Patents by Inventor Jan Bernard Plechelmus Van Schoot
Jan Bernard Plechelmus Van Schoot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120229787Abstract: In a lithographic apparatus, an illumination mode is set using a field mirror comprising a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. In the event that a field facet mirror is defective and cannot be set to a desired position, another of the movable facet mirrors is set to a corrective position, different than its desired position, to at least partially ameliorate a deleterious effect of the defective facet mirror.Type: ApplicationFiled: September 8, 2010Publication date: September 13, 2012Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Koen Van Ingen Schenau, Gosse Charles De Vries
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Publication number: 20120154777Abstract: An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.Type: ApplicationFiled: March 18, 2010Publication date: June 21, 2012Applicant: ASML Netherlands B.V.Inventors: Gosse Charles De Vries, Edwin Johan Buis, Marinus Johannes Maria Vandam, Jan Bernard Plechelmus Van Schoot, Fidelus Adrianus Boon, Hermanus Johannes Maria Kreuwel
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Publication number: 20120147348Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: ApplicationFiled: January 30, 2012Publication date: June 14, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Yuri Johannes Gabriel VAN DE VIJVER, Tjarko Adriaan Rudolf VAN EMPEL, Jan Bernard Plechelmus VAN SCHOOT, Gerardus Hubertus Petrus Maria SWINKELS, Hendrikus Gijsbertus SCHIMMEL, Dzmitry LABETSKI
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Publication number: 20120147346Abstract: A lithographic apparatus comprising a source that generates a beam of radiation, a support structure supporting a patterning device, a substrate table for holding a substrate, and a projection system projecting the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a vibration measurement apparatus configured to measure relative vibration between the patterning device and the substrate during exposure of the target portion. A control apparatus adjusts power of the radiation beam to compensate for the effect of the measured relative vibration on the pattern projected onto the substrate.Type: ApplicationFiled: October 24, 2011Publication date: June 14, 2012Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus VAN SCHOOT, Igor Petrus Maria Bouchoms, Antonius Johannes Josephus VAN DIJSSELDONK, Markus Franciscus Antonius Eurlings
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Publication number: 20120105818Abstract: An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes. Each reflective element is moveable to a first orientation in which it directs radiation to a location in an inner illumination location group, to a second orientation in which it directs radiation to a location in an intermediate illumination location group, and to a third orientation in which it directs radiation to a location in an outer illumination location group.Type: ApplicationFiled: June 7, 2010Publication date: May 3, 2012Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Gosse Charles De Vries
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Patent number: 8115900Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: GrantFiled: September 17, 2007Date of Patent: February 14, 2012Assignee: ASML Netherlands B.V.Inventors: Yuri Johannes Gabriël Van De Vijver, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski, Tjarko Adriaan Rudolf Van Empel
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Publication number: 20120013882Abstract: An illumination system of a lithographic apparatus includes a plurality of reflective elements arranged to receive radiation from a radiation source, the reflective elements being movable between different orientations. In the different orientations, the reflective elements direct radiation towards different locations at a reflective component in a pupil plane of the illumination system, thereby forming different illumination modes. Each reflective element is moveable between a first orientation, which directs radiation towards a first location the pupil plane, and a second orientation, which directs radiation towards a second location in the pupil plane. The first orientation and the second orientation of the reflective element are defined by end stops.Type: ApplicationFiled: February 25, 2010Publication date: January 19, 2012Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Koen Van Ingen Schenau, Jan Bernard Plechelmus Van Schoot, Christian Wagner, Gosse Charles De Vries
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Publication number: 20110223543Abstract: A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.Type: ApplicationFiled: May 5, 2009Publication date: September 15, 2011Applicant: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Wilhelmus Petrus De Boeij, Antonius Johannes Josephus Van Dijsseldonk, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels
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Publication number: 20110211181Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: ApplicationFiled: May 6, 2011Publication date: September 1, 2011Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Adrianus Fransiscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Publication number: 20110188018Abstract: A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).Type: ApplicationFiled: July 15, 2009Publication date: August 4, 2011Applicant: ASML Netherlands B.V.Inventors: Michel Fransois Hubert Klaassen, Jan Bernard Plechelmus Van Schoot, Sylvain Dutartre
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Publication number: 20110170078Abstract: A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy.Type: ApplicationFiled: July 17, 2009Publication date: July 14, 2011Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Wilhelmus Petrus De Boeij, Hans Butler, Robertus Johannes Marinus, Jan Bernard Plechelmus Van Schoot, Timotheus Franciscus Sengers, Maurice Willem Jozef Etiënne Wijckmans, Franciscus Johannes Joseph Janssen
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Patent number: 7961293Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: GrantFiled: March 17, 2008Date of Patent: June 14, 2011Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hebertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Patent number: 7889321Abstract: An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.Type: GrantFiled: April 3, 2007Date of Patent: February 15, 2011Assignee: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Hendricus Johannes Maria Meijer
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Publication number: 20100321657Abstract: A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.Type: ApplicationFiled: November 7, 2008Publication date: December 23, 2010Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus VAN SCHOOT, Diederik Jan Maas, Antonius Johannes Josephus Van Dijsseldonk, Hans Van Der Laan
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Patent number: 7816658Abstract: An extreme ultra-violet lithographic apparatus for imaging a pattern onto a substrate includes a radiation system constructed and arranged to provide a beam of an extreme ultra-violet radiation, and an absorber arranged in the beam and constructed and arranged to absorb at least a portion of the radiation beam. The absorber has a volume configured to accommodate a flow of an absorbing gas. The flow is directed in a transverse direction with respect to the beam. The absorber includes a structure having an extreme ultra-violet radiation-transmissive beam entry area and an extreme ultra-violet radiation-transmissive beam exit area. The apparatus also includes a gas inlet actuator array configured to inject the gas into the volume and a gas outlet actuator array arranged to evacuate the gas from the volume.Type: GrantFiled: June 7, 2007Date of Patent: October 19, 2010Assignee: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Johannes Hubertus Josephina Moors
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Publication number: 20100044591Abstract: A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.Type: ApplicationFiled: August 13, 2009Publication date: February 25, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels
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Publication number: 20090262328Abstract: An illumination system of a lithographic apparatus is disclosed that includes a first optical element to receive a radiation beam, the first optical element comprising first raster elements that partition the radiation beam into a plurality of radiation channels, and a second optical element to receive the plurality of radiation channels, the second optical element comprising second raster elements. For each of the radiation channels a raster element of said first raster elements is associated with a respective raster element of said second raster elements to provide a continuous beam path from said first optical element to an object plane. A filter is disposed in a path traversed by the radiation beam to create a desired spatial intensity distribution in a pupil of the illumination system, by, for example, reducing a transmittance of a selection of one or more of the radiation channels.Type: ApplicationFiled: April 20, 2009Publication date: October 22, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Jan Bernard Plechelmus VAN SCHOOT, Erik Roelof Loopstra
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Publication number: 20090090877Abstract: A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.Type: ApplicationFiled: August 25, 2008Publication date: April 9, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Tjarko Adriaan Rudolf Van Empel, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriel Van De Vijver, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Publication number: 20090073396Abstract: A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.Type: ApplicationFiled: September 17, 2007Publication date: March 19, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Yuri Johannes Gabriel Van De Vijver, Tjarko Adriaan Rudolf Van Empel, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Hendrikus Gijsbertus Schimmel, Dzmitry Labetski
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Publication number: 20090047604Abstract: A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.Type: ApplicationFiled: August 15, 2007Publication date: February 19, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Judocus Marie Dominicus Stoeldraijer, Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Diederik Jan Maas