Patents by Inventor Kazuyuki Hayashi

Kazuyuki Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reflective mask blank for EUV lithography and substrate with functional film for the same
    Patent number: 7833682
    Abstract: To provide an EUV mask blank of which the decrease in the reflectance during EUV exposure is suppressed, and a substrate with a functional film to be used for production of such an EUV mask blank. A substrate with a reflective layer for EUV lithography, comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer formed in this order on the substrate, wherein the protective layer contains ruthenium (Ru) and at least one element selected from the group consisting of boron (B) and zirconium (Zr); and in the protective layer, the Ru content is from 70 at % to 95 at % and the total content of B and Zr is from 5 at % to 30 at %.
    Type: Grant
    Filed: August 27, 2008
    Date of Patent: November 16, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama, Masaki Mikami
  • SOFT MAGNETIC MATERIAL, POWDER MAGNETIC CORE AND METHOD OF MANUFACTURING SOFT MAGNETIC MATERIAL
    Publication number: 20100255188
    Abstract: A soft magnetic material is a soft magnetic material including a composite magnetic particle (30) having a metal magnetic particle (10) mainly composed of Fe and an insulating coating (20) covering metal magnetic particle (10), and insulating coating (20) contains an iron phosphate compound and an aluminum phosphate compound. The atomic ratio of Fe contained in a contact surface of insulating coating (20) in contact with metal magnetic particle (10) is larger than the atomic ratio of Fe contained in the surface of insulating coating (20). The atomic ratio of Al contained in the contact surface of insulating coating (20) in contact with metal magnetic particle (10) is smaller than the atomic ratio of Al contained in the surface of insulating coating (20). Thus, iron loss can be reduced.
    Type: Application
    Filed: June 16, 2010
    Publication date: October 7, 2010
    Applicants: SUMITOMO ELECTRIC INDUSTRIES, LTD., TODA KOGYO CORP.
    Inventors: Toru MAEDA, Naoto Igarashi, Haruhisa Toyoda, Hirokazu Kugai, Kazuyuki Hayashi, Hiroko Morii, Seiji Ishitani
  • Color agent for road marking material and road marking material using the same
    Patent number: 7807733
    Abstract: A color agent for a road marking material comprising composite particles having an average particle diameter of 0.01 to 10.0 ?m, said composite particles comprising: inorganic particles; a gluing agent coating layer formed on surface of said inorganic particle; and an organic pigment coat formed onto said gluing agent coating layer in an amount of from 1 to 500 parts by weight based on 100 parts by weight of said inorganic particles. The color agent for a road marking material, contains no harmful elements and exhibits excellent tinting strength, hiding power, light resistance and heat resistance, and is suppressed in surface activity thereof. The road marking material using the color agent, shows a less change in hue with the passage of time and an excellent retroreflective property.
    Type: Grant
    Filed: July 13, 2007
    Date of Patent: October 5, 2010
    Assignee: Toda Kogyo Corporation
    Inventors: Kazuyuki Hayashi, Hiroko Morii, Yusuke Shimohata
  • Soft magnetic material, powder magnetic core and method of manufacturing soft magnetic material
    Patent number: 7767034
    Abstract: A soft magnetic material is a soft magnetic material including a composite magnetic particle (30) having a metal magnetic particle (10) mainly composed of Fe and an insulating coating (20) covering metal magnetic particle (10), and insulating coating (20) contains an iron phosphate compound and an aluminum phosphate compound. The atomic ratio of Fe contained in a contact surface of insulating coating (20) in contact with metal magnetic particle (10) is larger than the atomic ratio of Fe contained in the surface of insulating coating (20). The atomic ratio of Al contained in the contact surface of insulating coating (20) in contact with metal magnetic particle (10) is smaller than the atomic ratio of Al contained in the surface of insulating coating (20). Thus, iron loss can be reduced.
    Type: Grant
    Filed: September 29, 2005
    Date of Patent: August 3, 2010
    Assignees: Sumitomo Electric Industries, Ltd., Toda Kogyo Corp.
