Patents by Inventor Jian Ding

Jian Ding has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110021624
    Abstract: Disclosed are a series of ?-amino-N-substituted amide compounds having a structure of the following formula, the pharmaceutically acceptable salts thereof, and the pharmaceutical composition comprising the same. The ?-amino-N-substituted amide compounds or the pharmaceutically acceptable salts thereof according to the present invention have anti-tumor and/or anti-cancer activities in vivo and in vitro, can effectively depress the growth of various tumor cells and/or cancer cells, and thus can be used in preparing drugs for treating tumors and/or cancers.
    Type: Application
    Filed: December 11, 2008
    Publication date: January 27, 2011
    Inventors: Fajun Nan, Jia Li, Jian Ding, Gang Liu, Chuanming Xie, Zehong Miao, Wanyi Tai
  • Publication number: 20100178600
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Application
    Filed: March 22, 2010
    Publication date: July 15, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Madhavi R. Chandrachood, Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding
  • Patent number: 7737040
    Abstract: An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.
    Type: Grant
    Filed: November 9, 2007
    Date of Patent: June 15, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Christopher Dennis Bencher, Melvin Warren Montgomery, Alexander Buxbaum, Yung-Hee Yvette Lee, Jian Ding, Gilad Almogy, Wendy H. Yeh
  • Patent number: 7682518
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: March 23, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Madhavi R. Chandrachood, Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding
  • Publication number: 20090325996
    Abstract: New camptothecin derivatives with the following structure of the formula (I), their use and the pharmaceutical compositions containing the same. The compounds of the present invention have good anti-tumor activities and good solubility in water, and can be used in development of medicines.
    Type: Application
    Filed: January 17, 2007
    Publication date: December 31, 2009
    Inventors: Wei Lu, Jian Ding, Heyong Gao, Liping Lin, Yi Chen
  • Patent number: 7626044
    Abstract: Triptolide derivatives of Formula (I), their pharmaceutically acceptable salts and optical isomers, Formula (I): wherein, C5 and C6 are connect with each other by a C-C single bond or double bond; when C5 and C6 are connected with C-C single bond, X and Y represent independently hydrogen, oxygen, hydroxyl, halogen, lower alkyl-oxy, lower alkyl-amino, mercapto, lower alkyl-thio, the group of formula —OCOR, —OSO2OR or —OPO(OH)2, each of which is attached to C5 and C6, R represents —(CH2)nCO2Na, —(CO2)nCO2K, or —(CH2)nCH3, wherein n=1-6; Z represents hydrogen, oxygen, hydroxyl, halogen, lower alkyl-oxy, lower alkyl-amino, mercapto, lower alkyl-thio, the group of formula -OCOR, -OSO2OR or —OPO(OH)2, each of which is linked at C14-position, R represents —(CH2)nCO2Na, —(CO2)nCO2K, or —(CH2)nCH2, wherein n=1-6; wherein, the“______” linked with X, Y, and Z represents the stereochemistry orientations “” or “” , but X and Y cannot both be hydrogen atom at the same time, methods for preparing the triptolides and the
    Type: Grant
    Filed: January 28, 2003
    Date of Patent: December 1, 2009
    Assignees: Shanghai Institute of Materia Medica Chinese Academy of Sciences, Shanghai Pharmaceutical (Group) Co., Ltd.
    Inventors: Yuanchao Li, Jianping Zuo, Fan Zhang, Ru Zhou, Jian Ding
  • Publication number: 20090179146
    Abstract: The present invention contemplates various devices that are configured to separate a sample, which contains more than one unique species, into any desired number of sub-samples by passing the sample across a like number of separation media configured for a first separation protocol. Each of the sub-samples may be further separated by an additional separation protocol, thereby creating a plurality of mini-samples, each of which may be further separated and/or analyzed. The invention also contemplates using a simple method of using conduits to form a fluid path that passes through a plurality of separation media, each of which media is configured to isolate a particular sub-sample. After various sub-samples of the sample are isolated by the various separation media, the conduits may be removed, thereby enabling each of the isolated sub-samples to be further separated and/or analyzed independent of any other sub-sample.
    Type: Application
    Filed: January 19, 2006
    Publication date: July 16, 2009
    Inventors: Lee O. Lomas, Jian Ding, Egisto Boschetti
  • Patent number: 7541463
    Abstract: The invention discloses novel sulfur-containing naphthalimide derivatives, and the preparation and uses thereof. The conjugated plane of naphthalimide derivatives of the invention is enlarged by incorporating 5-or 6-membered heteroaromatic ring and/or introducing S heteroatom, thus increasing the anti-tumor activity of naphthalimide. The compounds of the invention displays significant inhibiting activities to the proliferation of various tumor cells such as human lung cancer, gastric cancer, liver cancer, leucocythemia and the like. The inhibition of cell proliferation is dose-dependent.
