Patents by Inventor Jacek Korec
Jacek Korec has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8547162Abstract: An output stage for a switched mode power supply has a high-side switch having a first power FET and a first speed-up FET monolithically integrated onto a first die. A low-side switch has a second power FET and a second speed-up FET monolithically integrated onto a second die. A semiconductor device has the power FET and the speed-up FET monolithically integrated in a “source-down” configuration. A method of operating an output stage of a switched mode power supply alternately turns on and off a high-side and a low-side switch and drives at least one of the switches with a speed-up FET monolithically integrated with the switch.Type: GrantFiled: December 9, 2010Date of Patent: October 1, 2013Assignee: Texas Instruments IncorporatedInventors: Jacek Korec, Christopher B. Kocon, Shuming Xu
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Patent number: 8367500Abstract: A method for providing self aligned contacts for a trench power MOSFET is disclosed. The method includes, etching trenches in a substrate through a mask of silicon nitride deposited on an oxide layer, forming a gate oxide layer on the walls of the trenches, applying polysilicon to fill the trenches and to cover the surface of the mask of silicon nitride, removing the polysilicon from the surface of the mask of silicon nitride and applying a photoresist mask to cover a location of a gate bus.Type: GrantFiled: March 3, 2003Date of Patent: February 5, 2013Assignee: Vishay-SiliconixInventors: Robert Q. Xu, Jacek Korec
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Publication number: 20130009253Abstract: A power MOSFET is formed in a semiconductor device with a parallel combination of a shunt resistor and a diode-connected MOSFET between a gate input node of the semiconductor device and a gate of the power MOSFET. A gate of the diode-connected MOSFET is connected to the gate of the power MOSFET. Source and drain nodes of the diode-connected MOSFET are connected to a source node of the power MOSFET through diodes. The drain node of the diode-connected MOSFET is connected to the gate input node of the semiconductor device. The source node of the diode-connected MOSFET is connected to the gate of the power MOSFET. The power MOSFET and the diode-connected MOSFET are integrated into the substrate of the semiconductor device so that the diode-connected MOSFET source and drain nodes are electrically isolated from the power MOSFET source node through a pn junction.Type: ApplicationFiled: July 3, 2012Publication date: January 10, 2013Applicant: TEXAS INSTRUMENTS INCORPORATEDInventors: Jun WANG, Shuming XU, Jacek KOREC
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Patent number: 8324711Abstract: A precision high-frequency capacitor includes a dielectric layer formed on the front side surface of a semiconductor substrate and a first electrode on top of the dielectric layer. The semiconductor substrate is heavily doped and therefore has a low resistivity. A second electrode, insulated from the first electrode, is also formed over the front side surface. In one embodiment, the second electrode is connected by a metal-filled via to a layer of conductive material on the back side of the substrate. In alternative embodiments, the via is omitted and the second electrode is either in electrical contact with the substrate or is formed on top of the dielectric layer, yielding a pair of series-connected capacitors. ESD protection for the capacitor can be provided by a pair of oppositely-directed diodes formed in the substrate and connected in parallel with the capacitor.Type: GrantFiled: March 30, 2011Date of Patent: December 4, 2012Assignee: Vishay Intertechnology, Inc.Inventors: Haim Goldberger, Sik Lui, Jacek Korec, Y. Mohammed Kasem, Harianto Wong, Jack Van Den Heuvel
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Publication number: 20120012982Abstract: Capacitors and methods of forming semiconductor device capacitors are disclosed. Trenches are formed to define a capacitor bottom plate in a doped upper region of a semiconductor substrate, a dielectric layer is formed conformally over the substrate within the trenches, and a polysilicon layer is formed over the dielectric layer to define a capacitor top plate. A guard ring region of opposite conductivity and peripheral recessed areas may be added to avoid electric field crowding. A central substrate of lower doping concentration may be provided to provide a resistor in series below the capacitor bottom plate. A series resistor may also be provided in a resistivity region of the polysilicon layer laterally extending from the trenched area region. Contact for the capacitor bottom plate may be made through a contact layer formed on a bottom of the substrate.Type: ApplicationFiled: July 18, 2011Publication date: January 19, 2012Applicant: TEXAS INSTRUMENTS INCORPORATEDInventors: Jacek Korec, Shuming Xu, Jun Wang, Boyi Yang
