Patents by Inventor Jennifer Y. Sun

Jennifer Y. Sun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Non-Line of Sight Deposition of Erbium Based Plasma Resistant Ceramic Coating
    Publication number: 20170369993
    Abstract: Described herein is a method of depositing a plasma resistant ceramic coating onto a surface of a chamber component using a non-line-of-sight (NLOS) deposition process, such as atomic layer deposition (ALD) and chemical vapor deposition (CVD). The plasma resistant ceramic coating consists of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride. Also described are chamber components having a plasma resistant ceramic coating of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride.
    Type: Application
    Filed: June 23, 2016
    Publication date: December 28, 2017
    Inventor: Jennifer Y. Sun
  • Fluoride glazes from fluorine ion treatment
    Patent number: 9850161
    Abstract: An article comprises a body having a coating. The coating comprising a mixture of a first oxide and a second oxide. The coating includes a glaze on a surface of the coating, the glaze comprising a eutectic system having a super-lattice of a first fluoride and a second fluoride.
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: December 26, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Chengtsin Lee, Jennifer Y. Sun
  • High purity aluminum top coat on substrate
    Patent number: 9850591
    Abstract: To manufacture a chamber component for a processing chamber, an aluminum coating is formed on an article comprising impurities, the aluminum coating being substantially free from impurities.
    Type: Grant
    Filed: March 3, 2014
    Date of Patent: December 26, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Sumanth Banda
  • Plasma erosion resistant rare-earth oxide based thin film coatings
    Patent number: 9850568
    Abstract: An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Y4Al2O9, Er2O3, Gd2O3, Er3Al5O12, Gd3Al5O12 and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.
    Type: Grant
    Filed: June 17, 2014
    Date of Patent: December 26, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor, Tom Cho
  • Non-line of sight deposition of erbium based plasma resistant ceramic coating
    Patent number: 9850573
    Abstract: Described herein is a method of depositing a plasma resistant ceramic coating onto a surface of a chamber component using a non-line-of-sight (NLOS) deposition process, such as atomic layer deposition (ALD) and chemical vapor deposition (CVD). The plasma resistant ceramic coating consists of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride. Also described are chamber components having a plasma resistant ceramic coating of an erbium containing oxide, an erbium containing oxy-fluoride, or an erbium containing fluoride.
    Type: Grant
    Filed: June 23, 2016
    Date of Patent: December 26, 2017
    Assignee: Applied Materials, Inc.
    Inventor: Jennifer Y. Sun
  • PROTECTIVE METAL OXY-FLUORIDE COATINGS
    Publication number: 20170323772
    Abstract: An article comprises a body having a protective coating. The protective coating is a thin film that comprises a metal oxy-fluoride. The metal oxy-fluoride has an empirical formula of MxOyFz, where M is a metal, y has a value of 0.1 to 1.9 times a value of x and z has a value of 0.1 to 3.9 times the value of x. The protective coating has a thickness of 1 to 30 microns and a porosity of less than 0.1%.
    Type: Application
    Filed: April 26, 2017
    Publication date: November 9, 2017
    Inventors: David Fenwick, Chengtsin Lee, Jennifer Y. Sun, Yikai Chen
  • Rare-earth oxide based coatings based on ion assisted deposition
    Patent number: 9812341
    Abstract: A component for a semiconductor processing chamber includes a ceramic body having at least one surface with a first average surface roughness of approximately 8-16 micro-inches. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 ?m over the at least one surface and having a second average surface roughness of below 10 micro-inches, wherein the second average surface roughness is equal to or less than the first average surface roughness.
    Type: Grant
    Filed: January 23, 2017
    Date of Patent: November 7, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor, Ying Zhang
  • ATOMIC LAYER DEPOSITION OF PROTECTIVE COATINGS FOR SEMICONDUCTOR PROCESS CHAMBER COMPONENTS
    Publication number: 20170314125
    Abstract: A multi-component coating composition for a surface of a semiconductor process chamber component comprising at least one first film layer of a yttrium oxide or a yttrium fluoride coated onto the surface of the semiconductor process chamber component using an atomic layer deposition process and at least one second film layer of an additional oxide or an additional fluoride coated onto the surface of the semiconductor process chamber component using an atomic layer deposition process, wherein the multi-component coating composition is selected from the group consisting of YOxFy, YAlxOy, YZrxOy and YZrxAlyOz.
