Patents by Inventor Jennifer Y. Sun

Jennifer Y. Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CERAMIC SLIT VALVE DOORS AND ASSEMBLIES
    Publication number: 20170211706
    Abstract: Slit valve doors including a door body made entirely of an Al2O3 ceramic material, and a seal coupled to the door body. Slit valve door assemblies and slit valve assemblies including the slit valve door are disclosed, as are numerous other aspects.
    Type: Application
    Filed: January 17, 2017
    Publication date: July 27, 2017
    Inventors: Ofer Amir, Michael R. Rice, Jennifer Y. Sun, Michael C. Kuchar
  • SLIT VALVE GATE COATING AND METHODS FOR CLEANING SLIT VALVE GATES
    Publication number: 20170213705
    Abstract: Slit valve gates and methods for cleaning are provided. Slit valves include: a slit valve gate configured to seal an opening of a process chamber, the slit valve gate comprising a surface that faces an processing volume of the process chamber; and a non-porous anodized coating on the surface of the slit valve gate. Methods of cleaning include: immersing the slit valve gate in a tank comprising deionized water; sonicating the slit valve gate at a first power density of about 6 W/cm2 to about 15 W/cm2 and a frequency of about 25 kHz to about 40 kHz for a first period of time; sonicating the slit valve gate at a second power density of about 30 W/cm2 to about 45 W/cm2 and a frequency of about 25 kHz to about 40 kHz for a second period of time; and removing the slit valve gate from the tank.
    Type: Application
    Filed: January 24, 2017
    Publication date: July 27, 2017
    Inventors: OFER AMIR, JENNIFER Y. SUN, MICHAEL R. RICE, MICHAEL C. KUCHAR, JOSEPH F. SOMMERS
  • ADDITIVE MANUFACTURING WITH LASER AND PLASMA
    Publication number: 20170203364
    Abstract: An additive manufacturing system includes a platen, a feed material dispenser apparatus configured to deliver a feed material over the platen, a laser configured to produce a laser beam, a controller configured to direct the laser beam to locations specified by data stored in a computer-readable medium to cause the feed material to fuse, and a plasma source configured to produce ions that are directed to substantially the same location on the platen as the laser beam.
    Type: Application
    Filed: July 16, 2015
    Publication date: July 20, 2017
    Inventors: Kartik Ramaswamy, Anantha K. Subramani, Kasiraman Krishnan, Jennifer Y. Sun, Srinivas D. Nemani, Thomas B. Brezoczky, Christopher A. Rowland, Simon Yavelberg, Swaminathan Srinivasan, Nag B. Patibandla, Ellie Y. Yieh, Hou T. Ng
  • LAYERWISE HEATING, LINEWISE HEATING, PLASMA HEATING AND MULTIPLE FEED MATERIALS IN ADDITIVE MANUFACTURING
    Publication number: 20170203363
    Abstract: An additive manufacturing system that includes a platen, a feed material delivery system configured to deliver feed material to a location on the platen specified by a computer aided design program and a heat source configured to raise a temperature of the feed material simultaneously across all of the layer or across a region that extends across a width of the platen and scans the region across a length of the platen. The heat source can be an array of heat lamps, or a plasma source.
    Type: Application
    Filed: July 8, 2015
    Publication date: July 20, 2017
    Inventors: Christopher A. Rowland, Anantha K. Subramani, Kasiraman Krishnan, Kartik Ramaswamy, Thomas B. Brezoczky, Swaminathan Srinivasan, Jennifer Y. Sun, Simon Yavelberg, Srinivas D. Nemani, Nag B. Patibandla, Hou T. Ng
  • Ion assisted deposition for rare-earth oxide based thin film coatings on process rings
    Patent number: 9711334
    Abstract: A method of manufacturing an article comprises providing a ring for an etch reactor. Ion assisted deposition (IAD) is then performed to deposit a protective layer on at least one surface of the ring, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 ?m and an average surface roughness of less than 6 micro-inches.
    Type: Grant
    Filed: September 19, 2013
    Date of Patent: July 18, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor, Ying Zhang
  • Aerosol deposition coating for semiconductor chamber components
    Patent number: 9708713
    Abstract: A method for coating a component for use in a semiconductor chamber for plasma etching includes providing the component and loading the component in a deposition chamber. A pressure in the deposition chamber is reduced to below atmospheric pressure. A coating is deposited on the component by spraying an aerosol comprising a suspension of a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle onto the component at approximately room temperature.
