Patents by Inventor In-kyeong Yoo

In-kyeong Yoo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040155283
    Abstract: A memory device including a single transistor having functions of RAM and ROM and methods for operating and manufacturing the same are provided. The memory device includes a single transistor formed on a substrate. The transistor may be a memory transistor having a gate with a nonvolatile memory element, or the nonvolatile memory element is provided between the transistor and the substrate.
    Type: Application
    Filed: February 10, 2004
    Publication date: August 12, 2004
    Applicant: SAMSUNG ELECTRONICS CO, LTD.
    Inventors: In-kyeong Yoo, Byong-man Kim
  • Publication number: 20040137704
    Abstract: A method of fabricating memory with nano dots includes sequentially depositing a first insulating layer, a charge storage layer, a sacrificial layer, and a metal layer on a substrate in which source and drain electrodes are formed, forming a plurality of holes on the resultant structure by anodizing the metal layer and oxidizing portions of the sacrificial layer that are exposed through the holes, patterning the charge storage layer to have nano dots by removing the oxidized metal layer, and etching the sacrificial layer and the charge storage layer using the oxidized sacrificial layer as a mask, and removing the oxidized sacrificial layer, depositing a second insulating layer and a gate electrode on the patterned charge storage layer, and patterning the first insulating layer, the patterned charge storage layer, the second insulating layer, and the gate electrode to a predetermined shape, for forming memory having uniformly distributed nano-scale storage nodes.
    Type: Application
    Filed: December 23, 2003
    Publication date: July 15, 2004
    Inventors: In-Sook Kim, Sun-Ae Seo, In-Kyeong Yoo, Soo-Hwan Jeong
  • Patent number: 6740925
    Abstract: A memory device including a single transistor having functions of RAM and ROM and methods for operating and manufacturing the same are provided. The memory device includes a single transistor formed on a substrate. The transistor may be a memory transistor having a gate with a nonvolatile memory element, or the nonvolatile memory element is provided between the transistor and the substrate.
    Type: Grant
    Filed: January 10, 2002
    Date of Patent: May 25, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-kyeong Yoo, Byong-man Kim
  • Patent number: 6740895
    Abstract: A method and apparatus for emission lithography using a patterned emitter wherein, in the apparatus for emission lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a mask and it is then heated. Upon heating, electrons are not emitted from that part of the emitter covered by the mask, but are emitted from the exposed part of the emitter not covered by the mask so that the shape of the emitter pattern is projected onto the substrate. To prevent dispersion of emitted electron beams, which are desired to be parallel, the electron beams are controlled using a magnet, a direct current magnetic field generator or a deflection system, thereby achieving an exact one-to-one projection or an exact x-to-one projection of the desired pattern etched on the substrate.
    Type: Grant
    Filed: May 29, 2001
    Date of Patent: May 25, 2004
    Assignees: Samsung Electronics Co., Ltd., Virginia Tech Intellectual Properties, Inc.
    Inventor: In-Kyeong Yoo
  • Publication number: 20040096617
    Abstract: An optical recording medium having a phase transition material film and a method of manufacturing the optical recording medium are provided. In the method, first, a phase transition material film, a sacrificial film, and a metal film are sequentially stacked on a substrate. Next, the metal film is anodized to form a metal oxide film having a plurality of holes, and portions of the sacrificial film exposed through the holes are anode-oxidized to form oxide films. Thereafter, the phase transition material film is patterned by removing the metal oxide film and by etching the sacrificial film and the phase transition material film using the oxide films as a mask. Then, the oxide films are removed from the sacrificial film, and an upper insulation film, a reflection film, and a protection film are deposited on the upper surface of the patterned phase transition material film.
