Patents by Inventor Jennifer Y. Sun

Jennifer Y. Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PLASMA RESISTANT SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS
    Publication number: 20190019655
    Abstract: Described herein are components of a semiconductor processing apparatus, where at least one surface of the component is resistant to a halogen-containing reactive plasma. The component includes a solid structure having a composition containing crystal grains of yttrium oxide, yttrium fluoride or yttrium oxyfluoride and at least one additional compound selected from an oxide, fluoride, or oxyfluoride of neodymium, cerium, samarium, erbium, aluminum, scandium, lanthanum, hafnium, niobium, zirconium, ytterbium, hafnium, and combinations thereof.
    Type: Application
    Filed: September 17, 2018
    Publication date: January 17, 2019
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Kenneth S. Collins
  • COATING ARCHITECTURE FOR PLASMA SPRAYED CHAMBER COMPONENTS
    Publication number: 20180366302
    Abstract: A method of plasma spraying an article comprises providing an article, feeding a liquid precursor solution into a plasma spray deposition system, and generating, with the plasma spray deposition system, a stream directed toward the article. The stream forms a ceramic coating on the article upon contact therewith. The ceramic coating comprises Y2O3 and one or more of ZrO2, Al2O3, Er2O3, Gd2O3, SiO2, or YF3.
    Type: Application
    Filed: August 22, 2018
    Publication date: December 20, 2018
    Inventors: Jennifer Y. Sun, Yikai Chen, Biraja P. Kanungo
  • Semiconductor processing apparatus with protective coating including amorphous phase
    Patent number: 10157731
    Abstract: Embodiments of the invention relate to compositions including a yttrium-based fluoride crystal phase, or a yttrium-based oxyfluoride crystal base, or an oxyfluoride amorphous phase, or a combination of those materials. The compositions may be used to form a solid substrate for use as a semiconductor processing apparatus, or the compositions may be used to form a coating which is present upon a surface of substrates having a melting point which is higher than about 1600°, substrates such as aluminum oxide, aluminum nitride, quartz, silicon carbide and silicon nitride, by way of example.
    Type: Grant
    Filed: March 19, 2015
    Date of Patent: December 18, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y Sun, Ren-Guan Duan, Kenneth S Collins
  • FLOURINATION PROCESS TO CREATE SACRIFICIAL OXY-FLOURIDE LAYER
    Publication number: 20180327898
    Abstract: An article comprises a body having a coating. The coating comprises a Y—O—F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.
    Type: Application
    Filed: April 27, 2018
    Publication date: November 15, 2018
    Inventors: Xiaowei Wu, David Fenwick, Guodong Zhan, Jennifer Y. Sun, Michael R. Rice
  • METAL OXY-FLOURIDE FILMS BASED ON OXIDATION OF METAL FLOURIDES
    Publication number: 20180327899
    Abstract: An article comprises a body having a coating. The coating comprises a Y-O-F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.
    Type: Application
    Filed: April 27, 2018
    Publication date: November 15, 2018
    Inventors: Xiaowei Wu, David Fenwick, Guodong Zhan, Jennifer Y. Sun, Michael R. Rice
  • MICROWAVE AND INDUCTION HEAT TREATMENT OF CERAMIC COATINGS
    Publication number: 20180327325
    Abstract: Methods comprise loading an article comprising a ceramic coating into an induction heating system or a microwave heating system and heat treating the ceramic coating using the microwave heating system or the induction heating system within a temperature range for a duration of about 1-15 minutes.
    Type: Application
    Filed: May 10, 2018
    Publication date: November 15, 2018
    Inventors: Kaushal Gangakhedkar, Jennifer Y. Sun
  • METAL OXY-FLOURIDE FILMS FOR CHAMBER COMPONENTS
    Publication number: 20180327892
    Abstract: An article comprises a body having a coating. The coating comprises a Y—O—F coating or other yttrium-based oxy-fluoride coating generated either by performing a fluorination process on a yttrium-based oxide coating or an oxidation process on a yttrium-based fluorine coating.
    Type: Application
    Filed: April 27, 2018
    Publication date: November 15, 2018
    Inventors: Xiaowei Wu, David Fenwick, Guodong Zhan, Jennifer Y. Sun, Michael R. Rice
  • MULTI-LAYER PLASMA EROSION PROTECTION FOR CHAMBER COMPONENTS
    Publication number: 20180330923
    Abstract: A method of applying a multi-layer plasma resistant coating on an article comprises performing plating or ALD to form a conformal first plasma resistant layer on an article, wherein the conformal first plasma resistant layer is formed on a surface of the article and on walls of high aspect ratio features in the article. The conformal first plasma resistant coating has a porosity of approximately 0% and a thickness of approximately 200 nm to approximately 1 micron. One of electron beam ion assisted deposition (EB-IAD), plasma enhanced chemical vapor deposition (PECVD), aerosol deposition or plasma spraying is then performed to form a second plasma resistant layer that covers the conformal first plasma resistant layer at a region of the surface but not at the walls of the high aspect ratio features.
