Abstract: A high voltage connector is provided that includes a female body, a male body, and a safety pin. The female body has an insertion bore, a push bar, and an engagement portion. The male body is inserted in the female body. An upper end portion of the male body has an engagement hook positioned to correspond to the engagement portion to engage the engagement hook and the engagement portion when the male body is inserted into the insertion bore of the female body. In addition, a first side of the safety pin is inserted in an upper portion of the insertion bore in the female body and contacts first sides of the engagement portion and the engagement hook A second side of the safety pin is exposed and has a pin recess into which a removal tool is to be inserted.

Abstract: An apparatus for manufacturing a polishing pad includes a housing including a body, an interconnection portion, and a discharging portion, and a stirrer located in the housing, the stirrer mixing a polishing pad composition and a pore forming material with each other. A diameter of the discharging portion is in a range of about 9 mm to about 16 mm.

Abstract: A polishing pad compound and a polishing pad, the polishing pad compound including a pre-polymer; and a hardener, wherein the pre-polymer includes about 45 wt % to about 50 wt % of a polyol, about 5 wt % to about 25 wt % of a hardness regulator, and a balance of an isocyanate.

Abstract: Provided is a chemical mechanical polishing (CMP) apparatus. The CMP apparatus may include a polishing pad including a plurality of concave regions. These concave regions may be two-dimensionally arranged in the polishing pad in a first direction and a second direction that are not perpendicular to each other and not parallel to each other. The concave regions arranged in the first direction may have a first pitch, and the concave regions arranged in the second direction may have a second pitch equal to the first pitch.