    Inventors: Toru Maeda, Naoto Igarashi, Haruhisa Toyoda, Hirokazu Kugai, Kazuyuki Hayashi, Hiroko Morii, Seiji Ishitani
  • Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blank
    Patent number: 7736821
    Abstract: To provide a substrate with a conductive film for an EUV mask blank having an increased surface hardness, and a substrate with a reflective multilayer film and an EUV mask blank using such a substrate with a conductive film. A substrate with a conductive film to be used for production of a reflective mask blank for EUV lithography, characterized in that the chief material of the conductive film is at least one member selected from the group consisting of Cr, Ti, Zr, Nb, Ni and V, and the conductive film contains B (boron) at an average concentration of from 1 to 70 at %.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: June 15, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazuyuki Hayashi, Takashi Sugiyama, Masaki Mikami
  • Reflective mask blank for EUV lithography
    Patent number: 7718324
    Abstract: A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %, and wherein the absorber layer has a content of N being 0 to at most 35 at. %.
    Type: Grant
    Filed: February 8, 2008
    Date of Patent: May 18, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama
  • Reflective mask blank for EUV lithography
    Patent number: 7713666
    Abstract: To provide a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in a wavelength region of EUV light or light for inspection of a pattern and which is easy to control to have a desired layer composition and thickness. A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta) and hafnium (Hf), and in the absorber layer, the content of Hf is from 20 to 60 at. % and the content of Ta is from 40 to 80 at. %.
    Type: Grant
    Filed: February 7, 2008
    Date of Patent: May 11, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama
  • METHOD OF PRODUCING L-AMINO ACID
    Publication number: 20100047878
    Abstract: An L-amino acid is produced by culturing a microorganism belonging to the family Enterobacteriaceae having an L-amino acid-producing ability and modified so that glycerol dehydrogenase and dihydroxyacetone kinase activities are increased, in a medium containing glycerol as a carbon source to produce and accumulate an L-amino acid in the medium or cells, and collecting the L-amino acid from the medium or the cells.
    Type: Application
    Filed: August 24, 2009
    Publication date: February 25, 2010
    Inventors: Yuri Nagai, Kazuyuki Hayashi, Takuji Ueda, Yoshihiro Usuda, Kazuhiko Matsui
  • REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
    Publication number: 20100035165
    Abstract: Provision of a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in the wavelength regions of EUV light and pattern inspection light and whose film composition and film thickness are easily controllable to desired ones. A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B) and silicon (Si), and in the absorber layer, the content of B is at least 1 at. % and less than 5 at. % and the content of Si is from 1 to 25 at. %, and wherein the absorber layer contains no nitrogen (N) or at most 10 at. % of N.
    Type: Application
    Filed: October 14, 2009
    Publication date: February 11, 2010
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: KAZUYUKI HAYASHI, KAZUO KADOWAKI, MASAKI MIKAMI, TAKASHI SUGIYAMA
  • PROCESS FOR PRODUCING FERROMAGNETIC METAL PARTICLES AND MAGNETIC RECORDING MEDIUM
    Publication number: 20100035087
    Abstract: The present invention relates to ferromagnetic metal particles having an average major axis diameter (L) of 10 to 100 nm which satisfy a relationship between the average major axis diameter (L) and a particle SFD represented by the following formula: Particle SFD?0.0001 L2?0.0217 L+1.75; a process for producing the ferromagnetic metal particles; and a magnetic recording medium using the ferromagnetic metal particles.
    Type: Application
    Filed: August 5, 2009
    Publication date: February 11, 2010
    Applicant: TODA KOGYO CORPORATION
    Inventors: Hiroko Morii, Keisuke Iwasaki, Seiji Ishitani, Mineko Ohsugi, Shinji Horie, Toshiharu Harada, Takehiro Matsuo, Yosuke Yamamoto, Kazuyuki Hayashi
  • REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND SUBSTRATE WITH FUNCTIONAL FILM FOR THE MASK BLANK
    Publication number: 20090253055
    Abstract: Provided are a substrate with a conductive film for an EUV mask blank in which the generation of particles due to abrasion between an electrostatic chuck and the substrate is prevented; and a substrate with a multilayer reflective film and an EUV mask blank each employing such a substrate with a conductive film. A substrate with a conductive film to be used for producing a reflective mask blank for EUV lithography, the conductive film containing chromium (Cr) and nitrogen (N), the average concentration of N in the conductive film being at least 0.1 atomic % and less than 40 atomic %, the crystal state of at least a surface of the conductive film being amorphous, the sheet resistance of the conductive film being at most 27 ?/?, and the surface roughness (rms) of the conductive film being at most 0.5 nm.