    Type: Grant
    Filed: May 20, 2014
    Date of Patent: July 18, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Biraja Kanungo, Tom Cho, Ying Zhang
  • ADDITIVE MANUFACTURING WITH LASER AND GAS FLOW
    Publication number: 20170182556
    Abstract: An additive manufacturing system includes a platen, a feed material dispenser apparatus configured to deliver a feed material onto the platen, a laser source configured to produce a laser beam during use of the additive manufacturing system, a controller configured to direct the laser beam to locations on the platen specified by a computer aided design program to cause the feed material to fuse, a gas source configured to supply gas, and a nozzle configured to accelerate and direct the gas to substantially the same location on the platen as the laser beam.
    Type: Application
    Filed: July 16, 2015
    Publication date: June 29, 2017
    Inventors: Kartik Ramaswamy, Anantha K. Subramani, Kasiraman Krishnan, Jennifer Y. Sun, Thomas B. Brezoczky, Christopher A. Rowland, Srinivas D. Nemani, Swaminathan Srinivasan, Simon Yavelberg, Ellie Y. Yieh, Hou T. Ng
  • Chamber components with polished internal apertures
    Patent number: 9687953
    Abstract: Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.
    Type: Grant
    Filed: June 27, 2014
    Date of Patent: June 27, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, David Koonce, Biraja Prasad Kanungo
  • ANODIZATION ARCHITECTURE FOR ELECTRO-PLATE ADHESION
    Publication number: 20170175284
    Abstract: A chamber component for a processing chamber comprises a metallic article that comprises impurities. The chamber component further comprises a first anodization layer on the metallic article, the first anodization layer having a thickness greater than about 100 nm. The first anodization layer comprises a dense barrier layer portion and a porous columnar layer portion over the dense barrier layer portion, wherein the porous columnar layer portion comprises a plurality of pores that are free from moisture. The chamber component further comprises an aluminum coating on the first anodization layer, the aluminum coating being substantially free from impurities.
    Type: Application
    Filed: March 9, 2017
    Publication date: June 22, 2017
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo
  • SHOWERHEAD HAVING A DETACHABLE GAS DISTRIBUTION PLATE
    Publication number: 20170178863
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a substrate processing chamber includes a body having a first side and an opposing second side; a gas distribution plate disposed proximate the second side of the body; and a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the body, wherein the body is electrically coupled to the gas distribution plate through the clamp.
    Type: Application
    Filed: March 3, 2017
    Publication date: June 22, 2017
    Inventors: DMITRY LUBOMIRSKY, VLADIMIR KNYAZIK, HAMID NOORBAKHSH, JASON DELLA ROSA, ZHENG JOHN YE, JENNIFER Y. SUN, SUMANTH BANDA
  • High purity metallic top coat for semiconductor manufacturing components
    Patent number: 9663870
    Abstract: A method for coating a component for use in a semiconductor chamber for plasma etching includes providing a component for use in a semiconductor manufacturing chamber, loading the component into a deposition chamber, cold spray coating a metal powder onto the component to form a coating on the component, and anodizing the coating to form an anodization layer.
    Type: Grant
    Filed: November 13, 2013
    Date of Patent: May 30, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Vahid Firouzdor
  • COPOLYMERIZED HIGH TEMPERATURE BONDING COMPONENT
    Publication number: 20170137575
    Abstract: A bonding component includes a first amount of an organofluorine polymer and a second amount of an organosilicon polymer which are chemically bound to each other and form a copolymer.
    Type: Application
    Filed: November 16, 2016
    Publication date: May 18, 2017
    Inventors: Jennifer Y. Sun, Sumanth Banda
  • ION ASSISTED DEPOSITION FOR RARE-EARTH OXIDE BASED COATINGS
    Publication number: 20170130319
    Abstract: A method of manufacturing an article comprises performing ion assisted deposition (IAD) to deposit a protective layer on at least one surface of the article, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 ?m and an average surface roughness of 10 micro-inches or less.
    Type: Application
    Filed: January 23, 2017
    Publication date: May 11, 2017
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor, Ying Zhang
  • RARE-EARTH OXIDE BASED COATINGS BASED ON ION ASSISTED DEPOSITION
    Publication number: 20170133207
    Abstract: A component for a semiconductor processing chamber includes a ceramic body having at least one surface with a first average surface roughness of approximately 8-16 micro-inches. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 ?m over the at least one surface and having a second average surface roughness of below 10 micro-inches, wherein the second average surface roughness is equal to or less than the first average surface roughness.
