Abstract: A photoresist polymer comprising a first repeating unit including a halogen donor group and a second repeating unit including a protecting group connected by a sulfide bond.

Abstract: An electrolyte for a rechargeable lithium battery includes a non-aqueous organic solvent; a lithium salt; a first compound represented by Chemical Formula 1; and a second compound represented by Chemical Formula 2, wherein an amount of the first compound is about 0.05 wt % to about 10 wt % and an amount of the second compound is about 0.05 wt % to about 10 wt %. In Chemical Formulae 1 and 2, the substituents are the same as defined in the detailed description.

Abstract: A composition for manufacturing a semiconductor device includes at least one carbon-based compound that includes at least one of an alkyne group and an azide group, and a solvent. A method of manufacturing a semiconductor device includes forming a feature layer on a substrate, coating the feature layer with a composition including alkyne and azide, forming a carbon-containing layer including a triazole compound by performing a heat treatment on the coated composition, forming a photoresist film on the carbon-containing layer, forming photoresist patterns by exposing and developing the photoresist film, and patterning the carbon-containing layer and the feature layer using the photoresist patterns.

Abstract: There is provided a patterning process that forms a negative pattern by developing using an organic solvent, using a resist top coat composition that not only reduces the effect from the environment on a resist film and effectively blocks OOB light, but also reduces the film loss of a resist pattern and the bridging between patterns, enhances the sensitivity of the resist film, and suppresses the emission of an outgas from the resist film. The patterning process includes the steps of forming a resist top coat on a photoresist film formed on a substrate, with the resist top coat using as a top base material a polymer having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group, in which m is 1 or 2, and p is 0<p?1.0; performing EUV exposure using an electron beam or having a wavelength of 3 nm to 15 nm; and forming a negative pattern by developing using an organic-solvent-based developer.

Abstract: A system to pair a mobile electronic device to an output device to output content from content data stored on a memory component, the memory component located in the mobile electronic device or locatable by the mobile electronic device includes a pairing server configured to send the content data to the output device in response to an output request by the mobile electronic device, a short range communication tag associated with the output device, and comprising identifying data associated with the output device, and a short range communication module communicatively and removeably coupled to, or comprising an element of, the mobile electronic device; and configured to receive the identifying data from the short range communication tag.

Abstract: In a method of forming a pattern of a semiconductor device, a hard mask layer is formed on a substrate. A photoresist film is coated on the hard mask layer. The photoresist film is exposed and developed to form a first photoresist pattern. A smoothing process is performed on the first photoresist pattern to form a second photoresist pattern having a roughness property lower from that of the first photoresist pattern. In the smoothing process, a surface of the first photoresist pattern is treated with an organic solvent. An ALD layer is formed on a surface of the second photoresist pattern. The ALD layer is anisotropically etched to form an ALD layer pattern on a sidewall of the second photoresist pattern. The hard mask layer is etched using the second photoresist pattern and the ALD layer pattern as an etching mask to form a hard mask pattern.

Abstract: An electronic device and a method for controlling the same are provided. The method includes obtaining a depth image using a depth camera, extracting a hand area including a hand of a user from the obtained depth image, modeling fingers and a palm of the user included in the hand area into a plurality of points, and sensing a touch input based on depth information of one or more of the plurality of modeled points.

Abstract: In a method of forming a pattern, a lower coating layer and a photoresist layer are sequentially formed on an object layer. An exposure process may be performed such that the photoresist layer is divided into an exposed portion and a non-exposed portion. A portion of the lower coating layer overlapping or contacting the exposed portion is at least partially transformed into a polarity conversion portion that has a polarity substantially identical to that of the exposed portion. The non-exposed portion of the photoresist layer is selectively removed.

Abstract: There are provided a top coat composition and a patterning process using that composition, which reduce the effect of contaminants in the surrounding atmosphere on the resist film in absorbing OOB light and in reducing film loss of the resist pattern and bridging between patterns, and also enhances the sensitivity of the resist film and suppresses the emission of outgas from the resist film. The resist top coat composition of the present invention is formed on a photoresist film formed on a wafer, and is used in a patterning process performed by lithography in which, after exposure, developing is performed. The resist top coat composition contains a polymer as a base resin having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group shown by the following general formula (1), a C6-C10 ether compound, and a C7-C12 hydrocarbon compound, and wherein m is 1 or 2, and p is in the range of 0<p?1.0.

Abstract: A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit adjacent to the stage, the electric field unit being configured to apply an electric field to the photoresist film, wherein the electric field unit is configured to be turned on at a same time as or before irradiation of the projection beam, and is configured to be turned off at a same time as or after termination of the projection beam.

