Abstract: A method for forming a capacitor array structure includes the following operations. A base is formed, which includes a substrate, a stack structure located on the substrate and a mask layer located on the stack structure in which an etching window that penetrates the mask layer in a direction perpendicular to the substrate is provided. The stack structure is etched along the etching window to form a capacitor hole that penetrates the stack structure along the direction perpendicular to the substrate. A conductive layer that fills up the capacitor hole and the etching window and covers a top surface of the mask layer is formed. The conductive layer and the mask layer at a top surface of the stack structure are removed, and the conductive layer remaining in the capacitor hole forms a lower electrode.

Abstract: The present application provides a method for preparing a semiconductor structure and a semiconductor structure, relating to the technical field of semiconductors. The method for preparing a semiconductor structure includes: providing a base; forming a support layer having capacitor holes and electric contact structures; forming a first dielectric layer in the capacitor holes, the first dielectric layer surrounding first intermediate holes; forming a first electrode layer in the first intermediate holes, the first electrode layer filling the first intermediate holes; removing part of the support layer to form second intermediate holes; forming a second dielectric layer in the second intermediate holes, the first dielectric layer and the second dielectric layer forming a dielectric layer; and, forming a second electrode layer on the dielectric layer.

Abstract: The present disclosure provides a manufacturing method of a semiconductor structure and a semiconductor structure, and relates to the technical field of semiconductors. The manufacturing method includes: providing a base, wherein the base is provided with an active region; forming a gate layer on the base; forming isolation structures on a periphery of the gate layer, wherein in a direction away from the gate layer, each of the isolation structures at least includes a hollow portion and an isolation portion; forming an insulating structure on top surfaces of the isolation structures; forming contact plugs, wherein the contact plugs penetrate the insulating structure; an end of each of the contact plugs close to the base is electrically connected to the active region; each of the contact plugs is located on a side of each of the isolation structures away from the gate layer.

Abstract: The present disclosure provides a manufacturing method of a semiconductor structure and a semiconductor structure. The manufacturing method includes: providing a substrate, where the substrate includes a complete die region and an incomplete die region; forming a stack on the substrate; forming a first mask layer with a first pattern on the stack; forming a first photoresist layer on the first mask layer; exposing the first photoresist layer, and developing to remove the first photoresist layer on the complete die region; and etching the stack by using the first mask layer on the complete die region and the first photoresist layer on the incomplete die region as masks.

Abstract: The present application relates to a mask structure, a semiconductor structure and methods for manufacturing the same. The method for manufacturing a mask structure includes: dividing an overall structure into two regions, and developing the array region and the periphery region with a negative photoresist.

Abstract: Devices and methods for photoacoustic tomography are disclosed herein. One exemplary photoacoustic tomography device uses a laser to produce acoustic waves in a sample. A transducer receives the acoustic waves through a slit formed by one or more blades positioned substantially parallel to the receiving aperture of the transducer. An acoustic absorber is affixed to each of the one or more blades along a surface proximal to the transducer. A processor acquires acoustic data and reconstructs photoacoustic tomographic images based on the acquired data. Reconstructing the image involves setting reconstruction parameters, defining a reconstruction area, reconstruction position, and pixel size, and calculating an acoustic travelling path for the sample to each transducer element. The acoustic travelling paths are saved into a three-dimensional array.

Abstract: The present invention relates to a drug conjugate of recombinant human serum albumin and a therapeutic drug. The drug conjugate is formed by covalent coupling a therapeutic drug to a free sulfhydryl group at position 34 of recombinant human serum albumin via a heterobifunctional linker. The drug conjugate of the present invention not only enhances the pharmacological action and improves the pharmacokinetics of the therapeutic drug, but also significantly increases the coupling efficiency of the therapeutic drug to human serum albumin, thereby reducing the production cost of the drug conjugate.