    Type: Application
    Filed: January 23, 2017
    Publication date: May 11, 2017
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor, Ying Zhang
  • Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
    Publication number: 20170110293
    Abstract: A bulk, sintered solid solution-comprising ceramic article useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas and provides advantageous mechanical properties. The solid solution-comprising ceramic article is formed from a combination of yttrium oxide and zirconium oxide. The bulk, sintered solid solution-comprising article is formed from zirconium oxide at a molar concentration ranging from about 96 mole % to about 94 mole %, and yttrium oxide at a molar concentration ranging from about 4 mole % to about 6 mole %.
    Type: Application
    Filed: October 20, 2015
    Publication date: April 20, 2017
    Applicant: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu, Kenneth S. Collins
  • Anodization architecture for electro-plate adhesion
    Patent number: 9624593
    Abstract: To manufacture a chamber component for a processing chamber a first anodization layer is formed on a metallic article with impurities, the first anodization layer having a thickness greater than about 100 nm, and an aluminum coating is formed on the first anodization layer, the aluminum coating being substantially free from impurities. A second anodization layer can be formed on the aluminum coating.
    Type: Grant
    Filed: August 19, 2014
    Date of Patent: April 18, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo
  • Rare-earth oxide based coating
    Patent number: 9617188
    Abstract: A solid sintered ceramic article may include Y2O3 at a concentration of approximately 40 molar % to approximately 60 molar % and Er2O3 at a concentration of approximately 400 molar % to approximately 60 molar %. An article may include a body and a plasma resistant ceramic coating on at least one surface of the body. The plasma resistant ceramic coating comprising Y2O3 at a concentration of approximately 30 molar % to approximately 60 molar %, Er2O3 at a concentration of approximately 20 molar % to approximately 60 molar %, and at least one of ZrO2, Gd2O3 or SiO2 at a concentration of over 0 molar % to approximately 30 molar %.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: April 11, 2017
    Assignee: Applied Material, Inc.
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo
  • Showerhead having a detachable gas distribution plate
    Patent number: 9610591
    Abstract: Embodiments of showerheads having a detachable gas distribution plate are provided herein. In some embodiments, a showerhead for use in a semiconductor processing chamber may include a base having a first side and a second side; a gas distribution plate disposed proximate the second side of the base; a clamp disposed about a peripheral edge of the gas distribution plate to removably couple the gas distribution plate to the base; and a thermal gasket disposed between the base and gas distribution plate.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: April 4, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Dmitry Lubomirsky, Vladimir Knyazik, Hamid Noorbakhsh, Jason Della Rosa, Zheng John Ye, Jennifer Y. Sun, Sumanth Banda
  • HIGH TEMPERATURE ELECTROSTATIC CHUCK BONDING ADHESIVE
    Publication number: 20170092525
    Abstract: Methods and apparatus for bonding an electrostatic chuck to a component of a substrate support are provided herein. In some embodiments, an adhesive for bonding components of a substrate support may include a matrix of silicon-based polymeric material having a filler dispersed therein. The silicon based polymeric material may be a polydimethylsiloxane (PDMS) structure having a molecular weight with a low molecular weight (LMW) content ? D3-D10 of less than about 500 ppm. In some embodiments, the filler may comprise between about 50 to about 70 percent by volume of the adhesive layer. In some embodiments, the filler may comprise particles of aluminum oxide (Al2O3), aluminum nitride (AlN), yttrium oxide (Y2O3), or combinations thereof. In some embodiments, the filler may comprise particles having a diameter of about 10 nanometers to about 10 microns.
    Type: Application
    Filed: December 9, 2016
    Publication date: March 30, 2017
    Inventors: JENNIFER Y. SUN, SENH THACH, III, REN-GUAN DUAN
  • Innovative top-coat approach for advanced device on-wafer particle performance
    Patent number: 9604249
    Abstract: To manufacture a coating for an article for a semiconductor processing chamber, the coating is applied to the article by a method including applying a sol-gel coating of Y2O3 over the article, and curing the sol-gel coating on the article by heating the article with the sol-gel coating and exposing the article with the sol-gel coating to plasma in a semiconductor manufacturing chamber.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: March 28, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Dmitry Lubomirsky, Vahid Fioruzdor