Patents by Inventor Jingwei Bai

Jingwei Bai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10350570
    Abstract: Provided herein are methods and compositions for placing single target molecules on a patterned substrate.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: July 16, 2019
    Assignee: ILLUMINA, INC.
    Inventors: Kevin L. Gunderson, Jingwei Bai, Boyan Boyanov
  • Patent number: 10041930
    Abstract: A nanodevice includes a nanochannel disposed through a dielectric material. A first electrode is disposed on a first side of the nanochannel, is formed within the dielectric material and has a surface exposed within the nanochannel. A second electrode is disposed on a second side of the nanochannel, is formed within the dielectric material and has a surface exposed within the nanochannel opposite the first electrode. A power circuit is connected between the first and second electrodes to create a potential difference between the first and second electrodes such that portions of a molecule can be identified by a change in electrical properties across the first and second electrodes as the molecule passes.
    Type: Grant
    Filed: June 28, 2013
    Date of Patent: August 7, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Jingwei Bai, Niina S. Haiminen, Laxmi P. Parida, Gustavo A. Stolovitzky
  • Publication number: 20180155773
    Abstract: The present disclosure provides a method for sequencing nucleic acids. The method can include polymerase catalyzed incorporation of nucleotides into a nascent nucleic acid strand against a nucleic acid template, wherein the polymerase is attached to a charge sensor that detects nucleotide incorporation events. One or more non-natural nucleotide types that each produce a unique signatures at the charge sensor can be used to uniquely identify different nucleotides in the template nucleic acid.
    Type: Application
    Filed: May 11, 2016
    Publication date: June 7, 2018
    Inventors: Kevin L Gunderson, Jingwei Bai, Cheng-Yao Chen, Jeffrey G Mandell, Sergio Peisajovich, Philip G Collins, Gregory A Weiss, Boyan Boyanov
  • Publication number: 20180141020
    Abstract: Provided herein are methods and compositions for placing single target molecules on a patterned substrate.
    Type: Application
    Filed: December 14, 2015
    Publication date: May 24, 2018
    Inventors: Kevin L. Gunderson, Jingwei Bai, Boyan Boyanov
  • Patent number: 9977002
    Abstract: A metal structure including a first metal end region, a second metal end region, and an intermediate region between the first metal end region and the second metal end region, wherein the intermediate region comprises a metal nanostructure having a plurality of pores.
    Type: Grant
    Filed: June 9, 2015
    Date of Patent: May 22, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Yann Astier, Jingwei Bai, Robert L. Bruce, Aaron D. Franklin, Joshua T. Smith
  • Publication number: 20180112265
    Abstract: A method of nucleic acid sequencing. The method can include the steps of (a) providing a polymerase tethered to a solid support charge sensor; (b) providing one or more nucleotides, whereby the presence of the nucleotide can be detected by the charge sensor; and (c) detecting incorporation of the nucleotide into a nascent strand complementary to a template nucleic acid.
    Type: Application
    Filed: December 12, 2017
    Publication date: April 26, 2018
    Inventors: Boyan BOYANOV, Jeffrey G. MANDELL, Jingwei BAI, Kevin L. GUNDERSON, Cheng-Yao CHEN, Michel PERBOST
  • Publication number: 20180037950
    Abstract: The present disclosure relates to the field of molecular biology and more specifically to microarrays and methods.
    Type: Application
    Filed: November 11, 2015
    Publication date: February 8, 2018
    Inventors: Kevin L. Gunderson, Jingwei Bai, Matthew William Kellinger, John M. Beierle, Jonathan Mark Boutell, Roberto Rigatti, Maria Candelaria Rogert Bacigalupo, Boyan Boyanov, Klaus Maisinger
  • Publication number: 20170260582
    Abstract: The disclosure provides detection apparatus having one or more nanopores, methods for making apparatus having one or more nanopore and methods for using apparatus having one or more nanopores. Uses include, but are not limited to detection and sequencing of nucleic acids.
