Patents by Inventor Jason M. Schaller

Jason M. Schaller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240420919
    Abstract: An ion implantation system including an ion source for generating an ion beam, an end station for holding a substrate to be implanted by the ion beam, and a linear accelerator disposed between the ion source and the end station and adapted to accelerate the ion beam, the linear accelerator comprising at least one acceleration stage including a resonator coil coupled to a drift tube assembly, the drift tube assembly including a first drift tube coupled to a first end of a first insulting rod via interference fit, a second drift tube coupled to a first end of a second insulting rod via interference fit, and a mounting bracket coupled to a second end of the first insulting rod and to a second end of the second insulting rod via interference fit.
    Type: Application
    Filed: June 15, 2023
    Publication date: December 19, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Aaron P. WEBB, Krag R. SENIOR, Chris CZAJKA, Charles T. CARLSON, Jason M. SCHALLER
  • Patent number: 12170220
    Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.
    Type: Grant
    Filed: September 8, 2022
    Date of Patent: December 17, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Jason M. Schaller, Luke Bonecutter, Charles T. Carlson, Rajkumar Thanu, Karuppasamy Muthukamatchi, Jeff Hudgens, Benjamin Riordon
  • Patent number: 12074042
    Abstract: Exemplary substrate processing systems may include a factory interface and a load lock coupled with the factory interface. The systems may include a transfer chamber coupled with the load lock. The transfer chamber may include a robot configured to retrieve substrates from the load lock. The systems may include a chamber system positioned adjacent and coupled with the transfer chamber. The chamber system may include a transfer region laterally accessible to the robot. The transfer region may include a plurality of substrate supports disposed about the transfer region. Each substrate support of the plurality of substrate supports may be vertically translatable. The transfer region may also include a transfer apparatus rotatable about a central axis and configured to engage substrates and transfer substrates among the plurality of substrate supports. The chamber system may also include a plurality of processing regions vertically offset and axially aligned with an associated substrate support.
    Type: Grant
    Filed: January 31, 2023
    Date of Patent: August 27, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan A. Nguyen, Swaminathan T. Srinivasan, Khokan Chandra Paul
  • Publication number: 20240153733
    Abstract: An ion implantation system including an ion source for generating an ion beam, an end station containing a platen for supporting a substrate to be implanted by the ion beam, and a load lock disposed adjacent the end station and adapted to transfer substrates between an external environment and the end station. The load lock may include a transfer chamber having a hollow interior, a first isolation door affixed to a first side of the transfer chamber and openable to the external environment, a second isolation door affixed to a second side of the transfer chamber and openable to an interior of the end station, and a volume filling cassette disposed within the hollow interior of the transfer chamber and adapted to hold at least one substrate.
    Type: Application
    Filed: November 4, 2022
    Publication date: May 9, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Michael Mason Carrell, Jason M. Schaller, Victor Flores Iracheta
  • Publication number: 20240145271
    Abstract: A system for transferring semiconductor workpieces from a load lock to an orientation station and onto a platen is disclosed. The system comprises two load locks, a multi-workpiece orientation station, two multi-pick robots that transfer a plurality of workpieces between a respective load lock and the multi-workpiece orientation station, and two backend robots that transfer individual workpieces between the multi-workpiece orientation station and the platen.
    Type: Application
    Filed: October 31, 2022
    Publication date: May 2, 2024
    Inventors: Jason M. Schaller, Michael Carrell, William T. Weaver, Charles T. Carlson
  • Publication number: 20240145270
    Abstract: A system for transferring semiconductor workpieces from a load lock to an orientation station and on to a platen is disclosed. The system comprises two load locks, two robots, and one orientation station. Each robot is associated with a respective load lock and follows a fixed sequence. The robot returns a processed workpiece to the load lock and also removes an unprocessed workpiece. The robot then moved to the orientation station, where it removes an aligned workpiece from the orientation station and deposits the unprocessed workpiece on the orientation station. Next, the robot moves to the platen, where it removes a processed workpiece and deposits the aligned workpiece. The robot then returns to the load lock and repeats this sequence.
    Type: Application
    Filed: October 31, 2022
    Publication date: May 2, 2024
    Inventors: Jason M. Schaller, Michael Carrell, William T. Weaver, Charles T. Carlson
  • Patent number: 11948817
    Abstract: Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.
