Patents by Inventor Keiji Emoto

Keiji Emoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10564541
    Abstract: A method of forming a pattern on a substrate includes forming a group of first patterns so as to define a first region on each of a plurality of substrates by using a projection exposure apparatus, and forming a group of second patterns so as to define a second region on the first region of each of substrates different from each other out of the plurality of substrates by using a plurality of imprint apparatuses. A plurality of second regions, which are respectively defined by the plurality of imprint apparatuses in the forming the group of second patterns, are different in shape but have a common component. In the forming the group of first patterns, the first regions are deformed in accordance with the common component.
    Type: Grant
    Filed: February 1, 2017
    Date of Patent: February 18, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tatsuya Hayashi, Keiji Emoto
  • Patent number: 10303069
    Abstract: The present invention provides a pattern forming method of forming a plurality of pattern layers on a substrate by using a plurality of lithography apparatuses including a first lithography apparatus and a second lithography apparatus, the method comprising a first step of forming a first pattern layer by the first lithography apparatus which adopts a die-by-die alignment method, based on alignment information obtained by using the die-by-die alignment method for a plurality of marks formed on the substrate by a lithography apparatus which adopts a global alignment method, and a second step of forming a second pattern layer so as to overlap with the first pattern layer by the second lithography apparatus, based on alignment information obtained by using the global alignment method for a plurality of shot regions formed on the substrate by the first lithography apparatus in the first step.
    Type: Grant
    Filed: September 11, 2015
    Date of Patent: May 28, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Eiji Sakamoto, Keiji Emoto, Yutaka Watanabe
  • Patent number: 10241424
    Abstract: An imprint apparatus includes: a stage configured to hold the substrate; a detector configured to detect a relative position between a shot region and the mold in a direction parallel to a surface of the substrate; and a controller configured to obtain, in an imprint process on a shot region different from a target shot region, information relating to a relative position, between the other shot region and the mold, used for aligning the other shot region after bringing the mold and the imprint material into contact with each other, and, when performing the imprint process on the target shot region, adjust a relative position between the target shot region and the mold in the direction by using a detection result on the target shot region and the obtained information.
    Type: Grant
    Filed: October 16, 2014
    Date of Patent: March 26, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tosiya Asano, Keiji Emoto
  • Publication number: 20180356741
    Abstract: An imprint apparatus forms a pattern on a substrate by curing an imprint material on the substrate while the imprint material is in contact with a mold. The imprint apparatus includes a substrate chuck having a substrate holding region for holding the substrate, a peripheral member arranged to surround the side surface of the substrate held by the substrate chuck, and a control unit configured to control a cleaning process for cleaning at least a partial region of the peripheral member by using a cleaning member including a charging unit. The cleaning process includes an operation for attracting a particle in the partial region to the charging unit by moving the cleaning member relative to the peripheral member while the charging unit faces at least the partial region of the peripheral member.
    Type: Application
    Filed: August 20, 2018
    Publication date: December 13, 2018
    Inventors: Yoichi Matsuoka, Kiyohito Yamamoto, Hisanobu Azuma, Shigeru Terashima, Toshihiro Maeda, Masami Yonekawa, Keiji Emoto, Kazuki Nakagawa
  • Patent number: 10105892
    Abstract: An imprint apparatus is provided with: an application unit; a substrate holding unit including an auxiliary plate; a gas supply unit including multiple supply outlets, which supplies gas to an interstice between a mold and a substrate, in conjunction with movement of a shot region by driving of the substrate holding unit from an application position of the application unit to a pressing position where pressing is conducted, when pressing the mold against an uncured resin applied to the shot region; and a controller which selects a supply outlet to supply the gas so that the supply outlet that supplies the gas among the multiple supply outlets is opposed by either the substrate or the auxiliary plate, while the shot region to which the uncured resin was applied is moved toward the pressing position, and which controls a direction of movement of the shot region.
    Type: Grant
    Filed: February 26, 2013
    Date of Patent: October 23, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kazuki Nakagawa, Keiji Emoto
  • Publication number: 20170285495
    Abstract: The present invention provides a pattern forming method of forming a plurality of pattern layers on a substrate by using a plurality of lithography apparatuses including a first lithography apparatus and a second lithography apparatus, the method comprising a first step of forming a first pattern layer by the first lithography apparatus which adopts a die-by-die alignment method, based on alignment information obtained by using the die-by-die alignment method for a plurality of marks formed on the substrate by a lithography apparatus which adopts a global alignment method, and a second step of forming a second pattern layer so as to overlap with the first pattern layer by the second lithography apparatus, based on alignment information obtained by using the global alignment method for a plurality of shot regions formed on the substrate by the first lithography apparatus in the first step.