    Type: Application
    Filed: May 20, 2003
    Publication date: May 20, 2004
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: In-Kyeong Yoo, Soo-Hwan Jeong, In-Sook Kim
  • Publication number: 20040090822
    Abstract: An MRAM having improved integration density and ability to use a magnetic tunneling junction (MTJ) layer having a low MR ratio, and methods for manufacturing and driving the same, are disclosed. The MRAM includes a semiconductor substrate having a bipolar junction transistor (BJT) formed thereon, a bit line coupled to an emitter of the BJT, an MTJ layer coupled to the BJT, a word line coupled to the MTJ layer, a plate line coupled to the BJT so as to be spaced apart from the MTJ layer, and an interlayer dielectric formed between components of the MRAM, wherein the MTJ layer is coupled to a base and a collector of the BJT, the plate line is coupled to the collector, and an amplifying unit for amplifying a signal while data is read out from the MTJ layer is coupled to the bit line, thereby allowing precise reading of the data.
    Type: Application
    Filed: November 6, 2003
    Publication date: May 13, 2004
    Inventors: In-Kyeong Yoo, Wan-Jun Park
  • Publication number: 20040084637
    Abstract: An electron projection lithography apparatus using secondary electrons includes a secondary electron emitter which is spaced apart from a substrate holder by a first predetermined interval and has a patterned mask formed on a surface thereof to face the substrate holder, a primary electron emitter which is spaced apart by a second predetermined interval from the secondary electron emitter in a direction opposite to the substrate holder and emits primary electrons to the secondary electron emitter, a second power supply which applies a second predetermined voltage between the substrate holder and the secondary electron emitter, a first power supply which applies a first predetermined voltage between the secondary electron emitter and the primary electron emitter, and a magnetic field generator which controls a path of secondary electrons emitted from the secondary electron emitter.
    Type: Application
    Filed: October 21, 2003
    Publication date: May 6, 2004
    Inventors: In-kyeong Yoo, Chang-wook Moon, Dong-wook Kim
  • Publication number: 20040065818
    Abstract: A high-density data storage medium, a method of manufacturing the data storage medium, a high-density data storage apparatus, and methods of writing data on, and reading and erasing data from the data storage medium by using the data storage apparatus are provided. The data storage medium includes a lower electrode, an insulation layer deposited on the lower electrode, a photoelectron emission layer deposited on the insulation layer and having a plurality of protrusions from which photoelectrons are emitted due to collisions between the protrusions and photons, and a dielectric layer deposited on the photoelectron emission layer and storing the photoelectrons emitted from the photoelectron emission layer.
    Type: Application
    Filed: July 2, 2003
    Publication date: April 8, 2004
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Seung-Bum Hong, In-Kyeong Yoo, Ju-Hwan Jung
  • Patent number: 6687210
    Abstract: A high-density information storage apparatus using electron emission and methods of writing, reading and erasing information using the same are provided. The high-density information storage apparatus includes a lower electrode, a photoconductive layer and a recording medium sequentially provided on the lower electrode, a conductive layer converting unit for making the photoconductive layer conductive, a data write and read unit for writing data to the recording medium or reading data from the recording medium, a data loss preventing unit for preventing loss of data during data write and read operations, and a power supply connected to the lower electrode and the data write and read unit, for supplying voltage necessary for reading and writing data.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: February 3, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: In-kyeong Yoo, Won-bong Choi, Byong-man Kim
  • Publication number: 20040007717
    Abstract: A memory device having one transistor and one resistant element as a storing means and a method for driving the memory device, includes an NPN-type transistor formed on a semiconductor substrate, an interlayer insulating film formed on the semiconductor substrate to cover the transistor in which a contact hole exposing a source region of the transistor is formed, a resistant material in which a bit data “0” or “1” is written connected to the source region of the transistor by a conductive plug or an insulating film, and a conductive plate contacting the resistant material. The memory device exhibits improved degree of integration, reduced current consumption by lengthening a refresh period thereof, and enjoys simplified manufacturing process due to a simple memory cell structure.