    Type: Application
    Filed: June 12, 2009
    Publication date: October 8, 2009
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Kazuyuki Hayashi, Kazuo Kadowaki, Takashi Sugiyama
  • SILICA-BASED SINGLE CORE OPTICAL FIBER, SILICA-BASED MULTI CORE OPTICAL FIBER, AND FABRICATION METHOD FOR THE SAME
    Publication number: 20090245742
    Abstract: A silica-based multi core optical fiber and a fabrication method for the same are provided, and include two or more cores of GeO2—SiO2 glass including an fluorine concentration not less than about 15 w % and a germanium concentration about 0.05 wt % to 2 wt %, in a core. A relative refractive index difference of a cladding and a core is not less than about 3%; and a ratio of a cladding diameter to a core diameter is about 1.02 to 3.0. A silica-based single core optical fiber is also provided, and includes a core having a germanium concentration not less than about 15 wt % and an fluorine concentration about 0.05 wt % to 2 wt %.
    Type: Application
    Filed: December 12, 2008
    Publication date: October 1, 2009
    Applicant: FUJIKURA LTD.
    Inventors: Manabu Kudou, Kazuyuki Hayashi, Takashi Tsumanuma
  • FERROMAGNETIC METAL PARTICLES AND PROCESS FOR PRODUCING THE SAME, AND MAGNETIC RECORDING MEDIUM
    Publication number: 20090220823
    Abstract: The present invention relates to ferromagnetic metal particles having a bulk density (?a) of not more than 0.25 g/cm3, a process for producing the above ferromagnetic metal particles and a magnetic recording medium comprising a non-magnetic substrate; a non-magnetic undercoat layer formed on the non-magnetic substrate which comprises non-magnetic particles and a binder resin; and a magnetic recording layer formed on the non-magnetic undercoat layer which comprises magnetic particles and a binder resin, wherein the above ferromagnetic metal particles were used as the magnetic particles.
    Type: Application
    Filed: February 27, 2009
    Publication date: September 3, 2009
    Applicant: TODA KOGYO CORPORATION
    Inventors: Hiroko MORII, Seiji Ishitani, Keisuke Iwasaki, Hirofumi Nishikawa, Mineko Ohsugi, Toshiharu Harada, Takahiro Matsuo, Yosuke Yamamoto, Kazuyuki Hayashi
  • PROCESS FOR PRODUCING MAGNETIC METAL PARTICLES FOR MAGNETIC RECORDING, AND MAGNETIC RECORDING MEDIUM
    Publication number: 20090202867
    Abstract: The present invention relates to a process for producing magnetic metal particles for magnetic recording, comprising: heat-treating goethite particles having an aluminum content of 4 to 50 atom % in terms of Al based on whole Fe to obtain hematite particles; and heat-reducing the hematite particles at a temperature of 200 to 600° C., the goethite particles being obtained by adding a peroxodisulfate to a reaction solution comprising: a ferrous salt aqueous solution and a mixed alkali aqueous solution comprising: an alkali hydrogen carbonate aqueous solution or alkali carbonate aqueous solution and an alkali hydroxide aqueous solution before initiation of an oxidation reaction of the reaction solution, and then conducting the oxidation reaction.
    Type: Application
    Filed: February 3, 2009
    Publication date: August 13, 2009
    Applicant: TODA KOGYO CORPORATION
    Inventors: Mineko Ohsugi, Toshiharu Harada, Takahiro Matsuo, Yosuke Yamamoto, Kazuyuki Hayashi
  • SPUTTERING TARGET USED FOR PRODUCTION OF REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
    Publication number: 20090130574
    Abstract: To provide a sputtering target to be used for production of an EUV mask blank, capable of preventing particles by film peeling even when formation of a reflective multilayer film as a reflective layer and a Ru layer as a protective layer is carried out at a production level using actual machines for a large number of cycles. A sputtering target for forming a ruthenium (Ru) layer in a reflective layer for reflecting EUV light on a substrate, which contains Ru and at least one element selected from the group consisting of boron (B) and zirconium (Zr) in a total content of B and Zr of from 5 at % to 50 at %.
