Abstract: Disclosed is a semiconductor structure that includes a vertical field effect transistor (VFET) with a U-shaped semiconductor body. The semiconductor structure can be a standard VFET or a feedback VFET. In either case, the VFET includes a lower source/drain region, a semiconductor body on the lower source/drain region, and an upper source/drain region on the top of the semiconductor body. Rather than having an elongated fin shape, the semiconductor body folds back on itself in the Z direction so as to be essentially U-shaped (as viewed from above). Using a U-shaped semiconductor body reduces the dimension of the VFET in the Z direction without reducing the end-to-end length of the semiconductor body. Thus, VFET cell height can be reduced without reducing device drive current or violating critical design rules. Also disclosed is a method of forming a semiconductor structure that includes such a VFET with a U-shaped semiconductor body.

Abstract: A failure mode detection method is provided. A first default read voltage is changed to a first read retry voltage by a first increment, and a second default read voltage is changed to a second read retry voltage by a second increment. A memory cell array of a solid state storage device is successfully read according to the first and second read retry voltages. If an absolute value of the first increment minus an absolute value of the second increment is larger than a predetermined voltage value, the memory cell array is in a data retention failure mode. If the absolute value of the first increment minus the absolute value of the second increment is smaller than the predetermined voltage value, the memory cell array is in a low temperature write high temperature read failure mode.

Abstract: An erased block reverification method for a solid state storage device is provided. Firstly, an erase command corresponding to a selected block is issued to an array control circuit. When an erase pass message is received, a judging step is performed to judge whether a setting condition of the selected block is satisfied. If the setting condition of the selected block is satisfied, the selected block is recorded as a good block. If the setting condition of the selected block is not satisfied, a selected block reverification process is performed. During the selected block reverification process, a data of the selected block is read and the selected block is recorded as the good block or a defective block according to a number of memory cells of the selected block in a non-erase state.

Abstract: Methods of patterning metallization lines having variable widths in a metallization layer. A first mandrel layer is formed over a mask layer, with the mask layer overlying a second mandrel layer. The first mandrel layer is etched to form mandrel lines that have variable widths. The first non-mandrel trenches are etched in the mask layer, where the non-mandrel trenches have variable widths. The first mandrel lines are used to etch mandrel trenches in the mask layer, so that the mandrel lines and first non-mandrel lines define a mandrel pattern. The second mandrel layer is etched according to the mandrel pattern to form second mandrel lines, with the second mandrel lines having the variable widths of the plurality of first mandrel lines and the variable widths of the plurality of non-mandrel trenches.

Abstract: A reading control method for a solid state storage device includes following steps. While the solid state storage device is in an idle mode, a background monitoring operation is performed on the first block and the second block. Consequently, a first optimal read voltage set corresponding to the first block and a second optimal read voltage set corresponding to the second block are acquired. In reading operation, a default read voltage set is provided to the non-volatile memory to read a data of the first block. If a data of the first block is not successfully decoded, a read retry process is performed on the first block and the first optimal read voltage set is provided to the non-volatile memory to read the data of the first block.

Abstract: The disclosure relates to integrated circuit (IC) structures with substantially T-shaped wires, and methods of forming the same. An IC structure according to the present disclosure can include a first substantially T-shaped wire including a first portion extending in a first direction, and a second portion extending in a second direction substantially perpendicular to the first direction; an insulator laterally abutting the first substantially T-shaped wire at an end of the first portion, opposite the second portion; and a pair of gates each extending in the first direction and laterally abutting opposing sidewalls of the insulator and the first portion of the substantially T-shaped wire.

Abstract: Methods of patterning metallization lines having variable widths in a metallization layer. A first mandrel layer is formed over a mask layer, with the mask layer overlying a second mandrel layer. The first mandrel layer is etched to form mandrel lines that have variable widths. The first non-mandrel trenches are etched in the mask layer, where the non-mandrel trenches have variable widths. The first mandrel lines are used to etch mandrel trenches in the mask layer, so that the mandrel lines and first non-mandrel lines define a mandrel pattern. The second mandrel layer is etched according to the mandrel pattern to form second mandrel lines, with the second mandrel lines having the variable widths of the plurality of first mandrel lines and the variable widths of the plurality of non-mandrel trenches.

Abstract: A control method of a solid state storage device includes the following steps. Firstly, a block of a memory cell array is checked. Then, a judging step is performed to judge whether a data storage time period of the block exceeds a threshold period. If the data storage time period of the block exceeds the threshold period, the block is tagged or a data of the block is refreshed.

Abstract: A method of building a decoding status prediction system is provided. Firstly, plural read records are collected during read cycles of a flash memory. Then, the plural read records are classified into read records with a first read result and read records with a second read result. Then, a first portion of the read records with the first read result are divided into K0 groups according to a clustering algorithm, and a second portion of the read records with the second read result are divided into K1 groups according to the clustering algorithm. Then, the read records of the K0 groups and the K1 groups are used to train prediction models. Consequently, K0×K1 prediction models are generated. Then, the prediction models are combined as a prediction database.

