Abstract: A method for configuring the placement of a plurality of storage cells on an integrated circuit includes grouping the plurality of storage cells into a plurality of words, where each of the plurality of words is protected by an error control mechanism. The method also includes placing each of the storage cells on the integrated circuit such that a distance between any two of the storage cells belonging to one of the plurality of words is greater than a minimum distance. The minimum distance is configured such that a probability of any of the plurality of words experiencing multiple radiation induced errors is below a threshold value.

Abstract: A modular refrigeration unit (MRU) health monitor includes a log data input configured to receive log data from an MRU, the log data comprising a plurality of datapoints, each of the plurality of datapoints comprising a position of a control valve of the MRU and a corresponding time; and MRU health monitoring logic configured to determine a plurality of MRU parameters from log data received on the log data input; determine a plurality of MRU health flags based on the MRU parameters; add the plurality of MRU health flags to determine an MRU health score; determine whether the MRU health score is higher than a replacement threshold; and indicate replacement of the MRU in the event the MRU health score is higher than the replacement threshold.

Abstract: Automated control of a cooling system cooling at least one electronic component is provided. The control includes monitoring over a period of time variation of an operational variable of the cooling system or of the at least one electronic component, and based, at least in part, on variation of the operational variable over the period of time, automatically determining whether to adjust control of the cooling system to limit variation of the operational variable. In one implementation, depending on the variation of the operational variable, and whether control of the cooling system has been previously adjusted, the method may further include automatically determining a probability of fail or an expected residual life of the cooling system, and responsive to the predicted probability of fail exceeding a first acceptable threshold or the expected residual life being below a second acceptable threshold, automatically scheduling for a cooling system repair or replacement.

Abstract: A field programmable gate array (FPGA) includes configuration RAM (CRAM) including at least one non-hardened portion and at least one hardened portion having an SER resilience greater than an SER resilience of the non-hardened portion.

Abstract: Automated control of a cooling system cooling at least one electronic component is provided. The control includes monitoring over a period of time variation of an operational variable of the cooling system or of the at least one electronic component, and based, at least in part, on variation of the operational variable over the period of time, automatically determining whether to adjust control of the cooling system to limit variation of the operational variable. In one implementation, depending on the variation of the operational variable, and whether control of the cooling system has been previously adjusted, the method may further include automatically determining a probability of fail or an expected residual life of the cooling system, and responsive to the predicted probability of fail exceeding a first acceptable threshold or the expected residual life being below a second acceptable threshold, automatically scheduling for a cooling system repair or replacement.

Abstract: A field programmable gate array (FPGA) includes configuration RAM (CRAM) including at least one non-hardened portion and at least one hardened portion having an SER resilience greater than an SER resilience of the non-hardened portion.

Abstract: A method for modular refrigeration unit (MRU) health monitoring includes receiving log data on a log data input from the MRU by a MRU health monitor, the log data comprising a plurality of datapoints, each of the plurality of datapoints comprising a position of a control valve of the MRU and a corresponding time; determining by the MRU health monitor a plurality of MRU parameters from the log data; determining a plurality of MRU health flags based on the MRU parameters; adding the plurality of MRU health flags to determine an MRU health score; determining whether the MRU health score is higher than a replacement threshold; and indicating replacement of the MRU in the event the MRU health score is higher than the replacement threshold.

Abstract: A field programmable gate array (FPGA) includes configuration RAM (CRAM) including at least one non-hardened portion and at least one hardened portion having an SER resilience greater than an SER resilience of the non-hardened portion.

Abstract: A method to reduce large temperature over/undershoot in a computer system. Using workload data, the method proactively modifies controls of mechanical cooling system to anticipate power and take appropriate actions to maintain temperature. Workload control modifies workload and scheduling to reduce power transients and subsequent temperature deviations. In addition, workload control allows more even distribution of temp across chips, allowing for even wear and reduction of small/ripple/noise temp oscillations. A system and program product for carrying out the method are also provided.

Abstract: A method of determining one or more transistors within a particular circuit to be respectively replaced with a hardened transistor includes: identifying, as not requiring hardening, one or more transistors; identifying, as candidates for hardening, each transistor in the circuit not previously identified as not requiring hardening; and employing the hardened transistor in place of a transistor identified as a candidate for hardening. The circuit is a latch and the transistor is an SOI CMOS FET. The transistor is also an SOI transistor. The series transistor includes first and second series-connected transistors having a shared source/drain region whereby a drain of the first series-connected transistor is merged with a source of the second series-connected transistor.

Abstract: An alpha particle blocking structure and method of making the structure. The structure includes: a semiconductor substrate; a set of interlevel dielectric layers stacked from a lowermost interlevel dielectric layer closest to the substrate to a uppermost interlevel dielectric layer furthest from the substrate, each interlevel dielectric layer of the set of interlevel dielectric layers including electrically conductive wires, top surfaces of the wires substantially coplanar with top surfaces of corresponding interlevel dielectric layers; an electrically conductive tot final pad contacting a wire pad of the uppermost interlevel dielectric layer; an electrically conductive plating base layer contacting a top surface of the terminal pad; and a copper block on the plating base layer.