    Type: Application
    Filed: January 14, 2009
    Publication date: May 21, 2009
    Applicant: Asahi Glass Company, Limited
    Inventors: Kazuyuki Hayashi, Takashi Sugiyama
  • SOFT MAGNETIC MATERIAL, DUST MAGNETIC CORE, PROCESS FOR PRODUCING SOFT MAGNETIC MATERIAL AND PROCESS FOR PRODUCING DUST MAGNETIC CORE
    Publication number: 20090047519
    Abstract: The soft magnetic material includes a plurality of composite magnetic particles having a metal magnetic particle and an insulating film surrounding the surface of the metal magnetic particle. The metal magnetic particle contains iron as the main component. The insulating film contains aluminum, silicon, phosphorus, and oxygen. The insulating film satisfies the relationship 0.4?MAl/(MAl+MSi)?0.9 and the relationship of 0.25?(MAl+MSi)/MP?1.0 in the case that molar amount of aluminum contained in the insulating film is represented by MAl, the sum of the molar amount of aluminum contained in the insulating film and the molar amount of silicon contained in the insulating film is represented by (MAl+MSi), and the molar amount of phosphorus contained in the insulating film is represented by MP.
    Type: Application
    Filed: November 22, 2006
    Publication date: February 19, 2009
    Applicants: SUMITOMO ELECTRIC INDUSTRIES, LTD., TODA KOGYO CORP.
    Inventors: Toru Maeda, Naoto Igarashi, Haruhisa Toyoda, Seiji Ishitani, Hiroko Morii, Kazuyuki Hayashi
  • NON-MAGNETIC PARTICLES FOR NON-MAGNETIC UNDERCOAT LAYER OF MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM
    Publication number: 20090042064
    Abstract: The present invention relates to non-magnetic particles for non-magnetic undercoat layer of magnetic recording medium, comprising: hematite particles; an inner coating layer comprising a phosphorus-containing inorganic compound which is formed on a surface of the respective hematite particles; and an outer coating layer comprising an aluminum-containing inorganic compound which is formed on an outside of the inner coating layer comprising the phosphorus-containing inorganic compound.
    Type: Application
    Filed: August 8, 2008
    Publication date: February 12, 2009
    Applicant: TODA KOGYO CORPORATION
    Inventors: Seiji ISHITANI, Hiroko Morii, Kazuyuki Hayashi
  • PARTICLE AND PREPARATION CONTAINING THE PARTICLE
    Publication number: 20090022915
    Abstract: The present invention relates to a particle having a mean particle size of 0.01 to 20 ?m, containing tert-butyl (4R)-4-{[((1R)-2-[(1-benzylpiperidin-4-yl)amino]-1-{[(cyclohexylmethyl)thio]methyl}-2-oxoethyl)amino]carbonyl}-1,3-thiazolidine-3-carboxylate. A preparation containing the particle is excellent in pulmonary delivery through inhalation and is easy to handle because of excellent dispersibility of the particle, and thus the present compound can be used as a pulmonary preparation.
    Type: Application
    Filed: March 8, 2006
    Publication date: January 22, 2009
    Applicant: ONO PHARMACEUTICAL CO., LTD.,
    Inventors: Hideo Masuda, Hikaru Sugihara, Akio Nishiura, Kazuyuki Hayashi
  • Process for producing composite cathode active material for non-aqueous electrolyte secondary cell
    Publication number: 20090017384
    Abstract: The present invention relates to a process for producing a composite cathode active material for a non-aqueous electrolyte secondary cell which is subjected to surface treatment, comprising: previously mixing the cathode active material with a surface-treating component in the form of a metal compound containing one or more metal elements selected from the group consisting of the first transition series elements and the second transition series elements; and then coating the cathode active material with the surface-treating component using an apparatus capable of effecting a high-speed shearing action.
    Type: Application
    Filed: July 8, 2008
    Publication date: January 15, 2009
    Applicant: TODA KOGYO CORPORATION
    Inventors: Keisuke Iwasaki, Kazuyuki Hayashi
  • Functional material, dispersion containing the functional material, and process for producing the functional material
    Publication number: 20090007821
    Abstract: A functional material comprising fine coloring particles having an average primary particle diameter of 1 to 50 nm in a dried state, and having a BET specific surface area value of to 500 m2/g and a light transmittance of not less than 80%. The functional material composed of fine coloring particles, exhibits not only an excellent transparency but also a high tinting strength and a clear hue.
    Type: Application
    Filed: September 4, 2008
    Publication date: January 8, 2009
    Applicant: TODA KOGYO CORPORATION
    Inventors: Mamoru KAMIGAKI, Hiroko MORII, Kazuyuki HAYASHI, Toru IWAKI