Abstract: A method for manufacturing a semiconductor structure includes: a substrate is provided, in which the substrate is provided with a peripheral area and an array area; an insulation layer is formed on the substrate; a first mask layer with a first mask pattern is formed on the insulation layer; the insulation layer is etched by taking the first mask layer as a mask, to form a contact hole in the array area; a first electrode layer is formed; a second mask layer with a second mask pattern is formed, in which the second mask layer is arranged on the first electrode layer; and the first electrode layer and the first mask layer are etched by taking the second mask layer as a mask until the insulation layer in the array area is exposed, in which a remaining portion of the first electrode layer forms a lower electrode layer.

Abstract: Embodiments of the present disclosure provide a patterning method and a semiconductor structure. The method includes: providing a substrate, wherein the substrate includes adjacent storage regions and peripheral circuit regions; forming, on the substrate, a pattern transfer layer, the pattern transfer layer having a plurality of first hard masks, wherein the first hard masks extend along a first direction and are spaced apart from each other; forming a barrier layer on the pattern transfer layer; forming, on the barrier layer, a plurality of second hard masks, the plurality of second hard masks extending along a second direction, wherein the second hard masks are spaced apart from each other, and the second hard masks are located in the storage regions and second hard masks close to the peripheral circuit regions have structural defects.

Abstract: Provided is a formation method of a semiconductor structure, including: providing a substrate having a first region and a second region, a plurality of discrete through holes being formed in the substrate, an arrangement density of the through holes in the first region being greater than that in the second region; forming a sacrificial layer filling the through holes; etching some thickness of the substrate around the sacrificial layer to form openings, the openings surrounding the sacrificial layer, a depth of the opening being less than a depth of the through hole in a direction perpendicular to a surface of the substrate; and removing the sacrificial layer, the openings communicating with the corresponding through holes to form trenches.

Abstract: The present disclosure discloses a capacitor structure and its formation method and a memory. The method includes: providing a substrate; forming an electrode support structure on the substrate in a stacking fashion, wherein the electrode support structure includes at least a first support layer on its top, a capacitor hole is formed at intervals within the electrode support structure and extends upwards in a direction perpendicular to a surface of the substrate; forming, within the capacitor hole, an electrode post and an electrode layer extending from the electrode post to the upper surface of the first support layer; removing the electrode layer; removing the first support layer; forming a dielectric layer on the top of the electrode support structure, wherein the dielectric layer covers the top of the electrode post, and an outer peripheral wall of the top of the electrode post is connected with the dielectric layer.

Abstract: Provided are a method and apparatus for determining a blockage of a filter of a clothes dryer and a clothes dryer. The clothes dryer includes a motor. The method includes following steps. An actual rotational speed of the motor is acquired, and an electrical parameter corresponding to a rotational speed range to which the actual rotational speed belongs is determined as a first threshold corresponding to the actual rotational speed; an actual clothes volume in the clothes dryer is acquired, and the first threshold is corrected according to a correction coefficient corresponding to a clothes volume range to which the actual clothes volume belongs so that a second threshold is obtained; and an actual electrical parameter of the motor is acquired, and when it is detected that the actual electrical parameter is less than the second threshold, it is determined that the filter of the clothes dryer is blocked.

Abstract: A method for manufacturing a semiconductor structure includes: providing a base; forming multiple discrete first mask layers on the base; forming multiple sidewall layers, in which each sidewall layer is configured to encircle one of the first mask layers, and each sidewall layer is connected to closest sidewall layers, the side walls, away from the first mask layers, of multiple connected sidewall layers define initial first vias and each of the initial first vias is provided with chamfers; removing the first mask layers, and each sidewall layer defines a second via; after removing the first mask layers, forming repair layers which are located on the side walls, away from the second vias, of the sidewall layers and fill the chamfers of the initial first vias to form first vias; and etching the base along the first vias and the second vias to form capacitor holes on the base.