    Type: Grant
    Filed: October 31, 2005
    Date of Patent: June 2, 2009
    Assignees: East China University of Science and Technology, Shanghai Institute of Materia Medica, Chinese Academy of Science, Dalian University of Technology
    Inventors: Xuhong Qian, Yonggang Li, Yufang Xu, Jian Ding, Liping Lin, Zehong Miao, Hong Zhu, Baoyuan Qu
  • Patent number: 7521000
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Grant
    Filed: August 25, 2004
    Date of Patent: April 21, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Madhavi R. Chandrachood, Nicole Sandlin, Yung-Hee Yvette Lee, Jian Ding
  • Publication number: 20080234287
    Abstract: The invention discloses novel sulfur-containing naphthalimide derivatives, and the preparation and uses thereof. The conjugated plane of naphthalimide derivatives of the invention is enlarged by incorporating 5- or 6-membered heteroaromatic ring and/or introducing S heteroatom, thus increasing the anti-tumor activity of naphthalimide. The compounds of the invention displays significant inhibiting activities to the proliferation of various tumor cells such as human lung cancer, gastric cancer, liver cancer, leucocythemia and the like. The inhibition of cell proliferation is dose-dependent.
    Type: Application
    Filed: May 7, 2008
    Publication date: September 25, 2008
    Inventors: Xuhong Qian, Yonggang Li, Yufang Xu, Jian Ding, Liping Lin, Zehong Miao, Hong Zhu, Baoyuan Qu
  • Patent number: 7365014
    Abstract: We have reduced the critical dimension bias for reticle fabrication. Pattern transfer to the radiation-blocking layer of the reticle substrate essentially depends upon use of a hard mask to which the pattern is transferred from a photoresist. The photoresist pull back which occurs during pattern transfer to the hard mask is minimalized. In addition, a hard mask material having anti-reflective properties which are matched to the reflective characteristics of the radiation-blocking layer enables a reduction in critical dimension size and an improvement in the pattern feature integrity in the hard mask itself. An anti-reflective hard mask layer left on the radiation-blocking layer provides functionality when the reticle is used in a semiconductor device manufacturing process.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: April 29, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Christopher Dennis Bencher, Melvin Warren Montgomery, Alexander Buxbaum, Yung-Hee Yvette Lee, Jian Ding, Gilad Almogy, Wendy H. Yeh
  • Publication number: 20080096138
    Abstract: An anti-reflective hard mask layer left on a radiation-blocking layer during fabrication of a reticle provides functionality when the reticle is used in a semiconductor device manufacturing process.
    Type: Application
    Filed: November 9, 2007
    Publication date: April 24, 2008
    Inventors: Christopher Bencher, Melvin Montgomery, Alexander Buxbaum, Yung-Hee Lee, Jian Ding, Gilad Almogy, Wendy Yeh
  • Publication number: 20070296980
    Abstract: Methods and apparatus for controlling the critical dimensions and monitoring the phase shift angles of photomasks. Critical dimensions measurement data before wafer processing and after wafer processing are collected by an integrated metrology tool to adjust the process recipe, to determine if the critical dimensions are in specification and to determine if additional etching is required. Phase shift angle and uniformity across substrate measurement after wafer processing are collected by an integrated metrology tool to determine if the phase shift angle and its uniformity are in specification. The real time process recipe adjustment and determination if additional etching is requires allow tightening of the process control. The phase shift angle and uniformity monitoring allows in-line screening of phase shift photomasks.