    Type: Application
    Filed: June 25, 2003
    Publication date: January 15, 2004
    Inventors: In-Kyeong Yoo, Sun-Ae Seo, Hyun-Jo Kim
  • Publication number: 20040007680
    Abstract: An electron beam lithography apparatus, which uses a patterned emitter, includes a pyroelectric plate emitter that emits electrons using a patterned metal thin layer formed on the pyroelectric plate as a mask. When the emitter is heated, electrons are emitted from portions of the emitter covered with a patterned dielectric layer, and not from portions of the emitter covered with a patterned metal thin layer, and a pattern of the emitter is thereby projected onto a substrate. To prevent dispersion of emitted electron beams, the electron beams may be controlled by a permanent magnet, an electro-magnet, or a deflector unit. A one-to-one or x-to-one projection of a desired pattern on the substrate is thereby obtained.
    Type: Application
    Filed: June 20, 2003
    Publication date: January 15, 2004
    Inventors: Dong-Wook Kim, In-Kyeong Yoo, Chang-Wook Moon, In-Sook Kim
  • Publication number: 20030170930
    Abstract: A fast, reliable, highly integrated memory device formed of a carbon nanotube memory device and a method for forming the same, in which the carbon nanotube memory device includes a substrate, a source electrode, a drain electrode, a carbon nanotube having high electrical and thermal conductivity, a memory cell having excellent charge storage capability, and a gate electrode. The source electrode and drain electrode are arranged with a predetermined interval between them on the substrate and are subjected to a voltage. The carbon nanotube connects the source electrode to the drain electrode and serves as a channel for charge movement. The memory cell is located over the carbon nanotube and stores charges from the carbon nanotube. The gate electrode is formed in contact with the upper surface of the memory cell and controls the amount of charge flowing from the carbon nanotube into the memory cell.
    Type: Application
    Filed: February 10, 2003
    Publication date: September 11, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Won-bong Choi, In-kyeong Yoo, Jae-uk Chu
  • Patent number: 6566666
    Abstract: A method and an apparatus for pyroelectric lithography using a patterned emitter is provided. In the apparatus for pyroelectric lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a mask and it is then heated. Upon heating, electrons are not emitted from that part of the emitter covered by the mask, but are emitted from the exposed part of the emitter not covered by the mask so that the shape of the emitter pattern is projected onto the substrate. To prevent dispersion of emitted electron beams, which are desired to be parallel, the electron beams are controlled using a magnet or a projection system, thereby achieving exact a one-to-one projection or a x-to-one projection of the desired pattern etched on the substrate.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: May 20, 2003
    Assignees: Samsung Electronics Co., Ltd., Virginia Tech Intellectual Properties
    Inventor: In-Kyeong Yoo
  • Publication number: 20030076707
    Abstract: A single transistor type magnetic random access memory device and a method of operating and manufacturing the same, wherein the single transistor type magnetic random access memory device includes a substrate, first and second doped regions spaced apart from each other, a gate dielectric layer on a portion of the semiconductor substrate between the first and second doped regions, a magnetic tunnel junction on the gate dielectric layer, word lines on the magnetic tunnel junction extending in a first direction which is the same direction as the second doped region, bit lines connected to the first doped region in a second direction perpendicular to the first direction, and an insulating layer covering the gate dielectric layer, the magnetic tunnel junction, and the word lines. The single transistor type magnetic random access memory device has a simple circuit structure, has a prolonged lifetime and is easy to manufacture.
    Type: Application
    Filed: September 24, 2002
    Publication date: April 24, 2003
    Inventors: Dong-wook Kim, In-kyeong Yoo, Jung-hyun Sok, June-key Lee
  • Publication number: 20030058749
    Abstract: A rapid data recording/reproducing method, a data recording system adopting the same, media for the system, and a tracking method, wherein the recording/reproducing method includes preparing media having a data recording layer in which a phase change is generated through electron absorption, generating electrons using an electron generating source at a position separated from the data recording layer by a predetermined interval, forming a magnetic field on the path of the electrons and cyclotron moving the electrons, recording data through local melting and cooling due to absorption of the electrons by the data recording layer. A micro-tip does not contact the data recording layer during electron collisions therewith, hence no damage is caused by or to the micro-tip. The present invention allows the region where the electron beam reaches the data recording layer to be minimized thereby maximizing the data recording density.