    Type: Application
    Filed: July 29, 2015
    Publication date: September 14, 2017
    Inventors: BOYAN BOYANOV, JEFFREY G MANDELL, KEVIN L GUNDERSON, JINGWEI BAI, LIANGLIANG QIANG, BRADLEY BAAS
  • Publication number: 20160220996
    Abstract: A technique includes forming a gradient channel with width and depth gradients. A mask is disposed on top of a substrate. The mask is patterned with at least one elongated channel pattern having different elongated channel pattern widths. A channel is etched in the substrate in a single etching step, the channel having a width gradient and a corresponding depth gradient both simultaneously etched in the single etching step according to the different elongated channel pattern widths in the mask.
    Type: Application
    Filed: April 12, 2016
    Publication date: August 4, 2016
    Inventors: Jingwei Bai, Qinghuang Lin, Gustavo A. Stolovitzky, Chao Wang
  • Patent number: 9322061
    Abstract: A technique includes forming a gradient channel with width and depth gradients. A mask is disposed on top of a substrate. The mask is patterned with at least one elongated channel pattern having different elongated channel pattern widths. A channel is etched in the substrate in a single etching step, the channel having a width gradient and a corresponding depth gradient both simultaneously etched in the single etching step according to the different elongated channel pattern widths in the mask.
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: April 26, 2016
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Jingwei Bai, Qinghuang Lin, Gustavo A. Stolovitzky, Chao Wang, Deqiang Wang
  • Publication number: 20160017416
    Abstract: A method of nucleic acid sequencing. The method can include the steps of (a) providing a polymerase tethered to a solid support charge sensor; (b) providing one or more nucleotides, whereby the presence of the nucleotide can be detected by the charge sensor; and (c) detecting incorporation of the nucleotide into a nascent strand complementary to a template nucleic acid.
    Type: Application
    Filed: July 14, 2015
    Publication date: January 21, 2016
    Applicant: ILLUMINA, INC
    Inventors: Boyan BOYANOV, Jeffrey G. MANDELL, Jingwei BAI, Kevin L. GUNDERSON, Cheng-Yao CHEN, Michel Perbost
  • Patent number: 9188578
    Abstract: An anti-retraction capping material is formed on a surface of a nanowire that is located upon a dielectric membrane. A gap is then formed into the anti-retraction capping material and nanowire forming first and second capped nanowire structures of a nanodevice. The nanodevice can be used for recognition tunneling measurements including, for example DNA sequencing. The anti-retraction capping material serves as a mobility barrier to pin, i.e., confine, a nanowire portion of each of the first and second capped nanowire structures in place, allowing long-term structural stability. In some embodiments, interelectrode leakage through solution during recognition tunneling measurements can be minimized.
    Type: Grant
    Filed: September 30, 2013
    Date of Patent: November 17, 2015
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Yann A. N. Astier, Jingwei Bai, Satyavolu S. Papa Rao, Kathleen B. Reuter, Joshua T. Smith
  • Patent number: 9182369
    Abstract: A technique is provided for manufacturing a nanogap in a nanodevice. An oxide is disposed on a wafer. A nanowire is disposed on the oxide. A helium ion beam is applied to cut the nanowire into a first nanowire part and a second nanowire part which forms the nanogap in the nanodevice. Applying the helium ion beam to cut the nanogap forms a signature of nanowire material in proximity to at least one opening of the nanogap.
    Type: Grant
    Filed: June 19, 2013
    Date of Patent: November 10, 2015
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Yann Astier, Jingwei Bai, Michael A. Guillorn, Satyavolu S. Papa Rao, Joshua T. Smith
  • Patent number: 9168717
    Abstract: Solid state nanopore devices for nanopore applications and methods of manufacture are disclosed herein. The method includes forming a membrane layer on an underlying substrate. The method further includes forming a hole in the membrane layer. The method further comprises plugging the hole with a sacrificial material. The method further includes forming a membrane over the sacrificial material. The method further includes removing the sacrificial material within the hole and portions of the underlying substrate. The method further includes drilling an opening in the membrane, aligned with the hole.