    Type: Application
    Filed: April 24, 2017
    Publication date: November 2, 2017
    Inventors: David Fenwick, Jennifer Y. Sun
  • Ion beam sputtering with ion assisted deposition for coatings on chamber components
    Patent number: 9797037
    Abstract: An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 ?m, wherein the plasma resistant rare earth oxide has a composition of 40-45 mol % of Y2O3, 5-10 mol % of ZrO2, 35-40 mol % of Er2O3, 5-10 mol % of Gd2O3, and 5-15 mol % of SiO2.
    Type: Grant
    Filed: July 15, 2016
    Date of Patent: October 24, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, Biraja Prasad Kanungo, Tom K. Cho, Vedapuram S. Achutharaman, Ying Zhang
  • ION ASSISTED DEPOSITION FOR RARE-EARTH OXIDE BASED THIN FILM COATINGS ON PROCESS RINGS
    Publication number: 20170301522
    Abstract: A ring shaped body includes a top flat region, a ring inner side and a ring outer side. The ring inner side comprises an approximately vertical wall. A conformal protective layer is disposed on at least the top flat region, the ring inner side and the ring outer side of the ring shaped body. The protective layer has a first thickness of less than 300 ?m on the top flat region and a second thickness on the vertical wall of the ring inner side, where the second thickness is 45-70% of the first thickness.
    Type: Application
    Filed: June 30, 2017
    Publication date: October 19, 2017
    Inventors: Jennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor, Ying Zhang
  • COATING ARCHITECTURE FOR PLASMA SPRAYED CHAMBER COMPONENTS
    Publication number: 20170301520
    Abstract: A method of plasma spraying an article comprises inserting the article into a vacuum chamber for a low pressure plasma spraying system. A low pressure plasma spray process is then performed by the low pressure plasma spraying system to form a first plasma resistant layer having a thickness of 20-500 microns and a porosity of over 1%. A plasma spray thin film, plasma spray chemical vapor deposition or plasma spray physical vapor deposition process is then performed by the low pressure plasma spraying system to deposit a second plasma resistant layer on the first plasma resistant layer, the second plasma resistant layer having a thickness of less than 50 microns and a porosity of less than 1%.
    Type: Application
    Filed: June 30, 2017
    Publication date: October 19, 2017
    Inventors: Jennifer Y. Sun, Yikai Chen, Biraja P. Kanungo
  • SOLUTION PRECURSOR PLASMA SPRAY OF CERAMIC COATING FOR SEMICONDUCTOR CHAMBER APPLICATIONS
    Publication number: 20170291856
    Abstract: Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a solution comprising a metal precursor into a plasma sprayer. The plasma sprayer generates a stream toward an article, forming a ceramic coating on the article upon contact.
    Type: Application
    Filed: April 4, 2017
    Publication date: October 12, 2017
    Inventors: Jennifer Y. Sun, Yikai Chen, Chengtsin Lee
  • AEROSOL DEPOSITION COATING FOR SEMICONDUCTOR CHAMBER COMPONENTS
    Publication number: 20170287683
    Abstract: An component of a processing chamber comprises an aerosol deposited coating on the component, the aerosol deposited coating comprising a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle.
    Type: Application
    Filed: June 12, 2017
    Publication date: October 5, 2017
    Inventors: Jennifer Y. Sun, Biraja Kanungo, Tom Cho, Ying Zhang
  • CLEANING PROCESS THAT PRECIPITATES YTTRIUM OXY-FLOURIDE
    Publication number: 20170282221
    Abstract: A method includes immersing an article comprising a yttrium based oxide in an acidic cleaning solution comprising water and 1-10 mol % HF acid. A portion of the yttrium based oxide is dissolved by the HF acid. A yttrium based oxy-fluoride is formed based on a reaction between the HF acid and the dissolved portion of the yttrium based. The yttrium based oxy-fluoride is precipitated onto the article over the yttrium based oxide to form a yttrium based oxy-fluoride coating. The acidic cleaning solution may include a yttrium based salt, which may additionally react with the HF acid to form more of the yttrium based oxy-fluoride.