    Type: Application
    Filed: September 23, 2002
    Publication date: March 27, 2003
    Inventors: In-Kyeong Yoo, Won-Bong Choi, Hyun-Jung Shin
  • Publication number: 20030053399
    Abstract: A high-density information storage apparatus using electron emission and methods of writing, reading and erasing information using the same are provided. The high-density information storage apparatus includes a lower electrode, a photoconductive layer and a recording medium sequentially provided on the lower electrode, a conductive layer converting unit for making the photoconductive layer conductive, a data write and read unit for writing data to the recording medium or reading data from the recording medium, a data loss preventing unit for preventing loss of data during data write and read operations, and a power supply connected to the lower electrode and the data write and read unit, for supplying voltage necessary for reading and writing data.
    Type: Application
    Filed: March 6, 2002
    Publication date: March 20, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: In-kyeong Yoo, Won-bong Choi, Byong-man Kim
  • Publication number: 20030006381
    Abstract: A method and an apparatus for pyroelectric lithography using a patterned emitter is provided. In the apparatus for pyroelectric lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a mask and it is then heated. Upon heating, electrons are not emitted from that part of the emitter covered by the mask, but are emitted from the exposed part of the emitter not covered by the mask so that the shape of the emitter pattern is projected onto the substrate. To prevent dispersion of emitted electron beams, which are desired to be parallel, the electron beams are controlled using a magnet or a projection system, thereby achieving exact a one-to-one projection or a x-to-one projection of the desired pattern etched on the substrate.
    Type: Application
    Filed: August 29, 2002
    Publication date: January 9, 2003
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: In-Kyeong Yoo
  • Publication number: 20020182542
    Abstract: An electron emission lithography apparatus and method using a selectively grown carbon nanotube as an electron emission source, wherein the electron emission lithography apparatus includes an electron emission source installed within a chamber and a stage, which is separated from the electron emission source by a predetermined distance and on which a sample is mounted, and wherein the electron emission source is a carbon nanotube having electron emission power. Since a carbon nanotube is used as an electron emission source, a lithography process can be performed with a precise critical dimension that prevents a deviation from occurring between the center of a substrate and the edge thereof and may realize a high throughput.
    Type: Application
    Filed: June 4, 2002
    Publication date: December 5, 2002
    Inventors: Won-Bong Choi, In-Kyeong Yoo
  • Patent number: 6479924
    Abstract: A ferroelectric emitter is described. The ferroelectric emitter of the present invention includes a ferroelectric layer having a first side, an opposing second side, and a top surface, a first and a second electrode formed along the top surface of the ferroelectric layer, and a mask layer which has a predetermined pattern and is formed along the top surface of the ferroelectric layer between the first and second electrodes. When used in ferroelectric switching emission lithography, the ferroelectric emitter of the present invention allows electron emission from a wide or narrow gap of a mask layer and from an isolated pattern such as a doughnut shape while facilitating re-poling in pyroelectric electron emission.
    Type: Grant
    Filed: August 11, 2000
    Date of Patent: November 12, 2002
    Assignees: Samsung Electronics Co., Ltd., Virginia Tech Intellectual Properties, Inc.
    Inventor: In-Kyeong Yoo
  • Patent number: 6476402
    Abstract: A method and an apparatus for pyroelectric lithography using a patterned emitter is provided. In the apparatus for pyroelectric lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a mask and it is then heated. Upon heating, electrons are not emitted from that part of the emitter covered by the mask, but are emitted from the exposed part of the emitter not covered by the mask so that the shape of the emitter pattern is projected onto the substrate. To prevent dispersion of emitted electron beams, which are desired to be parallel, the electron beams are controlled using a magnet or a projection system, thereby achieving exact a one-to-one projection or a x-to-one projection of the desired pattern etched on the substrate.
    Type: Grant
    Filed: July 19, 2000
    Date of Patent: November 5, 2002
    Assignees: Samsung Electronics Co., Ltd., Virginia Tech Intellectual Properties, Inc.
    Inventor: In-Kyeong Yoo