Abstract: A nanopore cell includes a titanium nitride (TiN) counter electrode configured to be at a first electric potential. The nanopore cell also include a working electrode configured to be at a second electric potential and an insulating wall. The insulating wall and the working electrode form at least a portion of a well configured to contain an electrolyte at a voltage that is at least a portion of an electric potential difference between the first electric potential of the titanium nitride counter electrode and the second electric potential of the working electrode.

Abstract: A nanopore cell includes a conductive layer and a working electrode disposed above the conductive layer and at the bottom of a well into which an electrolyte may be contained, such that at least a portion of a top base surface area of the working electrode is exposed to the electrolyte. The nanopore cell further includes a first insulating wall disposed above the working electrode and surrounding a lower section of a well, and a second insulating wall disposed above the first insulating wall and surrounding an upper section of the well, forming an overhang above the lower section of the well. The upper section of the well includes an opening that a membrane may span across, and wherein a base surface area of the opening is smaller than the at least a portion of the top base surface area of the working electrode that is exposed to the electrolyte.

Abstract: A nanopore cell is disclosed. The nanopore cell includes an electrolyte well having a bottom base, a surrounding sidewall, and a hydrophobic surface above the surrounding sidewall. The nanopore cell further includes a first layer of electrode material disposed on the bottom base of the electrolyte well. The nanopore cell further includes a second layer of electrode material disposed on the surrounding sidewall of the electrolyte well and electrically connected to the first layer of electrode material. The first layer of electrode material and the second layer of electrode material are configured to jointly provide capacitive coupling when an electrolyte is placed in the electrolyte well.

Abstract: Embodiments are disclosed for network devices and metadata transmission/receipt in a network. An example network device in a daisy-chain or ring network includes a network interface device, a processor, and a storage device storing instructions executable by the processor to allocate a channel in the network as a metadata channel, and synchronize with each other device in the network. The instructions are further executable to insert metadata into a metadata packet, and transmit the metadata packet on the allocated metadata channel alongside content transmitted on remaining channels of the network.

Abstract: A nanopore cell includes a conductive layer. The nanopore cell further includes a titanium nitride (TiN) working electrode disposed above the conductive layer. The nanopore cell further includes insulating walls disposed above the TiN working electrode, wherein the insulating walls and the TiN working electrode form a well into which an electrolyte may be contained. In some embodiments, the TiN working electrode comprises a spongy and porous TiN working electrode that is deposited by a deposition technique with conditions tuned to deposit sparsely-spaced TiN columnar structures or columns of TiN crystals above the conductive layer.

Abstract: A 3D gesture based interface for controlling audio information in flight deck applications is provided. The system and method utilize a set of simple, intuitive 3D gestures, and unburden the pilot of searching for specific audio device controls. The system and method are intuitive and enable the pilot to quickly silence or subdue non-essential audio information, before interfering with essential audio information.

Abstract: A biochip for molecular detection and sensing is disclosed. The biochip includes a substrate. The biochip includes a plurality of discrete sites formed on the substrate having a density of greater than five hundred wells per square millimeter. Each discrete site includes sidewalls disposed on the substrate to form a well. Each discrete site includes an electrode disposed at the bottom of the well. In some embodiments, the wells are formed such that cross-talk between the wells is reduced. In some embodiments, the electrodes disposed at the bottom of the wells are organized into groups of electrodes, wherein each group of electrodes shares a common counter electrode. In some embodiments, the electrode disposed at the bottom of the well has a dedicated counter electrode. In some embodiments, surfaces of the sidewalls are silanized such that the surfaces facilitate the forming of a membrane in or adjacent to the well.

Abstract: A method for repairing a blade forming a cathode and having a surface to be coated defining a critical area, utilizing an anode, an electrolyte bath including insoluble particles, and a mounting on which the blade is mounted in a working position relative to a reference wall. The mounting is placed in the bath, and the particles and the metal of the anode are co-deposited to form the coating on the surface to be coated. The anode is typically placed facing the critical area and the mounting includes a mechanism for monitoring current lines to obtain a coating with a relatively constant, predetermined thickness for the critical area, that gradually falls to a value of substantially zero along edges of the coating.

Abstract: An insect trapping device traps, kills and facilitates disposal of an insect. The device includes a handle which is hollow defining a conduit extending between a first end and a second end. A fan coupled to the handle in the conduit such that the fan provides suction into the first end of the handle. A cup is coupled to the first end of the handle for directing an insect into the first end of the handle. A receptacle is coupled to the second end of the handle and vented end such that the fan urges air flow out through the receptacle wherein the receptacle receives and holds the insect sucked through the first end of the handle.

Abstract: A modified electroplated nickel-based metallic alloy coating and method of forming the same is provided. The electroplated coatings exhibit unique microstructure and composition which improves performance over conventional metallic materials. The coatings have significantly higher strength at elevated service temperatures.

Abstract: A syringe for administering medicament from a cartridge. The syringe includes a sleeve having an interior for receiving the cartridge extending between a distal hub and a proximal opening. The syringe has a cap selectively covering the proximal opening for retaining the cartridge in the interior of the sleeve. The cap includes a finger grip extending outward from the sleeve for engaging fingers of a user. The syringe also has a plunger rod movably connected to the cap. The plunger rod has a distal connector for selectively connecting the rod to the cartridge plunger when the cartridge is received in the interior of the sleeve to push medicament from the cartridge reservoir as the plunger rod moves with respect to the cap.