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Patent number: 8004063Abstract: A precision high-frequency capacitor includes a dielectric layer formed on the front side surface of a semiconductor substrate and a first electrode on top of the dielectric layer. The semiconductor substrate is heavily doped and therefore has a low resistivity. A second electrode, insulated from the first electrode, is also formed over the front side surface. In one embodiment, the second electrode is connected by a metal-filled via to a layer of conductive material on the back side of the substrate. In alternative embodiments, the via is omitted and the second electrode is either in electrical contact with the substrate or is formed on top of the dielectric layer, yielding a pair of series-connected capacitors. ESD protection for the capacitor can be provided by a pair of oppositely-directed diodes formed in the substrate and connected in parallel with the capacitor.Type: GrantFiled: November 16, 2006Date of Patent: August 23, 2011Assignee: Vishay Intertechnology, Inc.Inventors: Haim Goldberger, Sik Lui, Jacek Korec, Y. Mohammed Kasem, Harianto Wong, Jack Van Den Heuvel
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Publication number: 20110198927Abstract: A semiconductor device includes a semiconductor substrate, a first p-channel laterally diffused metal oxide semiconductor (LDMOS) transistor formed over the semiconductor substrate and additional p-channel LDMOS transistors formed over the semiconductor substrate. First drain and gate electrodes are formed over the substrate and are coupled to the first LDMOS transistor. Additional drain and gate electrodes are formed over the substrate and are coupled to the second LDMOS transistor. A common source electrode for the first and second LDMOS transistors is also formed over the substrate.Type: ApplicationFiled: April 26, 2011Publication date: August 18, 2011Applicant: Texas Instruments Lehigh Valley IncorporatedInventors: Jacek Korec, Stephen L. Colino
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Publication number: 20110176247Abstract: A precision high-frequency capacitor includes a dielectric layer formed on the front side surface of a semiconductor substrate and a first electrode on top of the dielectric layer. The semiconductor substrate is heavily doped and therefore has a low resistivity. A second electrode, insulated from the first electrode, is also formed over the front side surface. In one embodiment, the second electrode is connected by a metal-filled via to a layer of conductive material on the back side of the substrate. In alternative embodiments, the via is omitted and the second electrode is either in electrical contact with the substrate or is formed on top of the dielectric layer, yielding a pair of series-connected capacitors. ESD protection for the capacitor can be provided by a pair of oppositely-directed diodes formed in the substrate and connected in parallel with the capacitor.Type: ApplicationFiled: March 30, 2011Publication date: July 21, 2011Applicant: VISHAY INTERTECHNOLOGY, INC.Inventors: Haim Goldberger, Sik Lui, Jacek Korec, Y. Mohammed Kasem, Harianto Wong, Jack Van Den Heuvel
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Publication number: 20110148376Abstract: A MOSFET main switch transistor has a pull-down FET coupled between a drain thereof and the gate of the main switch transistor. A gate of the pull-down FET is coupled to the drain of the main switch transistor by a capacitor and is connected to a source thereof by a resistor. The pull-down FET is operated by capacitive coupling to the voltage drop across the main switch and can be used to hold the gate of the main switch transistor at or near its source potential to avoid or reduce unintentional turn-on of the main switch transistor by the Miller effect.Type: ApplicationFiled: December 9, 2010Publication date: June 23, 2011Applicant: Texas Instruments IncorporatedInventors: Shuming Xu, Jacek Korec, Osvaldo J. Lopez
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Publication number: 20110148506Abstract: An output stage for a switched mode power supply has a high-side switch having a first power FET and a first speed-up FET monolithically integrated onto a first die. A low-side switch has a second power FET and a second speed-up FET monolithically integrated onto a second die. A semiconductor device has the power FET and the speed-up FET monolithically integrated in a “source-down” configuration. A method of operating an output stage of a switched mode power supply alternately turns on and off a high-side and a low-side switch and drives at least one of the switches with a speed-up FET monolithically integrated with the switch.Type: ApplicationFiled: December 9, 2010Publication date: June 23, 2011Applicant: Texas Instruments IncorporatedInventors: Jacek Korec, Christopher B. Kocon, Shuming Xu