    Type: Application
    Filed: July 31, 2007
    Publication date: December 27, 2007
    Inventors: ALFRED MAK, Yung-Hee Lee, Cynthia Brooks, Melisa Buie, Turgut Sahin, Jian Ding
  • Publication number: 20070197476
    Abstract: The invention relates to triptolide derivatives of Formula (I), their pharmaceutically acceptable salts and optical isomers, Formula (I): wherein, C5 and C6 connect with each other by a C—C single bond or double bond; when C5 and C6 are connected with C—C single bond, X and Y represents independently hydrogen, oxygen, hydroxyl, halogen, lower alkyl-oxy, lower alkyl-amino, mercapto, lower alkyl-thio, the group of formula —OCOR, —OSO2R or —OPO(OH)2, each of which is attached to C5 and C6, R represents —(CH2)nCO2Na, —(CO2)nCO2K, or —(CH2)nCH3, wherein n=1-6; Z represents hydrogen, oxygen, hydroxyl, halogen, lower alkyl-oxy, lower alkyl-amino, mercapto, lower alkyl-thio, the group of formula —OCOR, —OSO2R or —OPO(OH)2, each of which is linked at C14-position, R represents —(CH2)nCO2Na, —(CO2)nCO2K, or —(CH2)nCH2, wherein n=1-6; wherein, the “_” linked with X, Y, and Z represents “” or “”, but X and Y cannot both be hydrogen atom at the same time, the methods for preparing them and their use as antiphlogistic
    Type: Application
    Filed: January 28, 2003
    Publication date: August 23, 2007
    Inventors: Yuanchao Li, Jianping Zuo, Fan Zhang, Ru Zhou, Jian Ding
  • Publication number: 20070184354
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Application
    Filed: August 25, 2004
    Publication date: August 9, 2007
    Inventors: Madhavi Chandrachood, Nicole Sandlin, Yung-Hee Lee, Jian Ding
  • Patent number: 7250309
    Abstract: Methods and apparatus for controlling the critical dimensions and monitoring the phase shift angles of photomasks. Critical dimensions measurement data before wafer processing and after wafer processing are collected by an integrated metrology tool to adjust the process recipe, to determine if the critical dimensions are in specification and to determine if additional etching is required. Phase shift angle and uniformity across substrate measurement after wafer processing are collected by an integrated metrology tool to determine if the phase shift angle and its uniformity are in specification. The real time process recipe adjustment and determination if additional etching is requires allow tightening of the process control. The phase shift angle and uniformity monitoring allows in-line screening of phase shift photomasks.
    Type: Grant
    Filed: January 9, 2004
    Date of Patent: July 31, 2007
    Assignee: Applied Materials, Inc.
    Inventors: Alfred W. Mak, Yung-Hee Yvette Lee, Cynthia B. Brooks, Melisa J. Buie, Turgut Sahin, Jian Ding
  • Publication number: 20070110942
    Abstract: A finished high velocity oxy fuel (HVOF) tape used with, for example, during known HVOF processing imparts high temperature silicone pressure sensitive adhesives that provide enhanced adhesion strength to provide a firm adhesion to its own backing and unexpectedly leave no residue upon removal from metals. The novel enhanced tapes are made up of coated or uncoated, woven or non-woven glass cloth and ceramic based fabric laminated to at least one side of a metal-foil using a silicone based laminating adhesive, which is then laminated with another layer of a pre-selected combination of the same materials and coated with a high temperature silicone pressure sensitive adhesive and wound to itself to make a self wound tape or covered adhesive assembly with a release liner to make a laminated sheet for die cut samples, among other things.
    Type: Application
    Filed: February 14, 2006
    Publication date: May 17, 2007
    Inventors: Jaykumar Shah, Jian Ding, Timothy Kowal
  • Publication number: 20070105381
    Abstract: Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a substrate including positioning a substrate having a metal layer disposed on an optically transparent material in a processing chamber, introducing a processing gas processing gas comprising an oxygen containing gas, a chlorine containing gas, and a chlorine-free halogen containing gas, and optionally, an inert gas, into the processing chamber, generating a plasma of the processing gas in the processing chamber, and etching exposed portions of the metal layer disposed on the substrate.
    Type: Application
    Filed: December 28, 2006
    Publication date: May 10, 2007
    Inventors: Madhavi Chandrachood, Nicole Sandlin, Yung-Hee Lee, Jian Ding
  • Publication number: 20060257946
    Abstract: Certain biomarkers and biomarker combinations are useful in a qualifying ischaemic heart disease status in a patient. A diagnostic methodology employing these biomarkers and combinations can distinguish between ischaemic heart disease and normal, as well as between cases of severe myocardial infarction versus mild myocardial infarction.
    Type: Application
    Filed: June 4, 2004
    Publication date: November 16, 2006
    Inventors: Jian Ding, Lee Lomas
  • Publication number: 20060111367
    Abstract: The invention discloses novel sulfur-containing naphthalimide derivatives, and the preparation and uses thereof. The conjugated plane of naphthalimide derivatives of the invention is enlarged by incorporating 5-or 6-membered heteroaromatic ring and/or introducing S heteroatom, thus increasing the anti-tumor activity of naphthalimide. The compounds of the invention displays significant inhibiting activities to the proliferation of various tumor cells such as human lung cancer, gastric cancer, liver cancer, leucocythemia and the like. The inhibition of cell proliferation is dose-dependent.
    Type: Application
    Filed: October 31, 2005
    Publication date: May 25, 2006
    Inventors: Xuhong Qian, Yonggang Li, Yufang Xu, Jian Ding, Liping Lin, Zehong Miao, Hong Zhu, Baoyuan Qu