    Type: Grant
    Filed: October 13, 2022
    Date of Patent: April 2, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Charles T. Carlson, Jason M. Schaller, Luke Bonecutter, David Blahnik
  • Publication number: 20230360955
    Abstract: Embodiments described herein generally relate to process chambers with coaxial lift devices. In some embodiments, the device comprises both a bottom bowl lift and a pedestal lift. The bottom bowl lift supports a bottom bowl and is configured to move the bottom bowl into a position that reduces the process volume. The bottom bowl lift is co-axial with the pedestal lift and the bottom bowl lift and the pedestal lift are attached for vacuum operation. The pedestal lift includes multiple actuators to create a dynamic lift mechanism. Both systems complete a nested system such that the bottom bowl lift is adjustable and can close the bottom bowl creating a symmetric and small process volume. The pedestal lift can move independently to its process position and tilt in a desired direction without interference with the bottom bowl lift, increasing film uniformity on a processed substrate.
    Type: Application
    Filed: July 21, 2023
    Publication date: November 9, 2023
    Inventors: Jason M. SCHALLER, Jeffrey Charles BLAHNIK, Amit Kumar BANSAL
  • Publication number: 20230360956
    Abstract: Embodiments described herein generally relate to process chambers with coaxial lift devices. In some embodiments, the device comprises both a bottom bowl lift and a pedestal lift. The bottom bowl lift supports a bottom bowl and is configured to move the bottom bowl into a position that reduces the process volume. The bottom bowl lift is co-axial with the pedestal lift and the bottom bowl lift and the pedestal lift are attached for vacuum operation. The pedestal lift includes multiple actuators to create a dynamic lift mechanism. Both systems complete a nested system such that the bottom bowl lift is adjustable and can close the bottom bowl creating a symmetric and small process volume. The pedestal lift can move independently to its process position and tilt in a desired direction without interference with the bottom bowl lift, increasing film uniformity on a processed substrate.
    Type: Application
    Filed: July 21, 2023
    Publication date: November 9, 2023
    Inventors: Jason M. SCHALLER, Jeffrey Charles BLAHNIK, Amit Kumar BANSAL
  • Patent number: 11742235
    Abstract: Embodiments described herein generally relate to process chambers with coaxial lift devices. In some embodiments, the device comprises both a bottom bowl lift and a pedestal lift. The bottom bowl lift supports a bottom bowl and is configured to move the bottom bowl into a position that reduces the process volume. The bottom bowl lift is co-axial with the pedestal lift and the bottom bowl lift and the pedestal lift are attached for vacuum operation. The pedestal lift includes multiple actuators to create a dynamic lift mechanism. Both systems complete a nested system such that the bottom bowl lift is adjustable and can close the bottom bowl creating a symmetric and small process volume. The pedestal lift can move independently to its process position and tilt in a desired direction without interference with the bottom bowl lift, increasing film uniformity on a processed substrate.
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: August 29, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Jason M. Schaller, Jeffrey Charles Blahnik, Amit Kumar Bansal
  • Publication number: 20230170231
    Abstract: Exemplary substrate processing systems may include a factory interface and a load lock coupled with the factory interface. The systems may include a transfer chamber coupled with the load lock. The transfer chamber may include a robot configured to retrieve substrates from the load lock. The systems may include a chamber system positioned adjacent and coupled with the transfer chamber. The chamber system may include a transfer region laterally accessible to the robot. The transfer region may include a plurality of substrate supports disposed about the transfer region. Each substrate support of the plurality of substrate supports may be vertically translatable. The transfer region may also include a transfer apparatus rotatable about a central axis and configured to engage substrates and transfer substrates among the plurality of substrate supports. The chamber system may also include a plurality of processing regions vertically offset and axially aligned with an associated substrate support.
    Type: Application
    Filed: January 31, 2023
    Publication date: June 1, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan A. Nguyen, Swaminathan T. Srinivasan, Khokan Chandra Paul
  • Patent number: 11590662
    Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.
