Patents by Inventor Jason M. Schaller
Jason M. Schaller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240420919Abstract: An ion implantation system including an ion source for generating an ion beam, an end station for holding a substrate to be implanted by the ion beam, and a linear accelerator disposed between the ion source and the end station and adapted to accelerate the ion beam, the linear accelerator comprising at least one acceleration stage including a resonator coil coupled to a drift tube assembly, the drift tube assembly including a first drift tube coupled to a first end of a first insulting rod via interference fit, a second drift tube coupled to a first end of a second insulting rod via interference fit, and a mounting bracket coupled to a second end of the first insulting rod and to a second end of the second insulting rod via interference fit.Type: ApplicationFiled: June 15, 2023Publication date: December 19, 2024Applicant: Applied Materials, Inc.Inventors: Aaron P. WEBB, Krag R. SENIOR, Chris CZAJKA, Charles T. CARLSON, Jason M. SCHALLER
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Patent number: 12170220Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.Type: GrantFiled: September 8, 2022Date of Patent: December 17, 2024Assignee: Applied Materials, Inc.Inventors: Jason M. Schaller, Luke Bonecutter, Charles T. Carlson, Rajkumar Thanu, Karuppasamy Muthukamatchi, Jeff Hudgens, Benjamin Riordon
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Patent number: 12074042Abstract: Exemplary substrate processing systems may include a factory interface and a load lock coupled with the factory interface. The systems may include a transfer chamber coupled with the load lock. The transfer chamber may include a robot configured to retrieve substrates from the load lock. The systems may include a chamber system positioned adjacent and coupled with the transfer chamber. The chamber system may include a transfer region laterally accessible to the robot. The transfer region may include a plurality of substrate supports disposed about the transfer region. Each substrate support of the plurality of substrate supports may be vertically translatable. The transfer region may also include a transfer apparatus rotatable about a central axis and configured to engage substrates and transfer substrates among the plurality of substrate supports. The chamber system may also include a plurality of processing regions vertically offset and axially aligned with an associated substrate support.Type: GrantFiled: January 31, 2023Date of Patent: August 27, 2024Assignee: Applied Materials, Inc.Inventors: Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan A. Nguyen, Swaminathan T. Srinivasan, Khokan Chandra Paul
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Publication number: 20240153733Abstract: An ion implantation system including an ion source for generating an ion beam, an end station containing a platen for supporting a substrate to be implanted by the ion beam, and a load lock disposed adjacent the end station and adapted to transfer substrates between an external environment and the end station. The load lock may include a transfer chamber having a hollow interior, a first isolation door affixed to a first side of the transfer chamber and openable to the external environment, a second isolation door affixed to a second side of the transfer chamber and openable to an interior of the end station, and a volume filling cassette disposed within the hollow interior of the transfer chamber and adapted to hold at least one substrate.Type: ApplicationFiled: November 4, 2022Publication date: May 9, 2024Applicant: Applied Materials, Inc.Inventors: Michael Mason Carrell, Jason M. Schaller, Victor Flores Iracheta
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Publication number: 20240145271Abstract: A system for transferring semiconductor workpieces from a load lock to an orientation station and onto a platen is disclosed. The system comprises two load locks, a multi-workpiece orientation station, two multi-pick robots that transfer a plurality of workpieces between a respective load lock and the multi-workpiece orientation station, and two backend robots that transfer individual workpieces between the multi-workpiece orientation station and the platen.Type: ApplicationFiled: October 31, 2022Publication date: May 2, 2024Inventors: Jason M. Schaller, Michael Carrell, William T. Weaver, Charles T. Carlson
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Publication number: 20240145270Abstract: A system for transferring semiconductor workpieces from a load lock to an orientation station and on to a platen is disclosed. The system comprises two load locks, two robots, and one orientation station. Each robot is associated with a respective load lock and follows a fixed sequence. The robot returns a processed workpiece to the load lock and also removes an unprocessed workpiece. The robot then moved to the orientation station, where it removes an aligned workpiece from the orientation station and deposits the unprocessed workpiece on the orientation station. Next, the robot moves to the platen, where it removes a processed workpiece and deposits the aligned workpiece. The robot then returns to the load lock and repeats this sequence.Type: ApplicationFiled: October 31, 2022Publication date: May 2, 2024Inventors: Jason M. Schaller, Michael Carrell, William T. Weaver, Charles T. Carlson
