Patents by Inventor Jung-Sik Choi

Jung-Sik Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140183728
    Abstract: A wafer supporting structure includes a supporting substrate for supporting a wafer, a release layer for detaching the wafer from the supporting substrate, and an adhesive layer for attaching the wafer to the supporting substrate.
    Type: Application
    Filed: January 3, 2014
    Publication date: July 3, 2014
    Inventors: Jun-Won HAN, Jae-Hyun KIM, Tae-Hoon KIM, Ho-Geun LEE, You-Jeong JEONG, Jung-Sik CHOI
  • Patent number: 8715895
    Abstract: Disclosed are a photosensitive resin composition for a color filter that includes (A) a binder resin including phenol-based resin represented by the following Chemical Formula 1; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent, and a color filter using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: August 21, 2012
    Date of Patent: May 6, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Jung-Sik Choi, Chang-Min Lee, Min-Sung Kim, Jin-Woo Park, Myung-Ho Cho
  • Publication number: 20130164683
    Abstract: Disclosed are a photosensitive resin composition for a color filter that includes (A) a binder resin including phenol-based resin represented by the following Chemical Formula 1; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent, and a color filter using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: August 21, 2012
    Publication date: June 27, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Jung-Sik CHOI, Chang-Min LEE, Min-Sung KIM, Jin-Woo PARK, Myung-Ho CHO
  • Patent number: 8419978
    Abstract: An anisotropic conductive film (ACF) composition includes a binder having a thermoplastic resin and a styrene-acrylonitrile (SAN) copolymer resin, a curing composition, and conductive particles.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: April 16, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Hyoun Young Kim, Chang Bum Chung, Jeong Ku Kang, Jung Sik Choi
  • Patent number: 8318053
    Abstract: Disclosed is a photosensitive resin composition including (A) a photopolymerizable monomer including a compound represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification, (B) a binder resin, (C) a photopolymerization initiator, (D) a pigment and (E) a solvent, and a color filter using the same.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: November 27, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Jung-Sik Choi, Chang-Min Lee, Jin-Woo Park, Kyung-Won Ahn, Myung-Ho Cho
  • Publication number: 20120251724
    Abstract: The ?-ketoimine ligand is represented by the following formula 1: wherein R1 and R2 are each independently a C1-C5 alkyl group. A metal complex compound includes the ?-ketoimine ligand. A method of forming the ?-ketoimine ligand and a method of forming a thin film using the metal complex compound including ?-ketoimine ligand are provided.
    Type: Application
    Filed: March 30, 2012
    Publication date: October 4, 2012
    Inventors: Youn-Joung CHO, Senji WADA, Jung-Sik CHOI, Jin-Seo LEE, Atsushi SAKURAI, Kyoo-Chul CHO, Atsuya YOSHINAKA, Haruyoshi SATO, Junji UEYAMA., Tomoharu YOSHINO, Masako SHIMIZU
  • Patent number: 8273270
    Abstract: Disclosed are a photosensitive resin composition that includes (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2, wherein the substituents of Chemical Formulae 1 and 2 are the same as defined in the specification, (B) reactive unsaturated compound, (C) a pigment, (D) an initiator, and (E) a solvent, and a light blocking layer using the photosensitive resin composition.
    Type: Grant
    Filed: June 16, 2011
    Date of Patent: September 25, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Chang-Min Lee, Kil-Sung Lee, Jun-Seok Kim, Jung-Sik Choi
  • Patent number: 8268397
    Abstract: Disclosed are an organometallic precursor that may be used in manufacturing a semiconductor device, a thin film having the same, a metal wiring including the thin film, a method of forming a thin film and a method of manufacturing a metal wiring. An organometallic precursor including a central metal, a borohydride ligand and an amine ligand for reducing a polarity of the organometallic precursor may be provided onto a substrate, and may be thermally decomposed to form a thin film on the substrate. The organometallic precursor having a reduced polarity may be provided to a chamber with a constant flow rate, and thus stability and/or efficiency of a semiconductor manufacturing process may be improved.