Abstract: In a method of manufacturing a semiconductor device, a mask layer and a first layer may be sequentially formed on a substrate. The first layer may be patterned by a photolithography process to form a first pattern. A silicon oxide layer may be formed on the first pattern. A coating pattern including silicon may be formed on the silicon oxide layer. The mask layer may be etched using a second pattern as an etching mask to form a mask pattern, and the second pattern may includes the first pattern, the silicon oxide layer and the coating pattern. The mask pattern may have a uniform size.

Abstract: An apparatus for opening and closing a tailgate for a vehicle includes a latch device provided in the tailgate and an actuator. The latch device includes a claw to engage with a striker provided at a vehicle body side, a pawl to engage with the claw to maintain the claw in a locked position, and an unlocking lever to operate the pawl to unlock the claw. The actuator includes a cinching/release lever to selectively operate a cinching cable connected to the claw to rotate the claw from an unlocked position to the locked position, and a release cable connected to the unlocking lever to operate the claw from the locked position to the unlocked position.

Abstract: A feature compensation apparatus includes a feature extractor configured to extract corrupt speech features from a corrupt speech signal with additive noise that consists of two or more frames; a noise estimator configured to estimate noise features based on the extracted corrupt speech features and compensated speech features; a probability calculator configured to calculate a correlation between adjacent frames of the corrupt speech signal; and a speech feature compensator configured to generate compensated speech features by eliminating noise features of the extracted corrupt speech features while taking into consideration the correlation between adjacent frames of the corrupt speech signal and the estimated noise features, and to transmit the generated compensated speech features to the noise estimator.

Abstract: A module type PDU for different power supply is provided. The PDU includes: a base configured to transmit different kinds of power; and a multi socket module connected with the base to transmit one kind of power to devices plugs of which are connected to the multi socket module. Accordingly, double power supply can be achieved through a single PDU and thus a PDU installing cost can be reduced, and, as the number of PDUs is reduced, electric equipments can be simplified.

Abstract: Disclosed is a carboxylic acid-modified nitrile-based copolymer latex composition, including 0.1-10 parts by weight of a reactive emulsifier based on 100 parts by weight of a monomer mixture, wherein the monomer mixture includes 40-88 wt % of a conjugated diene-based monomer, 10-50 wt % of an ethylenically unsaturated nitrile monomer and 0.1-10 wt % of an ethylenically unsaturated acid monomer. Also disclosed are a method of preparing the carboxylic acid-modified nitrile-based copolymer latex composition and a latex composition for dip molding including the same. The carboxylic acid-modified nitrile-based copolymer latex composition reduces generation of foam through the use of a reactive emulsifier different from the conventional adsorption/desorption type emulsifier, thereby preventing degradation of the quality of latex caused by foam. In addition, the carboxylic acid-modified nitrile-based copolymer latex composition avoids a need for introducing a defoaming agent for removing foam or maturation process.

Abstract: An encoding method of an encoder is provided. The encoder generates first MDCT coefficients by transforming an input signal, and generates MDCT indices by quantizing the first MDCT coefficients. The encoder generates second MDCT coefficients by dequantizing the MDCT indices, and calculates MDCT residual coefficients using differences between the first MDCT coefficients and the second MDCT coefficients. The encoder generates a residual index by encoding the MDCT residual coefficients, and generates gain indices corresponding to gains from the first MDCT coefficients and the second MDCT coefficients.

Abstract: A method of manufacturing a semiconductor device, including forming an etching target film on a substrate; forming an anti-reflection film on the etching target film; forming a photoresist film on the anti-reflection film; exposing the photoresist film; performing heat treatment on the anti-reflection film and the photoresist film to form a covalent bond between the anti-reflection film and the photoresist film; and developing the photoresist film.

Abstract: The present inventive concept provides methods of manufacturing a semiconductor device including forming an inner mask layer on an etching target film, the inner mask layer including a polymer; forming a porous film on the etching target film, the porous film covering the inner mask layer; supplying an acid source to an outer surface area of the inner mask layer through the porous film; inducing a chemical reaction of the polymer included in the inner mask layer in the outer surface area by using the acid source; forming inner mask patterns by removing a chemically reacted portion of the inner mask layer; and etching the etching target film by using at least a portion of the porous film and the inner mask patterns as an etching mask.

Abstract: Methods of forming a hardmask material film are provided.

Abstract: An apparatus for displaying an RPM section having a good efficiency for a construction machine is disclosed, which includes a control unit outputting different control signals depending on whether a current engine RPM belongs to a predetermined RPM section having the good efficiency, and a good-efficiency display unit selectively turning on or off an LED lamp according to the control signal output from the control unit. Since the RPM section having the good efficiency of the construction machine equipment is defined and the LED lamp for indicating the good-efficiency state is turned on if the current engine RPM belongs to the RPM section, a client can finally achieve good fuel efficiency in using the construction machine equipment.