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Patent number: 11948817Abstract: Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.Type: GrantFiled: October 13, 2022Date of Patent: April 2, 2024Assignee: Applied Materials, Inc.Inventors: Charles T. Carlson, Jason M. Schaller, Luke Bonecutter, David Blahnik
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Publication number: 20230360955Abstract: Embodiments described herein generally relate to process chambers with coaxial lift devices. In some embodiments, the device comprises both a bottom bowl lift and a pedestal lift. The bottom bowl lift supports a bottom bowl and is configured to move the bottom bowl into a position that reduces the process volume. The bottom bowl lift is co-axial with the pedestal lift and the bottom bowl lift and the pedestal lift are attached for vacuum operation. The pedestal lift includes multiple actuators to create a dynamic lift mechanism. Both systems complete a nested system such that the bottom bowl lift is adjustable and can close the bottom bowl creating a symmetric and small process volume. The pedestal lift can move independently to its process position and tilt in a desired direction without interference with the bottom bowl lift, increasing film uniformity on a processed substrate.Type: ApplicationFiled: July 21, 2023Publication date: November 9, 2023Inventors: Jason M. SCHALLER, Jeffrey Charles BLAHNIK, Amit Kumar BANSAL
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Publication number: 20230360956Abstract: Embodiments described herein generally relate to process chambers with coaxial lift devices. In some embodiments, the device comprises both a bottom bowl lift and a pedestal lift. The bottom bowl lift supports a bottom bowl and is configured to move the bottom bowl into a position that reduces the process volume. The bottom bowl lift is co-axial with the pedestal lift and the bottom bowl lift and the pedestal lift are attached for vacuum operation. The pedestal lift includes multiple actuators to create a dynamic lift mechanism. Both systems complete a nested system such that the bottom bowl lift is adjustable and can close the bottom bowl creating a symmetric and small process volume. The pedestal lift can move independently to its process position and tilt in a desired direction without interference with the bottom bowl lift, increasing film uniformity on a processed substrate.Type: ApplicationFiled: July 21, 2023Publication date: November 9, 2023Inventors: Jason M. SCHALLER, Jeffrey Charles BLAHNIK, Amit Kumar BANSAL
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Patent number: 11742235Abstract: Embodiments described herein generally relate to process chambers with coaxial lift devices. In some embodiments, the device comprises both a bottom bowl lift and a pedestal lift. The bottom bowl lift supports a bottom bowl and is configured to move the bottom bowl into a position that reduces the process volume. The bottom bowl lift is co-axial with the pedestal lift and the bottom bowl lift and the pedestal lift are attached for vacuum operation. The pedestal lift includes multiple actuators to create a dynamic lift mechanism. Both systems complete a nested system such that the bottom bowl lift is adjustable and can close the bottom bowl creating a symmetric and small process volume. The pedestal lift can move independently to its process position and tilt in a desired direction without interference with the bottom bowl lift, increasing film uniformity on a processed substrate.Type: GrantFiled: September 9, 2019Date of Patent: August 29, 2023Assignee: Applied Materials, Inc.Inventors: Jason M. Schaller, Jeffrey Charles Blahnik, Amit Kumar Bansal
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Publication number: 20230170231Abstract: Exemplary substrate processing systems may include a factory interface and a load lock coupled with the factory interface. The systems may include a transfer chamber coupled with the load lock. The transfer chamber may include a robot configured to retrieve substrates from the load lock. The systems may include a chamber system positioned adjacent and coupled with the transfer chamber. The chamber system may include a transfer region laterally accessible to the robot. The transfer region may include a plurality of substrate supports disposed about the transfer region. Each substrate support of the plurality of substrate supports may be vertically translatable. The transfer region may also include a transfer apparatus rotatable about a central axis and configured to engage substrates and transfer substrates among the plurality of substrate supports. The chamber system may also include a plurality of processing regions vertically offset and axially aligned with an associated substrate support.Type: ApplicationFiled: January 31, 2023Publication date: June 1, 2023Applicant: Applied Materials, Inc.Inventors: Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan A. Nguyen, Swaminathan T. Srinivasan, Khokan Chandra Paul