    Type: Grant
    Filed: July 31, 2008
    Date of Patent: September 18, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Youn-Joung Cho, Jung-Ho Lee, Jun-Hyun Cho, Seung-Min Ryu, Kyoo-Chul Cho, Jung-Sik Choi
  • Publication number: 20120211369
    Abstract: A copper electroplating method including dipping a substrate in a copper electroplating solution, the substrate including a seed layer; and forming a copper electroplating layer on the seed layer, wherein the copper electroplating solution includes water, a copper supply source, an electrolytic material, and a first additive, the first additive includes a compound represented by Formula 1, below:
    Type: Application
    Filed: November 7, 2011
    Publication date: August 23, 2012
    Inventors: Myung-Beom Park, Jung-Sik Choi, Ki-Hyeon Kim, Yuji Morishima, Shin-ichi Tanaka, Takashi Yamada, Takehiro Zushi
  • Publication number: 20120193238
    Abstract: A composition for plating copper includes an electrolyte solution, an accelerator, a suppressor and a leveler. The electrolyte solution includes a soluble copper salt, sulfuric acid and hydrochloric acid. The accelerator includes about 20 to about 60 ppm of a disulfide compound. The suppressor includes about 40 to about 100 ppm of a polyethyleneoxide (PEO)-polypropyleneoxide (PPO)-polyethyleneoxide (PEO) triblock copolymer. The PEO-PPO-PEO triblock copolymer has a weight average molecular weight of about 300 to about 10,000. The leveler includes about 0.01 to about 100 ppm of arylated polyethyleneimine.
    Type: Application
    Filed: November 2, 2011
    Publication date: August 2, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Myung-Beom Park, Ki-Hyeon Kim, Jung-Sik Choi, Jung-Ho Lee
  • Publication number: 20120161088
    Abstract: Disclosed is a photosensitive resin composition including (A) a photopolymerizable monomer including a compound represented by the following Chemical Formula 1, wherein the substituents of Chemical Formula 1 are the same as defined in the specification, (B) a binder resin, (C) a photopolymerization initiator, (D) a pigment and (E) a solvent, and a color filter using the same.
    Type: Application
    Filed: August 25, 2011
    Publication date: June 28, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Jung-Sik CHOI, Chang-Min LEE, Jin-Woo PARK, Kyung-Won AHN, Myung-Ho CHO
  • Publication number: 20120091407
    Abstract: Disclosed are a photosensitive resin composition that includes (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2, (B) reactive unsaturated compound, (C) a pigment, (D) an initiator, and (E) a solvent, and a light blocking layer using the photosensitive resin composition. In Chemical Formulae 1 and 2, each substituent is the same as defined in the specification.
    Type: Application
    Filed: June 16, 2011
    Publication date: April 19, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Kil-Sung LEE, Jun-Seok KIM, Jung-Sik CHOI
  • Patent number: 8138057
    Abstract: A metal oxide alloy layer comprises a first layer including a first metal oxide and having a first thickness, and a second layer formed on the first layer, the second layer including a second metal oxide and having a second thickness, wherein a value of the first thickness is such that the first metal oxide is allowed to move into the second layer and a value of the second thickness is such that the second metal oxide is allowed to move into the first layer to form a single-layered structure in which the first and second metal oxides are mixed.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: March 20, 2012
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Jung-Ho Lee, Jung-Sik Choi, Jun-Hyun Cho, Tae-Min Eom, Ji-Hyun Lee
  • Patent number: 8036103
    Abstract: The present invention relates to a portable internet radio access station, and more particularly, to a portable internet radio access station including a plurality of management processors and a method of controlling the plurality of management processors.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: October 11, 2011
    Assignee: SeAH Networks Co., Ltd.
    Inventors: Jun-Ho Chung, Sung-Soo Oh, Shin-Ha Kang, Jung-Sik Choi
  • Publication number: 20110133130
    Abstract: An anisotropic conductive film (ACF) composition includes a binder having a thermoplastic resin and a styrene-acrylonitrile (SAN) copolymer resin, a curing composition, and conductive particles.
    Type: Application
    Filed: January 28, 2011
    Publication date: June 9, 2011
    Applicant: CHEIL INDUSTRIES, INC.