Abstract: An alpha particle blocking structure and method of making the structure. The structure includes: a semiconductor substrate; a set of interlevel dielectric layers stacked from a lowermost interlevel dielectric layer closest to the substrate to a uppermost interlevel dielectric layer furthest from the substrate, each interlevel dielectric layer of the set of interlevel dielectric layers including electrically conductive wires, top surfaces of the wires substantially coplanar with top surfaces of corresponding interlevel dielectric layers; an electrically conductive terminal pad contacting a wire pad of the uppermost interlevel dielectric layer; an electrically conductive plating base layer contacting a top surface of the terminal pad; and a copper block on the plating base layer.

Abstract: A method for reducing single event upsets in an integrated circuit includes the step of providing a plurality of levels within the integrated circuit, wherein the plurality of levels within the integrated circuit are in a stacked arrangement. The method also includes the step of providing a plurality of metal fill patterns within each of the plurality of levels within the integrated circuit. The method further includes the step of placing the plurality of metal fill patterns within at least one of the plurality of levels in a pattern such that a line of sight towards an active silicon layer does not exist within the stacked arrangement of the plurality of levels, thereby increasingly absorbing ionizing radiation particles, and thereby reducing single event upsets in the integrated circuit.

Abstract: A method of determining one or more transistors within a particular circuit to be respectively replaced with a hardened transistor includes: identifying, as not requiring hardening, one or more transistors; identifying, as candidates for hardening, each transistor in the circuit not previously identified as not requiring hardening; and employing the hardened transistor in place of a transistor identified as a candidate for hardening. The circuit is a latch and the transistor is an SOI CMOS FET. The transistor is also an SOI transistor. The series transistor includes first and second series-connected transistors having a shared source/drain region whereby a drain of the first series-connected transistor is merged with a source of the second series-connected transistor.

Abstract: A method of determining one or more transistors within a particular circuit to be respectively replaced with a hardened transistor includes: identifying, as not requiring hardening, one or more transistors; identifying, as candidates for hardening, each transistor in the circuit not previously identified as not requiring hardening; and employing the hardened transistor in place of a transistor identified as a candidate for hardening. The circuit is a latch and the transistor is an SOI CMOS FET. The transistor is also an SOI transistor. The series transistor includes first and second series-connected transistors having a shared source/drain region whereby a drain of the first series-connected transistor is merged with a source of the second series-connected transistor.

Abstract: A method for reducing single event upsets in an integrated circuit includes the step of providing a plurality of levels within the integrated circuit, wherein the plurality of levels within the integrated circuit are in a stacked arrangement. The method also includes the step of providing a plurality of metal fill patterns within each of the plurality of levels within the integrated circuit. The method further includes the step of placing the plurality of metal fill patterns within at least one of the plurality of levels in a pattern such that a line of sight towards an active silicon layer does not exist within the stacked arrangement of the plurality of levels, thereby increasingly absorbing ionizing radiation particles, and thereby reducing single event upsets in the integrated circuit.

Abstract: Each one of a pair of CMOS transistors is formed in its own island and a gate terminal for each transistor is formed by a single, in-line conductor connecting both gate terminals together. This type of “in-line” connection achieves nearly a five-time improvement in the reduction of the ability of ionizing radiation particles to strike both transistors at the same time as compared to prior art “side-by-side” transistor stacking through use of a relatively smaller solid angle spanning the two transistors. This results in “hardening” of the transistors and improving their resistance to single event upsets and, thus, improving the soft error rate (SER) of the transistors.

Abstract: Methods for preventing cavitation in high aspect ratio dielectric regions in a semiconductor device, and the device so formed, are disclosed. The invention includes depositing a first dielectric in the high aspect ratio dielectric region between a pair of structures, and then removing the first dielectric to form a bearing surface adjacent each structure. The bearing surface prevents cavitation of the interlayer dielectric that subsequently fills the high aspect ratio region.

Abstract: A method for forming a transistor. A semiconductor substrate is provided. The semiconductor substrate is patterned to provide a first body edge. A first gate structure of a first fermi level is provided adjacent the first body edge. The semiconductor substrate is patterned to provide a second body edge. The first and second body edges of the semiconductor substrate define a transistor body. A second gate structure of a second fermi level is provided adjacent the second body edge. A substantially uniform dopant concentration density is formed throughout the transistor body.

Abstract: An iterative timing analysis is analytically performed before a chip is fabricated, based on a methodology using optical proximity correction techniques for shortening the gate lengths and adjusting metal line widths and proximity distances of critical time sensitive devices. The additional mask is used as a selective trim to form shortened gate lengths or wider metal lines for the selected, predetermined transistors, affecting the threshold voltages and the RC time constants of the selected devices. Marker shapes identify a predetermined subgroup of circuitry that constitutes the devices in the critical timing path. The analysis methodology is repeated as often as needed to improve the timing of the circuit with shortened designed gate lengths and modified RC timing constants until manufacturing limits are reached. A mask is made for the selected critical devices using OPC techniques.