Patents by Inventor Jan Bernard Plechelmus Van Schoot
Jan Bernard Plechelmus Van Schoot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9411238Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.Type: GrantFiled: January 10, 2013Date of Patent: August 9, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
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Patent number: 9372413Abstract: In an EUV (extreme ultraviolet) lithography apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. A field facet mirror within mirror focuses EUV radiation onto a particular associated pupil facet mirror, from where it is directed to a target area. Each field facet mirror is modified to scatter unwanted DUV (deep ultraviolet) radiation into a range of directions. The majority of DUV falls onto neighboring pupil facet mirrors within the pupil mirrors, so that the amount of DUV radiation reaching target E is suppressed in comparison to the wanted EUV radiation. Because the distance between mirrors is much greater than the width of an individual pupil facet mirror, good DUV suppression can be achieved with only a narrow scattering angle. Absorption of EUV radiation in the scattering layer can be minimized.Type: GrantFiled: March 29, 2012Date of Patent: June 21, 2016Assignee: ASML Netherlands B.V.Inventors: Gosse Charles De Vries, Jan Bernard Plechelmus Van Schoot, Franciscus Johannes Joseph Janssen, Nicolaas Aldegonda Jan Maria Van Aerle
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Patent number: 9366967Abstract: A radiation source (60) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets (62) along a trajectory (64) towards a plasma formation location (66). The radiation source is configured to receive a first amount of radiation (68) such that the first amount of radiation is incident on a fuel droplet (62a) at the plasma formation location, and such that the first amount of radiation transfers energy into the fuel droplet to generate a modified fuel distribution (70), the modified fuel distribution having a surface.Type: GrantFiled: August 1, 2012Date of Patent: June 14, 2016Assignee: ASML Netherlands B.V.Inventors: Andrei Mikhailovich Yakunin, Vladimir Vitalevich Ivanov, Vladimir Mihailovitch Krivtsun, Viacheslav Medvedev, Gerardus Hubertus Petrus Maria Swinkels, Jan Bernard Plechelmus Van Schoot
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Patent number: 9363879Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.Type: GrantFiled: November 4, 2014Date of Patent: June 7, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van de Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Patent number: 9329503Abstract: There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.Type: GrantFiled: April 6, 2011Date of Patent: May 3, 2016Assignee: ASML Netherlands B.V.Inventors: Vadim Iourievich Timoshkov, Jan Bernard Plechelmus van Schoot, Antonius Theodorus Wilhelmus Kempen, Andrei Mikhailovich Yakunin, Edgar Alberto Osorio Oliveros
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Patent number: 9285685Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: GrantFiled: April 24, 2014Date of Patent: March 15, 2016Assignees: ASML NETHERLANDS B.V., CARL ZEISS SMT GmbHInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Gräupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Publication number: 20150334813Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.Type: ApplicationFiled: November 26, 2013Publication date: November 19, 2015Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus VAN SCHOOT, Markus Franciscus Antoniu EURLINGS, Hermanus Johannes Maria KREUWEL
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Patent number: 9170500Abstract: In a lithographic apparatus, an illumination mode is set using a field mirror comprising a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. In the event that a field facet mirror is defective and cannot be set to a desired position, another of the movable facet mirrors is set to a corrective position, different than its desired position, to at least partially ameliorate a deleterious effect of the defective facet mirror.Type: GrantFiled: September 8, 2010Date of Patent: October 27, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Koen Van Ingen Schenau, Gosse Charles De Vries
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Patent number: 9164401Abstract: A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy.Type: GrantFiled: July 17, 2009Date of Patent: October 20, 2015Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Wilhelmus Petrus De Boeij, Hans Butler, Robertus Johannes Marinus De Jongh, Jan Bernard Plechelmus Van Schoot, Timotheus Franciscus Sengers, Maurice Willem Jozef Etiënne Wijckmans, Franciscus Johannes Joseph Janssen
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Publication number: 20150296602Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.Type: ApplicationFiled: October 10, 2013Publication date: October 15, 2015Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Andrey Nikipelov, Edgar Alberto Osorio Oliveros, Alexander Matthijs Struycken, Bert Pieter Van Drieënhuizen, Jan Bernard Plechelmus Van Schoot
