Abstract: A semiconductor device includes a plurality of input/output (I/O) pads; a serial input pad; a serial output pad; a plurality of interface circuits respectively corresponding to the I/O pads; and a plurality of option setting circuits respectively corresponding to the interface circuits, suitable for setting options of the respective interface circuits, wherein the serial input pad, the interface circuits, the option setting circuits, and the serial output pad configure a serial chain.

Abstract: A semiconductor memory device includes a plurality of memory cell transistors arranged along a common semiconductor layer. Each of the plurality of memory cell transistors comprises a first source/drain region and a second source/drain region formed in the common semiconductor layer; a gate stack formed on a portion of the common semiconductor layer between the first source/drain region and the second source/drain region; and an electrical floating portion in the portion of the common semiconductor layer, a charge state of the electrical floating portion being adapted to adjust a threshold voltage and a channel conductance of the memory cell transistor. The plurality of memory cell transistors connected in series with each other along the common semiconductor layer provide a memory string.

Abstract: A semiconductor memory device includes a plurality of memory cell transistors arranged along a common semiconductor layer. Each of the plurality of memory cell transistors comprises a first source/drain region and a second source/drain region formed in the common semiconductor layer; a gate stack formed on a portion of the common semiconductor layer between the first source/drain region and the second source/drain region; and an electrical floating portion in the portion of the common semiconductor layer, a charge state of the electrical floating portion being adapted to adjust a threshold voltage and a channel conductance of the memory cell transistor. The plurality of memory cell transistors connected in series with each other along the common semiconductor layer provide a memory string.

Abstract: A semiconductor device includes a plurality of input/output (I/O) pads; a serial input pad; a serial output pad; a plurality of interface circuits respectively corresponding to the I/O pads; and a plurality of option setting circuits respectively corresponding to the interface circuits, suitable for setting options of the respective interface circuits, wherein the serial input pad, the interface circuits, the option setting circuits, and the serial output pad configure a serial chain.

Abstract: A semiconductor memory device includes a plurality of memory cell transistors arranged along a common semiconductor layer. Each of the plurality of memory cell transistors comprises a first source/drain region and a second source/drain region formed in the common semiconductor layer; a gate stack formed on a portion of the common semiconductor layer between the first source/drain region and the second source/drain region; and an electrical floating portion in the portion of the common semiconductor layer, a charge state of the electrical floating portion being adapted to adjust a threshold voltage and a channel conductance of the memory cell transistor. The plurality of memory cell transistors connected in series with each other along the common semiconductor layer provide a memory string.

Abstract: A semiconductor memory device includes a plurality of memory cell transistors arranged along a common semiconductor layer. Each of the plurality of memory cell transistors comprises a first source/drain region and a second source/drain region formed in the common semiconductor layer; a gate stack formed on a portion of the common semiconductor layer between the first source/drain region and the second source/drain region; and an electrical floating portion in the portion of the common semiconductor layer, a charge state of the electrical floating portion being adapted to adjust a threshold voltage and a channel conductance of the memory cell transistor. The plurality of memory cell transistors connected in series with each other along the common semiconductor layer provide a memory string.

Abstract: A semiconductor memory device includes a plurality of memory cell transistors arranged along a common semiconductor layer. Each of the plurality of memory cell transistors comprises a first source/drain region and a second source/drain region formed in the common semiconductor layer; a gate stack formed on a portion of the common semiconductor layer between the first source/drain region and the second source/drain region; and an electrical floating portion in the portion of the common semiconductor layer, a charge state of the electrical floating portion being adapted to adjust a threshold voltage and a channel conductance of the memory cell transistor. The plurality of memory cell transistors connected in series with each other along the common semiconductor layer provide a memory string.

Abstract: The present invention discloses an asynchronous serial communication system and method. The asynchronous serial communication system may include a semiconductor device having two terminals and configured to receive a voltage required for an operation from data transmitted through one terminal; and a controller configured to perform asynchronous serial communication with the semiconductor device with two terminals. The asynchronous serial communication system may perform asynchronous serial communication between the semiconductor device and the controller in order to write or read data through the one terminal.

Abstract: A semiconductor device and a method of fabricating the same are disclosed. A semiconductor device according to an embodiment of the present invention includes: a first type doped semiconductor substrate; a second type doped deep well configured such that one or more semiconductor device elements are formed therein; a first type doped first well formed inside a region surrounded by the deep well of the one surface of the semiconductor substrate, and separated from the semiconductor substrate by the deep well; a first electrical contact formed on a part of the one surface of the semiconductor substrate, and electrically connected to the first well; and a second electrical contact formed on another surface of the semiconductor substrate.

Abstract: A semiconductor memory device includes a plurality of memory cell transistors arranged along a common semiconductor layer. Each of the plurality of memory cell transistors comprises a first source/drain region and a second source/drain region formed in the common semiconductor layer; a gate stack formed on a portion of the common semiconductor layer between the first source/drain region and the second source/drain region; and an electrical floating portion in the portion of the common semiconductor layer, a charge state of the electrical floating portion being adapted to adjust a threshold voltage and a channel conductance of the memory cell transistor. The plurality of memory cell transistors connected in series with each other along the common semiconductor layer provide a memory string.