    Type: Application
    Filed: September 11, 2015
    Publication date: October 5, 2017
    Inventors: Eiji Sakamoto, Keiji Emoto, Yutaka Watanabe
  • Publication number: 20170227855
    Abstract: A method of forming a pattern on a substrate includes forming a group of first patterns so as to define a first region on each of a plurality of substrates by using a projection exposure apparatus, and forming a group of second patterns so as to define a second region on the first region of each of substrates different from each other out of the plurality of substrates by using a plurality of imprint apparatuses. A plurality of second regions, which are respectively defined by the plurality of imprint apparatuses in the forming the group of second patterns, are different in shape but have a common component. In the forming the group of first patterns, the first regions are deformed in accordance with the common component.
    Type: Application
    Filed: February 1, 2017
    Publication date: August 10, 2017
    Inventors: Tatsuya Hayashi, Keiji Emoto
  • Publication number: 20170057154
    Abstract: An imprint apparatus according to an embodiment of the present invention includes a supply unit configured to supply an imprint material on a substrate, a pattern formation unit including a holder holding a mold, the pattern formation unit being configured to bring the mold in contact with the imprint material supplied by the supply unit to form a pattern, a prevention unit configured to supply a gas in a direction intersecting a direction along the substrate to prevent a foreign matter from attaching to the substrate, and a removal unit configured to locally supply a fluid to the substrate to remove a foreign matter on the substrate.
    Type: Application
    Filed: August 23, 2016
    Publication date: March 2, 2017
    Inventors: Tatsuya Hayashi, Hisanobu Azuma, Keiji Emoto, Yoshikazu Miyajima
  • Patent number: 9435642
    Abstract: A position measuring apparatus configured to measure a position of an measured object using a plate-like scale including a grating pattern, includes a supporting unit configured to be arranged between a structure and the scale and to support the scale, in which the supporting unit includes a spring element that reduces vibration transferred from the structure to the scale in a plate thickness direction.
    Type: Grant
    Filed: April 16, 2013
    Date of Patent: September 6, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Keiji Emoto, Naoki Maruyama
  • Publication number: 20160223918
    Abstract: An imprint apparatus includes: a stage configured to hold the substrate; a detector configured to detect a relative position between a shot region and the mold in a direction parallel to a surface of the substrate; and a controller configured to obtain, in an imprint process on a shot region different from a target shot region, information relating to a relative position, between the other shot region and the mold, used for aligning the other shot region after bringing the mold and the imprint material into contact with each other, and, when performing the imprint process on the target shot region, adjust a relative position between the target shot region and the mold in the direction by using a detection result on the target shot region and the obtained information.
    Type: Application
    Filed: October 16, 2014
    Publication date: August 4, 2016
    Inventors: Tosiya Asano, Keiji Emoto
  • Patent number: 9217937
    Abstract: A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position.
    Type: Grant
    Filed: October 29, 2013
    Date of Patent: December 22, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Zenichi Hamaya, Keiji Emoto, Ryo Takai, Shinichiro Hirai
  • Patent number: 9158211
    Abstract: A scanning exposure apparatus exposes a plurality of shot regions on a substrate to light while scanning an original and the substrate. The apparatus includes: a stage which holds the substrate and moves; and a controller which controls movement of the stage based on a driving profile that defines the movement of the stage. A portion in the driving profile, which defines the movement of the stage during exposure of at least one shot region, is formed by a sine wave having a frequency lower than a resonance frequency in a stage controller.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: October 13, 2015
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Keiji Emoto, Tomohiro Harayama
  • Patent number: 9132458
    Abstract: At least three processing machines are positioned on a supporting structure including a plurality of beams spaced apart from each other. The at least three processing machines include a first processing machine, a second processing machine supported by at least one of beams which support the first processing machine, and a third processing machine supported by beams different from all the beams which support the first processing machine. A distance between the first processing machine and the second processing machine, at which an amount of vibration transferred from the first processing machine to the second processing machine becomes smaller than a predetermined amount, is determined, thereby positioning the first processing machine and the second processing machine with a distance not less than the determined distance.