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Publication number: 20150277233Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.Type: ApplicationFiled: September 17, 2013Publication date: October 1, 2015Inventors: Jan Bernard Plechelmus Van Schoot, Sven Antoin Johan Hol, Edwin Johan Buis, Erik Maria Rekkers, Gosse Charles De Vries, Hako Botma, Marinus Johannes Maria Van Dam, Ramon Pascal Van Gorkom
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Patent number: 9134629Abstract: An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.Type: GrantFiled: February 25, 2010Date of Patent: September 15, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Koen Van Ingen Schenau, Jan Bernard Plechelmus Van Schoot, Christian Wagner, Gosse Charles De Vries
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Publication number: 20150253679Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between centre points of the first and second patterned areas corresponds with a dimension of a conventional exposure.Type: ApplicationFiled: September 17, 2013Publication date: September 10, 2015Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Timotheus Franciscus Sengers, Christiaan Louis Valentin, Antonius Johannes Josephus Van Dijsseldonk
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Patent number: 9097982Abstract: A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.Type: GrantFiled: May 5, 2009Date of Patent: August 4, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Vadim Yevgenyevich Banine, Wilhelmus Petrus De Boeij, Antonius Johannes Josephus Van Dijsseldonk, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels
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Patent number: 9052605Abstract: In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.Type: GrantFiled: November 19, 2010Date of Patent: June 9, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Koen Van Ingen Schenau, Jan Bernard Plechelmus Van Schoot, Gosse Charles De Vries
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Publication number: 20150146182Abstract: A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.Type: ApplicationFiled: April 29, 2013Publication date: May 28, 2015Inventors: Jan Bernard Plechelmus Van Schoot, Antonius Theodorus Wilhelmus Kempen, Hermanus Kreuwel, Andrei Mikhailovich Yakunin
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Publication number: 20150077729Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.Type: ApplicationFiled: November 4, 2014Publication date: March 19, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf VAN EMPEL, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Erik Roelof LOOPSTRA, Johannes Hubertus Josephina MOORS, Jan Bernard Plechelmus VAN SCHOOT, Yuri Johannes Gabriël VAN DE VIJVER, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
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Publication number: 20140375974Abstract: A source-collector device is constructed and arranged to generate a radiation beam, The device includes a target unit constructed and arranged to present a target surface of plasma-forming material; a laser unit constructed and arranged to generate a beam of radiation directed onto the target surface so as to form a plasma from said plasma-forming material; a contaminant trap constructed and arranged to reduce propagation of particulate contaminants generated by the plasma; a radiation collector comprising a plurality of grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom; and a filter constructed and arranged to attenuate at least one wavelength range of the beam.Type: ApplicationFiled: January 10, 2013Publication date: December 25, 2014Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
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Publication number: 20140368802Abstract: A radiation source (60) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets (62) along a trajectory (64) towards a plasma formation location (66). The radiation source is configured to receive a first amount of radiation (68) such that the first amount of radiation is incident on a fuel droplet (62a) at the plasma formation location, and such that the first amount of radiation transfers energy into the fuel droplet to generate a modified fuel distribution (70), the modified fuel distribution having a surface.Type: ApplicationFiled: August 1, 2012Publication date: December 18, 2014Applicant: ASML Netherlands B.V.Inventors: Andrei Mikhailovich Yakunin, Vladimir Vitalevich Ivanov, Vladimir Mihailovitch Krivtsun, Viacheslav Medvedev, Gerardus, Hubertus, Petrus, Maria Swinkels, Jan, Bernard, Plechelmus Van Schoot
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Patent number: 8901521Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.Type: GrantFiled: August 25, 2008Date of Patent: December 2, 2014Assignee: ASML Netherlands B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski