Abstract: A semiconductor device may include a plurality of single-photon avalanche diode (SPAD) pixels. The semiconductor device may be a backside device having a substrate at the backside, dielectric layers on the substrate, metal layers interleaved with the dielectric layers, and a through silicon via (TSV) formed in the backside through the substrate and the dielectric layers. TSV seal rings may be formed around the TSV to protect the semiconductor device from moisture and/or water ingress. The TSV seal rings may be coupled to a high-voltage cathode bond pad and be coupled to offset portions of one of the metal layers to reduce leakage and/or parasitic effects due to the voltage difference between the cathode and the substrate. The TSV seal rings may also be merged with die seal rings at the edge of the substrate.

Abstract: A method includes etching a through-substrate via (TSV) in a substrate from a backside of the substrate. The substrate has a device layer on a frontside. The method further includes depositing a conformal spacer layer on the backside of the substrate, and sidewalls and a bottom of the TSV, and etching the spacer layer to form a self-aligned mask for etching a contact opening at the bottom of TSV to a metal pad in the device layer, and etching the contact opening at the bottom of TSV to the metal pad in the device layer. The method further includes disposing a conductive material layer in the TSV and the contact opening to make a vertical interconnection from the backside of the substrate to the metal pad in the device layer.

Abstract: Implementations of semiconductor packages may include: a digital signal processor having a first side and a second side and an image sensor array, having a first side and a second side. The first side of the image sensor array may be coupled to the second side of the digital signal processor through a plurality of hybrid bond interconnect (HBI) bond pads and an edge seal. One or more openings may extend from the second side of the image sensor array into the second side of the digital signal processor to an etch stop layer in the second side of the digital signal processor. The one or more openings may form a second edge seal between the plurality of HBI bond pads and the edge of the digital signal processor.

Abstract: Implementations of a semiconductor device may include a first semiconductor die hybrid bonded to a second semiconductor die; a bond pad included in the second semiconductor die; a through-silicon-via (TSV) extending entirely through the first semiconductor die and to the bond pad included in the second semiconductor die; and a trench formed entirely through the first semiconductor die and to the bond pad included in the second semiconductor die. The trench may form an edge seal.

Abstract: Implementations of image sensor devices may include a through-silicon-via (TSV) formed in a backside of an image sensor device and extending through a material of a die to a metal landing pad. The metal landing pad may be within a contact layer. The devices may include a TSV edge seal ring surrounding a portion of the TSV in the contact layer and extending from a first surface of the contact layer into the contact layer to a depth coextensive with a depth of the TSV.

Abstract: An integrated circuit die includes a silicon chromium (SiCr) thin film resistor disposed on a first oxide layer. The SiCr thin film resistor has a resistor body and a resistor head. A second oxide layer overlays the SiCr thin film resistor. The second oxide layer has an opening exposing a surface of the resistor head. A metal pad is disposed in the opening in the second oxide layer and is contact with the surface of the resistor head exposed by the opening. Further, an interlevel dielectric layer is disposed on the second oxide layer overlaying the SiCr thin film resistor. A metal-filled via extends from a top surface of interlevel dielectric layer through the interlevel dielectric layer and contacts the metal pad disposed in the opening in the second oxide layer.

Abstract: Implementations of image sensor devices may include a through-silicon-via (TSV) formed in a backside of an image sensor device and extending through a material of a die to a metal landing pad. The metal landing pad may be within a contact layer. The devices may include a TSV edge seal ring surrounding a portion of the TSV in the contact layer and extending from a first surface of the contact layer into the contact layer to a depth coextensive with a depth of the TSV.

Abstract: Implementations of semiconductor packages may include: a digital signal processor having a first side and a second side and an image sensor array, having a first side and a second side. The first side of the image sensor array may be coupled to the second side of the digital signal processor through a plurality of hybrid bond interconnect (HBI) bond pads and an edge seal. One or more openings may extend from the second side of the image sensor array into the second side of the digital signal processor to an etch stop layer in the second side of the digital signal processor. The one or more openings may form a second edge seal between the plurality of HBI bond pads and the edge of the digital signal processor.

Abstract: Implementations of semiconductor packages may include: a digital signal processor having a first side and a second side and an image sensor array, having a first side and a second side. The first side of the image sensor array may be coupled to the second side of the digital signal processor through a plurality of hybrid bond interconnect (HBI) bond pads and an edge seal. One or more openings may extend from the second side of the image sensor array into the second side of the digital signal processor to an etch stop layer in the second side of the digital signal processor. The one or more openings may form a second edge seal between the plurality of HBI bond pads and the edge of the digital signal processor.

Abstract: An imaging device may include single-photon avalanche diodes (SPADs). To mitigate crosstalk, isolation structures may be formed around each SPAD. The isolation structures may include front side deep trench isolation structures that extend partially or fully through a semiconductor substrate for the SPADs. The isolation structures may include a metal filler such as tungsten that absorbs photons. The isolation structures may include a p-type doped semiconductor liner to mitigate dark current. The isolation structures may include a buffer layer such as silicon dioxide that is interposed between the metal filler and the p-type doped semiconductor liner. The isolation structures may have a tapered portion or may be formed in two steps such that the isolation structures have different portions with different properties. An additional filler such as polysilicon or borophosphosilicate glass may be included in some of the isolation structures in addition to the metal filler.

Abstract: An integrated circuit die includes a silicon chromium (SiCr) thin film resistor disposed on a first oxide layer. The SiCr thin film resistor has a resistor body and a resistor head. A second oxide layer overlays the SiCr thin film resistor. The second oxide layer has an opening exposing a surface of the resistor head. A metal pad is disposed in the opening in the second oxide layer and is contact with the surface of the resistor head exposed by the opening. Further, an interlevel dielectric layer is disposed on the second oxide layer overlaying the SiCr thin film resistor. A metal-filled via extends from a top surface of interlevel dielectric layer through the interlevel dielectric layer and contacts the metal pad disposed in the opening in the second oxide layer.

Abstract: In a general aspect, a transistor can include a fin having a proximal end and a distal end. The fin can include a dielectric portion longitudinally extending between the proximal end and the distal end, and a semiconductor layer disposed on the dielectric portion. The semiconductor layer can longitudinally extend between the proximal end and the distal end. The transistor can further include a source region disposed at the proximal end of the fin, and a drain region disposed at the distal end of the fin. The transistor can also include a gate dielectric layer disposed on a channel region of the semiconductor layer. The channel region can be disposed between the gate dielectric layer and the dielectric portion. The channel region can be longitudinally disposed between the source region and the drain region. The transistor can further include a conductive gate electrode disposed on the gate dielectric layer.

Abstract: Implementations of methods of forming capacitors may include depositing a first metal layer over a substrate, forming a photoresist layer over the first metal layer, patterning the photoresist layer, patterning the first metal layer using the pattern of the photoresist layer, depositing a dielectric layer over the first metal layer, and depositing a second metal layer over the dielectric layer to form a metal-insulator-metal capacitor.

Abstract: A stacked assembly of semiconductor devices includes a mounting pad covering a first portion of a low-side semiconductor device, and a contact layer covering a second portion of the low-side semiconductor device. A first mounting clip electrically connected to the contact layer has a supporting portion joining the first mounting clip to a first lead frame portion. A second mounting clip attached to the mounting pad has a supporting portion joining the second mounting clip to a second lead frame portion. A high-side semiconductor device has a first terminal electrically connected to the first mounting clip and thereby to the contact layer, and a second terminal electrically connected to the second mounting clip.

Abstract: An event-recording circuit for recording electrical events experienced by an internal circuit in a semiconductor device is disclosed. The event-recording circuit is coupled to the internal circuit via a spark gap circuit. The spark gap circuit includes one or more encapsulated air-gap structures that are fabricated using a process flow that matches, or is adapted from, a process flow used in fabricating the semiconductor device. The event-recording circuit further includes a recording device that has an electrical property that is changed by a signal passed by the spark gap circuit, such as an ESD or EOS signal. Accordingly, a test may be performed to determine the presence, and in some cases the extent, of the change to the electrical property in a failure analysis of the semiconductor device.

Abstract: A method includes etching a through-substrate via (TSV) in a substrate from a backside of the substrate. The substrate has a device layer on a frontside. The method further includes depositing a conformal spacer layer on the backside of the substrate, and sidewalls and a bottom of the TSV, and etching the spacer layer to form a self-aligned mask for etching a contact opening at the bottom of TSV to a metal pad in the device layer, and etching the contact opening at the bottom of TSV to the metal pad in the device layer. The method further includes disposing a conductive material layer in the TSV and the contact opening to make a vertical interconnection from the backside of the substrate to the metal pad in the device layer.

Abstract: A stacked assembly of semiconductor devices includes a mounting pad covering a first portion of a low-side semiconductor device, and a contact layer covering a second portion of the low-side semiconductor device. A first mounting clip electrically connected to the contact layer has a supporting portion joining the first mounting clip to a first lead frame portion. A second mounting clip attached to the mounting pad has a supporting portion joining the second mounting clip to a second lead frame portion. A high-side semiconductor device has a first terminal electrically connected to the first mounting clip and thereby to the contact layer, and a second terminal electrically connected to the second mounting clip.

Abstract: Implementations of semiconductor packages may include a first die including a plurality of contact pads, a second die including a plurality of contact pads, a plurality of solder interconnects bonding the plurality of contact pads of the first die to the plurality of contact pads of the second die, and a plurality of magnetic particles each coated in an oxide included in each of the plurality of solder interconnects.

Abstract: Implementations of semiconductor packages may include a first die including a plurality of contact pads, a second die including a plurality of contact pads, a plurality of solder interconnects bonding the plurality of contact pads of the first die to the plurality of contact pads of the second die, and a plurality of magnetic particles each coated in an oxide included in each of the plurality of solder interconnects.

Abstract: Implementations of a semiconductor package may include: a first wafer having a first surface and a first set of blade interconnects, the first set of blade interconnects extending from the first surface. The package may include a second wafer having a first surface and a second set of blade interconnects, the second set of blade interconnects extending from the first surface and oriented substantially perpendicularly to a direction of orientation of the first set of blade interconnects. The first set of blade interconnects may be hybrid bonded to the second set of blade interconnects at a plurality of points of intersection between the first and second set of blade interconnects. The plurality of points of intersection may be located along a length of each blade interconnect of the first set of blade interconnects, and along the length of each blade interconnect of the second set of blade interconnects.