Abstract: A semiconductor device and a method of fabricating the same are disclosed. A semiconductor device according to an embodiment of the present invention includes: a first type doped semiconductor substrate; a second type doped deep well configured such that one or more semiconductor device elements are formed therein; a first type doped first well formed inside a region surrounded by the deep well of the one surface of the semiconductor substrate, and separated from the semiconductor substrate by the deep well; a first electrical contact formed on a part of the one surface of the semiconductor substrate, and electrically connected to the first well; and a second electrical contact formed on another surface of the semiconductor substrate.

Abstract: A biosensor including: a first electrode; a second electrode spaced from the first electrode; a channel unit electrically connected at a portion with the first electrode and electrically connected at another portion with the second electrode; a stimuli source electrically connected with the channel unit and applying an electric stimulus; and probes connected to the channel unit and complementarily bound with target materials to sense.

Abstract: A semiconductor device and a method of fabricating the same are disclosed. A semiconductor device according to an embodiment of the present invention includes: a first type doped semiconductor substrate; a second type doped deep well configured such that one or more semiconductor device elements are formed therein; a first type doped first well formed inside a region surrounded by the deep well of the one surface of the semiconductor substrate, and separated from the semiconductor substrate by the deep well; a first electrical contact formed on a part of the one surface of the semiconductor substrate, and electrically connected to the first well; and a second electrical contact formed on another surface of the semiconductor substrate.

Abstract: The present invention discloses an asynchronous serial communication system and method. The asynchronous serial communication system may include a semiconductor device having two terminals and configured to receive a voltage required for an operation from data transmitted through one terminal; and a controller configured to perform asynchronous serial communication with the semiconductor device with two terminals. The asynchronous serial communication system may perform asynchronous serial communication between the semiconductor device and the controller in order to write or read data through the one terminal.

Abstract: A semiconductor device and a method of fabricating the same are disclosed. A semiconductor device according to an embodiment of the present invention includes: a first type doped semiconductor substrate; a second type doped deep well configured such that one or more semiconductor device elements are formed therein; a first type doped first well formed inside a region surrounded by the deep well of the one surface of the semiconductor substrate, and separated from the semiconductor substrate by the deep well; a first electrical contact formed on a part of the one surface of the semiconductor substrate, and electrically connected to the first well; and a second electrical contact formed on another surface of the semiconductor substrate.

Abstract: A reference potential adjusting apparatus is provided. The reference potential adjusting apparatus includes a reference potential measuring unit configured to measure a potential of a solution, a counter electrode disposed in the solution, and configured to change the potential of the solution through oxidation-reduction reactions with the solution, and a comparator configured to compare a measurement voltage provided by the reference voltage measuring unit to a reference voltage provided by a reference voltage supply unit, and to adjust reactions of the counter electrode with the solution according to the result of the comparison. The reference potential measuring unit includes a reference electrode, a common electrode disposed to be spaced apart from the reference electrode, and at least one nano structure contacting the reference electrode and the common electrode, and having electrical conductivity changing according to the potential of the solution.

Abstract: A memory includes at least one first substrate on which unit memory arrays are disposed as a matrix type, each unit memory array including unit memory cells disposed in an array, a second substrate stacked with the at least one first substrate, the second substrate including a sense amplifier region in which sense amplifiers configured to sense information stored in the unit memory cells are disposed, and a plurality of vertical conduction traces configured to electrically connect the at least one first substrate with the second substrate. The sense amplifier region is disposed in a memory region of the second substrate, wherein the memory region of the second substrate corresponds to the memory region of the first substrate.

Abstract: A memory includes at least one first substrate on which unit memory arrays are disposed as a matrix type, each unit memory array including unit memory cells disposed in an array, a second substrate stacked with the at least one first substrate, the second substrate including a sense amplifier region in which sense amplifiers configured to sense information stored in the unit memory cells are disposed, and a plurality of vertical conduction traces configured to electrically connect the at least one first substrate with the second substrate. The sense amplifier region is disposed in a memory region of the second substrate, wherein the memory region of the second substrate corresponds to the memory region of the first substrate.

Abstract: A binding enhancing apparatus according to the present invention includes: a first electrode; a second electrode spaced from the first electrode; a channel unit electrically connected at a portion with the first electrode and electrically connected at another portion with the second electrode; a stimuli source electrically connected with the channel unit and applying an electric stimulus; and probes connected to the channel unit and complementarily bound with target materials to sense.

Abstract: A semiconductor memory device includes a first first-type well including a first cell array for storing a data to apply the data to one of a first bit line and a first bit line bar, and a first precharge MOS transistor having a second-type channel for equalizing voltage levels of the first bit line and the first bit line bar; a first second-type well including a first sense amplifying MOS transistor having a first-type channel for sensing and amplifying the signal difference between the first bit line and the first bit line bar, and a first connection MOS transistor; and a second first-type well including a second sense amplifying MOS transistor having a second-type channel for sensing and amplifying the signal difference between the first bit line and the first bit line bar.