Patents by Inventor Jeong-hoon Ahn

Jeong-hoon Ahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230099844
    Abstract: Provided is a semiconductor package including a first chip substrate including a first surface and a second surface, a through via passing through the first chip substrate, an upper passivation layer including a trench on the second surface of the first chip substrate, the trench exposing at least a portion of the second surface of the first chip substrate, an upper pad electrically connected with the through via on the trench, a second chip substrate including a third surface and a fourth surface, a lower pad electrically connected to the second chip substrate on the third surface of the second chip substrate, and a connection bump electrically connecting the upper pad with the lower pad and contacting the lower pad, wherein a width of the connection bump increases as the connection bump becomes farther away from the first surface of the first chip substrate.
    Type: Application
    Filed: June 2, 2022
    Publication date: March 30, 2023
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yong Ho KIM, Woo Jin JANG, Jeong Hoon AHN, Yun Ki CHOI
  • Publication number: 20230034654
    Abstract: A semiconductor package is provided. The semiconductor package includes: a first stack including a first semiconductor substrate; a through via that penetrates the first semiconductor substrate in a first direction; a second stack that includes a second face facing a first face of the first stack, on the first stack; a first pad that is in contact with the through via, on the first face of the first stack; a second pad including a concave inner side face that defines an insertion recess, the second pad located on the second face of the second stack; and a bump that connects the first pad and the second pad, wherein the bump includes a first upper bump on the first pad, and a first lower bump between the first upper bump and the first pad.
    Type: Application
    Filed: March 23, 2022
    Publication date: February 2, 2023
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yong Ho KIM, Bo In NOH, Jeong Hoon AHN
  • Patent number: 11538747
    Abstract: Provided is an interposer structure. The interposer structure comprises an interposer substrate, an interlayer insulating film which covers a top surface of the interposer substrate, a capacitor structure in the interlayer insulating film and a wiring structure including a first wiring pattern and a second wiring pattern spaced apart from the first wiring pattern, on the interlayer insulating film, wherein the capacitor structure includes an upper electrode connected to the first wiring pattern, a lower electrode connected to the second wiring pattern, and a capacitor dielectric film between the upper electrode and the lower electrode.
    Type: Grant
    Filed: May 22, 2020
    Date of Patent: December 27, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Shaofeng Ding, Jae June Jang, Jeong Hoon Ahn, Yun Ki Choi
  • Publication number: 20220328404
    Abstract: A semiconductor device includes an integrated circuit (IC) and an interlayer dielectric layer on the substrate, a contact through the interlayer dielectric layer and electrically connected to the IC, a wiring layer on the interlayer dielectric layer with a wiring line electrically connected to the contact, a first passivation layer on the wiring layer, first and second pads on the first passivation layer, and a through electrode through the substrate, the interlayer dielectric layer, the wiring layer, and the first passivation layer to connect to the first pad. The first pad includes a first head part on the first passivation layer, and a protruding part that extends into the first passivation layer from the first head part, the protruding part surrounding a lateral surface of the through electrode in the first passivation layer, and the second pad is connected to the IC through the wiring line and the contact.
    Type: Application
    Filed: November 16, 2021
    Publication date: October 13, 2022
    Inventors: Shaofeng DING, Jeong Hoon AHN, Yun Ki CHOI
  • Patent number: 11469174
    Abstract: A semiconductor device includes a substrate having a first region, a second region, a first buffer region, and a second buffer region. A plurality of conductive lines is disposed on the first region of the substrate. An inductor is disposed on the second region of the substrate, and a dummy pattern is disposed on the first buffer region of the substrate. The first buffer region is provided between the first region and the second region. The second buffer region is provided between the first buffer region and the second region.
    Type: Grant
    Filed: April 15, 2021
    Date of Patent: October 11, 2022
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Joon-Nyung Lee, Jeong Hoon Ahn
  • Publication number: 20220310506
    Abstract: A semiconductor device includes a first conductive lower wiring disposed at a first metal level and that extends in a first direction, a first upper wiring structure connected to the first conductive lower wiring and that includes a first conductive upper wiring and a first conductive upper via, where the first conductive upper wiring is disposed at a second metal level higher than the first metal level and extends in a second direction different from the first direction, and a conductive insertion pattern disposed between the first conductive lower wiring and the first upper wiring structure and connected to the first conductive upper via. An upper surface of the conductive insertion pattern has a first width in the first direction, and a bottom surface of the first conductive upper via has a second width in the first direction that is less than the first width.
