Abstract: A specially configured intermediate structure used in a stage of selective anodization during the manufacture of a circuit. The specially configured intermediate structure includes: a metal line having at least two edges; and a photoresist mask applied over a portion of the metal line that is to remain unanodized. A configuration of each of the edges of the metal line is such that the length of each edge under the mask is greater than the length of the mask. The extra length of the specially configured edge prevents a problem in later stages of the circuit manufacture due to unwanted, and practically unpreventable, seepage of the anodic oxidation chemical under the mask, along the edge, by the anodic oxidation chemical.

Abstract: A liquid crystal display device includes a first signal line formed on a substrate in one direction, a second signal line insulated from and crossing over the first signal line, and a plurality of parts projecting from the first signal line at the crossover portion, whereby the liquid crystal display device can effectively prevent the severance of the first signal line due to seepage of etchant, stress due to metal defects, and stress due to thermal expansion and thermal contraction.