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Patent number: 7952145Abstract: A semiconductor device includes a semiconductor substrate, a first p-channel laterally diffused metal oxide semiconductor (LDMOS) transistor formed over the semiconductor substrate and additional p-channel LDMOS transistors formed over the semiconductor substrate. First drain and gate electrodes are formed over the substrate and are coupled to the first LDMOS transistor. Additional drain and gate electrodes are formed over the substrate and are coupled to the second LDMOS transistor. A common source electrode for the first and second LDMOS transistors is also formed over the substrate.Type: GrantFiled: February 20, 2007Date of Patent: May 31, 2011Assignee: Texas Instruments Lehigh Valley IncorporatedInventors: Jacek Korec, Stephen L. Colino
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Publication number: 20110042742Abstract: In a trench-gated MIS device contact is made to the gate within the trench, thereby eliminating the need to have the gate material, typically polysilicon, extend outside of the trench. This avoids the problem of stress at the upper corners of the trench. Contact between the gate metal and the polysilicon is normally made in a gate metal region that is outside the active region of the device. Various configurations for making the contact between the gate metal and the polysilicon are described, including embodiments wherein the trench is widened in the area of contact. Since the polysilicon is etched back below the top surface of the silicon throughout the device, there is normally no need for a polysilicon mask, thereby saving fabrication costs.Type: ApplicationFiled: November 1, 2010Publication date: February 24, 2011Applicant: VISHAY-SILICONIXInventors: Anup Bhalla, Dorman Pitzer, Jacek Korec, Xiaorong Shi, Sik Lui
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Patent number: 7868381Abstract: In a trench-gated MIS device contact is made to the gate within the trench, thereby eliminating the need to have the gate material, typically polysilicon, extend outside of the trench. This avoids the problem of stress at the upper corners of the trench. Contact between the gate metal and the polysilicon is normally made in a gate metal region that is outside the active region of the device. Various configurations for making the contact between the gate metal and the polysilicon are described, including embodiments wherein the trench is widened in the area of contact. Since the polysilicon is etched back below the top surface of the silicon throughout the device, there is normally no need for a polysilicon mask, thereby saving fabrication costs.Type: GrantFiled: November 5, 2007Date of Patent: January 11, 2011Assignee: Vishay-SiliconixInventors: Anup Bhalla, Domon Pitzer, Jacek Korec, Xiaorong Shi, Sik Lui
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Publication number: 20100295152Abstract: A precision high-frequency capacitor includes a dielectric layer formed on the front side surface of a semiconductor substrate and a first electrode on top of the dielectric layer. The semiconductor substrate is heavily doped and therefore has a low resistivity. A second electrode, insulated from the first electrode, is also formed over the front side surface. In one embodiment, the second electrode is connected by a metal-filled via to a layer of conductive material on the back side of the substrate. In alternative embodiments, the via is omitted and the second electrode is either in electrical contact with the substrate or is formed on top of the dielectric layer, yielding a pair of series-connected capacitors. ESD protection for the capacitor can be provided by a pair of oppositely-directed diodes formed in the substrate and connected in parallel with the capacitor.Type: ApplicationFiled: November 16, 2006Publication date: November 25, 2010Inventors: Haim Goldberger, Sik Lui, Jacek Korec, Y. Mohammed Kasem, Harianto Wong, Jack Van Den Heuvel
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Publication number: 20100171543Abstract: A packaged switching device for power applications includes at least one pair of power MOSFET transistor dies connected between upper and lower power source rail leads, a high side one of the pair of MOSFET transistor dies being connected to the upper power source rail lead and a low side one of the pair of MOSFET transistor dies being connected to the lower power source rail lead. At least one of the MOSFET transistor dies is configured for vertical current flow therethrough and has a source electrode at a backside thereof.Type: ApplicationFiled: January 8, 2009Publication date: July 8, 2010Applicant: Ciclon Semiconductor Device Corp.Inventors: Jacek Korec, Christopher F. Bull, Juan Alejandro Herbsommer, David Jauregui, Christopher B. Kocon