    Type: Application
    Filed: January 4, 2022
    Publication date: September 29, 2022
    Inventors: Jung Il Park, Jeong Hoon Ahn, Yun Ki Choi
  • Patent number: 11437374
    Abstract: A semiconductor device includes a substrate including a logic cell region and a connection region, a dummy transistor on the connection region, an intermediate connection layer on the dummy transistor, a first metal layer on the intermediate connection layer, an etch stop layer between the intermediate connection layer and the first metal layer, a through contact below the first metal layer penetrating the connection region, an upper portion of the through contact protruding above the etch stop layer, and a protection insulating pattern on the etch stop layer covering the upper portion of the through contact. The protection insulating pattern covers an upper side surface of the through contact and a top surface of the through contact.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: September 6, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Shaofeng Ding, Minguk Kang, Jihyung Kim, Jeong Hoon Ahn, Haeri Yoo, Yun Ki Choi
  • Publication number: 20220278193
    Abstract: A semiconductor device includes a semiconductor substrate including a connection region, a pair of epitaxial patterns provided at the semiconductor substrate, a capacitor disposed between the pair of epitaxial patterns, a middle connection layer on the capacitor, an interconnection layer on the middle connection layer, and a through-via provided under the interconnection layer and penetrating the connection region of the semiconductor substrate. The capacitor includes an upper portion of the semiconductor substrate between the pair of epitaxial patterns, a metal electrode on the upper portion of the semiconductor substrate, and a dielectric pattern disposed between the upper portion of the semiconductor substrate and the metal electrode. The through-via is connected to the capacitor through the interconnection layer and the middle connection layer.
    Type: Application
    Filed: September 13, 2021
    Publication date: September 1, 2022
    Inventors: SHAOFENG DING, JEONG HOON AHN, YUN KI CHOI
  • Publication number: 20220278024
    Abstract: A semiconductor device includes a substrate provided with an integrated circuit and a contact, an interlayer dielectric layer covering the integrated circuit and the contact, a through electrode penetrating the substrate and the interlayer dielectric layer, a first intermetal dielectric layer on the interlayer dielectric layer, and first and second wiring patterns in the first intermetal dielectric layer. The first wiring pattern includes a first conductive pattern on the through electrode, and a first via penetrating the first intermetal dielectric layer and connecting the first conductive pattern to the through electrode. The second wiring pattern includes a second conductive pattern on the contact, and a second via penetrating the first intermetal dielectric layer and connecting the second conductive pattern to the contact. A first width in a first direction of the first via is greater than a second width in the first direction of the second via.
    Type: Application
    Filed: September 8, 2021
    Publication date: September 1, 2022
    Inventors: SHAOFENG DING, JEONG HOON AHN, YUN KI CHOI
  • Publication number: 20220271045
    Abstract: A semiconductor device includes a substrate including a logic cell region and a connection region, a dummy transistor on the connection region, an intermediate connection layer on the dummy transistor, the intermediate connection layer including a connection pattern electrically connected to the dummy transistor, a first metal layer on the intermediate connection layer, an etch stop layer between the intermediate connection layer and the first metal layer, the etch stop layer covering a top surface of the connection pattern, and a penetration contact extended from the first metal layer toward a bottom surface of the substrate penetrating the connection region.
    Type: Application
    Filed: September 14, 2021
    Publication date: August 25, 2022
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Shaofeng DING, Jeong Hoon AHN, Yun Ki CHOI
  • Patent number: 11257754
    Abstract: A semiconductor device includes a substrate having a first region, a second region, a first buffer region, and a second buffer region. A plurality of conductive lines is disposed on the first region of the substrate. An inductor is disposed on the second region of the substrate, and a dummy pattern is disposed on the first buffer region of the substrate. The first buffer region is provided between the first region and the second region. The second buffer region is provided between the first buffer region and the second region.
    Type: Grant
    Filed: August 24, 2019
    Date of Patent: February 22, 2022
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Joon-Nyung Lee, Jeong Hoon Ahn
  • Publication number: 20220028827
    Abstract: A semiconductor device includes an interposer substrate and at least one die mounted on the interposer substrate. The interposer substrate includes a semiconductor substrate having a first surface and a second surface opposite to the first surface, an interlayer insulating layer on the first surface of the semiconductor substrate, a capacitor in a hole penetrating the interlayer insulating layer, an interconnection layer on the interlayer insulating layer, and a through-via extending from the interconnection layer toward the second surface of the semiconductor substrate in a vertical direction that is perpendicular to the first surface of the semiconductor substrate. The capacitor includes a sequential stack of a first electrode, a first dielectric layer, a second electrode, a second dielectric layer and a third electrode. A bottom of the hole is distal from the second surface of the semiconductor substrate in relation to the first surface of the semiconductor substrate.
    Type: Application
    Filed: March 1, 2021
    Publication date: January 27, 2022
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Shaofeng DING, Jeong Hoon AHN, Yun Ki CHOI
  • Patent number: 11133266
    Abstract: A method of fabricating a semiconductor device comprises forming first and second align keys in a wafer, the second align key apart from the first align key, forming third and fourth align keys in the wafer, the third align key apart from the second align key, the fourth align key apart from the third align key, forming a fifth align key in the wafer, the fifth align key apart from the fourth align key, forming a first line pattern in the wafer using the second and third align keys, forming a second line pattern in the wafer using the fourth and fifth align keys, forming a first interposer including the first line pattern by cutting a space between the first and second align keys, and forming a second interposer, the second interposer including the second line pattern by cutting a space between the third and fourth align keys.