    Inventors: HYOUN YOUNG KIM, Chang Bum Chung, Jeong Ku Kang, Jung Sik Choi
  • Patent number: 7879259
    Abstract: An anisotropic conductive film (ACF) composition includes a binder having a thermoplastic resin and a styrene-acrylonitrile (SAN) copolymer resin, a curing composition, and conductive particles.
    Type: Grant
    Filed: October 17, 2007
    Date of Patent: February 1, 2011
    Assignee: Cheil Industries, Inc.
    Inventors: Hyoun Young Kim, Chang Bum Chung, Jeong Ku Kang, Jung Sik Choi
  • Patent number: 7851789
    Abstract: The present invention provides a photosensitive resin composition for a pad protective layer that includes (A) an alkali soluble resin, (B) a reactive unsaturated compound, (C) a photoinitiator, and (D) a solvent. The (A) alkali soluble resin includes a copolymer including about 5 to about 50 wt % of a unit having the Chemical Formula 1, about 1 to about 25 wt % of a unit having the Chemical Formula 2, and about 45 to about 90 wt % of a unit having the Chemical Formula 3, and a method of making an image sensor using the photosensitive resin composition.
    Type: Grant
    Filed: December 8, 2008
    Date of Patent: December 14, 2010
    Assignee: Cheil Industries Inc.
    Inventors: Kil-Sung Lee, Jae-Hyun Kim, Chang-Min Lee, Eui-June Jeong, Kwen-Woo Han, O-Bum Kwon, Jung-Sik Choi, Jong-Seob Kim, Tu-Won Chang, Jung-Hyun Cho, Seul-Young Jeong
  • Patent number: 7700007
    Abstract: Disclosed herein is an anisotropic conductive film forming composition, including at least one polymer comprising a polymer containing a silane group; at least one polymerizable compound; and a plurality of conductive particles. The at least one polymer may include an elastomeric polymer and a filler polymer, at least one of which contains a silane group. The at least one polymerizable compound may include a cross-linking agent and/or a polymerization reaction enhancer. The cross-linking agent may also have a silane group. In addition, the film forming composition may include a solvent. The film forming composition is advantageous in that the resulting anisotropic conductive film exhibits enhanced peel and adhesive strength and low electrical contact resistance.
    Type: Grant
    Filed: November 14, 2005
    Date of Patent: April 20, 2010
    Assignee: Cheil Industries, Inc.
    Inventors: Ki Sung Jung, Jeong Ku Kang, Jung Sik Choi, Jong Hwa Lee, Hyoun Young Kim, Tu Won Chang
  • Publication number: 20100084277
    Abstract: A composition for copper plating and associated methods, a method of forming a copper wiring including forming an insulation layer having a recessed portion on a substrate, and forming a copper layer on the insulation layer to fill the recessed portion by performing an electroplating process using a composition that includes an aqueous electrolyte solution containing a copper ion and at least one of a disulfide compound represented by Formula 1, a betaine compound represented by at least one of Formulae 3 and 4, and a triblock copolymer of polyethylene oxide-polypropylene oxide-polyethylene oxide (PEO-PPO-PEO) having a weight average molecular weight of about 2,500 to about 5,000 g/mol and an ethylene oxide content (EO %, w/w) of about 30% to about 60%.
    Type: Application
    Filed: October 6, 2009
    Publication date: April 8, 2010
    Inventors: Myung-Beom Park, Hye-Young Jin, Jin-Seo Lee, Hye-Jin Cha, Jung-Sik Choi, Jung-Ho Lee, Ki-Hag Lee
  • Patent number: 7662448
    Abstract: A photosensitive resin composition for forming column spacers for a liquid crystal display device is provided. The composition includes an alkali-soluble resin, a reactive unsaturated compound, a photoinitiator and a solvent. The alkali-soluble resin includes structural units represented by Formulae 1, 2 and 3, which are described in the specification. A pattern formed using the composition is also provided. The pattern shows improved thickness uniformity, good developability without leaving any residual image, superior solvent resistance and high recovery rate.
    Type: Grant
    Filed: December 10, 2007
    Date of Patent: February 16, 2010
    Assignee: Cheil Industries Inc.
    Inventors: Jae Sun Han, Jeong Min Hong, Jung Sik Choi, Kil Sung Lee