH CHEN, CHING-FENG HSIEH
  • Roller assembly for a brush cleaning device in a cleaning module
    Patent number: 8250695
    Abstract: Embodiments described herein relate to an apparatus and method for a roller assembly that may be utilized in a brush cleaning module. In one embodiment, a roller assembly is described. The roller assembly includes an annular groove having at least two substantially parallel opposing sidewalls adapted to contact the major surfaces of a substrate along a periphery of the substrate, each of the opposing sidewalls comprising a compressible material having a pre-compressed dimension that is less than a thickness of the periphery of the substrate.
    Type: Grant
    Filed: October 5, 2009
    Date of Patent: August 28, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Lakshmanan Karuppiah, Dan Zhang, Simon Yavelberg, Jim K. Atkinson, Hung Chih Chen, Noel Manto, Jonathan Domin
  • SPEAKER UNIT AND ELECTRONIC DEVICE HAVING THE SAME
    Publication number: 20120183170
    Abstract: An electronic device includes a housing and a speaker unit. The housing includes an upper housing half and a lower housing half connected to and disposed under the upper housing half. The lower housing half is provided with at least one insert post. The speaker unit includes a magnetic element disposed on the upper housing half of the housing, and a speaker module including a speaker body disposed above and abutting against the lower housing half of the housing and having at least one post-connecting portion, and a magnetic body adapted for generating an audio signal. The post-connecting portion has a hole permitting the insert post to extend movably therethrough. A magnetic attractive force or a magnetic repulsive force exists between the magnetic element and the magnetic body.
    Type: Application
    Filed: March 29, 2012
    Publication date: July 19, 2012
    Inventor: Hung-Chih Chen
  • Closed loop control of pad profile based on metrology feedback
    Patent number: 8221193
    Abstract: A chemical mechanical polishing apparatus includes a metrology system that detects the thickness of the polishing pad as semiconductor wafers are processed and the thickness of the polishing pad is reduced. The chemical mechanical polishing apparatus includes a controller that adjusts the rate of material removal of a conditioning disk when areas of the polishing surface are detected that are higher or lower than the adjacent areas of the polishing pad.
    Type: Grant
    Filed: August 7, 2008
    Date of Patent: July 17, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Shou-Sung Chang, Hung Chih Chen, Stan D Tsai, Yuchun Wang
  • PRESSURE CONTROLLED POLISHING PLATEN
    Publication number: 20120171933
    Abstract: A method and apparatus for controlling pressure or forces applied to a substrate in a polishing process is described. In one embodiment, a polishing system is described. The system includes a platen rotatably disposed on a base, the platen having a sidewall and a polishing pad disposed thereon forming an interior volume, and a pad pressure applicator disposed in the interior volume of the platen adjacent the underside of the polishing pad.
    Type: Application
    Filed: December 13, 2011
    Publication date: July 5, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventor: Hung Chih Chen
  • Brush alignment control mechanism
    Patent number: 8181302
    Abstract: A method and apparatus for providing uniform pressure, friction and/or contact between a substrate and a cylindrical roller in a brush-type cleaning system is described. The apparatus includes an alignment member adapted to allow pivotal movement of the cylindrical roller based on the topography of a substrate and/or the outer surface of the cylindrical roller. The method includes positioning a substrate between two cylindrical rollers, moving each of the two cylindrical rollers to a position where at least a portion of an outer surface of each of the cylindrical rollers are in contact with the major surfaces of the substrate, and rotating one or both of the substrate and the two cylindrical rollers relative to each other while allowing a longitudinal axis of one or both of the two cylindrical rollers to pivot relative to a plane defined by one of the major surfaces of the substrate.
    Type: Grant
    Filed: September 22, 2009
    Date of Patent: May 22, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Hung Chih Chen, Hui Chen, Dan Zhang
  • RETAINING RING WITH SHAPED SURFACE
    Publication number: 20120071067
    Abstract: A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portions. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.
    Type: Application
    Filed: November 28, 2011
    Publication date: March 22, 2012
    Inventors: Hung Chih Chen, Steven M. Zuniga, Charles C. Garretson, Douglas R. McAllister, Jian Lin, Stacy Meyer, Sidney P. Huey, Jeonghoon Oh, Trung T. Doan, Jeffrey Schmidt, Martin S. Wohlert, Kerry F. Hughes, James C. Wang, Danny Cam Toan Lu, Romain Beau De Lamenie, Venkata R. Balagani, Aden Martin Allen, Michael Jon Fong
  • APPARATUS AND METHOD FOR TEMPERATURE CONTROL DURING POLISHING
    Publication number: 20120040592
    Abstract: Embodiments of the present invention relate to apparatus and method for improve uniformity of a polishing process. Embodiments of the present invention provide a heating mechanism configured to apply thermal energy to a perimeter of a substrate during polishing, or a cooling mechanism configured to cool a central region of the substrate during polishing, or a biased heating mechanism configured to create a temperature step differential on a given radius of a polishing pad.
    Type: Application
    Filed: August 11, 2010
    Publication date: February 16, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: HUNG CHIH CHEN, Samuel Chu-Chiang Hsu, Gautam Shashank Dandavate, Denis M. Koosau
  • CARRIER HEAD WITH NARROW INNER RING AND WIDE OUTER RING
    Publication number: 20120034849
    Abstract: A carrier head for a chemical mechanical polisher includes base, a substrate mounting surface, an annular inner ring, and an annular outer ring. The inner ring has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. The inner ring is vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad. The outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring. The lower surface of the inner ring has a first width, and the lower surface of the outer ring has a second width greater than the first width.
    Type: Application
    Filed: August 5, 2011
    Publication date: February 9, 2012
    Inventors: Hung Chih Chen, Samuel Chu-Chiang Hsu, Yin Yuan, Huanbo Zhang, Gautam Shashank Dandavate
  • SUBSTRATE EDGE TUNING WITH RETAINING RING
    Publication number: 20120034848
    Abstract: A carrier head for a chemical mechanical polisher includes a base, a substrate mounting surface, an annular inner ring and an outer ring. The inner ring has a lower surface configured to contact an upper surface of a substrate positioned on the substrate mounting surface, an outer surface, and an inwardly facing surface extending downwardly from the lower surface and is configured to circumferentially surround the edge of the substrate, the inner ring vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad, and the outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring.
    Type: Application
    Filed: August 5, 2011
    Publication date: February 9, 2012
    Inventors: Hung Chih Chen, Mario David Silvetti, Yin Yuan
  • SUBSTRATE HOLDER TO REDUCE SUBSTRATE EDGE STRESS DURING CHEMICAL MECHANICAL POLISHING
    Publication number: 20120021673
    Abstract: Embodiments of the present invention generally relate to methods for chemical mechanical polishing a substrate. The methods generally include coupling a first substrate to be polished to a dummy substrate, and removing a portion of the backside of the first substrate to reduce the thickness of the first substrate. The first substrate and the dummy substrate are positioned in a carrier head assembly comprising an inflatable membrane and a support ring. The first substrate is placed in contact with a polishing pad to reduce the surface roughness of the backside of the first substrate. The support ring restricts lateral movement of the inflatable membrane to prevent the first substrate from contacting an interior surface of the carrier head assembly. The support ring is sized to allow vertical movement of the inflatable membrane within the carrier head assembly.
    Type: Application
    Filed: July 20, 2010
    Publication date: January 26, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Hung Chih Chen, Samuel Chu-Chiang Hsu, Gautam Shashank Dandavate, Denis M. Koosau