    Type: Grant
    Filed: May 18, 2020
    Date of Patent: September 28, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Shaofeng Ding, Jeong Hoon Ahn, Yun Ki Choi
  • Publication number: 20210296229
    Abstract: A semiconductor device includes a substrate, a first electrode including a first hole, a first dielectric layer on an upper surface of the first electrode and on an inner surface of the first hole, a second electrode on the first dielectric layer, a second dielectric layer on the second electrode, a third electrode on the second dielectric layer and including a second hole, and a first contact plug extending through the second electrode and the second dielectric layer and extending through the first hole and the second hole. A sidewall of the first contact plug is isolated from direct contact with the sidewall of the first hole and a sidewall of the second hole, and has a step portion located adjacent to an upper surface of the second electrode.
    Type: Application
    Filed: June 7, 2021
    Publication date: September 23, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jinho PARK, Shaofeng DING, Yongseung BANG, Jeong Hoon AHN
  • Patent number: 11114524
    Abstract: A semiconductor device including a first electrode on a substrate, a second electrode on the first electrode, a first dielectric layer between the first electrode and the second electrode; a third electrode on the second electrode, a second dielectric layer between the second electrode and the third electrode, and a first contact plug penetrating the third electrode and contacting the first electrode, the first contact plug contacts a top surface of the third electrode and a side surface of the third electrode.
    Type: Grant
    Filed: June 13, 2019
    Date of Patent: September 7, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Shaofeng Ding, Jinho Park, Yongseung Bang, Jeong Hoon Ahn
  • Publication number: 20210242147
    Abstract: Disclosed are semiconductor devices and methods of fabricating the same. The semiconductor device includes a first dielectric layer including a first pad, a second dielectric layer on the first dielectric layer, a through electrode that penetrates the second dielectric layer and is electrically connected to the first pad, an upper passivation layer on the second dielectric layer, a second pad on the upper passivation layer, and an upper barrier layer between the upper passivation layer and the second pad. The first pad and the through electrode include a first material. The second pad includes a second material that is different from the first material of the first pad and the through electrode. The second pad includes a first part on the upper passivation layer, and a second part that extends from the first part into the upper passivation layer and is connected to the through electrode.
    Type: Application
    Filed: September 2, 2020
    Publication date: August 5, 2021
    Inventors: JINHO PARK, CHIN KIM, YONGSEUNG BANG, JIYEON BAEK, JEONG HOON AHN
  • Publication number: 20210242203
    Abstract: A semiconductor device includes a substrate including a logic cell region and a connection region, a dummy transistor on the connection region, an intermediate connection layer on the dummy transistor, a first metal layer on the intermediate connection layer, an etch stop layer between the intermediate connection layer and the first metal layer, a through contact below the first metal layer penetrating the connection region, an upper portion of the through contact protruding above the etch stop layer, and a protection insulating pattern on the etch stop layer covering the upper portion of the through contact. The protection insulating pattern covers an upper side surface of the through contact and a top surface of the through contact.
    Type: Application
    Filed: September 28, 2020
    Publication date: August 5, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Shaofeng DING, Minguk KANG, Jihyung KIM, Jeong Hoon AHN, Haeri YOO, Yun Ki CHOI
  • Publication number: 20210233842
    Abstract: A semiconductor device includes a substrate having a first region, a second region, a first buffer region, and a second buffer region. A plurality of conductive lines is disposed on the first region of the substrate. An inductor is disposed on the second region of the substrate, and a dummy pattern is disposed on the first buffer region of the substrate. The first buffer region is provided between the first region and the second region. The second buffer region is provided between the first buffer region and the second region.
    Type: Application
    Filed: April 15, 2021
    Publication date: July 29, 2021
    Inventors: JOON-NYUNG LEE, JEONG HOON AHN
  • Patent number: 11043456
    Abstract: A semiconductor device includes a substrate, a first electrode including a first hole, a first dielectric layer on an upper surface of the first electrode and on an inner surface of the first hole, a second electrode on the first dielectric layer, a second dielectric layer on the second electrode, a third electrode on the second dielectric layer and including a second hole, and a first contact plug extending through the second electrode and the second dielectric layer and extending through the first hole and the second hole. A sidewall of the first contact plug is isolated from direct contact with the sidewall of the first hole and a sidewall of the second hole, and has a step portion located adjacent to an upper surface of the second electrode.
    Type: Grant
    Filed: October 22, 2019
    Date of Patent: June 22, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jinho Park, Shaofeng Ding, Yongseung Bang, Jeong Hoon Ahn
  • Publication number: 20210125937
    Abstract: A method of fabricating a semiconductor device comprises forming first and second align keys in a wafer, the second align key apart from the first align key, forming third and fourth align keys in the wafer, the third align key apart from the second align key, the fourth align key apart from the third align key, forming a fifth align key in the wafer, the fifth align key apart from the fourth align key, forming a first line pattern in the wafer using the second and third align keys, forming a second line pattern in the wafer using the fourth and fifth align keys, forming a first interposer including the first line pattern by cutting a space between the first and second align keys, and forming a second interposer, the second interposer including the second line pattern by cutting a space between the third and fourth align keys.
    Type: Application
    Filed: May 18, 2020
    Publication date: April 29, 2021
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Shaofeng DING, Jeong Hoon AHN, Yun Ki CHOI