    Type: Application
    Filed: April 27, 2018
    Publication date: November 15, 2018
    Inventors: Toan Tran, Laksheswar Kalita, Tae Won Kim, Dmitry Lubomirsky, Xiaowei Wu, Xiao-Ming He, Cheng-Hsuan Chou, Jennifer Y. Sun
  • Plasma erosion resistant rare-earth oxide based thin film coatings
    Patent number: 10119188
    Abstract: An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Y4Al2O9, Er2O3, Gd2O3, Er3Al5O12, Gd3Al5O12 and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.
    Type: Grant
    Filed: November 16, 2017
    Date of Patent: November 6, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor, Tom Cho
  • CHEMISTRY COMPATIBLE COATING MATERIAL FOR ADVANCED DEVICE ON-WAFER PARTICLE PERFORMANCE
    Publication number: 20180269039
    Abstract: A chamber component comprises a body and a plasma sprayed ceramic coating on the body. The plasma sprayed ceramic coating is applied using a method that includes feeding powder comprising a yttrium oxide containing solid solution into a plasma spraying system, wherein the powder comprises a majority of donut-shaped particles, each of the donut-shaped particles having a spherical body with indentations on opposite sides of the spherical body. The method further includes plasma spray coating the body to apply a ceramic coating onto the body, wherein the ceramic coating comprises the yttrium oxide containing solid solution, wherein the donut-shaped particles cause the ceramic coating to have an improved morphology and a decreased porosity as compared to powder particles of other shapes, wherein the improved surface morphology comprises a reduced amount of surface nodules.
    Type: Application
    Filed: May 17, 2018
    Publication date: September 20, 2018
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Dmitry Lubomirsky
  • SINTERED CERAMIC PROTECTIVE LAYER FORMED BY HOT PRESSING
    Publication number: 20180251406
    Abstract: Disclosed herein are methods for fabricating layered ceramic materials via hot pressing. A method includes disposing a powder compact or a ceramic slurry onto a surface of an article, wherein the article is a chamber component of a processing chamber. The powder compact or ceramic slurry is hot pressed against the surface of the article by heating the article and the powder compact or ceramic slurry and applying a pressure of 15-100 Megapascals. The hot pressing sinters the powder compact or ceramic slurry into a sintered ceramic protective layer and bonds the sintered ceramic protective layer to the surface of the article.
    Type: Application
    Filed: February 27, 2018
    Publication date: September 6, 2018
    Inventors: Jennifer Y. Sun, Guodong Zhan, David Fenwick, Michael R. Rice
  • MULTI-LAYER PLASMA RESISTANT COATING BY ATOMIC LAYER DEPOSITION
    Publication number: 20180240648
    Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The plasma resistant coating has a stress relief layer and a rare earth metal-containing oxide layer and uniformly covers features, such as those having an aspect ratio of about 3:1 to about 300:1.
    Type: Application
    Filed: January 20, 2017
    Publication date: August 23, 2018
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun, Guodong Zhan
  • PLASMA EROSION RESISTANT THIN FILM COATING FOR HIGH TEMPERATURE APPLICATION
    Publication number: 20180230587
    Abstract: An article such as a susceptor includes a body of a thermally conductive material coated by a first protective layer and a second protective layer over a surface of the body. The first protective layer is a thermally conductive ceramic. The second protective layer covers the first protective layer and is a plasma resistant ceramic thin film that is resistant to cracking at temperatures of 650 degrees Celsius.
    Type: Application
    Filed: April 16, 2018
    Publication date: August 16, 2018
    Inventors: Vahid Firouzdor, Biraja P. Kanungo, Jennifer Y. Sun, Martin J. Salinas, Jared Ahmad Lee
  • MULTIPLE SEQUENTIAL LINEAR POWDER DISPENSERS FOR ADDITIVE MANUFACTURING
    Publication number: 20180221948
    Abstract: An additive manufacturing system includes a platen to support an object to be fabricated, a dispenser assembly positioned above the platen, and an energy source configured to selectively fuse a layer of powder. The dispenser assembly includes a first dispenser, a second dispenser, and a drive system. The first dispenser delivers a first powder in a first linear region that extends along a first axis, and the second dispenser delivers a second powder in a second linear region that extends parallel to the first linear region and is offset from the first linear region along a second axis perpendicular to the first axis. The drive system a drive system moves the support with the first dispenser and second dispenser together along the second axis.