Abstract: A control method of a solid state storage device includes the following steps. Firstly, a block of a memory cell array is checked. Then, a judging step is performed to judge whether a data storage time period of the block exceeds a threshold period. If the data storage time period of the block exceeds the threshold period, the block is tagged or a data of the block is refreshed.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to contacts for local connections and methods of manufacture. The structure includes: at least one contact electrically shorted to a gate structure and a source/drain contact and located below a first wiring layer; and gate, source and drain contacts extending from selected gate structures and electrically connecting to the first wiring layer.

Abstract: A terminal positioning method and a network device, where the network device obtains radio signal sampling information of a first terminal at a current moment. The first terminal is any terminal in a target region, and the target region is a preset geographic region. The network device obtains position information of the first terminal at the current moment by prediction based on the radio signal sampling information of the first terminal at the current moment and a predictive model of the target region. The predictive model is obtained by extensive data training in the target region, has relatively strong error tolerance and error-correction capabilities, and can accurately reflect a relationship between radio signal sampling information and position information of a terminal. Terminal positioning accuracy is effectively improved.

Abstract: At least one method, apparatus and system disclosed involves providing a functional cell for a circuit layout for an integrated circuit device. A determination as to a first location for a two-dimensional portion of a first power rail in a functional cell is made. A first portion of the first power rail is formed in a first direction. A second portion of the first power rail is formed in a second direction in the first location for the two-dimensional portion.

Abstract: A solid state storage device includes a non-volatile memory and a controlling circuit. In a first read retry process, the controlling circuit judges whether an information corresponding to a first block of the non-volatile memory is recorded in the cache table. If the information is not recorded in the cache table, the controlling circuit sequentially provides plural predetermined retry read voltage sets to the non-volatile memory according to a sequence of the plural predetermined retry read voltage sets in the retry table and performs a read retry operation. If a read data of the first block is successfully decoded through the read retry operation according to a first predetermined retry read voltage set of the plural predetermined retry read voltage sets in the retry table, the controlling circuit records the first predetermined retry read voltage set into the cache table.

Abstract: Embodiments of the present invention provide an improved semiconductor structure and methods of fabrication that provide transistor contacts that are self-aligned in two dimensions. Two different capping layers are used, each being comprised of a different material. The two capping layers are selectively etchable to each other. One capping layer is used for gate coverage while the other capping layer is used for source/drain coverage. Selective etch processes open the desired gates and source/drains, while block masks are used to cover elements that are not part of the connection scheme. A metallization line (layer) is deposited, making contact with the open elements to provide electrical connectivity between them.

Abstract: A solid state storage device includes a non-volatile memory and a controlling circuit. In a first read retry process, the controlling circuit judges whether an information corresponding to a first block of the non-volatile memory is recorded in the cache table. If the information is not recorded in the cache table, the controlling circuit sequentially provides plural predetermined retry read voltage sets to the non-volatile memory according to a sequence of the plural predetermined retry read voltage sets in the retry table and performs a read retry operation. If a read data of the first block is successfully decoded through the read retry operation according to a first predetermined retry read voltage set of the plural predetermined retry read voltage sets in the retry table, the controlling circuit records the first predetermined retry read voltage set into the cache table.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to contacts for local connections and methods of manufacture. The structure includes: at least one contact electrically shorted to a gate structure and a source/drain contact and located below a first wiring layer; and gate, source and drain contacts extending from selected gate structures and electrically connecting to the first wiring layer.

Abstract: One aspect of the disclosure is directed to a method of forming an integrated circuit structure. The method may include: providing a set of fins over a semiconductor substrate, the set of fins including a plurality of working fins and a plurality of dummy fins, the plurality of dummy fins including a first subset of dummy fins within a pre-defined distance from any of the plurality of working fins, and a second subset of dummy fins beyond the pre-defined distance from any of the plurality of working fins; removing the first subset of dummy fins by an extreme ultraviolet (EUV) lithography technique; and removing at least a portion of the second subset of dummy fins.

Abstract: The disclosure relates to integrated circuit (IC) structures with substantially T-shaped wires, and methods of forming the same. An IC structure according to the present disclosure can include a first substantially T-shaped wire including a first portion extending in a first direction, and a second portion extending in a second direction substantially perpendicular to the first direction; an insulator laterally abutting the first substantially T-shaped wire at an end of the first portion, opposite the second portion; and a pair of gates each extending in the first direction and laterally abutting opposing sidewalls of the insulator and the first portion of the substantially T-shaped wire.

Abstract: At least one method, apparatus and system disclosed involves providing a functional cell for a circuit layout for an integrated circuit device. A determination as to a first location for a two-dimensional portion of a first power rail in a functional cell is made. A first portion of the first power rail is formed in a first direction. A second portion of the first power rail is formed in a second direction in the first location for the two-dimensional portion.