    Type: Grant
    Filed: October 3, 2012
    Date of Patent: September 15, 2015
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tetsuji Okada, Keiji Emoto, Noriyasu Hasegawa
  • Patent number: 9104121
    Abstract: An exposure apparatus includes: a substrate stage configured to move upon holding the substrate; a structural member configured to support a substrate stage; a first counter mass stage configured to cancel a driving reaction force that is generated due to driving of the substrate stage and acts on the structural member; a substrate stage driver configured to generate a force between the substrate stage and the first counter mass stage; a first counter mass driver configured to generate a force between the structural member and the first counter mass stage; a controller configured to control the first counter mass driver so as to cancel the force that acts on the structural member by generating a force between the structural member and the first counter mass stage using the first counter mass driver.
    Type: Grant
    Filed: July 11, 2012
    Date of Patent: August 11, 2015
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Keiji Emoto, Tosiya Asano
  • Patent number: 8956143
    Abstract: A lithography system includes at least two lithography apparatuses disposed on the same fixed base, each of which includes an object, a moving body, and a vibration isolation unit. A control unit configured to control the lithography apparatuses controls a vibration isolation unit included in a first lithography apparatus based on driving instruction information to be given to a moving body included in a second lithography apparatus, and a control indicator regarding vibration directed onto an object to be vibration-isolated included in the first lithography apparatus due to a moving operation of the moving body.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: February 17, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Mitsuhiro Furumoto, Keiji Emoto
  • Publication number: 20150042012
    Abstract: An imprint apparatus is provided with: an application unit; a substrate holding unit including an auxiliary plate; a gas supply unit including multiple supply outlets, which supplies gas to an interstice between a mold and a substrate, in conjunction with movement of a shot region by driving of the substrate holding unit from an application position of the application unit to a pressing position where pressing is conducted, when pressing the mold against an uncured resin applied to the shot region; and a controller which selects a supply outlet to supply the gas so that the supply outlet that supplies the gas among the multiple supply outlets is opposed by either the substrate or the auxiliary plate, while the shot region to which the uncured resin was applied is moved toward the pressing position, and which controls a direction of movement of the shot region.
    Type: Application
    Filed: February 26, 2013
    Publication date: February 12, 2015
    Inventors: Kazuki Nakagawa, Keiji Emoto
  • Patent number: 8915479
    Abstract: The present invention provides an anti-vibration apparatus including an anti-vibration base, a plurality of supporting mechanisms configured to support the anti-vibration base, a plurality of actuators configured to apply a force to the anti-vibration base, an obtaining unit configured to obtain vibration data which represents vibrations on the anti-vibration base, a first calculation unit configured to calculate, based on the vibration data obtained by the obtaining unit, a force to be applied to the anti-vibration base so as to reduce the vibrations on the anti-vibration base, and a distribution unit configured to distribute the force calculated by the first calculation unit to forces to be applied by the plurality of actuators to the anti-vibration base.
    Type: Grant
    Filed: August 8, 2012
    Date of Patent: December 23, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Mitsuhiro Furumoto, Tosiya Asano, Keiji Emoto
  • Patent number: 8891054
    Abstract: A stage device includes a base and a stage movable portion that is movable along a surface of the base. An interferometer measures a position of the stage movable portion using measurement light. At least one of a piping element and a wiring element are connected to the stage movable portion. An auxiliary member, including a plurality of members connected with each other along an axial direction of the piping element, guides a bend of the at least one of the piping element and the wiring element. A plurality of heat insulating sheets are supported by the plurality of members of the auxiliary member. The plurality of heat insulating sheets are provided between a space through which the measurement light of the interferometer passes, and the at least one of the piping element and the wiring element.
    Type: Grant
    Filed: December 14, 2011
    Date of Patent: November 18, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hitoshi Sato, Yasuhito Sasaki, Keiji Emoto
  • Publication number: 20140125962
    Abstract: A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position.
    Type: Application
    Filed: October 29, 2013
    Publication date: May 8, 2014
    Applicant: Canon Kabushiki Kaisha
    Inventors: Zenichi Hamaya, Keiji Emoto, Ryo Takai, Shinichiro Hirai
  • Publication number: 20130293889
    Abstract: A position measuring apparatus configured to measure a position of an measured object using a plate-like scale including a grating pattern, includes a supporting unit configured to be arranged between a structure and the scale and to support the scale, in which the supporting unit includes a spring element that reduces vibration transferred from the structure to the scale in a plate thickness direction.
    Type: Application
    Filed: April 16, 2013
    Publication date: November 7, 2013
    Inventors: Keiji Emoto, Naoki Maruyama