Abstract: The present disclosure relates to a networked ecological conservation water-saving system for urban mass green land, comprising 5-9 ecological conservation water-saving devices which are orderly arranged in the urban green land per square meter. The ecological conservation water-saving devices are arranged in a central symmetry manner. Each ecological conservation water-saving device comprises a columnar housing and an infiltrating irrigation unit. A first water storage unit is provided at the center of each infiltrating irrigation unit, and a second water storage unit is provided at the lower part of each first water storage unit. The networked ecological conservation water-saving system further comprises a first water delivery pipe network, a second water delivery pipe network, and a third water delivery pipe network.

Abstract: The present disclosure discloses a method for manufacturing a capacitor, a capacitor array structure and a semiconductor memory. The method for manufacturing a capacitor includes: providing an underlayer; forming a substrate to be etched on the underlayer; enabling a wafer to include a central area and an edge area; forming a first hard mask layer having a first pattern in the central area on the substrate to be etched; using the first hard mask layer as a mask to etch the substrate to be etched, to form capacitor holes; depositing a lower electrode layer; and sequentially forming a capacitor dielectric layer and an upper electrode layer.

Abstract: A method for manufacturing a memory includes: providing a substrate, capacitor contact pads being formed in the substrate; forming a laminated structure on the substrate, the laminated structure including a first laminated structure formed on the substrate and a second laminated structure formed on the first laminated structure; forming first through holes in the second laminated structure; forming a protective layer on side walls of the first through holes, the protective layer in the first through holes enclosing second through holes; and etching the first laminated structure along the second through holes to form third through holes, the third through holes exposing the capacitor contact pads.

Abstract: A capacitor structure and a method of preparing the same are provided. The method includes the followings. A substrate is provided. A stacked layer is formed on the substrate. A plurality of first via holes penetrating through the stacked layer are formed. The first via hole is filled with a conductive material to form a conductive pillar. A plurality of second via holes penetrating through the stacked layer are formed at a preset radius with the conductive pillar as an axis. The second via hole surrounds the conductive pillar circumferentially. The second via hole is filled with the conductive material to form an annular top electrode with a second gear.

Abstract: A laminated capacitor and a method for manufacturing the same are provided. The method includes operations of providing a substrate; forming a first isolation insulation spacer and a plurality of discrete bottom bonding pads on the substrate; forming a sub-capacitor structure on the bottom bonding pads, which comprises a plurality of discrete bottom electrodes, a plurality of discrete top electrodes, and a dielectric medium located between the bottom electrodes and the top electrodes, wherein the plurality of bottom bonding pads are respectively electrically connected with the plurality of bottom electrodes in one-to-one correspondence; and repeatedly performing an operation of forming a connection structure and the sub-capacitor structure for N times on the sub-capacitor structure, such that N connection structures and N+1 sub-capacitor structures are alternately arranged along a direction perpendicular to the substrate, wherein N is an integer greater than or equal to 1.

Abstract: A wearable device includes a case and a detection module. The case includes an inner casing and an outer casing. The inner casing includes a main body and a lateral wall. The main body is an annular structure. The lateral wall is disposed on a lateral side of the main body. The main body has a first installation area, a second installation area and a third installation area. The outer casing is disposed around the inner casing and abuts against the lateral wall, and the outer casing has a first opening. The detection module is disposed inside the case. The detection module includes an energy storage unit, an information transmission unit and an optical identification assembly. The energy storage unit is located on the first installation area. The information transmission unit is located on the second installation area. The optical identification assembly is located on the third installation area.

Abstract: Embodiments provide a method for fabricating an array structure of a columnar capacitor and a semiconductor structure. In the method, before a mask layer is removed, a photoresist layer is filled to adjust a thickness of the mask layer in a peripheral region and a thickness of the mask layer in an array region to be equal, thereby preventing a top support layer from being worn due to impacts of different thicknesses of the mask layers on a thickness of the top support layer. In addition, in the method, a third sacrificial layer and an auxiliary layer are further formed to perform dual protection on the top support layer, thereby preventing the top support layer from being thinned in subsequent processes, to increase support strength of the top support layer, thereby further preventing the columnar capacitor from tilting due to insufficient support strength of the top support layer.