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Patent number: 11590662Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.Type: GrantFiled: September 13, 2021Date of Patent: February 28, 2023Assignee: Applied Materials, Inc.Inventors: Paul Z. Wirth, Charles T. Carlson, Jason M. Schaller
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Patent number: 11574826Abstract: Exemplary substrate processing systems may include a factory interface and a load lock coupled with the factory interface. The systems may include a transfer chamber coupled with the load lock. The transfer chamber may include a robot configured to retrieve substrates from the load lock. The systems may include a chamber system positioned adjacent and coupled with the transfer chamber. The chamber system may include a transfer region laterally accessible to the robot. The transfer region may include a plurality of substrate supports disposed about the transfer region. Each substrate support of the plurality of substrate supports may be vertically translatable. The transfer region may also include a transfer apparatus rotatable about a central axis and configured to engage substrates and transfer substrates among the plurality of substrate supports. The chamber system may also include a plurality of processing regions vertically offset and axially aligned with an associated substrate support.Type: GrantFiled: July 7, 2020Date of Patent: February 7, 2023Assignee: Applied Materials, Inc.Inventors: Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan A. Nguyen, Swaminathan T. Srinivasan, Khokan Chandra Paul
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Publication number: 20230032854Abstract: Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.Type: ApplicationFiled: October 13, 2022Publication date: February 2, 2023Applicant: Applied Materials, Inc.Inventors: Charles T. Carlson, Jason M. Schaller, Luke Bonecutter, David Blahnik
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Publication number: 20230005783Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.Type: ApplicationFiled: September 8, 2022Publication date: January 5, 2023Applicant: Applied Materials, Inc.Inventors: Jason M. Schaller, Luke Bonecutter, Charles T. Carlson, Rajkumar Thanu, Karuppasamy Muthukamatchi, Jeff Hudgens, Benjamin Riordon
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Publication number: 20220403520Abstract: Embodiments described herein relate to ground path systems providing a shorter and symmetrical path for radio frequency (RF) energy to propagate to a ground to reduce generation of the parasitic plasma. The ground path system bifurcates the processing volume of the chamber to form an inner volume that isolates an outer volume of the processing volume.Type: ApplicationFiled: August 22, 2022Publication date: December 22, 2022Inventors: Tuan Anh NGUYEN, Jason M. SCHALLER, Edward P. HAMMOND, IV, David BLAHNIK, Tejas ULAVI, Amit Kumar BANSAL, Sanjeev BALUJA, Jun MA, Juan Carlos ROCHA-ALVAREZ
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Patent number: 11499666Abstract: Embodiments described herein relate to a precision dynamic leveling mechanism for repeatedly positioning the pedestal within a process. The precision dynamic leveling mechanism includes bearing assemblies. Bearing assemblies having inner races forced against a pedestal assembly carrier and outer races forced against a guide adaptor provide nominal clearance between the inner races and outer races to allow the inner races and the outer races to slide on each other with minimal or no radial motion.Type: GrantFiled: May 1, 2019Date of Patent: November 15, 2022Assignee: Applied Materials, Inc.Inventors: Jason M. Schaller, Michael P. Rohrer, Tuan Anh Nguyen
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Patent number: 11476135Abstract: Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.Type: GrantFiled: July 7, 2020Date of Patent: October 18, 2022Assignee: Applied Materials, Inc.Inventors: Charles T. Carlson, Jason M. Schaller, Luke Bonecutter, David Blahnik
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Patent number: 11443973Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.Type: GrantFiled: July 7, 2020Date of Patent: September 13, 2022Assignee: Applied Materials, Inc.Inventors: Jason M. Schaller, Luke Bonecutter, Charles T. Carlson, Rajkumar Thanu, Karuppasamy Muthukamatchi, Jeff Hudgens, Benjamin Riordon
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Patent number: 11434569Abstract: Embodiments described herein relate to ground path systems providing a shorter and symmetrical path for radio frequency (RF) energy to propagate to a ground to reduce generation of the parasitic plasma. The ground path system bifurcates the processing volume of the chamber to form an inner volume that isolates an outer volume of the processing volume.Type: GrantFiled: May 1, 2019Date of Patent: September 6, 2022Assignee: Applied Materials, Inc.Inventors: Tuan Anh Nguyen, Jason M. Schaller, Edward P. Hammond, IV, David Blahnik, Tejas Ulavi, Amit Kumar Bansal, Sanjeev Baluja, Jun Ma, Juan Carlos Rocha