    Type: Application
    Filed: March 30, 2018
    Publication date: August 9, 2018
    Inventors: Christopher A. Rowland, Anantha K. Subramani, Kasiraman Krishnan, Kartik Ramaswamy, Thomas B. Brezoczky, Swaminathan Srinivasan, Jennifer Y. Sun, Simon Yavelberg, Srinivas D. Nemani, Nag B. Patibandla, Hou T. Ng
  • LINEAR POWDER DISPENSER THAT RASTER SCANS FOR ADDITIVE MANUFACTURING
    Publication number: 20180221949
    Abstract: An additive manufacturing system includes a platen, a dispenser configured to deliver a powder in a linear region that extends across less than all of a width of the platen, a drive system configured to move the dispenser along the first axis and a perpendicular second axis, a controller, and an energy source configured to selectively fuse a layer of powder. The controller is configured to cause the drive system to move the dispenser along the second axis a first time such that the linear region makes a first sweep along the second axis to deposit the powder in a first swath over the platen, thereafter along the first axis, and thereafter along the second axis a second time such that the first linear region makes a second sweep along the second axis to deposit the powder in a parallel second swath over the platen.
    Type: Application
    Filed: March 30, 2018
    Publication date: August 9, 2018
    Inventors: Christopher A. Rowland, Anantha K. Subramani, Kasiraman Krishnan, Kartik Ramaswamy, Thomas B. Brezoczky, Swaminathan Srinivasan, Jennifer Y. Sun, Simon Yavelberg, Srinivas D. Nemani, Nag B. Patibandla, Hou T. Ng
  • Semiconductor processing apparatus with protective coating including amorphous phase
    Publication number: 20180226232
    Abstract: Embodiments of the invention relate to compositions including a yttrium-based fluoride crystal phase, or a yttrium-based oxyfluoride crystal phase, or an oxyfluoride amorphous phase, or a combination of these materials. The compositions may be used to form a solid substrate for use as a semiconductor processing apparatus, or the compositions may be used to form a coating which is present upon a surface of substrates having a melting point which is higher than about 1600°, substrates such as aluminum oxide, aluminum nitride, quartz, silicon carbide and silicon nitride, by way of example.
    Type: Application
    Filed: March 19, 2015
    Publication date: August 9, 2018
    Applicant: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Ren-Guan Duan, Kenneth S. Collins
  • MULTI-LAYER PLASMA RESISTANT COATING BY ATOMIC LAYER DEPOSITION
    Publication number: 20180209042
    Abstract: Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The plasma resistant coating has a stress relief layer and a layer comprising a solid solution of Y2O3—ZrO2 and uniformly covers features, such as those having an aspect ratio of about 3:1 to about 300:1.
    Type: Application
    Filed: December 20, 2017
    Publication date: July 26, 2018
    Inventors: Xiaowei Wu, David Fenwick, Jennifer Y. Sun, Guodong Zhan
  • LOW TEMPERATURE FLUORIDE GLASSES AND GLAZES
    Publication number: 20180208501
    Abstract: An article comprises a body having a coating. The coating comprising a eutectic system having a super-lattice of a first fluoride and a second fluoride. The coating includes a glaze on a surface of the coating, the glaze comprising the eutectic system having the super-lattice of the first fluoride and the second fluoride.
    Type: Application
    Filed: March 23, 2018
    Publication date: July 26, 2018
    Inventors: Chengtsin Lee, Jennifer Y. Sun
  • Electrostatic chuck having reduced power loss
    Patent number: 10026636
    Abstract: Embodiments of the invention generally relate to an electrostatic chuck having reduced power loss, and methods and apparatus for reducing power loss in an electrostatic chuck, as well as methods for testing and manufacture thereof. In one embodiment, an electrostatic chuck is provided. The electrostatic chuck includes a conductive base, and a ceramic body disposed on the conductive base, the ceramic body comprising an electrode and one or more heating elements embedded therein, wherein the ceramic body comprises a dissipation factor of about 0.11 to about 0.16 and a capacitance of about 750 picoFarads to about 950 picoFarads between the electrode and the one or more heating elements.
    Type: Grant
    Filed: February 12, 2016
    Date of Patent: July 17, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Konstantin Makhratchev, Jennifer Y. Sun
  • Chemistry compatible coating material for advanced device on-wafer particle performance
    Patent number: 10020170
    Abstract: A method includes feeding powder comprising a yttrium oxide into a plasma spraying system, wherein the powder comprises a majority of donut-shaped particles, each of the donut-shaped particles having a spherical body with indentations on opposite sides of the spherical body. The method further includes plasma spray coating an article to apply a ceramic coating onto the article, wherein the ceramic coating comprises the yttrium oxide, wherein the donut-shaped particles cause the ceramic coating to have an improved morphology and a decreased porosity as compared to powder particles of other shapes, wherein the improved surface morphology comprises a reduced amount of surface nodules.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: July 10, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Dmitry Lubomirsky