    Type: Grant
    Filed: September 11, 2013
    Date of Patent: October 27, 2015
    Assignee: GLOBALFOUNDRIES U.S. 2 LLC
    Inventors: Yann Astier, Jingwei Bai, Satyavolu Papa Rao, Kathleen Reuter, Joshua T. Smith
  • Publication number: 20150300984
    Abstract: An apparatus for an electro-fluidic flow probe includes a body portion including an electro-fluidic bias tee for receiving (i) a fluid electrolyte and (ii) an electrical connection for providing an electrical potential to the fluid electrolyte; a first inlet including a tube extending from the first inlet to an outlet through the electro-fluidic bias tee; and a second inlet including the electrical connection having a wire that extends from the second inlet to the outlet through the electro-fluidic bias tee to transfer the electrical potential to a device under test.
    Type: Application
    Filed: December 17, 2014
    Publication date: October 22, 2015
    Inventors: Yann Andre Nicolas Astier, Jingwei Bai, Young Hoon Kwark, Stanislav Polonsky, Joshua T. Smith
  • Publication number: 20150300973
    Abstract: An apparatus for an electro-fluidic flow probe includes a body portion including an electro-fluidic bias tee for receiving (i) a fluid electrolyte and (ii) an electrical connection for providing an electrical potential to the fluid electrolyte; a first inlet including a tube extending from the first inlet to an outlet through the electro-fluidic bias tee; and a second inlet including the electrical connection having a wire that extends from the second inlet to the outlet through the electro-fluidic bias tee to transfer the electrical potential to a device under test.
    Type: Application
    Filed: June 19, 2015
    Publication date: October 22, 2015
    Inventors: Yann Andre Nicolas Astier, Jingwei Bai, Young Hoon Kwark, Stanislav Polonsky, Joshua T. Smith
  • Publication number: 20150268206
    Abstract: A metal structure including a first metal end region, a second metal end region, and an intermediate region between the first metal end region and the second metal end region, wherein the intermediate region comprises a metal nanostructure having a plurality of pores.
    Type: Application
    Filed: June 9, 2015
    Publication date: September 24, 2015
    Inventors: Yann Astier, Jingwei Bai, Robert L. Bruce, Aaron D. Franklin, Joshua T. Smith
  • Publication number: 20150252414
    Abstract: A technique includes forming a gradient channel with width and depth gradients. A mask is disposed on top of a substrate. The mask is patterned with at least one elongated channel pattern having different elongated channel pattern widths. A channel is etched in the substrate in a single etching step, the channel having a width gradient and a corresponding depth gradient both simultaneously etched in the single etching step according to the different elongated channel pattern widths in the mask.
    Type: Application
    Filed: March 6, 2014
    Publication date: September 10, 2015
    Applicant: International Business Machines Corporation
    Inventors: Jingwei Bai, Qinghuang Lin, Gustavo A. Stolovitzky, Chao Wang, Deqiang Wang
  • Patent number: 9128078
    Abstract: A technique is provided for manufacturing a nanogap in a nanodevice. An oxide is disposed on a wafer. A nanowire is disposed on the oxide. A helium ion beam is applied to cut the nanowire into a first nanowire part and a second nanowire part which forms the nanogap in the nanodevice. Applying the helium ion beam to cut the nanogap forms a signature of nanowire material in proximity to at least one opening of the nanogap.
    Type: Grant
    Filed: July 18, 2013
    Date of Patent: September 8, 2015
    Assignee: International Business Machines Corporation
    Inventors: Yann Astier, Jingwei Bai, Michael A. Guillorn, Satyavolu S. Papa Rao, Joshua T. Smith
  • Publication number: 20150241385
    Abstract: Solid state nanopore devices for nanopore applications and methods of manufacture are disclosed herein. The method includes forming a membrane layer on an underlying substrate. The method further includes forming a hole in the membrane layer. The method further comprises plugging the hole with a sacrificial material. The method further includes forming a membrane over the sacrificial material. The method further includes removing the sacrificial material within the hole and portions of the underlying substrate. The method further includes drilling an opening in the membrane, aligned with the hole.
    Type: Application
    Filed: May 7, 2015
    Publication date: August 27, 2015
    Inventors: Yann ASTIER, Jingwei BAI, Satyavolu PAPA RAO, Kathleen REUTER, Joshua T. SMITH