    Type: Grant
    Filed: September 13, 2021
    Date of Patent: February 28, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Paul Z. Wirth, Charles T. Carlson, Jason M. Schaller
  • Patent number: 11574826
    Abstract: Exemplary substrate processing systems may include a factory interface and a load lock coupled with the factory interface. The systems may include a transfer chamber coupled with the load lock. The transfer chamber may include a robot configured to retrieve substrates from the load lock. The systems may include a chamber system positioned adjacent and coupled with the transfer chamber. The chamber system may include a transfer region laterally accessible to the robot. The transfer region may include a plurality of substrate supports disposed about the transfer region. Each substrate support of the plurality of substrate supports may be vertically translatable. The transfer region may also include a transfer apparatus rotatable about a central axis and configured to engage substrates and transfer substrates among the plurality of substrate supports. The chamber system may also include a plurality of processing regions vertically offset and axially aligned with an associated substrate support.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: February 7, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Jason M. Schaller, Steve Hongkham, Charles T. Carlson, Tuan A. Nguyen, Swaminathan T. Srinivasan, Khokan Chandra Paul
  • Publication number: 20230032854
    Abstract: Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.
    Type: Application
    Filed: October 13, 2022
    Publication date: February 2, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Charles T. Carlson, Jason M. Schaller, Luke Bonecutter, David Blahnik
  • Publication number: 20230005783
    Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.
    Type: Application
    Filed: September 8, 2022
    Publication date: January 5, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Jason M. Schaller, Luke Bonecutter, Charles T. Carlson, Rajkumar Thanu, Karuppasamy Muthukamatchi, Jeff Hudgens, Benjamin Riordon
  • Publication number: 20220403520
    Abstract: Embodiments described herein relate to ground path systems providing a shorter and symmetrical path for radio frequency (RF) energy to propagate to a ground to reduce generation of the parasitic plasma. The ground path system bifurcates the processing volume of the chamber to form an inner volume that isolates an outer volume of the processing volume.
    Type: Application
    Filed: August 22, 2022
    Publication date: December 22, 2022
    Inventors: Tuan Anh NGUYEN, Jason M. SCHALLER, Edward P. HAMMOND, IV, David BLAHNIK, Tejas ULAVI, Amit Kumar BANSAL, Sanjeev BALUJA, Jun MA, Juan Carlos ROCHA-ALVAREZ
  • Patent number: 11499666
    Abstract: Embodiments described herein relate to a precision dynamic leveling mechanism for repeatedly positioning the pedestal within a process. The precision dynamic leveling mechanism includes bearing assemblies. Bearing assemblies having inner races forced against a pedestal assembly carrier and outer races forced against a guide adaptor provide nominal clearance between the inner races and outer races to allow the inner races and the outer races to slide on each other with minimal or no radial motion.
    Type: Grant
    Filed: May 1, 2019
    Date of Patent: November 15, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Jason M. Schaller, Michael P. Rohrer, Tuan Anh Nguyen
  • Patent number: 11476135
    Abstract: Exemplary substrate processing systems may include a transfer region housing defining an internal volume. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft concentric with and counter-rotatable to the first shaft. The transfer apparatus may include a first end effector coupled with the first shaft. The first end effector may include a plurality of first arms. The transfer apparatus may also include a second end effector coupled with the second shaft. The second end effector may include a plurality of second arms having a number of second arms equal to the number of first arms of the first end effector.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: October 18, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Charles T. Carlson, Jason M. Schaller, Luke Bonecutter, David Blahnik
  • Patent number: 11443973
    Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: September 13, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Jason M. Schaller, Luke Bonecutter, Charles T. Carlson, Rajkumar Thanu, Karuppasamy Muthukamatchi, Jeff Hudgens, Benjamin Riordon
  • Patent number: 11434569
    Abstract: Embodiments described herein relate to ground path systems providing a shorter and symmetrical path for radio frequency (RF) energy to propagate to a ground to reduce generation of the parasitic plasma. The ground path system bifurcates the processing volume of the chamber to form an inner volume that isolates an outer volume of the processing volume.
    Type: Grant
    Filed: May 1, 2019
    Date of Patent: September 6, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Tuan Anh Nguyen, Jason M. Schaller, Edward P. Hammond, IV, David Blahnik, Tejas Ulavi, Amit Kumar Bansal, Sanjeev Baluja, Jun Ma, Juan Carlos Rocha