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Patent number: 7745846Abstract: A semiconductor device includes a substrate having a first conductivity type and a semiconductor layer formed over the substrate and having lower and upper surfaces. A laterally diffused metal-oxide-semiconductor (LDMOS) transistor device is formed over the substrate and includes a source region of the first conductivity type and a drain extension region of the first conductivity type formed in the semiconductor layer proximate the upper surface of the semiconductor layer, and a drain contact electrically connecting the drain extension region to the substrate. A Schottky diode is formed over the substrate and includes at least one doped region of the first conductivity type formed in the semiconductor layer proximate to the upper surface, an anode contact forming a Schottky barrier with the at least one doped region, and a cathode contact laterally spaced from the anode contact and electrically connecting at least one doped region to the substrate.Type: GrantFiled: January 15, 2008Date of Patent: June 29, 2010Assignee: Ciclon Semiconductor Device Corp.Inventors: Jacek Korec, Shuming Xu, Christopher Boguslaw Kocon
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Patent number: 7642164Abstract: A method for providing self aligned contacts for a trench power MOSFET is disclosed. The method includes, etching trenches in a substrate through a mask of silicon nitride deposited on an oxide layer, forming a gate oxide layer on the walls of the trenches, applying polysilicon to fill the trenches and to cover the surface of the mask of silicon nitride, removing the polysilicon from the surface of the mask of silicon nitride and applying a photoresist mask to cover a location of a gate bus.Type: GrantFiled: September 27, 2004Date of Patent: January 5, 2010Assignee: Vishay-SiliconixInventors: Robert Q. Xu, Jacek Korec
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Patent number: 7589378Abstract: A laterally diffused metal-oxide-semiconductor transistor device includes a substrate having a first conductivity type with a semiconductor layer formed over the substrate. A source region and a drain extension region of the first conductivity type are formed in the semiconductor layer. A body region of a second conductivity type is formed in the semiconductor layer. A conductive gate is formed over a gate dielectric layer that is formed over a channel region. A drain contact electrically connects the drain extension region to the substrate and is laterally spaced from the channel region. The drain contact includes a highly-doped drain contact region formed between the substrate and the drain extension region in the semiconductor layer, wherein a topmost portion of the highly-doped drain contact region is spaced from the upper surface of the semiconductor layer. A source contact electrically connects the source region to the body region.Type: GrantFiled: February 20, 2007Date of Patent: September 15, 2009Assignee: Texas Instruments Lehigh Valley IncorporatedInventors: Christopher Boguslaw Kocon, Shuming Xu, Jacek Korec
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Publication number: 20090179264Abstract: A semiconductor device includes a substrate having a first conductivity type and a semiconductor layer formed over the substrate and having lower and upper surfaces. A laterally diffused metal-oxide-semiconductor (LDMOS) transistor device is formed over the substrate and includes a source region of the first conductivity type and a drain extension region of the first conductivity type formed in the semiconductor layer proximate the upper surface of the semiconductor layer, and a drain contact electrically connecting the drain extension region to the substrate. A Schottky diode is formed over the substrate and includes at least one doped region of the first conductivity type formed in the semiconductor layer proximate to the upper surface, an anode contact forming a Schottky barrier with the at least one doped region, and a cathode contact laterally spaced from the anode contact and electrically connecting at least one doped region to the substrate.Type: ApplicationFiled: January 15, 2008Publication date: July 16, 2009Applicant: CICLON SEMICONDUCTOR DEVICE CORP.Inventors: Jacek Korec, Shuming Xu, Christopher Boguslaw Kocon
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Patent number: 7560808Abstract: A semiconductor device includes at least one macro-cell device, the macro-cell device comprising a plurality of LDMOS devices. A first conductive layer is formed over the substrate, the first conductive layer providing source and drain contacts for the macro-cell device. A first isolation layer is formed over the first conductive layer and a second conductive layer is formed over the first isolation layer, the second conductive layer forming a drain bus and a source bus, wherein the buses are electrically coupled to the contacts through the first isolation layer. A second isolation layer is formed over the second conductive layer and insulates the source bus from the drain bus. A plurality of conductive bumps are formed over the second isolation layer, at least one of the conductive bumps directly contacting the drain bus and at least one of the conductive bumps directly contacting the source bus through the second isolation layer.Type: GrantFiled: October 19, 2005Date of Patent: July 14, 2009Assignee: Texas Instruments IncorporatedInventors: Jacek Korec, Shuming Xu, Wenhua Dai