Abstract: Particle-clean formulations and methods for semiconductor substrates use aqueous solutions of tetraethylammonium hydroxide (“TEAH,” C8H21NO) with or without hydrogen peroxide (H2O2). The solution pH ranges from 8-12.5. At process temperatures between 20-70 C, the TEAH solutions have been observed to remove particles from silicon-germanium (SiGe) with 20-99% Ge content in 15-300 seconds with very little etching (SiGe etch rates<1 nm/min).

Abstract: Two-step process sequences uniformly etch both tungsten-based and titanium-based structures on a substrate. A sequence of wet etches using peroxide and heated nitric acid uniformly recesses a metal stack that includes W, TiN, and TiAl. W, TiN and TiC are uniformly recessed by a peroxide etch at ˜25 C followed by an acid solution with a very small amount of added peroxide at ˜60 C. TiC is etched without etching trench oxides or other metals in a work-function metal stack by either (1) highly-dilute of ultra-dilute HF at 25-35 C, (2) dilute HCl at 25-60 C, (3) dilute NH4OH at 25-60 C, or (4) solution (2) or (3) with small amounts of peroxide. Other metals in the stack may then be plasma-etched without being blocked by TiC residues.

Abstract: A biochip for molecular detection and sensing is disclosed. The biochip includes a substrate. The biochip includes a plurality of discrete sites formed on the substrate having a density of greater than five hundred wells per square millimeter. Each discrete site includes sidewalls disposed on the substrate to form a well. Each discrete site includes an electrode disposed at the bottom of the well. In some embodiments, the wells are formed such that cross-talk between the wells is reduced. In some embodiments, the electrodes disposed at the bottom of the wells are organized into groups of electrodes, wherein each group of electrodes shares a common counter electrode. In some embodiments, the electrode disposed at the bottom of the well has a dedicated counter electrode. In some embodiments, surfaces of the sidewalls are silanized such that the surfaces facilitate the forming of a membrane in or adjacent to the well.

Abstract: An apparatus for dispensing a frozen confection is provided comprising: an insulated chamber (1) housing a container (3) of a frozen confection; a refrigeration system (8); a nozzle (4) having an inner end which is connected to the container (3); and an outer end which is located outside the insulated chamber; means for applying pressure to the frozen confection thereby to dispense it from the container (3); a cap (7) which can enclose the outer end (6) of the nozzle (4) when closed and which allows external access to the outer end (6) of the nozzle (4) when open; and one or more channels (12) which allow cold air to flow from the chamber into the region around the outer end of the nozzle; wherein the apparatus comprises a removable holder (10) that supports the container (3) and wherein the spaces between the container (3), the inside of the chamber and the underside of the holder form the one or more channels (12).

Abstract: Provided are methods for fabricating transistors using a gate last approach. These methods involve etching of titanium nitride and titanium carbide structures while preserving high k-dielectric structures. The titanium carbide structures may also include aluminum. Etching may be performed in one or more etching solutions, each including hydrogen peroxide. Titanium nitride and titanium carbide structures can be etched simultaneously (non-selectively) in the same etching solution that also includes hydrochloric acid, in addition to hydrogen peroxide, and maintained at about 25° C. and 85° C. In some embodiments, titanium nitride structures and titanium carbide structures may be etched separately (selectively) in different operations and using different etching solutions. The titanium nitride structures may be etched in a diluted hydrogen peroxide solution maintained at about 25° C. and 85° C.

Abstract: A 3D gesture based interface for controlling audio information in flight deck applications is provided. The system and method utilize a set of simple, intuitive 3D gestures, and unburden the pilot of searching for specific audio device controls. The system and method are intuitive and enable the pilot to quickly silence or subdue non-essential audio information, before interfering with essential audio information.

Abstract: Methods, apparatuses, and computer program products are herein provided for causing navigation notifications tailored for a helmet to be presented in the helmet. A determination may be made, such as by a processor, that a helmet is being worn by a user while a navigation event is occurring. A set of navigation notifications associated with the navigation event may be determined, where the set of navigation notifications is tailored for presentation in the helmet, and the set of navigation notifications may be presented in the helmet. Corresponding apparatuses and computer program products are also provided.

Abstract: A cryogenic refrigeration system is provided having particular application in cooling a Magnetic Resonance Imaging system. The cryogenic refrigeration system comprises a conduit arranged as a cooling circuit through which a coolant fluid is pumped, the conduit being in thermal communication with a least one cooled stage for cooling the coolant fluid to a first temperature, and wherein the conduit comprises a cryotrap in communication with the coolant fluid, the cryotrap being operable to remove contaminants from the coolant fluid by cryogenic pumping. The conduit further comprises a flow impedance for cooling the coolant fluid to a second temperature lower than the first temperature, and a hydrogen filter upstream of the flow impedance and in communication with the coolant fluid, the hydrogen filter being cooled to a temperature below the freezing point of hydrogen in the coolant fluid and operable to remove contaminant hydrogen from the coolant fluid.

Abstract: Two-step process sequences uniformly etch both tungsten-based and titanium-based structures on a substrate. A sequence of wet etches using peroxide and heated nitric acid uniformly recesses a metal stack that includes W, TiN, and TiAl. W, TiN and TiC are uniformly recessed by a peroxide etch at ˜25 C followed by an acid solution with a very small amount of added peroxide at ˜60 C. TiC is etched without etching trench oxides or other metals in a work-function metal stack by either (1) highly-dilute of ultra-dilute HF at 25-35 C, (2) dilute HCl at 25-60 C, (3) dilute NH4OH at 25-60 C, or (4) solution (2) or (3) with small amounts of peroxide. Other metals in the stack may then be plasma-etched without being blocked by TiC residues.