    Type: Application
    Filed: April 1, 2016
    Publication date: October 5, 2017
    Inventors: Chengtsin Lee, Jennifer Y. Sun, Yikai Chen
  • LOW TEMPERATURE FLUORIDE GLASSES AND GLAZES
    Publication number: 20170283312
    Abstract: An article comprises a body having a coating. The coating comprising a eutectic system having a super-lattice of a first fluoride and a second fluoride. The coating includes a glaze on a surface of the coating, the glaze comprising the eutectic system having the super-lattice of the first fluoride and the second fluoride.
    Type: Application
    Filed: January 27, 2017
    Publication date: October 5, 2017
    Inventors: Chengtsin Lee, Jennifer Y. Sun
  • FLUORIDE GLAZES FROM FLUORINE ION TREATMENT
    Publication number: 20170283313
    Abstract: An article comprises a body having a coating. The coating comprising a mixture of a first oxide and a second oxide. The coating includes a glaze on a surface of the coating, the glaze comprising a eutectic system having a super-lattice of a first fluoride and a second fluoride.
    Type: Application
    Filed: January 27, 2017
    Publication date: October 5, 2017
    Inventors: Chengtsin Lee, Jennifer Y. Sun
  • CHAMBER COMPONENTS WITH POLISHED INTERNAL APERTURES
    Publication number: 20170274493
    Abstract: Disclosed herein are systems and methods for polishing internal surfaces of apertures in semiconductor processing chamber components. A method includes providing a ceramic article having at least one aperture, the ceramic article being a component for a semiconductor processing chamber. The method further includes polishing the at least one aperture based on flowing an abrasive media through the at least one aperture of the ceramic article, the abrasive media including a polymer base and a plurality of abrasive particles.
    Type: Application
    Filed: June 9, 2017
    Publication date: September 28, 2017
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, David Koonce, Biraja Prasad Kanungo
  • PLASMA RESISTANT COATING WITH TAILORABLE COEFFICIENT OF THERMAL EXPANSION
    Publication number: 20170260616
    Abstract: An article comprises a body and at least one final plasma resistant coating layer on at least one surface of the body. The at least one final plasma resistant coating layer is a mixture of a ScF3 and an initial plasma resistant coating material selected from the group consisting of YF3, Y2O3, a compound of Y4Al2O9, a solid-solution of Y2O3—ZrO2, CaF2, MgF2, SrF2, AlF3, ErF3, LaF3, NdF3, ScF3, CeF4, ZrF4, and combinations thereof. The at least one final plasma resistant coating layer has a thermal expansion coefficient that is within about 20% of the thermal expansion coefficient of the body.
    Type: Application
    Filed: January 27, 2017
    Publication date: September 14, 2017
    Inventors: Chengtsin Lee, Jennifer Y. Sun
  • HIGH PURITY METALLIC TOP COAT FOR SEMICONDUCTOR MANUFACTURING COMPONENTS
    Publication number: 20170247795
    Abstract: A component for a manufacturing chamber comprises a cold spray coating and an anodization layer on the cold spray coating. The anodization layer has a thickness of about 2-10 mil. The anodization layer comprises a low porosity bottom layer portion having a porosity that is less than about 40-50% and a porous columnar top layer portion having a porosity of about 40-40% and comprising a plurality of columnar nanopores having a diameter of about 10-50 nm.
    Type: Application
    Filed: May 15, 2017
    Publication date: August 31, 2017
    Inventors: Jennifer Y. Sun, Vahid Firouzdor
  • Ion beam sputtering with ion assisted deposition for coatings on chamber components
    Patent number: 9725799
    Abstract: A method of manufacturing an article includes providing a component for an etch reactor. Ion beam sputtering with ion assisted deposition (IBS-IAD) is then performed to deposit a protective layer on at least one surface of the component, wherein the protective layer is a plasma resistant film having a thickness of less than 1000 ?m.
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: August 8, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Vahid Firouzdor, Biraja Prasad Kanungo, Tom K. Cho, Vedapuram S. Achutharaman, Ying Zhang